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1. 发明授权

US08551868B2 Irradiation assisted nucleation of quantum confinements by atomic layer deposition 有权
标题翻译：通过原子层沉积来辐射辅助成核量子限制
公开(公告)号：US08551868B2
公开(公告)日：2013-10-08
申请号：US13065582
申请日：2011-03-24
申请人： Timothy P. Holme , Andrei Iancu , Hee Joon Jung , Michael C Langston , Munekazu Motoyama , Friedrich B. Prinz , Takane Usui , Hitoshi Iwadate , Neil Dasgupta , Cheng-Chieh Chao
发明人： Timothy P. Holme , Andrei Iancu , Hee Joon Jung , Michael C Langston , Munekazu Motoyama , Friedrich B. Prinz , Takane Usui , Hitoshi Iwadate , Neil Dasgupta , Cheng-Chieh Chao
IPC分类号： H01L21/36
CPC分类号： C23C16/482 , B82Y10/00 , B82Y20/00 , C23C16/48 , C23C16/483 , C23C16/486 , C23C16/487 , H01L21/02532 , H01L21/02568 , H01L21/02601 , H01L21/02603 , H01L21/0262 , H01L31/035209 , H01L31/035218 , H01L31/035227 , H01L31/035236 , H01L31/18 , Y10S977/762 , Y10S977/773 , Y10S977/774
摘要： A method of fabricating quantum confinements is provided. The method includes depositing, using a deposition apparatus, a material layer on a substrate, where the depositing includes irradiating the layer, before a cycle, during a cycle, and/or after a cycle of the deposition to alter nucleation of quantum confinements in the material layer to control a size and/or a shape of the quantum confinements. The quantum confinements can include quantum wells, nanowires, or quantum dots. The irradiation can be in-situ or ex-situ with respect to the deposition apparatus. The irradiation can include irradiation by photons, electrons, or ions. The deposition is can include atomic layer deposition, chemical vapor deposition, MOCVD, molecular beam epitaxy, evaporation, sputtering, or pulsed-laser deposition.
摘要翻译：提供了一种制造量子限制的方法。该方法包括使用沉积设备沉积衬底上的材料层，其中沉积包括在循环之前，循环期间和/或在沉积循环之后照射该层，以改变在该沉积中的量子限制的成核材料层以控制量子限制的尺寸和/或形状。量子限制可以包括量子阱，纳米线或量子点。相对于沉积设备，照射可以就地或离位。照射可以包括光子，电子或离子的照射。沉积可以包括原子层沉积，化学气相沉积，MOCVD，分子束外延，蒸发，溅射或脉冲激光沉积。

2. 发明申请

US20110269298A1 Irradiation assisted nucleation of quantum confinements by atomic layer deposition 有权
标题翻译：通过原子层沉积来辐射辅助成核量子限制
公开(公告)号：US20110269298A1
公开(公告)日：2011-11-03
申请号：US13065582
申请日：2011-03-24
申请人： Timothy P. Holme , Andrei Iancu , Hee Joon Jung , Michael C Langston , Munekazu Motoyama , Friedrich B. Prinz , Takane Usui , Hitoshi Iwadate , Neil Dasgupta , Cheng-Chieh Chao
发明人： Timothy P. Holme , Andrei Iancu , Hee Joon Jung , Michael C Langston , Munekazu Motoyama , Friedrich B. Prinz , Takane Usui , Hitoshi Iwadate , Neil Dasgupta , Cheng-Chieh Chao
IPC分类号： H01L21/18 , B82Y40/00
CPC分类号： C23C16/482 , B82Y10/00 , B82Y20/00 , C23C16/48 , C23C16/483 , C23C16/486 , C23C16/487 , H01L21/02532 , H01L21/02568 , H01L21/02601 , H01L21/02603 , H01L21/0262 , H01L31/035209 , H01L31/035218 , H01L31/035227 , H01L31/035236 , H01L31/18 , Y10S977/762 , Y10S977/773 , Y10S977/774
摘要： A method of fabricating quantum confinements is provided. The method includes depositing, using a deposition apparatus, a material layer on a substrate, where the depositing includes irradiating the layer, before a cycle, during a cycle, and/or after a cycle of the deposition to alter nucleation of quantum confinements in the material layer to control a size and/or a shape of the quantum confinements. The quantum confinements can include quantum wells, nanowires, or quantum dots. The irradiation can be in-situ or ex-situ with respect to the deposition apparatus. The irradiation can include irradiation by photons, electrons, or ions. The deposition is can include atomic layer deposition, chemical vapor deposition, MOCVD, molecular beam epitaxy, evaporation, sputtering, or pulsed-laser deposition.
摘要翻译：提供了一种制造量子限制的方法。该方法包括使用沉积设备沉积衬底上的材料层，其中沉积包括在循环之前，循环期间和/或在沉积循环之后照射该层，以改变在该沉积中的量子限制的成核材料层以控制量子限制的尺寸和/或形状。量子限制可以包括量子阱，纳米线或量子点。相对于沉积设备，照射可以就地或离位。照射可以包括光子，电子或离子的照射。沉积可以包括原子层沉积，化学气相沉积，MOCVD，分子束外延，蒸发，溅射或脉冲激光沉积。

3. 发明申请

US20100183948A1 Closed-end nanotube arrays as an electrolyte of a solid oxide fuel cell 审中-公开
标题翻译：封闭式纳米管阵列作为固体氧化物燃料电池的电解质
公开(公告)号：US20100183948A1
公开(公告)日：2010-07-22
申请号：US12653111
申请日：2009-12-07
申请人： Cheng-Chieh Chao , Turgut M. Gür , Munekazu Motoyama , Friedrich B. Prinz , Joon Hyung Shim , Joong Sun Park
发明人： Cheng-Chieh Chao , Turgut M. Gür , Munekazu Motoyama , Friedrich B. Prinz , Joon Hyung Shim , Joong Sun Park
IPC分类号： H01M8/10
CPC分类号： H01M8/1253 , H01M8/2404 , H01M8/243 , Y02E60/525 , Y02P70/56
摘要： The present invention provides solid oxide fuel cell that includes an electrolyte membrane, a first electrode layer, and a second electrode layer, where the electrolyte membrane is disposed between the first electrode layer and the second electrode layer. The electrolyte membrane includes a solid electrolyte structure having at least two solid electrolyte nanoscopic closed-end tubes, where an open-ended base of each solid electrolyte nanoscopic closed-end tube is connected by a solid electrolyte layer.
摘要翻译：本发明提供了一种固体氧化物燃料电池，其包括电解质膜，第一电极层和第二电极层，其中电解质膜设置在第一电极层和第二电极层之间。电解质膜包括具有至少两个固体电解质纳米封闭端管的固体电解质结构，其中每个固体电解质纳米封闭端管的开口基底通过固体电解质层连接。

4. 发明授权

US08168251B2 Method for producing tapered metallic nanowire tips on atomic force microscope cantilevers 失效
标题翻译：在原子力显微镜悬臂上生产锥形金属纳米线尖端的方法
公开(公告)号：US08168251B2
公开(公告)日：2012-05-01
申请号：US12287721
申请日：2008-10-10
申请人： Friedrich B. Prinz , Neil Dasgupta , Munekazu Motoyama
发明人： Friedrich B. Prinz , Neil Dasgupta , Munekazu Motoyama
IPC分类号： B05D5/12
CPC分类号： G01Q60/38 , G01Q70/10 , G01Q70/12
摘要： A method of making nanowire probes is provided. The method includes providing a template having a nanoporous structure, providing a probe tip that is disposed on top of the template, and growing nanowires on the probe tip, where the nanowires are grown from the probe tip along the nanopores, and the nanowires conform to the shape of the nanopores.
摘要翻译：提供制造纳米线探针的方法。该方法包括提供具有纳米多孔结构的模板，提供设置在模板顶部的探针尖端，以及在探针尖端上生长纳米线，其中纳米线沿着纳米孔从探针尖端生长，并且纳米线符合纳米孔的形状。

5. 发明申请

US20100089866A1 Method for producing tapered metallic nanowire tips on atomic force microscope cantilevers 失效
标题翻译：在原子力显微镜悬臂上生产锥形金属纳米线尖端的方法
公开(公告)号：US20100089866A1
公开(公告)日：2010-04-15
申请号：US12287721
申请日：2008-10-10
申请人： Friedrich B. Prinz , Neil Dasgupta , Munekazu Motoyama
发明人： Friedrich B. Prinz , Neil Dasgupta , Munekazu Motoyama
IPC分类号： C23F1/00 , B05D5/12 , C23C14/34 , C23C16/44 , C25D5/02
CPC分类号： G01Q60/38 , G01Q70/10 , G01Q70/12
摘要： A method of making nanowire probes is provided. The method includes providing a template having a nanoporous structure, providing a probe tip that is disposed on top of the template, and growing nanowires on the probe tip, where the nanowires are grown from the probe tip along the nanopores, and the nanowires conform to the shape of the nanopores.
摘要翻译：提供制造纳米线探针的方法。该方法包括提供具有纳米多孔结构的模板，提供设置在模板顶部的探针尖端，以及在探针尖端上生长纳米线，其中纳米线沿着纳米孔从探针尖端生长，并且纳米线符合纳米孔的形状。

6. 发明申请

US20070284257A1 Apparatus for Manufacturing Metal Nanotube and Process for manufacturing Metal Nanotube 失效
标题翻译：金属纳米管制造装置及制造金属纳米管的方法
公开(公告)号：US20070284257A1
公开(公告)日：2007-12-13
申请号：US10576937
申请日：2004-10-13
申请人： Yasuhiro Fukunaka , Munekazu Motoyama , Ryuji Ishii
发明人： Yasuhiro Fukunaka , Munekazu Motoyama , Ryuji Ishii
IPC分类号： C25D1/02
CPC分类号： C25D1/10 , B82Y30/00 , C25D1/02
摘要： Disclosed is a low-cost, high quality metal nanotube comprising Ni, Fe, Co or the like. A metal thin film having a thickness of 10 to 80 nm is formed as a cathode on one surface of a film having penetrated holes, and an electrolyte solution is filled between an anode and the cathode to which a voltage is applied. Metal ions in the electrolyte solution are electrochemically deposited on the walls of the penetrated holes, thereby forming metal nanotubes. A thermoplastic resin porous film such as a polycarbonate film, an alumina porous film or aluminum anodic oxide film may be used as the film, and the diameters of the penetrated holes are preferably 15 to 500 nm. The metal thin film can be formed by sputtering, and preferably comprises a platinum-palladium alloy. The electrochemical processing of nanostructured tailored materials is a unique technique.
摘要翻译：公开了包含Ni，Fe，Co等的低成本，高质量的金属纳米管。在具有穿透孔的膜的一个表面上形成具有10至80nm厚度的金属薄膜作为阴极，并且在阳极和施加电压的阴极之间填充电解质溶液。电解液中的金属离子电化学沉积在穿透孔的壁上，从而形成金属纳米管。可以使用聚碳酸酯膜，氧化铝多孔膜或铝阳极氧化膜等热塑性树脂多孔膜作为膜，穿透孔的直径优选为15〜500nm。金属薄膜可以通过溅射形成，并且优选地包括铂 - 钯合金。纳米结构定制材料的电化学处理是一种独特的技术。

7. 发明授权

US08007650B2 Apparatus for manufacturing metal nanotube and process for manufacturing metal nanotube 失效
标题翻译：金属纳米管制造装置及其制造方法
公开(公告)号：US08007650B2
公开(公告)日：2011-08-30
申请号：US10576937
申请日：2004-10-13
申请人： Yasuhiro Fukunaka , Yoko Konishi , Munekazu Motoyama , Ryuji Ishii
发明人： Yasuhiro Fukunaka , Yoko Konishi , Munekazu Motoyama , Ryuji Ishii
IPC分类号： C25D5/02
CPC分类号： C25D1/10 , B82Y30/00 , C25D1/02
摘要： Disclosed is a low-cost, high quality metal nanotube comprising Ni, Fe, Co or the like. A metal thin film having a thickness of 10 to 80 nm is formed as a cathode on one surface of a film having penetrated holes, and an electrolyte solution is filled between an anode and the cathode to which a voltage is applied. Metal ions in the electrolyte solution are electrochemically deposited on the walls of the penetrated holes, thereby forming metal nanotubes. A thermoplastic resin porous film such as a polycarbonate film, an alumina porous film or aluminum anodic oxide film may be used as the film, and the diameters of the penetrated holes are preferably 15 to 500 nm. The metal thin film can be formed by sputtering, and preferably comprises a platinum-palladium alloy. The electrochemical processing of nanostructured tailored materials is a unique technique.
摘要翻译：公开了包含Ni，Fe，Co等的低成本，高质量的金属纳米管。在具有穿透孔的膜的一个表面上形成具有10至80nm厚度的金属薄膜作为阴极，并且在阳极和施加电压的阴极之间填充电解质溶液。电解液中的金属离子电化学沉积在穿透孔的壁上，从而形成金属纳米管。可以使用聚碳酸酯膜，氧化铝多孔膜或铝阳极氧化膜等热塑性树脂多孔膜作为膜，穿透孔的直径优选为15〜500nm。金属薄膜可以通过溅射形成，并且优选地包括铂 - 钯合金。纳米结构定制材料的电化学处理是一种独特的技术。

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