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    • 21. 发明授权
    • Polycarbonate with epoxidized block copolymer
    • 聚碳酸酯树脂组合物
    • US6111016A
    • 2000-08-29
    • US116816
    • 1998-07-17
    • Masahiro KatayamaMasaaki ItoYoshihiro Otsuka
    • Masahiro KatayamaMasaaki ItoYoshihiro Otsuka
    • C08L69/00C08L101/00C08L53/02
    • C08L69/00C08L101/00
    • A thermoplastic resin composition can be obtained by adding about 0.1 to 20 parts by weight of a diene-series block copolymer (2) to 100 parts by weight of a resin composition containing a polycarbonate-series resin (1) as a basic component of which the proportion of terminal hydroxy groups relative to the whole of the terminals is 1 mole % or above (about 5 to 40 mole %). The polycarbonate-series resin base may further comprise a thermoplastic resin composition (3) such as a rubber-modified styrenic resin. The block copolymer component (2) includes an epoxy-modified block copolymer, etc. When added an organophosphorus compound as a flame retardant (4), or a fluorine-containing resin as a flame-retartant auxiliary (5), a halogen-free flame-retardant thermoplastic resin composition can be obtained. A thermoplastic resin with an improved flowability and impact strength can be obtained by modifying a polymer blend of the polycarbonate-series resin and the styrenic-series resin in quality.
    • 通过向100重量份的作为其基本成分的聚碳酸酯系树脂(1)的树脂组合物100重量份中加入约0.1〜20重量份的二烯系嵌段共聚物(2),可以得到热塑性树脂组合物, 末端羟基相对于整个末端的比例为1摩尔%以上(约5〜40摩尔%)。 聚碳酸酯系树脂基材还可以含有热塑性树脂组合物(3),例如橡胶改性苯乙烯树脂。 嵌段共聚物组分(2)包括环氧改性的嵌段共聚物等。当加入作为阻燃剂的有机磷化合物(4)或作为阻燃助剂(5)的含氟树脂时,不含卤素 可以得到阻燃热塑性树脂组合物。 通过改性聚碳酸酯系树脂和苯乙烯系树脂的聚合物共混物的质量,可以获得具有改善的流动性和冲击强度的热塑性树脂。
    • 24. 发明授权
    • Alumina ceramic body
    • 氧化铝陶瓷体
    • US4735926A
    • 1988-04-05
    • US839579
    • 1986-03-14
    • Minato AndoMasaaki ItoFumio Mizuno
    • Minato AndoMasaaki ItoFumio Mizuno
    • C04B35/111H01B3/12H01P7/10C04B35/46
    • C04B35/111
    • A dielectric alumina ceramic body having a constant dielectric loss tangent tan .delta. is obtained by sintering a composition consisting essentially of:100 parts by weight of a ternary formulation consisting of 92.4 to 98.7 mol % Al.sub.2 O.sub.3, at least 0.5 mol % CaO, and 1.3 to 7.6 mol % TiO.sub.2 ; andat least one selected from the group consisting of Cr.sub.2 O.sub.3 and NiO subject to the relation of: ##EQU1## where x is the weight part of Cr.sub.2 O.sub.3 per 100 parts by weight of said formulation,y is the weight part of NiO per 100 parts by weight of said formulation, andz is the mol % of Al.sub.2 O.sub.3 in the formulation,provided that x.gtoreq.0 and y.gtoreq.0, except x=y=0.
    • 具有恒定介电损耗角正切tanδ的电介质氧化铝陶瓷体通过烧结基本上由以下组成的组合物获得:100重量份的由92.4至98.7mol%的Al 2 O 3,至少0.5mol%的CaO和1.3至 7.6mol%TiO 2; 和选自Cr 2 O 3和NiO中的至少一种,其关系如下:< IMAGE>其中x是每100重量份所述制剂的Cr 2 O 3的重量份,y是NiO每100重量份的重量份 所述制剂的重量,z是制剂中Al 2 O 3的摩尔%,条件是除了x = y = 0,x> = = 0且y> / = 0。
    • 28. 发明申请
    • PATTERN DEFECT INSPECTING APPARATUS AND METHOD
    • 图案缺陷检查装置及方法
    • US20110221886A1
    • 2011-09-15
    • US13059908
    • 2009-07-08
    • Hidetoshi NishiyamaMasaaki ItoSachio UtoKei Shimura
    • Hidetoshi NishiyamaMasaaki ItoSachio UtoKei Shimura
    • H04N7/18
    • G01N21/956G01N21/94H01L22/12
    • In recent years, a wafer inspection time in semiconductor manufacturing processes is being required to be reduced for reduction in manufacturing time and for early detection of yield reduction factors. To meet this requirement, there is a need to reduce the time required for inspection parameter setup, as well as the time actually required for inspection. Based on the speed or position change information relating to a transport system 2, inspection is also conducted during acceleration/deceleration of the transport system 2 by controlling an accumulation time and/or operational speed of a detector or by correcting acquired images. Alternate display of review images of a detection region at fixed time intervals improves visibility of the detection region and makes it possible to confirm within a short time whether a defect is present.
    • 近年来,为了减少制造时间和减少因素的早期检测,需要减少半导体制造工序中的晶片检查时间。 为了满足这一要求,需要减少检查参数设置所需的时间以及检查所需的时间。 基于与运输系统2有关的速度或位置变化信息,通过控制检测器的累积时间和/或操作速度或通过校正所获取的图像,也可以在运输系统2的加速/减速期间进行检查。 以固定的时间间隔交替显示检测区域的检查图像提高了检测区域的可视性,并且使得可以在短时间内确认是否存在缺陷。
    • 30. 发明申请
    • APPARATUS AND METHOD FOR INSPECTING AN OBJECT SURFACE DEFECT
    • 用于检查物体表面缺陷的装置和方法
    • US20110141272A1
    • 2011-06-16
    • US13059523
    • 2009-07-10
    • Sachio UtoHidetoshi NishiyamaKei ShimuraMasaaki Ito
    • Sachio UtoHidetoshi NishiyamaKei ShimuraMasaaki Ito
    • H04N7/18G01N21/956
    • G01N21/95607G01N21/94G01N21/9501
    • Disclosed is an apparatus having a light source of a deep ultraviolet ray for detecting a small foreign matter or pattern defect, which may arise during a process for manufacturing a semiconductor device or the like, in high resolution. The apparatus comprises a means for detecting a damage on an optical system due to a wavelength reduction thereby to save a damaged portion, and a means for comparing an optical system arrangement with that at the manufacturing time and detecting the abnormality thereof, to thereby make a correction, so that the apparatus can inspect the defect on an object substrate stably at a high speed and in high sensitivity. Also disclosed is a method for the stable inspection. The apparatus is provided, in the optical path of the optical system, with a means for detecting the intensity and the convergent state of an illumination light, and a means for detecting the abnormality of the optics system and for saving an abnormal portion from alignment with an optical axis. The apparatus is constituted such that the optical system is adjusted to make corrections for the optical conditions at the manufacturing time, thereby to elongate the lifetime of the optical system in the inspecting apparatus and to detect the small defect stably.
    • 公开了一种具有用于检测在高分辨率的半导体器件等的制造工艺期间可能出现的小异物或图案缺陷的深紫外线光源的装置。 该装置包括用于检测由于波长减小而导致的光学系统的损坏从而节省损坏部分的装置,以及用于将光学系统布置与制造时间布置进行比较并检测其异常的装置,从而使 校正,使得设备可以高速和高灵敏度稳定地检查对象基板上的缺陷。 还公开了用于稳定检查的方法。 该装置在光学系统的光路中设置有用于检测照明光的强度和收敛状态的装置,以及用于检测光学系统的异常并且用于保存异常部分与对准的装置 光轴。 该装置被构造成使得光学系统被调整以对制造时的光学条件进行校正,从而延长了检查装置中的光学系统的寿命并且稳定地检测小缺陷。