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    • 1. 发明授权
    • Illumination optical system and exposure apparatus including the same
    • 照明光学系统和包括其的曝光装置
    • US07538856B2
    • 2009-05-26
    • US12179506
    • 2008-07-24
    • Kazuhiko KajiyamaToshihiko Tsuji
    • Kazuhiko KajiyamaToshihiko Tsuji
    • G03B27/54G03B27/42
    • G03F7/70075G03B27/42
    • An illumination optical system includes a first optical unit that collects light emitted from a light source; a reflective integrator that has a plurality of cylindrical reflection surfaces, whose generating lines are oriented in a uniform direction, and forms a plurality of linear light sources by using the light emitted from the first optical unit; a pair of flat mirrors that are disposed parallel to the generating lines so as to face each other with the plurality of linear light sources residing therebetween; an aperture stop that is disposed perpendicular to the generating lines and has an opening for allowing the light emitted from the plurality of linear light sources to pass therethrough; and a second optical unit that integrates beams of the light emitted from the plurality of linear light sources that have passed through the opening one on top of another in an illumination target plane.
    • 照明光学系统包括:第一光学单元,其收集从光源发射的光; 反射积分器,其具有多个圆筒反射面,其发生线沿均匀方向取向,并且通过使用从第一光学单元发射的光形成多个线性光源; 一对平面反射镜,其平行于所述发生线布置成彼此面对,所述多个线性光源位于它们之间; 一个孔径光阑,其垂直于所述生成线设置并具有用于允许从所述多个线性光源发出的光通过的开口; 以及第二光学单元,其将在已经穿过所述开口的多个线性光源发射的光的光束在照明目标平面中积分。
    • 2. 发明授权
    • Exposure apparatus
    • 曝光装置
    • US07714987B2
    • 2010-05-11
    • US11870626
    • 2007-10-11
    • Kazuhiko KajiyamaToshihiko Tsuji
    • Kazuhiko KajiyamaToshihiko Tsuji
    • G03B27/72
    • G03B27/72G03F7/70075
    • An exposure apparatus includes a first optical unit configured to condense light from a light source, a catoptric integrator configured to form plural secondary light sources using light from the first optical unit, the catoptric integrator including plural cylindrical reflection surfaces having the same generatrix direction, an aperture stop arranged perpendicular to the generatrix direction, and a second optical unit configured to superpose light from each secondary light source onto an illumination surface, wherein the catoptric integrator includes plural integrator parts each having plural cylindrical reflection surfaces, and the plural integrator parts are arranged in a direction perpendicular to the generatrix direction and to an arrangement direction of the cylindrical reflection surfaces and located at an incident side of the aperture stop.
    • 曝光装置包括被配置为使来自光源的光聚光的第一光学单元,使用来自第一光学单元的光形成多个次级光源的反射积分器,该反射积分器包括具有相同母线方向的多个圆柱形反射面, 孔径光阑,垂直于母线方向排列;第二光学单元,被配置为将来自每个次级光源的光叠加到照明表面上,其中,所述反射积分器包括多个具有多个圆柱形反射面的积分器部分,并且所述多个积分器部件布置 在垂直于母线方向的方向和圆柱形反射表面的排列方向上并且位于孔径光阑的入射侧。
    • 3. 发明申请
    • ILLUMINATION OPTICAL SYSTEM AND EXPOSURE APPARATUS
    • 照明光学系统和曝光装置
    • US20100053584A1
    • 2010-03-04
    • US12552941
    • 2009-09-02
    • Kazuhiko KajiyamaToshihiko Tsuji
    • Kazuhiko KajiyamaToshihiko Tsuji
    • G03B27/72
    • G03B27/72G03F7/70075
    • An illumination optical system includes first and second reflection integrators. The second reflection integrator forms a plurality of linear light sources using light from the first reflection integrator. The illumination optical system further includes a pair of flat plane mirrors that are arranged parallel to the meridional line direction on the second reflection integrator and opposite to each other so as to sandwich the plurality of linear light sources in between, a unit for changing an aperture shape of an aperture stop arranged at an exit side of the second reflection integrator in a direction perpendicular to the meridional line direction so that the aperture stop has an optical Fourier transformation relationship with the surface to be illuminated, and an adjustment unit configured to adjust an interval between the pair of flat plane mirrors as the aperture shape of the aperture stop is changed.
    • 照明光学系统包括第一和第二反射积分器。 第二反射积分器使用来自第一反射积分器的光形成多个线性光源。 照明光学系统还包括一对平面镜,它们平行于第二反射积分器上的子午线方向布置并且彼此相对,以将多个线性光源夹在其间,用于改变光圈的单元 形状的孔径光阑,其布置在与第二反射积分器的出射侧在垂直于子午线方向的方向上,使得孔径光阑与待照射的表面具有光学傅里叶变换关系;以及调整单元, 改变孔径光阑的孔径形状的一对平面镜之间的间隔。
    • 4. 发明授权
    • Illumination optical system and exposure apparatus
    • 照明光学系统和曝光装置
    • US08284378B2
    • 2012-10-09
    • US12552941
    • 2009-09-02
    • Kazuhiko KajiyamaToshihiko Tsuji
    • Kazuhiko KajiyamaToshihiko Tsuji
    • G03B27/54
    • G03B27/72G03F7/70075
    • An illumination optical system includes first and second reflection integrators. The second reflection integrator forms a plurality of linear light sources using light from the first reflection integrator. The illumination optical system further includes a pair of flat plane mirrors that are arranged parallel to the meridional line direction on the second reflection integrator and opposite to each other so as to sandwich the plurality of linear light sources in between, a unit for changing an aperture shape of an aperture stop arranged at an exit side of the second reflection integrator in a direction perpendicular to the meridional line direction so that the aperture stop has an optical Fourier transformation relationship with the surface to be illuminated, and an adjustment unit configured to adjust an interval between the pair of flat plane mirrors as the aperture shape of the aperture stop is changed.
    • 照明光学系统包括第一和第二反射积分器。 第二反射积分器使用来自第一反射积分器的光形成多个线性光源。 照明光学系统还包括一对平面镜,它们平行于第二反射积分器上的子午线方向布置并且彼此相对,以将多个线性光源夹在其间,用于改变光圈的单元 形状的孔径光阑,其布置在与第二反射积分器的出射侧在垂直于子午线方向的方向上,使得孔径光阑与待照射的表面具有光学傅里叶变换关系;以及调整单元, 改变孔径光阑的孔径形状的一对平面镜之间的间隔。
    • 5. 发明申请
    • ILLUMINATION OPTICAL SYSTEM AND EXPOSURE APPARATUS INCLUDING THE SAME
    • 照明光学系统和曝光装置,包括它们
    • US20090027641A1
    • 2009-01-29
    • US12179506
    • 2008-07-24
    • Kazuhiko KajiyamaToshihiko Tsuji
    • Kazuhiko KajiyamaToshihiko Tsuji
    • G03B27/42G03B27/72
    • G03F7/70075G03B27/42
    • An illumination optical system includes a first optical unit that collects light emitted from a light source; a reflective integrator that has a plurality of cylindrical reflection surfaces, whose generating lines are oriented in a uniform direction, and forms a plurality of linear light sources by using the light emitted from the first optical unit; a pair of flat mirrors that are disposed parallel to the generating lines so as to face each other with the plurality of linear light sources residing therebetween; an aperture stop that is disposed perpendicular to the generating lines and has an opening for allowing the light emitted from the plurality of linear light sources to pass therethrough; and a second optical unit that integrates beams of the light emitted from the plurality of linear light sources that have passed through the opening one on top of another in an illumination target plane.
    • 照明光学系统包括:第一光学单元,其收集从光源发射的光; 反射积分器,其具有多个圆筒反射面,其发生线沿均匀方向取向,并且通过使用从第一光学单元发射的光形成多个线性光源; 一对平面反射镜,其平行于所述发生线布置成彼此面对,所述多个线性光源位于它们之间; 一个孔径光阑,其垂直于所述生成线设置并具有用于允许从所述多个线性光源发出的光通过的开口; 以及第二光学单元,其将在已经穿过所述开口的多个线性光源发射的光的光束在照明目标平面中积分。
    • 6. 发明申请
    • ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS USING THE SAME AND DEVICE MANUFACTURING METHOD
    • 照明光学系统,使用它的曝光装置和装置制造方法
    • US20090213355A1
    • 2009-08-27
    • US12390315
    • 2009-02-20
    • Kazuhiko Kajiyama
    • Kazuhiko Kajiyama
    • G03B27/72
    • G03B27/72G03F7/70075
    • An illumination optical system includes a pair of fly-eye mirrors configured to receive light from a light source, a first condenser configured to condense light from the pair of fly-eye mirrors, a reflection type integrator configured to receive light from the first condenser, the reflection type integrator including a plurality of cylindrical reflective surfaces having parallel generating line directions, an aperture stop arranged perpendicular to the generating line direction, and a second condenser configured to superpose on an illuminated surface luminous fluxes from a plurality of cylindrical reflective surfaces of the reflection type integrator.
    • 一种照明光学系统,包括配置成从光源接收光的一对飞眼镜,被配置为使来自该一对飞眼镜的光聚光的第一聚光镜,被配置为接收来自第一冷凝器的光的反射型积分器, 所述反射型积分器包括具有平行的生成线方向的多个圆柱形反射表面,垂直于所述生成线方向布置的孔径光阑;以及第二聚光器,被配置为在照射表面上叠加来自所述发光线方向的多个圆柱形反射表面的光通量 反射型积分器。
    • 10. 发明授权
    • Illumination optical system, exposure apparatus using the same and device manufacturing method
    • 照明光学系统,使用相同的曝光装置和装置制造方法
    • US08149386B2
    • 2012-04-03
    • US12390315
    • 2009-02-20
    • Kazuhiko Kajiyama
    • Kazuhiko Kajiyama
    • G03B27/70
    • G03B27/72G03F7/70075
    • An illumination optical system includes a pair of fly-eye mirrors configured to receive light from a light source, a first condenser configured to condense light from the pair of fly-eye mirrors, a reflection type integrator configured to receive light from the first condenser, the reflection type integrator including a plurality of cylindrical reflective surfaces having parallel generating line directions, an aperture stop arranged perpendicular to the generating line direction, and a second condenser configured to superpose on an illuminated surface luminous fluxes from a plurality of cylindrical reflective surfaces of the reflection type integrator.
    • 一种照明光学系统,包括配置成从光源接收光的一对飞眼镜,被配置为使来自该一对飞眼镜的光聚光的第一聚光镜,被配置为接收来自第一冷凝器的光的反射型积分器, 所述反射型积分器包括具有平行的生成线方向的多个圆柱形反射表面,垂直于所述生成线方向布置的孔径光阑;以及第二聚光器,被配置为在照射表面上叠加来自所述发光线方向的多个圆柱形反射表面的光通量 反射型积分器。