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    • 28. 发明授权
    • Method for making die-compensated threshold tuning circuit
    • 制造芯片补偿阈值调谐电路的方法
    • US6048746A
    • 2000-04-11
    • US92906
    • 1998-06-08
    • James B. Burr
    • James B. Burr
    • G01R31/26G01R31/27H01L21/66
    • G01R31/275G01R31/2621
    • To compensate for process, activity and environmental variations in a semiconductor device, a back-bias potential tuning circuit is formed on a semiconductor die. The tuning circuit tunes a bias potential applied to the semiconductor die to maintain a predetermined ratio between a transistor on-current and a transistor off-current through at least one channel region. Then, a leakage current is measured for multiple transistors formed in the semiconductor die to determine a representative leakage of the semiconductor die. Tuning characteristics of the back-bias potential tuning circuit are then set to match the representative leakage of the semiconductor die.
    • 为了补偿半导体器件中的工艺,活性和环境变化,在半导体管芯上形成背偏电位调谐电路。 调谐电路调节施加到半导体管芯的偏置电位,以保持晶体管导通电流和通过至少一个沟道区域的晶体管截止电流之间的预定比率。 然后,对形成在半导体管芯中的多个晶体管测量泄漏电流,以确定半导体管芯的代表性泄漏。 然后设置背偏电位调谐电路的调谐特性以匹配半导体管芯的代表性泄漏。
    • 30. 发明授权
    • Method for forming MOS devices with retrograde pocket regions and
counter dopant regions buried in the substrate surface
    • 用于形成埋置在衬底表面中的逆行袋区和反掺杂区的MOS器件的方法
    • US5985727A
    • 1999-11-16
    • US885071
    • 1997-06-30
    • James B. Burr
    • James B. Burr
    • H01L21/336H01L29/10H01L29/78
    • H01L29/66659H01L29/1045H01L29/105H01L29/1083H01L29/7835
    • Disclosed is a low threshold asymmetric MOS device having a pocket region with a graded concentration profile. The pocket region includes a relatively high dopant atom concentration (of the same conductivity type as the bulk region) abutting either the device's source or its drain along the side of the source or drain that faces the device's channel region. The pocket region's graded concentration profile provides a lower dopant concentration near the substrate surface and an increasing dopant concentration below that surface. This provides a relatively low resistance conduction path through the pocket region, while allowing the device's threshold voltage to be somewhat higher at the pocket region. The asymmetric device can also include a counter dopant region located beneath its substrate surface. This forces current to flow in the substrate but just above the region of high counter dopant concentration, where the resistance is relatively low.
    • 公开了具有分级浓度分布的口袋区域的低阈值非对称MOS器件。 袋区域包括与器件的沟道区域相对的源或漏侧的器件的源极或漏极的相对高的掺杂剂原子浓度(与体区相同的导电类型)。 口袋区域的渐变浓度分布在基底表面附近提供较低的掺杂剂浓度,并且在该表面下方增加的掺杂剂浓度。 这提供了通过袋区域的相对较低的电阻传导路径,同时允许器件的阈值电压在口袋区域稍高一些。 不对称装置还可以包括位于其衬底表面下方的反掺杂剂区域。 这迫使电流在衬底中流动,但刚好高于高对位掺杂剂浓度的区域,其中电阻相对较低。