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    • 27. 发明授权
    • All-electron battery having area-enhanced electrodes
    • 全电子电池具有面积增强的电极
    • US08524398B2
    • 2013-09-03
    • US12798102
    • 2010-03-29
    • Timothy P. HolmeFriedrich B. PrinzTakane Usui
    • Timothy P. HolmeFriedrich B. PrinzTakane Usui
    • H01M2/00H01G4/33
    • H01G4/33H01G9/048H01G9/055H01G11/26H01L28/82H01L28/91Y02E60/13
    • Improved energy storage is provided by exploiting two physical effects in combination. The first effect can be referred to as the All-Electron Battery (AEB) effect, and relates to the use of inclusions embedded in a dielectric structure between two electrodes of a capacitor. Electrons can tunnel through the dielectric between the electrodes and the inclusions, thereby increasing the charge storage density relative to a conventional capacitor. The second effect can be referred to as an area enhancement effect, and relates to the use of micro-structuring or nano-structuring on one or both of the electrodes to provide an enhanced interface area relative to the electrode geometrical area. Area enhancement is advantageous for reducing the self-discharge rate of the device.
    • 通过组合利用两种物理效应来提供改进的能量存储。 第一效果可以称为全电子电池(AEB)效应,并且涉及嵌入在电容器的两个电极之间的电介质结构中的夹杂物的使用。 电子可以穿过电极和夹杂物之间的电介质,从而相对于常规电容器增加电荷存储密度。 第二个效果可以称为区域增强效应,并且涉及在一个或两个电极上使用微结构或纳米结构以提供相对于电极几何面积的增强的界面面积。 面积增加对于降低装置的自放电率是有利的。
    • 28. 发明授权
    • Precursor selection method for chemical vapor deposition techniques
    • 化学气相沉积技术的前体选择方法
    • US08163338B2
    • 2012-04-24
    • US12070389
    • 2008-02-14
    • Timothy P. HolmeFriedrich B. PrinzMasayuki Sugawara
    • Timothy P. HolmeFriedrich B. PrinzMasayuki Sugawara
    • C23C16/00G06G7/58
    • C23C16/404C23C16/409C23C16/44C30B23/02C30B25/02
    • A method of precursor selection for thin film deposition is provided, that includes a group of precursors, using a rule-set for selecting one or more candidate precursors for thermal stability, high growth rate, and low contamination. Candidate geometries and constituent geometries are simulated and optimized, and bond strengths of the candidates and constituents are determined. The rule-set is based on bond strength that compares molecule and constituent energies between a set of bond strengths within a candidate ligand or between a metal atom and one ligand. The rule-set requires metal atom-ligand bonds are between 0.2 and 3 eV, metal atom-ligand bond strengths are less than metal atom-ligand bond strengths of other candidates. The metal atom-ligand bond strength is >TΔS, where T is a reaction temperature and ΔS is the reaction entropy change and the bond within a ligand, where (ligand bond)>(metal atom and ligand bond).
    • 提供了一种用于薄膜沉积的前体选择方法,其包括一组前体,使用规则集来选择用于热稳定性,高生长速率和低污染的一种或多种候选前体。 模拟和优化候选几何和组成几何,确定候选人和组成部分的债券强度。 规则集是基于结合强度,其比较候选配体之间或金属原子与一个配体之间的一组键强度之间的分子和组分能量。 规则集要求金属原子 - 配体键的介于0.2和3eV之间,金属原子 - 配体键强度小于其他候选物的金属原子 - 配体键强度。 金属原子 - 配体键合强度> T&Dgr; S,其中T是反应温度,Dgr; S是反应熵变和配体内的键(配体键)>(金属原子和配体键)。