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    • 29. 发明申请
    • SEMICONDUCTOR DEVICE, AND MANUFACTURING METHOD AND MANUFACTURING APPARATUS OF THE SAME
    • 半导体器件及其制造方法及其制造方法
    • US20120187542A1
    • 2012-07-26
    • US13353826
    • 2012-01-19
    • Tetsuya KUROSAWAShinya TakyuAkira Tomono
    • Tetsuya KUROSAWAShinya TakyuAkira Tomono
    • H01L29/30H01L21/78B32B37/06
    • H01L21/78H01L21/6836
    • According to one embodiment, a manufacturing method of a semiconductor device is disclosed. The method includes: (a) forming cutting grooves in an element formation surface of a semiconductor wafer on which semiconductor elements are formed; (b) applying a protection tape on the element formation surface of the semiconductor wafer; (c) grinding a rear surface of the semiconductor wafer to thin the semiconductor wafer and to divide the semiconductor wafer into a plurality of semiconductor chips on which the semiconductor elements are formed; (d) forming an adhesive layer on the rear surface of the semiconductor wafer; (e) separating and cutting the adhesive layer for each of the semiconductor chips; and (f) removing the protection tape. The (e) is performed by spraying a high-pressure air to the adhesive layer formed on the rear surface of the semiconductor wafer while melting or softening the adhesive layer by heating.
    • 根据一个实施例,公开了一种半导体器件的制造方法。 该方法包括:(a)在形成有半导体元件的半导体晶片的元件形成表面中形成切割槽; (b)在半导体晶片的元件形成表面上施加保护带; (c)研磨半导体晶片的后表面以使半导体晶片变薄,并将半导体晶片分成多个形成有半导体元件的半导体芯片; (d)在半导体晶片的后表面上形成粘合剂层; (e)分离和切割每个半导体芯片的粘合剂层; 和(f)去除保护胶带。 (e)通过在通过加热熔化或软化粘合剂层的同时向形成在半导体晶片的后表面上的粘合剂层喷射高压空气来进行。