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    • 26. 发明授权
    • Spacer structure having a surface which can reduce secondaries
    • 间隔结构具有可以减少二次的表面
    • US06809469B1
    • 2004-10-26
    • US09413774
    • 1999-10-07
    • Nobuhiro ItoHideaki Mitsutake
    • Nobuhiro ItoHideaki Mitsutake
    • H01J162
    • H01J9/242H01J29/028H01J29/864H01J31/127H01J2329/863H01J2329/8635H01J2329/864H01J2329/8645H01J2329/8655H01J2329/866
    • A spacer on which static electricity is restricted and an electron beam apparatus in which the spacer is provided. In the electron beam apparatus comprising an electron source provided with electron emission devices, a face plate provided with anodes and spacers installed between the electron source and the face plate, unevenness is formed on the surface of the spacer substrate, and further a thin film which has a smaller thickness than a roughness. This makes possible the restriction of incident angle multiplication coefficient for the primary electrons whose energy is lower than the second cross-point energy of a resistive film. The electron beam apparatus provided with the above spacer is excellent in display definition and long-term reliability since the displacement of light emission points and the creeping discharge accompanying the static electricity can be restricted due to the spacer.
    • 静电受限制的间隔物和设置间隔物的电子束装置。 在包括设置有电子发射装置的电子源的电子束装置中,设置有设置在电子源和面板之间的阳极和间隔物的面板在间隔基板的表面上形成不均匀性, 具有比粗糙度更小的厚度。 这使得对于能量低于电阻膜的第二交叉点能量的一次电子的入射角倍增系数的限制成为可能。 设置有上述间隔物的电子束装置由于间隔件而可以限制发光点的位移和伴随静电的沿面放电的显示定义和长期可靠性。