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    • 25. 发明授权
    • Depletion mode thin film semiconductor photodetectors
    • 耗尽模式薄膜半导体光电探测器
    • US4598305A
    • 1986-07-01
    • US621340
    • 1984-06-18
    • Anne ChiangNoble M. Johnson
    • Anne ChiangNoble M. Johnson
    • H01L27/146H01L31/10H01L31/113H01L29/78H01L27/12
    • H01L31/1136
    • A depletion mode thin film semiconductor photodetector comprises a crystalline silicon thin film on an insulating substrate with a source region, a drain region and a thin film light sensing channel region formed therebetween. A gate oxide formed over the channel region and a gate electrode formed on the gate oxide. A p-n junction located parallel to the surface of the substrate and within the thin film functioning as a space charge separation region in the channel. The lower portion of the channel region is a p region extending to the substrate and the upper portion of the channel region is a n region extending to the gate oxide. The channel region functions as a fully depleted channel when the photodetector is operated in its OFF state providing for high dynamic range and large photocurrent operation. The depletion mode thin film semiconductor photodetector with n.sup.+ source and drain regions function as an ohmic contacts to the channel n region forming a thin film transistor. The thin film transistor photodetector has high photoconductive gain at low light intensities when the n channel region is fully pinched off by an applied gate voltage to the gate electrode which is sufficiently negative as compared to the threshold voltage of the photodetector. When the drain region is replaced by a p.sup.+ region functioning as an ohmic contact to the channel p region, a depletion mode gated diode is formed. When the channel region is extended to include a plurality of linearly spaced gate electrodes formed on the gate oxide region with an input diode formed adjacent to the first of such gate electrodes and an output diode formed adjacent to the last of such gate electrodes, the photodetector functions as a charge coupled device.
    • 耗尽型薄膜半导体光电检测器包括在绝缘基板上的晶体硅薄膜,源极区,漏区和在其间形成的薄膜光感应沟道区。 形成在沟道区上的栅极氧化物和形成在栅极氧化物上的栅电极。 p-n结,其平行于衬底的表面并且在薄膜内,用作通道中的空间电荷分离区域。 沟道区的下部是延伸到衬底的p区,沟道区的上部是延伸到栅极氧化物的n区。 当光电检测器工作在其关闭状态时,通道区域用作完全耗尽的通道,提供高动态范围和大的光电流操作。 具有n +源极和漏极区域的耗尽型薄膜半导体光电探测器用作形成薄膜晶体管的沟道n区的欧姆接触。 薄膜晶体管光电检测器在低光强度下具有高的光电导增益,当n沟道区被栅极施加的栅极电压完全夹到栅电极时,与光电检测器的阈值电压相比是足够的。 当漏极区被由作为与沟道p区的欧姆接触起作用的p +区代替时,形成耗尽型门控二极管。 当沟道区域被扩展以包括形成在栅极氧化物区域上的多个线性间隔开的栅极时,其中形成在与这些栅电极中的第一个栅极电极相邻的输入二极管上,以及与最后一个这样的栅电极相邻形成的输出二极管, 用作电荷耦合器件。
    • 29. 发明授权
    • Transmitting/reflecting emanating light with time variation
    • 发射/反射发光随时间变化
    • US08373860B2
    • 2013-02-12
    • US12762702
    • 2010-04-19
    • Peter KieselMarkus BeckNoble M. JohnsonMichael Bassler
    • Peter KieselMarkus BeckNoble M. JohnsonMichael Bassler
    • G01N21/25
    • G01N21/05G01N21/255G01N21/645G01N2021/0346
    • A filter arrangement can transmit and/or reflect light emanating from a moving object so that the emanating light has time variation, and the time variation can include information about the object, such as its type. For example, emanating light from segments of a path can be transmitted/reflected through positions of a filter assembly, and the transmission functions of the positions can be sufficiently different that time variation occurs in the emanating light between segments. Or emanating light from a segment can be transmitted/reflected through a filter component in which simpler transmission functions are superimposed, so that time variation occurs in the emanating light in accordance with superposition of two simpler non-uniform transmission functions. One or more mask arrangements can be configured to receive the emanating light and in response provide encoded emanating light.
    • 滤波器装置可以发射和/或反射从移动物体发出的光,使得发射光具有时间变化,并且时间变化可以包括关于物体的信息,例如其类型。 例如,可以通过路径的区段发出光,并通过过滤器组件的位置进行透射/反射,并且位置的透射函数可以充分地不同,从而在区间之间的发光中发生时间变化。 或者发射来自光束的光可以通过其中叠加更简单的透射函数的滤光器部件被透射/反射,使得根据两个更简单的不均匀透射函数的叠加在发射光中发生时间变化。 一个或多个掩模布置可以被配置为接收发射光并且作为响应提供编码的发射光。