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    • 1. 发明授权
    • Height measurement device and height measurement method
    • 高度测量装置和高度测量方法
    • US6052189A
    • 2000-04-18
    • US909017
    • 1997-08-11
    • Takashi FuseHiroyuki TsukaharaYoshitaka OshimaYouji NishiyamaFumiyuki Takahashi
    • Takashi FuseHiroyuki TsukaharaYoshitaka OshimaYouji NishiyamaFumiyuki Takahashi
    • G01B11/02G01B11/06G01C3/06H01L21/60H01L21/66G01B11/00
    • G01B11/0608H01L2224/05568H01L2224/05573H01L2224/1403H01L2224/75H01L2224/75753H01L2224/759H01L2924/00014
    • The object of the present invention is to provide a height measurement device that can accurately measure the height of an object to be measured, and that can easily and precisely adjust the focal point of an optical system. According to the present invention, a height measurement device, which forms an image of a light point generated by a light source on a surface of a measured object via an irradiation side focusing lens, which forms an image of the formed image of the light point on a light point position detector via a light reception side focusing lens, and measures a height of the measured object according to the light point position on the light point position detector, comprises: a stage perpendicularly movable with the measured object mounted thereon; a camera for obtaining a light point image formed on a target face on the stage; and a controller for detecting a position of the stage or of the radiation focusing lens as a focal point, at which a light quantity on a predetermined pixel in the light point image obtained by the camera becomes a maximum level, while moving the stage or the irradiation side focusing lens.
    • 本发明的目的是提供一种可以精确地测量被测量物体的高度并能够容易且精确地调节光学系统的焦点的高度测量装置。 根据本发明,一种高度测量装置,其形成通过照射侧聚焦透镜在被测量物体的表面上由光源产生的光点的图像,该照射侧聚焦透镜形成所形成的光点图像的图像 通过光接收侧聚焦透镜在光点位置检测器上,并且根据光点位置检测器上的光点位置测量被测物体的高度,包括:与安装在其上的被测物体可垂直移动的平台; 用于获得形成在所述平台上的目标面上的光点图像的照相机; 以及控制器,用于检测所述舞台或所述辐射聚焦透镜的位置作为焦点,在所述焦点处,由所述相机获得的所述光点图像中的预定像素上的光量在所述舞台或 照射侧聚焦透镜。
    • 2. 发明授权
    • Method and apparatus for inspecting bumps and determining height from a regular reflection region
    • 用于检查凸起并从正反射区域确定高度的方法和装置
    • US06555836B1
    • 2003-04-29
    • US09533235
    • 2000-03-22
    • Fumiyuki TakahashiHiroyuki TsukaharaYoshitaka OshimaYouji NishiyamaTakashi Fuse
    • Fumiyuki TakahashiHiroyuki TsukaharaYoshitaka OshimaYouji NishiyamaTakashi Fuse
    • G01N2186
    • G01N21/95684H01L2224/05568H01L2224/05573H01L2224/16H01L2924/00014H01L2224/05599
    • A method of inspecting bumps provided on a surface of an object to be inspected includes the steps of: (a) irradiating a first irradiation beam on said object in an oblique direction and (b) imaging a first reflected beam from said object so as to obtain a first reflection image including a first reflection region and a height data of said bump corresponding to said first regular reflection region produced by a part of the first reflected beam reflected near an apex of the bump. The method further includes the steps of (c) shifting a position of said first regular reflection region in said first reflection image in accordance with a value derived from said height data and said predetermined angle, (d) extracting said first regular reflection region within a predetermined region from said first reflection image after said step c), and (e) detecting a height of said bump based on said height data corresponding to the extracted first regular reflection region. Also disclosed is an apparatus for performing the disclosed method.
    • 检查被检查体的表面上设置的凸点的方法包括以下步骤:(a)沿倾斜方向照射所述物体上的第一照射光束,和(b)对来自所述物体的第一反射光束进行成像,以便 获得包括第一反射区域的第一反射区域和对应于由凸起的顶点附近反射的第一反射光束的一部分产生的所述第一正反射区域的凸起的高度数据。 该方法还包括以下步骤:(c)根据从所述高度数据和所述预定角度导出的值,在所述第一反射图像中移位所述第一正反射区域的位置,(d)在所述第一反射区域内提取所述第一正反射区域 在所述步骤c)之后的所述第一反射图像的预定区域,以及(e)基于对应于所提取的第一正反射区域的所述高度数据来检测所述凸块的高度。 还公开了用于执行所公开的方法的装置。
    • 3. 发明授权
    • Method and apparatus for visual inspection of bump array
    • 凸块阵列目视检查方法及装置
    • US6104493A
    • 2000-08-15
    • US310089
    • 1999-05-12
    • Takashi FuseYouji NishiyamaYoshitaka OshimaFumiyuki TakahashiHiroyuki Tsukahara
    • Takashi FuseYouji NishiyamaYoshitaka OshimaFumiyuki TakahashiHiroyuki Tsukahara
    • G01N21/95F01B11/28
    • G01N21/9501
    • The bump height is measure din a sample area on a wafer, the bump height distribution on the wafer is estimated on the bases of the measured value, the portion where the estimated height distribution is out of a predetermined range is determined as an inspection area, and the bump height is measured in the inspection area, and a chip area having a bump height out of a predetermined range is judged to be defective. Data of the inspection areas and inspection results are accumulated, and the inspection density is renewed on the basis of the accumulated data. In another method, the inspection area is divided into rectangular blocks so that each block has a width of approximately equal to a light beam scanning length and a distance between any adjacent bumps in the feeding direction is less than a predetermined value, feeding path being perpendicular to the scanning direction. Block feed time and between-block feed time are calculated, a whole feeding path whose total feed time of the block and between-block feed time are minimum is found, and bump height is measured with receiving reflected light from the bump while feeding along the found feeding path.
    • 凸起高度是在晶片上的样品区域上测量的,基于测量值估计晶片上的凸块高度分布,将估计高度分布超出预定范围的部分确定为检查区域, 并且在检查区域中测量凸起高度,并且将具有突出高度超出预定范围的芯片区域判断为有缺陷。 累积检查区域和检查结果的数据,并根据累计数据更新检验密度。 在另一种方法中,检查区域被分成矩形块,使得每个块具有近似等于光束扫描长度的宽度,并且在馈送方向上的任何相邻凸块之间的距离小于预定值,馈送路径垂直 到扫描方向。 计算块进给时间和块间进给时间,发现块的总进给时间和块间进给时间为最小的整个进给路径,并且在沿着凸块进给的同时接收来自凸块的反射光来测量凸起高度 发现喂养路径。
    • 4. 发明授权
    • Method for inspecting height, and a height inspection apparatus to carry
out the method
    • 检查高度的方法,以及执行该方法的高度检查装置
    • US5999266A
    • 1999-12-07
    • US954286
    • 1997-10-20
    • Fumiyuki TakahashiHiroyuki TsukaharaYoshitaka OshimaYouji NishiyamaTakashi Fuse
    • Fumiyuki TakahashiHiroyuki TsukaharaYoshitaka OshimaYouji NishiyamaTakashi Fuse
    • G01B11/02G01B11/06H01L21/60H01L21/66G01B11/24
    • G01B11/0608
    • The present invention is a method for inspecting height, scanning the surface of a subject item having zones of different reflectance with incident light of a prescribed intensity, causing the reflected light from the surface to be imaged with means for detecting light spot positions, and detecting the height of said surface from the light spot position which was imaged, said method comprising: a step of scanning, in a second zone with low reflectance surrounding a first zone with high reflectance with a first intensity of incident light, which is low to the degree that said means for detecting light spot positions is not saturated even with said high reflectance; and a step of scanning, if it is detected that the quantity of light of the imaged light of said reflected light exceeds a prescribed threshold value, with an appropriate second intensity of incident light found from said intensity of incident light and said detected quantity of light at the time of the preceding scan.
    • 本发明是一种用于检查高度的方法,用具有规定强度的入射光对具有不同反射率的区域的物体的表面进行扫描,从而使来自表面的反射光成像,以检测光斑位置,并且检测 所述方法包括:在具有低反射率的第二区域中以具有高反射率的第一区域扫描具有第一强度入射光的第一区域的低反射率的步骤,该第二区域具有低反射率 即使用所述高反射率,所述用于检测光斑位置的装置也不饱和; 以及扫描的步骤,如果检测到所述反射光的成像光的光量超过规定的阈值,则从入射光的强度和所述检测的光量发现适当的第二入射光强度 在上一次扫描时。
    • 7. 发明授权
    • Phase unwrapping method, program, and interference measurement apparatus
    • 相位展开方法,程序和干涉测量装置
    • US07593596B2
    • 2009-09-22
    • US11407036
    • 2006-04-20
    • Fumiyuki TakahashiHiroyuki Tsukahara
    • Fumiyuki TakahashiHiroyuki Tsukahara
    • G06K9/36G06K9/00
    • G01B9/02087G01B9/02079G01B11/2441
    • A candidate pixel generating unit searches a path-undetermined adjacent pixel j which is adjacent around a parent pixel i, and, with respect to the searched adjacent pixel j, generates a candidate pixel having data {j(i,|Wij|)} in which the parent pixel i and magnitude |Wij| of a phase difference Wij in which phase skip between the pixels is corrected are combined. The registration control unit registers the pixel to a heap having a function of ordering the registration order, and order the pixel, if the weight |Wij| is equal to or more than a predetermined threshold value TH; and registers the pixel to a queue not having the function of ordering the registration order if it is less than the threshold value TH. A path determination unit prioritizes the queue to retrieve and eliminate one candidate pixel, and determines a path between the eliminated candidate pixel and the parent pixel.
    • 候选像素生成单元搜索与父像素i相邻的路径不确定的相邻像素j,并且关于搜索到的相邻像素j,生成具有数据{j(i,| Wij |)}的候选像素 父像素i和幅度| Wij | 组合了像素之间的相位跳过被校正的相位差Wij的组合。 注册控制单元将像素注册到具有排序注册顺序的功能的堆,并且如果权重| Wij | 等于或大于预定阈值TH; 并且如果其小于阈值TH,则将像素注册到不具有排序注册顺序的功能的队列。 路径确定单元优先考虑队列以检索和消除一个候选像素,并且确定所消除的候选像素和父像素之间的路径。
    • 8. 发明申请
    • Phase unwrapping method, program, and interference measurement apparatus
    • 相位展开方法,程序和干涉测量装置
    • US20070110334A1
    • 2007-05-17
    • US11407036
    • 2006-04-20
    • Fumiyuki TakahashiHiroyuki Tsukahara
    • Fumiyuki TakahashiHiroyuki Tsukahara
    • G06K9/36
    • G01B9/02087G01B9/02079G01B11/2441
    • A candidate pixel generating unit searches a path-undetermined adjacent pixel j which is adjacent around a parent pixel i, and, with respect to the searched adjacent pixel j, generates a candidate pixel having data {j(i,|Wij|)} in which the parent pixel i and magnitude |Wij| of a phase difference Wij in which phase skip between the pixels is corrected are combined. The registration control unit registers the pixel to a heap having a function of ordering the registration order, and order the pixel, if the weight |Wij| is equal to or more than a predetermined threshold value TH; and registers the pixel to a queue not having the function of ordering the registration order if it is less than the threshold value TH. A path determination unit prioritizes the queue to retrieve and eliminate one candidate pixel, and determines a path between the eliminated candidate pixel and the parent pixel.
    • 候选像素生成单元搜索与父像素i相邻的路径不确定的相邻像素j,并且关于搜索到的相邻像素j生成具有数据{j(i,| Wij |)的候选像素,其中 合并校正像素之间的相位跳跃的相位差Wij的父像素i和幅度| Wij |,登记控制单元将具有排序注册顺序的功能的像素登记到像素,如果 权重| Wij |等于或大于预定阈值TH;并且如果其小于阈值TH,则将该像素注册到不具有排序登记顺序的功能的队列;路径确定单元优先排列队列 检索和消除一个候选像素,并且确定所消除的候选像素和父像素之间的路径。
    • 9. 发明授权
    • Adaptable terminal assembly for multi-contact electrical connector
    • 适用于多接点电连接器的端子组件
    • US4676580A
    • 1987-06-30
    • US841950
    • 1986-03-20
    • Fumiyuki Takahashi
    • Fumiyuki Takahashi
    • H01R43/00H01R9/22H01R43/16H05K7/10H01R4/10
    • H01R43/16H05K7/10
    • The terminal assembly of this invention has a terminal carrier comprised of a series of integral, same-shape structures whose shape forms a series of widthwise protuberances, arranged at a predetermined pitch, which constitute the respective longitudinal sides of the terminal carrier. A series of contact terminals extend from either side of each of the protuberances along one longitudinal side of the terminal carrier such that they are supported in the widthwise direction and by a pitch determined by that of the protuberances. Lozenge-shaped through holes are formed in the center of each of the same-shape structures at the point of intersection between an imaginary latitudinal and longitudinal axis. The individual same-shape structures and the terminal carrier as a whole are symmetrical with respect to these axes. Those protuberances constituting that side of the terminal carrier from which the terminals extend are the first protuberances, while those that constitute the carrier's opposite side are the second protuberances.
    • 本发明的端子组件具有一个端子架,它由一系列一体的相同形状的结构组成,它们的形状形成了一组以预定间距布置的宽度方向的突起,它们构成端子托架的各个纵向侧面。 一系列接触端子从端子架的一个纵向侧的每个突起的任一侧延伸,使得它们在宽度方向上被支撑,并且由突起确定的间距延伸。 在虚拟纬线和纵轴之间的交叉点处,在每个相同形状结构的中心形成有菱形通孔。 各个相同形状的结构和端子载体作为整体相对于这些轴对称。 构成端子托架延伸的端子托架的这些突起是第一突起,而构成载体相对侧的突起是第二突起。