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    • 28. 发明授权
    • Substrate treatment apparatus
    • 基板处理装置
    • US08033288B2
    • 2011-10-11
    • US12043561
    • 2008-03-06
    • Akio ShiomiYoshihiro NishinaToru SatoRyo Muramoto
    • Akio ShiomiYoshihiro NishinaToru SatoRyo Muramoto
    • B08B3/04
    • H01L21/67781H01L21/67075H01L21/67766Y10S134/902
    • A substrate treatment apparatus includes a container holder which holds a container for containing multiple substrates vertically stacked in horizontal postures, a substrate treatment section which collectively applies treatment to multiple substrates horizontally stacked in vertical postures, a main conveyance mechanism which conveys multiple substrates horizontally stacked in vertical postures between a substrate delivery position and the substrate treatment section, a carrying in/out mechanism which carries in/out the multiple substrates with respect to the container and changes postures of the multiple substrates between the horizontal postures and the vertical postures, and a sub conveyance mechanism which receives and delivers multiple substrates in vertical postures from and to the carrying in/out mechanism at a transfer position, receives and delivers multiple substrates in vertical postures from and to the main conveyance mechanism at the substrate delivery position, and conveys multiple substrates in vertical postures between the transfer and substrate delivery positions.
    • 基板处理装置包括:容器保持器,其容纳用于容纳垂直堆叠在水平姿势中的多个基板的容器;基板处理部,其对垂直方向上水平堆叠的多个基板进行处理;主输送机构,其将多个基板水平地堆叠在 在基板输送位置和基板处理部之间的垂直姿势,相对于容器进出多个基板的搬入/退出机构,并且在水平姿势和垂直姿势之间改变多个基板的姿势,以及 在传送位置从承载/离开机构接收和传送垂直姿势的多个基板的副传送机构,在基板传送位置处从主传送机构接收并传送多个基板至主传送机构的垂直姿势,并且传送 在转移和底物递送位置之间的垂直姿势中具有多个基底。