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21. 发明授权

US07188224B2 Content duplication management system and networked apparatus 有权
标题翻译：内容复制管理系统和联网设备
公开(公告)号：US07188224B2
公开(公告)日：2007-03-06
申请号：US10649890
申请日：2003-08-28
申请人： Yuusaku Ohta , Hiroki Yamauchi , Masaya Miyazaki , Natsume Matsuzaki , Toshihisa Abe
发明人： Yuusaku Ohta , Hiroki Yamauchi , Masaya Miyazaki , Natsume Matsuzaki , Toshihisa Abe
IPC分类号： G06F12/14
CPC分类号： G06F21/10 , G11B20/00086 , G11B20/00195 , G11B20/0021 , G11B20/00224 , G11B20/00746 , G11B20/00804 , G11B20/0084 , G11B20/00855 , H04L29/06 , H04L67/306 , H04L69/329
摘要： A highly-convenient content duplication management system for allowing users to duplicate a content as long as the duplication is in compliance with a given usage right. In the system, a request destination device stores a content and a permitted number of duplications of the content. In response to a duplication request, the request destination device judges whether or not the request source device is an in-group device that belongs to the same group as the request destination device. When judging that the request source device is an in-group device, the request destination device transmits the content together with a permitted number that is equal to or smaller than the currently stored permitted number. The request destination device then updates the currently stored permitted number by subtracting the permitted number transmitted.
摘要翻译：一种高度方便的内容复制管理系统，只要复制符合给定的使用权限，允许用户复制内容。在系统中，请求目的地装置存储内容和允许的内容的重复次数。响应于复制请求，请求目的地设备判断请求源设备是否属于与请求目的地设备相同组的组内设备。当判断请求源设备是组内设备时，请求目的地设备与当前存储的允许号码等于或小于的允许号码一起发送内容。然后，请求目的地装置通过减去发送的允许号码来更新当前存储的允许号码。

22. 发明授权

US06758723B2 Substrate polishing apparatus 有权
公开(公告)号：US06758723B2
公开(公告)日：2004-07-06
申请号：US10329424
申请日：2002-12-27
申请人： Yoichi Kobayashi , Shunsuke Nakai , Hitoshi Tsuji , Yasuo Tsukuda , Hiroki Yamauchi
发明人： Yoichi Kobayashi , Shunsuke Nakai , Hitoshi Tsuji , Yasuo Tsukuda , Hiroki Yamauchi
IPC分类号： B24B100
CPC分类号： B24B37/205 , B24B37/013 , B24B49/12
摘要： The substrate polishing apparatus for polishing a polishing surface of a substrate comprises a film thickness monitoring device for monitoring a state of a film thickness of a thin film on the polishing surface of the substrate during polishing. The apparatus includes a table, a polishing member fixed on a surface of the table, a substrate support member for pressing the substrate onto the polishing member, an optical system composed of an optical fiber for irradiating the polishing surface of the substrate with a light of irradiation and an optical fiber for receiving a reflected light reflected on the polishing surface of the substrate, an analysis-processing system for processing an analysis of the reflected light received with the optical system, and the film-thickness monitoring device, wherein the table is provided with a liquid-feeding opening for feeding a translucent liquid into a through-hole disposed in the polishing member.

23. 发明授权

US07925697B2 Group judgment device 有权
标题翻译：组判断装置
公开(公告)号：US07925697B2
公开(公告)日：2011-04-12
申请号：US10669656
申请日：2003-09-25
申请人： Yuichi Futa , Hiroki Yamauchi , Yuusaku Ohta , Natsume Matsuzaki
发明人： Yuichi Futa , Hiroki Yamauchi , Yuusaku Ohta , Natsume Matsuzaki
IPC分类号： G06F15/16
CPC分类号： H04W40/246 , H04L29/06 , H04L41/0893 , H04L41/509 , H04L43/50 , H04L63/0492 , H04L63/08 , H04L63/10 , H04L67/18 , H04L69/16 , H04L69/329 , H04W4/02 , H04W40/20 , H04W76/10
摘要： In a server, an echo-request transmitting unit 204 transmits echo-request data to a target device, and an echo-reply receiving unit 205 receives echo-reply data from the target device. A time measuring unit 206 measures, as the target time, the time required between transmission of the echo-request data and reception of the echo-reply data, and compares the target time with the reference time. In this way, the server judges whether the target device connected to its network belongs to a predetermined group.
摘要翻译：在服务器中，回波请求发送部204向目标装置发送回波请求数据，回波应答接收部205从目标装置接收回波应答数据。时间测量单元206测量回传请求数据的发送和回波回复数据的接收之间所需的时间作为目标时间，并将目标时间与参考时间进行比较。以这种方式，服务器判断连接到其网络的目标设备是否属于预定组。

24. 发明授权

US07752433B2 Content-duplication management system, apparatus and method, playback apparatus and method, and computer program 失效
标题翻译：内容复制管理系统，装置和方法，播放装置和方法以及计算机程序
公开(公告)号：US07752433B2
公开(公告)日：2010-07-06
申请号：US10649624
申请日：2003-08-28
申请人： Hiroki Yamauchi , Yuusaku Ohta , Masaya Miyazaki , Natsume Matsuzaki , Toshihisa Abe
发明人： Hiroki Yamauchi , Yuusaku Ohta , Masaya Miyazaki , Natsume Matsuzaki , Toshihisa Abe
IPC分类号： H04L29/06
CPC分类号： G11B20/0021 , G06F21/10 , G06F2221/0706 , G06F2221/2111 , G11B20/00086 , G11B20/00195 , G11B20/00224 , G11B20/00804 , G11B20/0084 , H04N21/43615
摘要： A content management system formed from a playback apparatus that requests and plays content, and a content management apparatus that manages duplication and deletion of content. The playback apparatus notifies group information of the playback apparatus to the content management apparatus, acquires information from the content management apparatus showing whether requests are permitted, and duplicates/deletes content. By judging whether the playback apparatus belongs to a group, and notifying whether a duplication request is permitted or rejected, based on in-group and out-group remaining numbers that show the remaining number of duplications permitted of apparatuses in-group and out-group, respectively, the content management apparatus relaxes restrictions on in-group content duplication as compared with out-group content duplication, and thus improves convenience for users in a home network, while protecting the rights of copyright holders, with respect to content duplication and usage.
摘要翻译：由请求和播放内容的播放装置形成的内容管理系统以及管理内容的复制和删除的内容管理装置。回放装置向内容管理装置通知播放装置的组信息，从内容管理装置获取表示是否允许请求的信息，并且复制/删除内容。通过判断播放装置是否属于一个组，并且基于组内和组外剩余的数字来通知复制请求是否被允许或拒绝，所述剩余数字表示组内和组外的设备允许的剩余重复次数内容管理装置与组外内容复制相比，放松了组内内容复制的限制，从而提高了家庭网络用户的便利性，同时在保护版权持有人的权利方面相对于内容复制和使用。

25. 发明授权

US07585204B2 Substrate polishing apparatus 有权
标题翻译：基材抛光装置
公开(公告)号：US07585204B2
公开(公告)日：2009-09-08
申请号：US12372076
申请日：2009-02-17
申请人： Yoichi Kobayashi , Shunsuke Nakai , Hitoshi Tsuji , Yasuo Tsukuda , Hiroki Yamauchi
发明人： Yoichi Kobayashi , Shunsuke Nakai , Hitoshi Tsuji , Yasuo Tsukuda , Hiroki Yamauchi
IPC分类号： B24B49/00
CPC分类号： B24B37/205 , B24B37/013 , B24B49/12
摘要： A substrate polishing apparatus for polishing a polishing surface of a substrate has a film thickness monitoring device for monitoring a state of a film thickness of a thin film on the polishing surface of the substrate during polishing. The apparatus includes a table, a polishing member fixed on a surface of the table, a substrate support member for pressing the substrate onto the polishing member, an optical system composed of an optical fiber for irradiating the polishing surface of the substrate with a light of irradiation and an optical fiber for receiving a reflected light reflected on the polishing surface of the substrate, an analysis-processing system for processing an analysis of the reflected light received with the optical system, and the film-thickness monitoring device. The table is provided with a liquid-feeding opening for feeding a translucent liquid into a through-hole disposed in the polishing member.
摘要翻译：用于抛光基板的抛光表面的基板抛光装置具有用于在抛光期间监测基板的研磨表面上的薄膜的膜厚状态的膜厚监视装置。该装置包括：台子，固定在工作台的表面上的抛光部件，用于将基板按压到研磨部件上的基板支撑部件;光学系统，其由用于向基板的研磨面照射基板的光照射和用于接收在基板的研磨表面上反射的反射光的光纤，用于处理由光学系统接收的反射光的分析的分析处理系统和膜厚监视装置。该台设置有用于将半透明液体供给到设置在抛光构件中的通孔中的供液口。

26. 发明授权

US07457410B2 Transmission/reception system 失效
标题翻译：发射/接收系统
公开(公告)号：US07457410B2
公开(公告)日：2008-11-25
申请号：US10836239
申请日：2004-05-03
申请人： Hiroki Yamauchi , Natsume Matsuzaki , Yuusaku Ohta , Yuichi Futa
发明人： Hiroki Yamauchi , Natsume Matsuzaki , Yuusaku Ohta , Yuichi Futa
IPC分类号： H04L9/00
CPC分类号： H04L63/0442 , H04L9/0841 , H04L9/3271 , H04L63/08 , H04L63/10 , H04L2209/60 , H04L2463/101
摘要： A server and a client hold common secret information in respective secret information holding units. A server Cyclic Redundancy Check (CRC) unit in the server generates a CRC code after adding the secret information to communication data, and transmits the communication data with the CRC code attached. A client CRC unit of the client generates a CRC code after adding the secret information to communication data, and checks whether or not an error has occurred in the communication data on the communication path. Since the client holds the secret information, the client determines that an error has not occurred, and obtains the communication data. On the other hand, a router, which does not hold the secret information, is unable to obtain the communication data. This prevents the communication data from being transferred to devices outside an authorized domain.
摘要翻译：服务器和客户端在各个秘密信息保持单元中保存公用秘密信息。服务器中的服务器循环冗余校验（CRC）单元在将秘密信息添加到通信数据后生成CRC代码，并发送带有附加CRC码的通信数据。客户端CRC单元在将秘密信息添加到通信数据之后生成CRC码，并且检查通信路径中的通信数据中是否发生错误。由于客户端保存秘密信息，所以客户机确定没有发生错误，并获得通信数据。另一方面，不保存秘密信息的路由器不能获得通信数据。这样可以防止通信数据被传送到授权域之外的设备。

27. 发明授权

US07349396B2 Content distribution system 有权
标题翻译：内容分发系统
公开(公告)号：US07349396B2
公开(公告)日：2008-03-25
申请号：US10670053
申请日：2003-09-25
申请人： Yuusaku Ohta , Natsume Matsuzaki , Hiroki Yamauchi , Yuichi Futa
发明人： Yuusaku Ohta , Natsume Matsuzaki , Hiroki Yamauchi , Yuichi Futa
IPC分类号： H04L12/28
CPC分类号： H04W40/246 , H04L29/06 , H04L41/0893 , H04L41/509 , H04L43/50 , H04L63/0492 , H04L63/08 , H04L63/10 , H04L67/18 , H04L69/16 , H04L69/329 , H04W4/02 , H04W40/20 , H04W76/10
摘要： A content distribution system in which content transmission/reception is suppressed when there is a high risk of contents being stolen by a third party during communication. A content server acquires a communication distance indicating how far the content server is from a terminal in data communication. The content server conducts content transmission/reception when the communication distance is less than or equal to a predetermined value, and suppresses content transmission/reception when the communication distance exceeds the predetermined value.
摘要翻译：内容分发系统，其中当在通信期间内容被盗用的高风险时，内容发送/接收被抑制。内容服务器在数据通信中获取指示内容服务器距离终端多远的通信距离。当通信距离小于或等于预定值时，内容服务器进行内容发送/接收，并且当通信距离超过预定值时抑制内容发送/接收。

28. 发明申请

US20080022416A1 Content Management System and Content Management Unit 有权
标题翻译：内容管理系统和内容管理单元
公开(公告)号：US20080022416A1
公开(公告)日：2008-01-24
申请号：US11632863
申请日：2005-07-13
申请人： Hiroki Yamauchi , Natsume Matsuzaki , Yuichi Futa , Toshihisa Nakano
发明人： Hiroki Yamauchi , Natsume Matsuzaki , Yuichi Futa , Toshihisa Nakano
IPC分类号： G06F21/22
CPC分类号： G06F21/10 , G06F2221/2137
摘要： A content management system which can prevent a content from being copied exceeding the limited number of copies for the content. The content management system includes a first content management device and a second content management device. The first content management device stores period information that indicates an available period during which a first external device is permitted to use a copied content which has been copied from the content, and outputs the period information to the second content management device when the content is moved. Upon receiving the period information from the first content management device, the second content management device judges whether the available period of the copied content has expired, using the received period information, and if it is judges that the available period has not expired, it inhibits the content from being copied to the second external device.
摘要翻译：一种内容管理系统，其可以防止内容被复制超过该内容的有限数量的副本。内容管理系统包括第一内容管理装置和第二内容管理装置。第一内容管理装置存储指示允许第一外部装置使用从内容复制的复制内容的可用期间的周期信息，并且当内容移动时将该周期信息输出到第二内容管理装置。在从第一内容管理装置接收到期间信息的情况下，第二内容管理装置使用接收到的周期信息来判断复制内容的可用期间是否到期，如果判断为可用期间未到期，则抑制将内容从复制到第二个外部设备。

29. 发明申请

US20070254565A1 Substrate polishing apparatus 有权
公开(公告)号：US20070254565A1
公开(公告)日：2007-11-01
申请号：US11806445
申请日：2007-05-31
申请人： Yoichi Kobayashi , Shunsuke Nakai , Hitoshi Tsuji , Yasuo Tsukuda , Hiroki Yamauchi
发明人： Yoichi Kobayashi , Shunsuke Nakai , Hitoshi Tsuji , Yasuo Tsukuda , Hiroki Yamauchi
IPC分类号： B24B7/00
CPC分类号： B24B37/205 , B24B37/013 , B24B49/12
摘要： A substrate polishing apparatus for polishing a polishing surface of a substrate has a film thickness monitoring device for monitoring a state of a film thickness of a thin film on the polishing surface of the substrate during polishing. The apparatus includes a table, a polishing member fixed on a surface of the table, a substrate support member for pressing the substrate onto the polishing member, an optical system composed of an optical fiber for irradiating the polishing surface of the substrate with a light of irradiation and an optical fiber for receiving a reflected light reflected on the polishing surface of the substrate, an analysis-processing system for processing an analysis of the reflected light received with the optical system, and the film-thickness monitoring device. The table is provided with a liquid-feeding opening for feeding a translucent liquid into a through-hole disposed in the polishing member.

30. 发明授权

US07241202B2 Substrate polishing apparatus 有权
标题翻译：基材抛光装置
公开(公告)号：US07241202B2
公开(公告)日：2007-07-10
申请号：US11169797
申请日：2005-06-30
申请人： Yoichi Kobayashi , Shunsuke Nakai , Hitoshi Tsuji , Yasuo Tsukuda , Hiroki Yamauchi
发明人： Yoichi Kobayashi , Shunsuke Nakai , Hitoshi Tsuji , Yasuo Tsukuda , Hiroki Yamauchi
IPC分类号： B24B49/00
CPC分类号： B24B37/205 , B24B37/013 , B24B49/12
摘要： A substrate polishing apparatus for polishing a polishing surface of a substrate has a film thickness monitoring device for monitoring a state of a film thickness of a thin film on the polishing surface of the substrate during polishing. The apparatus includes a table, a polishing member fixed on a surface of the table, a substrate support member for pressing the substrate onto the polishing member, an optical system composed of an optical fiber for irradiating the polishing surface of the substrate with a light of irradiation and an optical fiber for receiving a reflected light reflected on the polishing surface of the substrate, an analysis-processing system for processing an analysis of the reflected light received with the optical system, and the film-thickness monitoring device. The table is provided with a liquid-feeding opening for feeding a translucent liquid into a through-hole disposed in the polishing member.
摘要翻译：用于抛光基板的抛光表面的基板抛光装置具有用于在抛光期间监测基板的研磨表面上的薄膜的膜厚状态的膜厚监视装置。该装置包括：台子，固定在工作台的表面上的抛光部件，用于将基板按压到研磨部件上的基板支撑部件;光学系统，其由用于向基板的研磨面照射基板的光照射和用于接收在基板的研磨表面上反射的反射光的光纤，用于处理由光学系统接收的反射光的分析的分析处理系统和膜厚监视装置。该台设置有用于将半透明液体供给到设置在抛光构件中的通孔中的供液口。

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