专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

21. 发明授权

US6042688A Carrier for double-side polishing 失效
标题翻译：载体双面抛光
公开(公告)号：US6042688A
公开(公告)日：2000-03-28
申请号：US104396
申请日：1998-06-25
申请人： Hisashi Masumura , Kiyoshi Suzuki
发明人： Hisashi Masumura , Kiyoshi Suzuki
IPC分类号： B24B37/27 , B24B37/28 , B24B53/00 , B24B49/18
CPC分类号： B24B53/017 , B24B37/28
摘要： A carrier for double-side polishing, which has a polishing pad dressing function as well as a polishing function, so that it can do removal of matter stuck to polishing pads and wear correction thereof concurrently with polishing and ensure stable work polishing accuracy. A resin-coated metal or resin ring is provided around the outer periphery of a carrier portion having work retainer holes and abrasive feed holes, and projections are formed on the upper and lower surfaces of the ring. The projections are cylindrical, triangular pyramidal, quadrangular pyramidal or conical, or they may be irregular projections formed by blasting.
摘要翻译：用于双面抛光的载体，其具有抛光垫修整功能以及抛光功能，使得它可以在抛光垫上同时去除粘附在抛光垫上的物质并进行磨损校正，并确保稳定的抛光精度。在具有工作保持孔和磨料供给孔的承载部分的外周设置树脂涂覆的金属或树脂环，并且在环的上表面和下表面上形成突起。突起是圆柱形，三角锥体，四棱锥形或圆锥形，或者它们可以是通过喷砂形成的不规则突起。

22. 发明授权

US5827779A Method of manufacturing semiconductor mirror wafers 失效
标题翻译：制造半导体镜片晶圆的方法
公开(公告)号：US5827779A
公开(公告)日：1998-10-27
申请号：US684000
申请日：1996-07-19
申请人： Hisashi Masumura , Kiyoshi Suzuki , Hideo Kudo
发明人： Hisashi Masumura , Kiyoshi Suzuki , Hideo Kudo
IPC分类号： B24B37/07 , B24B37/20 , B24B37/24 , C30B33/00 , H01L21/304 , H01L21/44
CPC分类号： C30B33/00
摘要： A method of manufacturing semiconductor mirror wafers includes a double side primary mirror polishing step and a single side final mirror polishing step. The method having the double side mirror polishing step is capable of higher flatness level wafer processing, suppression of fine dust or particles, thereby to increase the yield of semiconductor devices, higher productivity due to simplification of processes, higher quality processing with lower manufacturing cost than conventional methods.
摘要翻译：制造半导体镜面晶片的方法包括双面主镜抛光步骤和单面最终镜面抛光步骤。具有双面镜研磨工序的方法能够进行更高的平坦度晶片处理，抑制细粉尘或微粒，从而提高半导体器件的成品率，由于工艺简单，生产率提高，制造成本低，质量更高，制造成本低常规方法。

23. 发明授权

US5827395A Polishing pad used for polishing silicon wafers and polishing method using the same 失效
标题翻译：用于抛光硅晶片的抛光垫及使用其的抛光方法
公开(公告)号：US5827395A
公开(公告)日：1998-10-27
申请号：US455519
申请日：1995-05-31
申请人： Hisashi Masumura , Kiyoshi Suzuki , Hideo Kudo
发明人： Hisashi Masumura , Kiyoshi Suzuki , Hideo Kudo
IPC分类号： B24B37/20 , B24B37/24 , B24D13/14 , H01L21/304 , C23F1/02
CPC分类号： B24B37/24
摘要： A polishing pad composed of a rigid polyurethane added with CaCO.sub.3 particles is able to provide polished wafers having a surface roughness which is comparable to that attained by the conventional final polishing process. Even when polishing is achieved under a high load condition to improve the productivity, the polished wafers are free from deformation, such as concaving, and have an excellent flatness.
摘要翻译：由添加有CaCO 3颗粒的刚性聚氨酯组成的抛光垫能够提供具有与通过常规最终抛光工艺获得的表面粗糙度相当的表面粗糙度的抛光晶片。即使在高负载条件下进行抛光以提高生产率的情况下，抛光的晶片也不会变形，例如凹陷，并且具有优异的平坦度。

24. 发明授权

US5373119A Exhaust muffler for internal combustion engine 失效
标题翻译：内燃机排气消声器
公开(公告)号：US5373119A
公开(公告)日：1994-12-13
申请号：US122799
申请日：1993-09-15
申请人： Kiyoshi Suzuki , Noboru Nagai , Tadashi Ozaki , Isao Masuda
发明人： Kiyoshi Suzuki , Noboru Nagai , Tadashi Ozaki , Isao Masuda
IPC分类号： F01N1/08 , F01N1/10 , F01N3/033 , F01N3/28 , F01N13/00 , F02B1/04 , F01N3/02 , F01N3/15
CPC分类号： F01N13/002 , F01N1/08 , F01N1/10 , F01N3/0335 , F01N3/2885 , F01N2230/02 , F01N2230/04 , F01N2330/10 , F01N2450/18 , F01N2450/30 , F01N2470/14 , F01N2470/18 , F01N2590/06 , F02B1/04 , Y02T10/20
摘要： A muffler for internal combustion engines is formed of vertically separable body sections so that the sound absorbing and filter members may be accessed easily for replacement and/or cleaning.
摘要翻译：用于内燃机的消音器由垂直分离的主体部分形成，使得吸音和过滤构件可以容易地被接近以进行更换和/或清洁。

25. 发明授权

US5292922A N-acyl-N-phenyltetrahydrophthalamic acid derivatives, methods of producing same, and herbicides containing same as effective components 失效
标题翻译： N-酰基-N-苯基四氢酞酸衍生物，其制造方法，以及含有与有效成分相同的除草剂
公开(公告)号：US5292922A
公开(公告)日：1994-03-08
申请号：US849063
申请日：1992-04-22
申请人： Tetsuo Takematsu , Takashi Kume , Takeo Komata , Kiyoshi Suzuki , Matsue Minezaki , Yumiko Shirakawa , Kaoru Mori
发明人： Tetsuo Takematsu , Takashi Kume , Takeo Komata , Kiyoshi Suzuki , Matsue Minezaki , Yumiko Shirakawa , Kaoru Mori
IPC分类号： A01N37/30 , A01N37/38 , A01N39/00 , A01N39/02 , A01N39/04 , A01N43/08 , C07C233/91 , C07C233/92 , C07C257/02 , C07C229/00 , C07C233/00
CPC分类号： C07C257/02 , A01N37/30 , A01N37/38 , A01N39/00 , A01N39/02 , A01N39/04 , A01N43/08 , C07C233/91 , C07C233/92 , C07C2101/16
摘要： The invention provides N-acyl-N-phenyltetrahydrophthalamic acid derivatives represented by the general formula [I], methods of producing the same, and herbicides containing the same as the effective components, ##STR1## wherein X and Y each individually represent hydrogen atoms or halogen atoms, R.sup.1 represents a hydrogen atom, a halogen atom, a lower alkoxy group, a lower alkenyloxy group, a lower alkynyloxy group, a lower alkoxyalkoxy group or a lower alkoxycarbonylalkoxy group, R.sup.2 represents a lower alkyl group, a halogenated lower alkyl group, or a substituted or unsubstituted phenyl group, and R.sup.3 represents a lower alkoxy group, a lower alkenyloxy group, a lower alkynyloxy group, a lower alkoxyalkoxy group, a benzyloxy group or a lower alkoxycarbonylalkoxy group. The herbicides which are very useful can be widely applied to upland, paddy field, orchard, turf, forest, non-crop land, etc, and are not harmful to crops.
摘要翻译： PCT No.PCT / JP91 / 01109 Sec。 371日期：1992年4月22日 102（e）日期1992年4月22日PCT提交1991年8月21日PCT公布。出版物WO92 / 03407 本发明提供了通式（I）表示的N-酰基-N-苯基四氢酞酸衍生物，其制造方法，含有与有效成分相同的除草剂，（*化学结构*）（I）其中X和Y各自独立地表示氢原子或卤素原子，R1表示氢原子，卤素原子，低级烷氧基，低级链烯氧基，低级炔氧基，低级烷氧基烷氧基或低级烷氧羰基烷氧基 R 2表示低级烷基，卤代低级烷基或取代或未取代的苯基，R 3表示低级烷氧基，低级链烯氧基，低级炔氧基，低级烷氧基烷氧基，苄氧基或低级烷氧基羰基烷氧基。非常有用的除草剂可广泛应用于旱地，水田，果园，草坪，森林，非作物地等，对作物无害。

26. 发明授权

US5046797A Light beam scanner with foreign matter removing feature 失效
标题翻译：光束扫描器具有异物去除功能
公开(公告)号：US5046797A
公开(公告)日：1991-09-10
申请号：US322872
申请日：1989-03-14
申请人： Akira Kurisu , Kiyoshi Suzuki
发明人： Akira Kurisu , Kiyoshi Suzuki
IPC分类号： G02B26/12 , G02B27/00
CPC分类号： G02B27/0006 , G02B26/121
摘要： A light beam scanner which is adapted to reflect optical beams by a rotary polygonal mirror provided adjacent a free end portion of a rotary shaft which is supported rotatably by a bearing, thereby performing scanning, the rotary polygonal mirror is covered with a protective cover, the protective cover being provided with a gas-inlet opening capable of introducing gas into the inside of the protective cover and a gas-outlet opening with the rotary shaft loosely-fitted therein, the gas-outlet opening permitting a discharge of gas from the inside of the protection cover. Accordingly, any deposition of oil mist which may leak from the bearing on the rotary polygonal mirror can be prevented by producing a gas-flow stream which travels from the gas-inlet opening to the gas-outlet opening.
摘要翻译：一种光束扫描器，其适于通过旋转多面镜反射光束，所述旋转多面镜邻近由轴承可旋转地支撑的旋转轴的自由端部设置，从而进行扫描，所述旋转多面镜被保护盖覆盖，保护罩设置有能够将气体引入保护罩的内部的气体入口和带有松动地配合在其中的旋转轴的气体出口，气体出口开口允许从内部排出气体防护罩。因此，可以通过产生从气体入口到气体出口开口的气流来防止可能从旋转多面镜上的轴承泄漏的油雾沉积。

27. 发明授权

US4381338A Process for preparing photoconductive particles 失效
标题翻译：光电导颗粒的制备方法
公开(公告)号：US4381338A
公开(公告)日：1983-04-26
申请号：US188229
申请日：1980-09-17
申请人： Kiyoshi Suzuki
发明人： Kiyoshi Suzuki
IPC分类号： G03G5/08 , G03G5/087 , H01L31/0264 , H01L31/18
CPC分类号： H01L31/18 , G03G5/08 , G03G5/087
摘要： Photoconductive particles are prepared by the reaction of a water-soluble metal salt with an ion exchange resin having an anion which reacts with the metal ion of the water-soluble metal salt to produce a water insoluble metal compound and the deposition of the water insoluble metal compound resulting from the reaction on the surface of the photoconductive particles.
摘要翻译：通过水溶性金属盐与具有与水溶性金属盐的金属离子反应的阴离子的离子交换树脂的反应来制备光导颗粒，以产生水不溶性金属化合物和沉积不溶于水的金属由光电导表面上的反应产生的化合物。

28. 发明授权

US4316947A Cadmium sulfide for electrophotography 失效
标题翻译：用于电子照相的硫化镉
公开(公告)号：US4316947A
公开(公告)日：1982-02-23
申请号：US184752
申请日：1980-09-08
申请人： Kiyoshi Suzuki , Hirokuni Kawashima
发明人： Kiyoshi Suzuki , Hirokuni Kawashima
IPC分类号： C01G11/02 , G03G5/08 , G03G5/087
CPC分类号： C01G11/02 , G03G5/08
摘要： Cadium sulfide for electrophotography is produced by reacting hydrogen sulfide with a solution containing cadmium sulfate, sulfuric acid and hydrochloric acid of a low concentration, and then firing the resulting cadmium sulfide without adding a donor impurity other than that derived from the hydrochloric acid.
摘要翻译：通过使硫化氢与含有低浓度的硫酸镉，硫酸和盐酸的溶液反应，然后在不添加源自盐酸的供体杂质的情况下烧制所得到的硫化镉而制造电子照相用硫化硫。

29. 外观设计

USD258434S Combined radio and television receiver 失效
公开(公告)号：USD258434S
公开(公告)日：1981-03-03
申请号：US52640
申请日：1979-06-27
申请人： Kiyoshi Suzuki , Kenichi Itho , Tadashi Sumino , Satoru Kotani , Masaki Yamamoto , Kazunori Mano
设计人： Kiyoshi Suzuki , Kenichi Itho , Tadashi Sumino , Satoru Kotani , Masaki Yamamoto , Kazunori Mano

30. 发明授权

US08082054B2 Method of optimizing process recipe of substrate processing system 有权
标题翻译：基板处理系统工艺配方优化方法
公开(公告)号：US08082054B2
公开(公告)日：2011-12-20
申请号：US12760017
申请日：2010-04-14
申请人： Kaname Yamaji , Kiyoshi Suzuki , Yuichi Takenaga
发明人： Kaname Yamaji , Kiyoshi Suzuki , Yuichi Takenaga
IPC分类号： G06F19/00
CPC分类号： C23C16/52 , G05B13/021 , H01L21/67005 , H01L22/12 , H01L22/20
摘要： The present invention is a method of optimizing a process recipe of a substrate processing system including: a substrate processing apparatus that performs a film deposition process of a substrate to be processed according to a process recipe; a data processing unit that executes a calculation for optimizing the process recipe; and a host computer; the substrate processing apparatus, the data processing unit, and the host computer being connected to each other through a network. The present invention includes the steps of: measuring a film thickness of a substrate to be processed that has been subjected to a film deposition process by the substrate processing apparatus; sending a command for conducting a process-recipe optimizing process from the host computer to the substrate processing apparatus, when the measured film thickness is deviated from a target film thickness and the deviation is beyond an allowable range; and in response to the command for conducing a process-recipe optimizing process from the host computer, sending required data from the substrate processing apparatus to the data processing unit, causing the data processing unit to execute a process-recipe optimizing calculation to calculate an optimum process recipe for achievement of the target film thickness, and updating the process recipe in the substrate processing apparatus based on the calculated result.
摘要翻译：本发明是一种优化基板处理系统的工艺配方的方法，包括：基板处理装置，其根据处理配方进行待加工基板的成膜处理; 数据处理单元，其执行用于优化处理配方的计算; 和主机; 基板处理装置，数据处理单元和主机通过网络彼此连接。本发明包括以下步骤：测量由基板处理装置进行的膜沉积处理的被处理基板的膜厚; 当测量的膜厚度偏离目标膜厚度并且偏差超出允许范围时，发送用于进行从主机到基板处理装置的处理配方优化处理的命令; 并且响应于从主计算机进行处理配方优化处理的命令，将所需数据从基板处理装置发送到数据处理单元，使数据处理单元执行处理配方优化计算以计算最佳值用于实现目标膜厚度的处理配方，以及基于计算结果更新基板处理装置中的处理配方。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式