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21. 发明授权

US07236231B2 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07236231B2
公开(公告)日：2007-06-26
申请号：US11090519
申请日：2005-03-24
申请人： Takashi Nakamura , Hirohisa Ota , Eigo Kawakami , Kazuyuki Kasumi , Toshinobu Tokita
发明人： Takashi Nakamura , Hirohisa Ota , Eigo Kawakami , Kazuyuki Kasumi , Toshinobu Tokita
IPC分类号： G03B27/42
CPC分类号： G03F7/70275
摘要： An exposure apparatus for scanning an exposure spot in an exposure allocated area and for exposing a desired pattern by controlling power of the exposure spot in accordance with an exposure pattern, includes an exposure unit for arranging plural fine exposure elements, for forming plural exposure spots F1 to F9 on an object to be exposed, and for previously defining the exposure allocated areas SA11 to SA19 respectively corresponding to the plural exposure spots F1 to F9, an exposure allocated area adjuster for adjusting the exposure allocated areas SA12 and SA15 in accordance with directions and sizes of offsets (offset amount vectors V2 and V5) of the exposure spots F2 and F5 from a reference position, and an exposure spot controller for controlling the power of the exposure spot in accordance with the exposure pattern corresponding to actual positions of the exposure spots F1 to F9.
摘要翻译：一种曝光装置，用于通过根据曝光图案控制曝光点的电源来对曝光分配区域中的曝光点进行扫描和曝光所期望的图案，包括用于配置多个细微曝光元件的曝光单元，用于形成多个曝光点F 1到F 9，并且为了预先分别对应于多个曝光点F 1至F 9的曝光分配区域SA11至SA19分别设置曝光分配区域调整器SA 12 和SA 15，根据曝光点F 2和F 5从基准位置的偏移量（偏移量向量V 2和V 5）的方向和大小，以及根据曝光点控制曝光点的功率的曝光点控制器曝光图案对应于曝光点F 1至F 9的实际位置。

22. 发明申请

US20060192928A1 Pattern transferring apparatus and pattern transferring method 有权
公开(公告)号：US20060192928A1
公开(公告)日：2006-08-31
申请号：US11364694
申请日：2006-02-27
申请人： Kazuyuki Kasumi , Hirohisa Ota , Eigo Kawakami , Takashi Nakamura , Toshinobu Tokita
发明人： Kazuyuki Kasumi , Hirohisa Ota , Eigo Kawakami , Takashi Nakamura , Toshinobu Tokita
IPC分类号： G03B27/52
CPC分类号： B29C59/026 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A pattern transferring apparatus is disclosed which can prevent damage to a transferred pattern and realize fast mold release regardless of the type of resist. The pattern transferring apparatus transfers a pattern formed on a mold to an object by bringing the mold into contact with the apparatus has a deformer which causes deformation in the mold for releasing the mold from the object. The apparatus transfers a pattern formed on a mold to a photo-curing resin by bringing the mold into contact with the photo-curing resin and applying light thereto to cure the photo-curing resin. The apparatus has an optical system which applies light at an irradiation light intensity to a non-transfer area other than a transfer area where the pattern is to be transferred in the photo-curing resin, the intensity being different from an irradiation light intensity of light applied to the transfer area.

23. 发明申请

US20050237375A1 Exposure apparatus, device manufacturing method, pattern generator and maintenance method 有权
标题翻译：曝光装置，装置制造方法，图案发生器及维护方法
公开(公告)号：US20050237375A1
公开(公告)日：2005-10-27
申请号：US11112695
申请日：2005-04-21
申请人： Toshinobu Tokita , Hirohisa Ota , Eigo Kawakami , Takashi Nakamura , Kazuyuki Kasumi
发明人： Toshinobu Tokita , Hirohisa Ota , Eigo Kawakami , Takashi Nakamura , Kazuyuki Kasumi
IPC分类号： G02F1/13 , B41J29/38 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70916 , G03F7/70291 , G03F7/70691
摘要： An exposure apparatus for exposing a predetermined pattern onto an object via a projection optical system includes a pattern generating unit that includes plural pixels, and generates the predetermined pattern by driving the plural pixels, a measuring unit for measuring at least one of optical performance of the pattern generating unit and a driving state of the plural pixels, and a maintenance unit for maintaining the pattern generating unit based on a measuring result by the measuring unit.
摘要翻译：一种用于经由投影光学系统将预定图案曝光到物体上的曝光装置包括：图形生成单元，包括多个像素，并通过驱动多个像素产生预定图案;测量单元，用于测量至少一个光学性能图案生成单元和多个像素的驱动状态，以及维护单元，用于基于测量单元的测量结果来维持图案生成单元。

24. 发明申请

US20050219485A1 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20050219485A1
公开(公告)日：2005-10-06
申请号：US11090519
申请日：2005-03-24
申请人： Takashi Nakamura , Hirohisa Ota , Eigo Kawakami , Kazuyuki Kasumi , Toshinobu Tokita
发明人： Takashi Nakamura , Hirohisa Ota , Eigo Kawakami , Kazuyuki Kasumi , Toshinobu Tokita
IPC分类号： G03B27/42 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70275
摘要： An exposure apparatus for scanning an exposure spot in an exposure allocated area and for exposing a desired pattern by controlling power of the exposure spot in accordance with an exposure pattern, includes an exposure unit for arranging plural fine exposure elements, for forming plural exposure spots F1 to F9 on an object to be exposed, and for previously defining the exposure allocated areas SA11 to SA19 respectively corresponding to the plural exposure spots F1 to F9, an exposure allocated area adjuster for adjusting the exposure allocated areas SA12 and SA15 in accordance with directions and sizes of offsets (offset amount vectors V2 and V5) of the exposure spots F2 and F5 from a reference position, and an exposure spot controller for controlling the power of the exposure spot in accordance with the exposure pattern corresponding to actual positions of the exposure spots F1 to F9.
摘要翻译：一种曝光装置，用于通过根据曝光图案控制曝光点的电源来对曝光分配区域中的曝光点进行扫描和曝光所期望的图案，包括用于配置多个细微曝光元件的曝光单元，用于形成多个曝光点F 1到F 9，并且为了预先分别对应于多个曝光点F 1至F 9的曝光分配区域SA11至SA19分别设置曝光分配区域调整器SA 12 和SA 15，根据曝光点F 2和F 5从基准位置的偏移量（偏移量向量V 2和V 5）的方向和大小，以及根据曝光点控制曝光点的功率的曝光点控制器曝光图案对应于曝光点F 1至F 9的实际位置。

25. 发明申请

US20070132157A1 PROCESSING METHOD 有权
标题翻译：处理方法
公开(公告)号：US20070132157A1
公开(公告)日：2007-06-14
申请号：US11608009
申请日：2006-12-07
申请人： Toshinobu Tokita , Hirohisa Ota , Eigo Kawakami , Kazuyuki Kasumi
发明人： Toshinobu Tokita , Hirohisa Ota , Eigo Kawakami , Kazuyuki Kasumi
IPC分类号： B29C35/08 , C03C25/68 , G03C5/04
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A processing method for forming a first pattern on a substrate to which a resist is applied includes the steps of pressing an original having a second pattern that has a relief reverse to that of the first pattern, against the resist on the substrate, and irradiating light onto the resist via the original, wherein a size of a concave of the second pattern is greater than a size of a convex of the first pattern corresponding to the concave of the second pattern, and a size of a convex of the second pattern is smaller than a size of a concave of the first pattern corresponding to the convex of the second pattern.
摘要翻译：在施加抗蚀剂的基板上形成第一图案的处理方法包括将具有与第一图案相反的第二图案的原稿压在基板上的抗蚀剂上的步骤，以及照射光通过原稿到抗蚀剂上，其中第二图案的凹部的尺寸大于对应于第二图案的凹部的第一图案的凸起的尺寸，并且第二图案的凸起的尺寸较小比第一图案的凹部的尺寸对应于第二图案的凸起。

26. 发明授权

US07807065B2 Processing method 有权
标题翻译：加工方法
公开(公告)号：US07807065B2
公开(公告)日：2010-10-05
申请号：US11608009
申请日：2006-12-07
申请人： Toshinobu Tokita , Hirohisa Ota , Eigo Kawakami , Kazuyuki Kasumi
发明人： Toshinobu Tokita , Hirohisa Ota , Eigo Kawakami , Kazuyuki Kasumi
IPC分类号： B44C1/22 , C03C15/00 , C03C25/68 , C23F1/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A processing method for forming a first pattern on a substrate to which a resist is applied includes the steps of pressing an original having a second pattern that has a relief reverse to that of the first pattern, against the resist on the substrate, and irradiating light onto the resist via the original, wherein a size of a concave of the second pattern is greater than a size of a convex of the first pattern corresponding to the concave of the second pattern, and a size of a convex of the second pattern is smaller than a size of a concave of the first pattern corresponding to the convex of the second pattern.
摘要翻译：在施加抗蚀剂的基板上形成第一图案的处理方法包括将具有与第一图案相反的第二图案的原稿压在基板上的抗蚀剂上的步骤，以及照射光经由原稿到抗蚀剂上，其中第二图案的凹部的尺寸大于与第二图案的凹部对应的第一图案的凸起的尺寸，并且第二图案的凸起的尺寸较小比第一图案的凹部的尺寸对应于第二图案的凸起。

27. 发明申请

US20060087635A1 Exposure apparatus and device manufacturing method 失效
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20060087635A1
公开(公告)日：2006-04-27
申请号：US11257791
申请日：2005-10-24
申请人： Kazuyuki Kazumi , Hirohisa Ota , Eigo Kawakami , Takashi Nakamura , Toshinobu Tokita
发明人： Kazuyuki Kazumi , Hirohisa Ota , Eigo Kawakami , Takashi Nakamura , Toshinobu Tokita
IPC分类号： G03B27/72
CPC分类号： G03F7/70283 , G03F7/70291
摘要： An exposure apparatus includes a projection optical system for projecting a multigradation pattern onto an object, a spatial modulation element that includes plural, two-dimensionally arranged pixels, and forms an optical image by binary control over each pixel, and a superposing optical system for forming the multigradation pattern by superposing the optical images for each row and/or for each column.
摘要翻译：曝光装置包括：投影光学系统，用于将多重放射图案投射到物体上;空间调制元件，其包括多个二维排列的像素，并通过每个像素的二进制控制形成光学图像;以及叠加光学系统，用于形成通过叠加每行和/或每列的光学图像的多放射图案。

28. 发明授权

US09116110B2 Object information acquiring apparatus and object information acquiring method 有权
标题翻译：对象信息获取装置和对象信息获取方法
公开(公告)号：US09116110B2
公开(公告)日：2015-08-25
申请号：US13600399
申请日：2012-08-31
申请人： Hiroshi Yamamoto , Yukio Furukawa , Toshinobu Tokita
发明人： Hiroshi Yamamoto , Yukio Furukawa , Toshinobu Tokita
IPC分类号： G01N29/00 , G01N29/24 , A61B5/00 , A61B5/145 , G01N29/06
CPC分类号： G01N29/2418 , A61B5/0095 , A61B5/14542 , A61B2576/00 , G01N29/06 , G01N29/09 , G01N2291/02466
摘要： This invention employs an object information acquiring apparatus including a probe for receiving, as a received signal, an acoustic wave which is generated within an object irradiated with light and propagates on an object surface, and a processor for generating object information, which is information based on an internal optical characteristic value of the object, by using intensity of the received signal. The processor corrects the intensity of the received signal by using the reflectance upon the acoustic wave entering the probe which is calculated based on the angle of the acoustic wave entering the probe, and on the acoustic impedance and acoustic velocity of the object and the probe.
摘要翻译：本发明采用一种对象信息获取装置，包括：探头，用于接收在被照射的光中产生的并在物体表面上传播的声波作为接收信号;以及处理器，用于生成作为信息的对象信息通过使用接收信号的强度来对对象的内部光学特性值进行处理。处理器通过使用基于进入探针的声波的角度计算的声波进入探针的反射率，以及物体和探针的声阻抗和声速来校正接收信号的强度。

29. 发明申请

US20140051971A1 LIGHT IRRADIATING APPARATUS, CONTROL METHOD THEREFOR, AND OBJECT INFORMATION ACQUIRING APPARATUS 有权
标题翻译：光照射装置，其控制方法及获取装置的对象信息
公开(公告)号：US20140051971A1
公开(公告)日：2014-02-20
申请号：US14113679
申请日：2012-04-25
申请人： Toshinobu Tokita
发明人： Toshinobu Tokita
IPC分类号： A61B5/00
CPC分类号： A61B5/0095 , A61B5/6843
摘要： A light irradiating apparatus is used, which is characterized by having: a probe including an irradiating unit which guides light to an object, a housing containing the irradiating unit, and a touch sensor acquiring a contact condition amount between the object and the housing; and a controller controlling irradiation with light from the irradiating unit based on a level of the contact condition amount and a change in the contact condition amount, wherein in a case where the contact condition amount is equal to or more than a first reference value while the change in the contact condition amount which occurs when the housing is pressed against the object is a positive value, the controller performs a control which enables irradiation with light from the irradiating unit when the change in the contact condition amount is equal to or more than a second reference value.
摘要翻译：使用光照射装置，其特征在于具有：包括将光引导到物体的照射单元的探针，容纳所述照射单元的壳体和获取所述物体与所述壳体之间的接触状态量的触摸传感器; 以及控制器，其基于所述接触条件量的水平和所述接触状态量的变化来控制来自所述照射单元的光的照射，其中，在所述接触条件量等于或大于第一基准值的情况下，当壳体被压靠在物体上时发生的接触状态量的变化为正值时，当接触条件量的变化等于或大于该值时，控制器进行能够照射来自照射单元的光的控制第二参考值。

30. 发明申请

US20120238859A1 MEASURING APPARATUS 有权
标题翻译：测量装置
公开(公告)号：US20120238859A1
公开(公告)日：2012-09-20
申请号：US13512662
申请日：2011-01-26
申请人： Toshinobu Tokita , Yasuhiro Someda
发明人： Toshinobu Tokita , Yasuhiro Someda
IPC分类号： A61B6/00
CPC分类号： A61B8/0825 , A61B5/0095 , A61B8/4281
摘要： The present invention employs a measuring apparatus having: a holding plate for holding a subject; an acoustic matching member provided between the subject and the holding plate; and a probe for receiving an acoustic wave propagating through the subject via the acoustic matching member and the holding plate, wherein the acoustic matching member includes a first portion that contacts the subject and a second portion that contacts the holding plate, and the second portion has greater rigidity than the first portion.
摘要翻译：本发明采用一种测量装置，其具有：用于保持被检体的保持板; 设置在所述被检体和所述保持板之间的声匹配部件; 以及用于经由所述声匹配部件和所述保持板接收通过所述被检体传播的声波的探针，其中所述声匹配部件包括接触被检体的第一部分和与所述保持板接触的第二部分，并且所述第二部分具有比第一部分具有更大的刚度。

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