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21. 发明授权

US5430468A Image recording apparatus 失效
标题翻译：图像记录装置
公开(公告)号：US5430468A
公开(公告)日：1995-07-04
申请号：US853961
申请日：1992-03-19
申请人： Keizo Sasai , Takehiro Yoshida , Masakatsu Iwata , Makoto Kobayashi , Minoru Yokoyama , Takashi Fuse , Hirohisa Sawada , Akihiro Tomoda , Fumihiko Nakamura
发明人： Keizo Sasai , Takehiro Yoshida , Masakatsu Iwata , Makoto Kobayashi , Minoru Yokoyama , Takashi Fuse , Hirohisa Sawada , Akihiro Tomoda , Fumihiko Nakamura
IPC分类号： B41J11/42 , B41J17/36 , B41J15/04 , B41J2/325
CPC分类号： B41J11/42 , B41J17/36
摘要： A record head is energized in accordance with received image data to transfer an ink of an ink sheet to a record medium and perform image recording on the record medium while the ink sheet and the record medium are fed in opposite directions. The rotation period of a roller driven during feeding of the record medium or the feed direction of the record medium is detected to detect adhesion between the ink sheet and the record medium. When adhesion between the ink sheet and the record medium is detected, a recording operation is interrupted to feed the ink sheet and the record medium to release adhesion between the ink sheet and the record medium. When the adhesion is released within a predetermined time period, the recording operation is continued. When the adhesion is not released within the predetermined time period, an alarm sound is issued.
摘要翻译：记录头根据接收到的图像数据通电，以将油墨片的油墨传送到记录介质，并且在墨纸和记录介质沿相反方向进给的同时在记录介质上进行图像记录。检测在记录介质的供给期间驱动的辊的旋转周期或记录介质的进给方向，以检测油墨片和记录介质之间的粘附。当检测到墨片和记录介质之间的粘合时，中断记录操作以供给墨纸和记录介质以释放墨纸和记录介质之间的粘附。当在预定时间段内释放粘附力时，继续进行记录操作。当在预定时间段内没有释放粘附时，发出报警声。

22. 发明申请

US20130008470A1 SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD 有权
标题翻译：基板清洗装置和基板清洗方法
公开(公告)号：US20130008470A1
公开(公告)日：2013-01-10
申请号：US13617530
申请日：2012-09-14
申请人： Kazuya DOBASHI , Takashi Fuse
发明人： Kazuya DOBASHI , Takashi Fuse
IPC分类号： B08B7/00
CPC分类号： H01L21/02052 , H01L21/0206 , H01L21/31133 , H01L21/67051
摘要： A substrate cleaning device is capable of removing more diverse contaminants from substrates than ultra-low temperature aerosol ejection, while avoiding technical problems inherent to wet cleaning, such as micro-roughness, watermarks, loss of substrate material and destruction of the device structure. A substrate cleaning device for cleaning wafers to which cleaning target objects have adhered includes a cluster spraying unit which sprays the wafer with one or more types of clusters formed of cleaning preparation molecules agglomerated together, a suction unit which sucks the cleaning target objects separated by spraying the clusters of the cleaning agent molecules; and a unit for moving the wafer and the cluster spraying unit relative to the one another along the surface of the wafer W to which the cleaning target objects have adhered.
摘要翻译：衬底清洁装置能够从超低温气溶胶喷射中除去基材中更多种污染物，同时避免湿法清洁所固有的技术问题，例如微粗糙度，水印，衬底材料的损失和器件结构的破坏。用于清洁清洁对象物体所粘附的晶片的基板清洗装置包括：一个簇喷射单元，其用一个或多个聚集在一起的清洁制剂分子形成的一个或多个类型的簇喷射晶片;抽吸单元，其吸取通过喷射分离的清洁对象物体清洁剂分子的簇; 以及用于相对于彼此沿晶片W的表面移动所述晶片和所述簇喷射单元的单元，所述晶片W的附着在所述表面上。

23. 发明申请

US20070228285A1 STATIC ELECTRICITY DEFLECTING DEVICE, ELECTRON BEAM IRRADIATING APPARATUS, SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND METHOD OF MANUFACTURING SUBSTRATE 失效
公开(公告)号：US20070228285A1
公开(公告)日：2007-10-04
申请号：US11615588
申请日：2006-12-22
申请人： Takashi Fuse , Tadashi Kotsugi , Kyo Tsuboi , Koji Takeya
发明人： Takashi Fuse , Tadashi Kotsugi , Kyo Tsuboi , Koji Takeya
IPC分类号： G21K1/08 , H01R43/00
CPC分类号： H01J37/1474 , B82Y10/00 , B82Y40/00 , H01J37/026 , H01J37/147 , H01J37/3174 , H01J2237/03 , H01J2237/151 , H01L21/67017 , H01L21/67213 , Y10T29/49117 , Y10T29/49204 , Y10T29/49224 , Y10T29/49885
摘要： A substrate processing apparatus which irradiates a substrate under processing with an electron beam and processes the substrate with the electron beam is disclosed. The substrate processing apparatus includes an electron beam generation mechanism which generates the electron beam, first area having a plurality of first static electricity deflecting devices whose thicknesses gradually increase in a traveling direction of the electron beam, and a second area disposed on a downstream side of the electron beam of the first area and having a plurality of second static electricity deflecting devices whose thicknesses are nearly same in the traveling direction of the electron beam. The substrate processing apparatus may further include a plurality of lenses whose thicknesses gradually decrease in the traveling direction of the electron beam, at least one of the plurality of lenses being disposed in each of the first area and the second area.

24. 发明申请

US20060249481A1 Plasma processing method 失效
公开(公告)号：US20060249481A1
公开(公告)日：2006-11-09
申请号：US11482705
申请日：2006-07-10
申请人： Takashi Fuse
发明人： Takashi Fuse
IPC分类号： C23F1/00 , H01L21/461 , B44C1/22
CPC分类号： H01L21/67253 , H01J37/32935
摘要： A plasma processing method is conducted while a thickness of a resist film being monitored, thereby preventing the thickness of the resist film from being reduced. The plasma processing method includes steps of supplying a processing gas into an airtight processing chamber, and plasma-processing a target layer formed on an object to be processed by using a resist film as a mask. The method includes a main etching process (first process) of plasma-processing the target layer while the thickness of the resist film being monitored until the reduction rate of the thickness of the resist film reaches a predetermined value, and an over-etching process (second process) of plasma-processing the target layer in a changed process condition in which selectivity against the resist film is higher than in the first process.

25. 发明授权

US6052189A Height measurement device and height measurement method 失效
标题翻译：高度测量装置和高度测量方法
公开(公告)号：US6052189A
公开(公告)日：2000-04-18
申请号：US909017
申请日：1997-08-11
申请人： Takashi Fuse , Hiroyuki Tsukahara , Yoshitaka Oshima , Youji Nishiyama , Fumiyuki Takahashi
发明人： Takashi Fuse , Hiroyuki Tsukahara , Yoshitaka Oshima , Youji Nishiyama , Fumiyuki Takahashi
IPC分类号： G01B11/02 , G01B11/06 , G01C3/06 , H01L21/60 , H01L21/66 , G01B11/00
CPC分类号： G01B11/0608 , H01L2224/05568 , H01L2224/05573 , H01L2224/1403 , H01L2224/75 , H01L2224/75753 , H01L2224/759 , H01L2924/00014
摘要： The object of the present invention is to provide a height measurement device that can accurately measure the height of an object to be measured, and that can easily and precisely adjust the focal point of an optical system. According to the present invention, a height measurement device, which forms an image of a light point generated by a light source on a surface of a measured object via an irradiation side focusing lens, which forms an image of the formed image of the light point on a light point position detector via a light reception side focusing lens, and measures a height of the measured object according to the light point position on the light point position detector, comprises: a stage perpendicularly movable with the measured object mounted thereon; a camera for obtaining a light point image formed on a target face on the stage; and a controller for detecting a position of the stage or of the radiation focusing lens as a focal point, at which a light quantity on a predetermined pixel in the light point image obtained by the camera becomes a maximum level, while moving the stage or the irradiation side focusing lens.
摘要翻译：本发明的目的是提供一种可以精确地测量被测量物体的高度并能够容易且精确地调节光学系统的焦点的高度测量装置。根据本发明，一种高度测量装置，其形成通过照射侧聚焦透镜在被测量物体的表面上由光源产生的光点的图像，该照射侧聚焦透镜形成所形成的光点图像的图像通过光接收侧聚焦透镜在光点位置检测器上，并且根据光点位置检测器上的光点位置测量被测物体的高度，包括：与安装在其上的被测物体可垂直移动的平台; 用于获得形成在所述平台上的目标面上的光点图像的照相机; 以及控制器，用于检测所述舞台或所述辐射聚焦透镜的位置作为焦点，在所述焦点处，由所述相机获得的所述光点图像中的预定像素上的光量在所述舞台或照射侧聚焦透镜。

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