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    • 30. 发明授权
    • Dry-developing photosensitive dry film resist
    • 干式显影感光干膜抗蚀剂
    • US4357413A
    • 1982-11-02
    • US248347
    • 1981-03-27
    • Abraham B. CohenJoseph E. Gervay
    • Abraham B. CohenJoseph E. Gervay
    • G03F7/34H05K3/00H05K3/06H05K3/34G03C5/00
    • H05K3/0079G03F7/34H05K2203/0537H05K3/064H05K3/3452
    • A dry-developing dry film resist is provided comprising a photopolymerizable layer preferably sandwiched between a support sheet and a cover sheet, the layer comprising polymerizable monomer in excess of the absorptive capacity of the layer, photopolymerization initiator, and binder component of a plurality of polymers, at least one of these polymers being incompatible so as to be present as a dispersion in the layer to reduce the cohesive strength of the layer. The layer is developed by peeling away the support sheet, the unexposed area of the layer adhering to the support sheet and the exposed area adhering to the substrate to which it was laminated to form a resist image against such treatments as etching, plating and soldering, especially to make a printed circuit.
    • 提供一种干式显影干膜抗蚀剂,其包含优选夹在支撑片和覆盖片之间的可光聚合层,该层包含超过该层的吸收能力的可聚合单体,光聚合引发剂和多种聚合物的粘合剂组分 ,这些聚合物中的至少一种是不相容的,以便作为层中的分散体存在,以降低层的内聚强度。 通过剥离支撑片,附着在支撑片上的层的未曝光区域和附着在其上被层压的衬底的曝光区域形成抗蚀剂图像,从而形成抗蚀剂图像,以防蚀刻,电镀和焊接等处理, 特别是制作印刷电路。