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1. 发明授权

US5073462A Photopolymerizable composition having superior adhesion, articles and processes 失效
标题翻译：光聚合组合物具有优异的附着力，制品和工艺
公开(公告)号：US5073462A
公开(公告)日：1991-12-17
申请号：US509415
申请日：1990-04-09
申请人： Joseph E. Gervay
发明人： Joseph E. Gervay
IPC分类号： C08F299/02 , C08L63/10 , G03F7/027 , H05K1/00 , H05K3/00 , H05K3/46
CPC分类号： G03F7/027 , C08F299/026 , C08L63/10 , H05K3/4676 , H05K2201/0133 , H05K3/0023 , H05K3/4644 , Y10S428/901 , Y10T428/24802 , Y10T428/24851 , Y10T428/24917 , Y10T428/31681
摘要： A photopolymerizable composition comprising(a) a monomeric componment which is a half acryloyl ester of bisphenol A epoxy monomer;(b) an initiating system activated by actinic radiation; and(c) a preformed macromolecular elastomeric polymer binder.
摘要翻译：一种可光聚合组合物，其包含（a）单体组分，其为双酚A环氧单体的半丙烯酰酯; （b）通过光化辐射激活的引发体系; 和（c）预制的大分子弹性体聚合物粘合剂。

2. 发明授权

US4429027A Photoimaging process 失效
标题翻译：光成像过程
公开(公告)号：US4429027A
公开(公告)日：1984-01-31
申请号：US266057
申请日：1981-05-21
申请人： Vaughan C. Chambers, Jr. , Joseph E. Gervay
发明人： Vaughan C. Chambers, Jr. , Joseph E. Gervay
IPC分类号： G03F1/00 , G03F3/10 , G03G7/00 , G03G13/00 , H05K3/00 , H05K3/06 , G03C11/12
CPC分类号： G03F7/2018 , G03F3/103 , G03G13/00 , G03G7/00 , H05K3/0082 , H05K2203/0517 , H05K2203/0551 , H05K3/065 , H05K3/1266
摘要： A simplified method for photoimaging a photosensitive layer produces in situ a radiation-opaque photomask on the photosensitive layer or on a cover sheet of the layer. A nonvisible latent image is toned and the toner is transferred to a layer or cover sheet to form an actinic radiation-opaque photomask.
摘要翻译：感光层的光学成像的简化方法在感光层或层的覆盖片上原位产生辐射不透明的光掩模。将不可见的潜像调色，并将调色剂转移到层或覆盖片以形成光化辐射不透明的光掩模。

3. 发明授权

US5536620A Pliable, aqueous processable, photopolymerizable permanent coating for printed circuits 失效
标题翻译：用于印刷电路的柔性可水性可加工的光聚合永久涂层
公开(公告)号：US5536620A
公开(公告)日：1996-07-16
申请号：US300286
申请日：1994-09-02
申请人： Thomas E. Dueber , Joseph E. Gervay
发明人： Thomas E. Dueber , Joseph E. Gervay
IPC分类号： G03F7/004 , C08F20/34 , C08F22/36 , C08F220/34 , C08F222/38 , C08F291/00 , C08F299/06 , G03F7/027 , G03F7/028 , G03F7/033 , H05K3/28 , G03C1/73
CPC分类号： C08F299/06 , G03F7/033 , H05K3/287 , Y10S428/901
摘要： Aqueous processable photopolymerizable compositions containing (a) a cobinder system, (b) an acrylated urethane monomeric component; (c) a photoinitiator system; and (d) a thermal cross-linking agent are disclosed, which as cured compositions, are flexible and can be used as permanent coatings for the protection of printed circuitry.
摘要翻译：含水可加工的可光聚合组合物，其包含（a）椰子料系统，（b）丙烯酸酯化的聚氨酯单体组分; （c）光引发剂体系; 和（d）热交联剂，其作为固化的组合物是柔性的并且可以用作保护印刷电路的永久涂层。

4. 发明授权

US4357413A Dry-developing photosensitive dry film resist 失效
标题翻译：干式显影感光干膜抗蚀剂
公开(公告)号：US4357413A
公开(公告)日：1982-11-02
申请号：US248347
申请日：1981-03-27
申请人： Abraham B. Cohen , Joseph E. Gervay
发明人： Abraham B. Cohen , Joseph E. Gervay
IPC分类号： G03F7/34 , H05K3/00 , H05K3/06 , H05K3/34 , G03C5/00
CPC分类号： H05K3/0079 , G03F7/34 , H05K2203/0537 , H05K3/064 , H05K3/3452
摘要： A dry-developing dry film resist is provided comprising a photopolymerizable layer preferably sandwiched between a support sheet and a cover sheet, the layer comprising polymerizable monomer in excess of the absorptive capacity of the layer, photopolymerization initiator, and binder component of a plurality of polymers, at least one of these polymers being incompatible so as to be present as a dispersion in the layer to reduce the cohesive strength of the layer. The layer is developed by peeling away the support sheet, the unexposed area of the layer adhering to the support sheet and the exposed area adhering to the substrate to which it was laminated to form a resist image against such treatments as etching, plating and soldering, especially to make a printed circuit.
摘要翻译：提供一种干式显影干膜抗蚀剂，其包含优选夹在支撑片和覆盖片之间的可光聚合层，该层包含超过该层的吸收能力的可聚合单体，光聚合引发剂和多种聚合物的粘合剂组分，这些聚合物中的至少一种是不相容的，以便作为层中的分散体存在，以降低层的内聚强度。通过剥离支撑片，附着在支撑片上的层的未曝光区域和附着在其上被层压的衬底的曝光区域形成抗蚀剂图像，从而形成抗蚀剂图像，以防蚀刻，电镀和焊接等处理，特别是制作印刷电路。

5. 发明授权

US4278752A Flame retardant radiation sensitive element 失效
标题翻译：阻燃辐射敏感元件
公开(公告)号：US4278752A
公开(公告)日：1981-07-14
申请号：US121438
申请日：1980-02-14
申请人： Joseph E. Gervay , Yvan P. Pilette
发明人： Joseph E. Gervay , Yvan P. Pilette
IPC分类号： G03F7/033 , H05K3/28 , G03C1/68
CPC分类号： H05K3/287 , G03F7/033 , Y10S430/106
摘要： A radiation sensitive element comprising a support bearing a layer of photopolymerizable composition which comprises (1) at least one addition polymerizable ethylenically unsaturated compound, (2) an initiator activatable in the ultraviolet to visible region of the spectrum, and (3) at least 20% by weight of a polymeric binder containing at least 5% by weight of acrylonitrile, the composition having present at least 5% by weight halogen based on the total weight of composition covalently bonded to an aromatic moiety of at least one of said components of the composition and/or a conjugated vinyl component. The elements withstand soldering and are flame retardant and are useful as solder masks.
摘要翻译：一种辐射敏感元件，其包括带有可光聚合组合物层的载体，其包含（1）至少一种可加聚的烯键式不饱和化合物，（2）可在光谱的紫外至可见光区激活的引发剂，和（3）至少20 重量％的包含至少5重量％丙烯腈的聚合物粘合剂，该组合物基于共价键合到至少一种所述组分的芳族部分的组合物的总重量，存在至少5重量％的卤素组合物和/或共轭乙烯基组分。这些元件耐受焊接并且是阻燃的并且可用作焊接掩模。

6. 发明授权

US4937172A Photopolymerizable composition having superior adhesion, articles and processes 失效
标题翻译：光聚合组合物具有优异的附着力，制品和工艺
公开(公告)号：US4937172A
公开(公告)日：1990-06-26
申请号：US262267
申请日：1988-10-20
申请人： Joseph E. Gervay
发明人： Joseph E. Gervay
IPC分类号： C08F299/02 , C08L63/10 , G03F7/027 , H05K1/00 , H05K3/00 , H05K3/46
CPC分类号： G03F7/027 , C08F299/026 , C08L63/10 , H05K3/4676 , H05K2201/0133 , H05K3/0023 , H05K3/4644
摘要： A photopolymerizable composition comprising(a) a monomeric component which is a half acryloyl ester of bisphenol A epoxy monomer;(b) an initiating system activated by actinic radiation; and(c) a preformed macromolecular elastomeric polymer binder.
摘要翻译：一种可光聚合组合物，其包含（a）单体组分，其是双酚A环氧单体的半丙烯酰酯; （b）通过光化辐射激活的引发体系; 和（c）预制的大分子弹性体聚合物粘合剂。

7. 发明授权

US4621043A Storage stable photopolymerizable composition 失效
标题翻译：储存稳定的光聚合组合物
公开(公告)号：US4621043A
公开(公告)日：1986-11-04
申请号：US462403
申请日：1983-01-31
申请人： Joseph E. Gervay
发明人： Joseph E. Gervay
IPC分类号： C08L101/00 , C08F2/00 , C08F2/48 , C08L33/00 , C08L33/02 , C08L61/00 , C08L61/20 , G03C1/00 , G03F7/004 , G03F7/032 , G03C1/68
CPC分类号： G03F7/032 , Y10S430/111
摘要： A storage stable photopolymerizable composition is disclosed comprising polymeric acid binder with an acid number of at least 45 and a pKa value of at least 5, monomer, photoinitiator and an aldehyde resin precursor.
摘要翻译：公开了一种储存稳定的光聚合组合物，其包含酸值至少为45且pKa值至少为5的聚合酸性粘合剂，单体，光引发剂和醛树脂前体。

8. 发明授权

US4289841A Dry-developing photosensitive dry film resist 失效
标题翻译：干式显影感光干膜抗蚀剂
公开(公告)号：US4289841A
公开(公告)日：1981-09-15
申请号：US144300
申请日：1980-04-28
申请人： Abraham B. Cohen , Joseph E. Gervay
发明人： Abraham B. Cohen , Joseph E. Gervay
IPC分类号： G03F7/34 , H05K3/00 , H05K3/06 , H05K3/34 , G03C11/12 , G03C1/68
CPC分类号： G03F7/34 , H05K3/0079 , H05K2203/0537 , H05K3/064 , H05K3/3452 , Y10S430/106 , Y10S430/108 , Y10S430/109
摘要： A dry-developing dry film resist is provided comprising a photopolymerizable layer preferably sandwiched between a support sheet and a cover sheet, the layer comprising polymerizable monomer in excess of the absorptive capacity of the layer, photopolymerization initiator, and binder component of a plurality of polymers, at least one of these polymers being incompatible so as to be present as a dispersion in the layer to reduce the cohesive strength of the layer. The layer is developed by peeling away the support sheet, the unexposed area of the layer adhering to the support sheet and the exposed area adhering to the substrate to which it was laminated to form a resist image against such treatments as etching, plating and soldering, especially to make a printed circuit.
摘要翻译：提供一种干式显影干膜抗蚀剂，其包含优选夹在支撑片和覆盖片之间的可光聚合层，该层包含超过该层的吸收能力的可聚合单体，光聚合引发剂和多种聚合物的粘合剂组分，这些聚合物中的至少一种是不相容的，以便作为层中的分散体存在，以降低层的内聚强度。通过剥离支撑片，附着在支撑片上的层的未曝光区域和附着在其上被层压的衬底的曝光区域形成抗蚀剂图像，从而形成抗蚀剂图像，以防蚀刻，电镀和焊接等处理，特别是制作印刷电路。

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