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    • 26. 发明授权
    • Curable liquid resin composition
    • 可固化液体树脂组合物
    • US07084187B2
    • 2006-08-01
    • US10488472
    • 2002-09-26
    • Hideaki TakaseYoshikazu YamaguchiTakayoshi Tanabe
    • Hideaki TakaseYoshikazu YamaguchiTakayoshi Tanabe
    • C08J3/28
    • C09D4/00C08F230/08
    • To provide a radiation-sensitive curable liquid resin composition having excellent applicability and capable of producing a film excelling in hardness, scratch resistance, adhesion, transparency, and appearance of the surface of the film.A curable liquid resin composition comprising: (A) particles prepared by bonding at least one oxide of an element selected from the group consisting of silicon, aluminum, zirconium, titanium, zinc, germanium, indium, tin, antimony, and cerium to a specific organic compound which comprises a polymerizable unsaturated group and a group shown by —X—C(═Y)—NH— (wherein X is NH, O, or S, and Y is O or S), and preferably a silanol group, (B) a compound having two or more polymerizable unsaturated groups in the molecule, (C) a specific alkylene glycol organic solvent, and preferably (D) a polymerization initiator.
    • 本发明提供一种具有优异适用性且能够制备出优异的薄膜表面的硬度,耐擦伤性,粘附性,透明性和外观的薄膜的辐射敏感性固化性液体树脂组合物。 一种可固化液体树脂组合物,其包含:(A)通过将选自硅,铝,锆,钛,锌,锗,铟,锡,锑和铈中的至少一种元素的氧化物键合到特定的 包含可聚合不饱和基团和由-XC(-Y)-NH-(其中X是NH,O或S,Y是O或S)表示的基团的有机化合物,优选硅烷醇基,(B) 在分子中具有两个以上聚合性不饱和基团的化合物,(C)特定的亚烷基二醇有机溶剂,优选(D)聚合引发剂。
    • 28. 发明授权
    • Radiation-sensitive resin composition
    • 辐射敏感树脂组合物
    • US6120972A
    • 2000-09-19
    • US136051
    • 1998-08-18
    • Shin-ichiro IwanagaEiichi KobayashiTakayoshi TanabeKazuo Kawaguchi
    • Shin-ichiro IwanagaEiichi KobayashiTakayoshi TanabeKazuo Kawaguchi
    • G03F7/004G03F7/039
    • G03F7/0045G03F7/039
    • A radiation-sensitive resin composition comprising (A) a copolymer which comprises (a) a repeating unit (I) formed by cleavage of a carbon--carbon double bond of a monomer having one polymerizable carbon--carbon double bond and (b) a repeating unit (II) formed by cleavage of a carbon--carbon double bond of a monomer having two or more polymerizable carbon--carbon double bonds and at least one divalent group decomposed by an acid of the following formulas (1) or (2), ##STR1## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are an alkyl group having 1-5 carbon atoms or an aryl group having 6-14 carbon atoms individually, said monomer having a structure in which each carbon--carbon double bond combines via said divalent group, and (B) a photoacid generator. The radiation-sensitive resin composition exhibits excellent sensitivity and resolution, fewer effect from the swing curves, excellent pattern profile, and superior heat resistance, high sensitivity to ultraviolet rays, far ultraviolet rays, X-rays, and various types of radiation such as charged particle rays, and is useful as a chemically amplified positive tone resist used in the manufacture of integrated circuit devices.
    • 一种辐射敏感性树脂组合物,其包含(A)共聚物,其包含(a)通过裂解具有一个可聚合碳 - 碳双键的单体的碳 - 碳双键形成的重复单元(I)和(b)重复 通过裂解具有两个或多个可聚合碳 - 碳双键的单体的碳 - 碳双键形成的单元(II)和由下式(1)或(2)的酸分解的至少一个二价基团,其中 R1,R2,R3和R4分别是具有1-5个碳原子的烷基或具有6-14个碳原子的芳基,所述单体具有其中每个碳 - 碳双键通过所述二价基团结合的结构和( B)光致酸发生器。 辐射敏感性树脂组合物表现出优异的灵敏度和分辨率,较少的挥发曲线影响,优异的图案轮廓和优异的耐热性,对紫外线,远紫外线,X射线以及各种类型的辐射如带电的高灵敏度 粒子射线,并且可用作用于制造集成电路器件的化学放大正色调抗蚀剂。
    • 30. 发明授权
    • Water developable photosensitive resin composition
    • 水可显影光敏树脂组合物
    • US5736298A
    • 1998-04-07
    • US536494
    • 1995-10-02
    • Katsuo KoshimuraTakayoshi TanabeHozumi SatoNoboru OhshimaTakashi Nishioka
    • Katsuo KoshimuraTakayoshi TanabeHozumi SatoNoboru OhshimaTakashi Nishioka
    • G03F7/027G03F7/033G03C1/73
    • G03F7/027G03F7/033
    • A photo-sensitive resin composition is provided which contains (1) a particulate polymer of a carboxy-group-containing-diene having a cross-linked structure; (2) a polymer having two or more photo-polymerizable unsaturated groups at its molecular chain terminals, and, optionally, a photo-polymerizable unsaturated group, carboxyl group, hydroxy group, amino group, or epoxy group in side chains, or (2') a non-diene-type polymer having a photo-polymerizable unsaturated group, carboxyl group, hydroxy group, amino group, or epoxy group in side chains, or a low molecular weight linear diene-type polymer; (3) a photo-polymerizable unsaturated monomer; (4) a polymer containing an amino group; and (5) a photo-polymerization initiator. The photo-sensitive resin composition has excellent water-developing capability and shows almost no swelling in water, causing minimal reduction in strength and only minimal dimensional changes during development. Resin plates prepared from the composition possess excellent strength after exposure to light, excellent elongation at break, impact resilience and superb transparency, providing a good characteristic balance of properties.
    • 提供了一种光敏树脂组合物,其包含(1)具有交联结构的含羧基的二烯的颗粒状聚合物; (2)在其分子链末端具有两个以上的光聚合性不饱和基团的聚合物,以及任选的侧链中的光聚合性不饱和基团,羧基,羟基,氨基或环氧基,或(2 ')侧链中具有光聚合性不饱和基团,羧基,羟基,氨基或环氧基的非二烯类聚合物,或低分子线型二烯类聚合物; (3)光聚合性不饱和单体; (4)含有氨基的聚合物; 和(5)光聚合引发剂。 感光树脂组合物具有优异的水显影能力,并且在水中几乎没有溶胀,在显影期间几乎不降低强度并且只有极小的尺寸变化。 由组合物制备的树脂板在曝光后具有优异的强度,优异的断裂伸长率,抗冲击弹性和极好的透明度,提供良好的性能特征平衡。