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21. 发明授权

US4396254A f.multidot..theta. Lens 失效
标题翻译： fxθ镜头
公开(公告)号：US4396254A
公开(公告)日：1983-08-02
申请号：US235087
申请日：1981-02-17
申请人： Masato Shibuya
发明人： Masato Shibuya
IPC分类号： G02B26/10 , G02B9/64 , G02B13/00 , G02B13/22 , G02B27/00 , G02B9/62
CPC分类号： G02B13/00 , G02B13/0005 , G02B27/0025
摘要： An f.multidot..theta. lens includes, in succession from the incident light side, a first group having a negative refractive power, a second group having a meniscus lens component having its convex surface facing the incident light side, a third group having a meniscus lens component having its convex surface facing the emergent light side, and a fourth group having a positive refractive power.
摘要翻译： fxθ透镜从入射光侧依次包括具有负屈光力的第一组，具有其凸表面面对入射光侧的弯月透镜部件的第二组，具有弯月透镜部件的第三组具有其凸表面面向出射光侧，第四组具有正折射光焦度。

22. 发明授权

US07336448B2 Magnetic head actuator with equalized deviation 失效
标题翻译：具有均衡偏差的磁头执行机构
公开(公告)号：US07336448B2
公开(公告)日：2008-02-26
申请号：US10901214
申请日：2004-07-29
申请人： Shinji Fujimoto , Masato Shibuya , Hisashi Kaneko , Tsuneyori Ino , Yukihiro Komura , Mitsuhiro Izumi , Kei Funabashi
发明人： Shinji Fujimoto , Masato Shibuya , Hisashi Kaneko , Tsuneyori Ino , Yukihiro Komura , Mitsuhiro Izumi , Kei Funabashi
IPC分类号： G11B5/54 , G11B21/22
CPC分类号： G11B5/5569 , G11B5/54
摘要： A magnetic disk device comprises a magnetic disk in which a data zone is formed. An actuator has a voice coil and a head slider carrying a magnetic head, the actuator being swung to move the magnetic head over the disk between an innermost position of the data zone and an outermost position of the data zone. A magnet has a magnetization center and is opposed to the voice coil so that a voice coil motor which swings the actuator is formed, the magnet having a north pole and a south pole confronting each other via the magnetization center. The magnetic disk device is provided so that a deviation of a center of the voice coil from the magnetization center when the magnetic head is in the innermost position of the data zone is substantially equal to a deviation of the center of the voice coil from the magnetization center when the magnetic head is in the outermost position of the data zone.
摘要翻译：磁盘装置包括形成数据区的磁盘。致动器具有音圈和携带磁头的磁头滑块，所述致动器摆动以使磁头在数据区的最内位置和数据区的最外位置之间的磁盘上移动。磁体具有磁化中心并且与音圈相对，从而形成摆动致动器的音圈电动机，磁体具有通过磁化中心彼此相对的北极和南极。提供磁盘装置，使得当磁头处于数据区的最内位置时，音圈的中心与磁化中心的偏差基本上等于音圈的中心与磁化的偏差当磁头位于数据区的最外侧位置时居中。

23. 发明申请

US20050174698A1 Housing base of recording medium drive 失效
标题翻译：记录媒体驱动器的基座
公开(公告)号：US20050174698A1
公开(公告)日：2005-08-11
申请号：US11100413
申请日：2005-04-07
申请人： Yoshiharu Matsuda , Shinji Fujimoto , Masato Shibuya , Keiichi Miyajima
发明人： Yoshiharu Matsuda , Shinji Fujimoto , Masato Shibuya , Keiichi Miyajima
IPC分类号： G11B5/48 , G11B5/55 , G11B19/20 , G11B25/04 , G11B33/12
CPC分类号： G11B33/121 , G11B5/4813 , G11B5/5569 , G11B19/2009 , G11B25/043
摘要： A hard disk drive includes a base having a bottom plate. A magnetic body is embedded in the bottom plate. The magnetic body is allowed to serve as a magnetic shield in the hard disk drive. The magnetic body is allowed to have a sufficient thickness without requiring an additional space outside the base, since the magnetic body is embedded in the base. The magnetic field directed outside the base can reliably be absorbed at the magnetic body. The magnetic body may be received in a depression defined in the bottom plate. The depression may be formed based on a reduction in the thickness of the bottom plate.
摘要翻译：硬盘驱动器包括具有底板的底座。磁性体嵌入底板。允许磁体用作硬盘驱动器中的磁屏蔽。允许磁体具有足够的厚度，而不需要在基座之外的额外空间，因为磁体嵌入基座中。引导到基座外部的磁场可以可靠地被吸收在磁体上。磁体可以容纳在底板中限定的凹陷中。凹陷可以基于底板的厚度的减小而形成。

24. 发明授权

US06741394B1 Optical integrator, illumination optical apparatus, exposure apparatus and observation apparatus 失效
标题翻译：光学积分器，照明光学装置，曝光装置和观察装置
公开(公告)号：US06741394B1
公开(公告)日：2004-05-25
申请号：US09703727
申请日：2000-11-02
申请人： Osamu Tanitsu , Yuji Kudo , Mitsunori Toyoda , Masato Shibuya
发明人： Osamu Tanitsu , Yuji Kudo , Mitsunori Toyoda , Masato Shibuya
IPC分类号： G02B2710
CPC分类号： G03G7/0046 , B41M5/5272 , G02B3/0056 , G02B3/0062 , G02B3/0068 , G02B21/082 , G03F7/70075 , G03F7/70091 , G03G7/0006
摘要： The present invention is aimed at providing a wavefront dividing type optical integrator which can yield a uniform illuminance distribution substantially over the whole illumination field formed thereby even when the size of each micro lens constituting the optical integrator is made smaller so as to set a large number of wavefront divisions. The optical integrator in accordance with the present invention is a wavefront dividing type optical integrator, having a number of micro lenses arranged two-dimensionally, for forming a number of light sources by dividing a wavefront of an incident beam; each micro lens having a rectangular entrance surface and a rectangular exit surface, and satisfying at least one of the following conditions: (d1/2)(D1/2)/(&lgr;·f)≧3.05 (d2/2)(D2/2)/(&lgr;·f)≧3.05 where f is the focal length of each micro lens, d1 is the length of one side of the entrance surface of each micro lens, d2 is the length of the other side of the entrance surface of each micro lens, D1 is the length of the side of exit surface in each micro lens corresponding to the one side of entrance surface, D2 is the length of the side of exit surface in each micro lens corresponding to the other side of entrance surface, and &lgr; is the wavelength of the incident beam.
摘要翻译：本发明的目的在于提供一种波前分割型光学积分器，即使构成光积分器的每个微透镜的尺寸更小，从而可以大大地在由此形成的整个照明场上产生均匀的照度分布，从而设定大量的波前部门。根据本发明的光学积分器是波面分割型光学积分器，其具有二维布置的多个微透镜，用于通过分割入射光束的波前来形成多个光源; 每个微透镜具有矩形入射面和矩形出射面，并且满足以下条件中的至少一个：其中f是每个微透镜的焦距，d1是每个微透镜的入射面的一侧的长度，d2是每个微透镜的入射面的另一侧的长度，D1是每个微透镜的出射表面的与入射面一侧对应的一侧的长度，D2是出口侧的长度每个微透镜中的表面对应于入射表面的另一侧，λ是入射光束的波长。

25. 发明授权

US06238063B1 Illumination optical apparatus and projection exposure apparatus 失效
标题翻译：照明光学装置和投影曝光装置
公开(公告)号：US06238063B1
公开(公告)日：2001-05-29
申请号：US09300660
申请日：1999-04-27
申请人： Osamu Tanitsu , Masato Shibuya , Nobumichi Kanayamaya
发明人： Osamu Tanitsu , Masato Shibuya , Nobumichi Kanayamaya
IPC分类号： F21V1310
CPC分类号： G03F7/70583 , G03F7/70208
摘要： An illumination optical apparatus (IOA1) and an exposure apparatus (EA1) having same, that reduces coherence in the illumination light beam, which in turn eliminates illumination non-uniformities at the mask (13) and wafer (17). The illumination apparatus comprises, in order along an optical axis (AX), a coherent light source (1) capable of generating a first light beam (b1) having a coherence length, the light beam being directed along a first optical path. Further included is a depolarizer (3) and a first optical delay element (4). The latter is capable of splitting from the first light beam a second light beam (b4) which travels a delay optical path (DOP1) with a path length not less than the coherence length of the first light beam. The delay optical path returns to said first optical path at a deflection angle from said optical delay element. The illumination optical system may also include a plurality (i.e., second, third, etc.) optical delay elements or splitting delay stages (e.g., 213-215) having different path lengths.
摘要翻译：具有这样的照明光学装置（IOA1）和曝光装置（EA1），其减小了照明光束的相干性，从而消除了在掩模（13）和晶片（17）处的照明不均匀性。照明装置沿着光轴（AX）依次包括能够产生具有相干长度的第一光束（b1）的相干光源（1），所述光束沿着第一光路被引导。还包括去极化器（3）和第一光延迟元件（4）。后者能够以不小于第一光束的相干长度的路径长度从第一光束分裂行进延迟光路（DOP1）的第二光束（b4）。延迟光路以所述光延迟元件的偏转角返回到所述第一光路。照明光学系统还可以包括具有不同路径长度的多个（即，第二，第三等等）光学延迟元件或分裂延迟级（例如，213-215）。

26. 发明授权

US5902716A Exposure method and apparatus 失效
标题翻译：曝光方法和装置
公开(公告)号：US5902716A
公开(公告)日：1999-05-11
申请号：US708580
申请日：1996-09-05
申请人： Soichi Owa , Kazuya Okamoto , Hiroshi Ooki , Masato Shibuya
发明人： Soichi Owa , Kazuya Okamoto , Hiroshi Ooki , Masato Shibuya
IPC分类号： G03F7/09 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70425 , G03F7/091 , G03F7/2022 , H01L21/0275
摘要： After a photoresist is applied onto a wafer, a contrast enhancement material (CEM) layer is applied onto this photoresist. A pattern is projected through this CEM layer onto the photoresist. Next, this CEM layer is removed from the photoresist and thereafter a new CEM layer is again applied onto the photoresist. Another pattern is projected through this new CEM layer onto the photoresist, whereby the photoresist is exposed in accordance with a composite pattern of the two patterns. This composite pattern can surpass the resolution limit of projection optical system.
摘要翻译：在将光致抗蚀剂施加到晶片上之后，将对比度增强材料（CEM）层施加到该光致抗蚀剂上。通过该CEM层将图案投射到光致抗蚀剂上。接下来，将该CEM层从光致抗蚀剂中除去，然后将新的CEM层再次施加到光致抗蚀剂上。通过这个新的CEM层将另一种图案投影到光致抗蚀剂上，由此根据两种图案的复合图案曝光光致抗蚀剂。该复合图案可以超过投影光学系统的分辨率极限。

27. 发明授权

US5851707A Microlithography projection-exposure masks, and methods and apparatus employing same 失效
标题翻译：微光投影曝光掩模，以及使用其的方法和装置
公开(公告)号：US5851707A
公开(公告)日：1998-12-22
申请号：US899909
申请日：1997-07-24
申请人： Masato Shibuya , Hiroshi Ooki , Kazuya Okamoto , Soichi Owa
发明人： Masato Shibuya , Hiroshi Ooki , Kazuya Okamoto , Soichi Owa
IPC分类号： G03F7/20 , H01L21/027 , G03F9/00
CPC分类号： G03F7/70433 , G03F1/50 , G03F7/2022 , G03F7/70466
摘要： Methods and apparatus are disclosed for microlithographically exposing a photosensitive substrate comprising single-exposure areas and multiple-exposure areas. After exposing the substrate, line widths in the single-exposure areas are substantially the same as line widths in the multiple-exposure areas. Also disclosed are masks comprising a first mask pattern used to expose the single-exposure areas once and a plurality of other mask patterns for exposing the multiple-exposure areas a predetermined number of times. Each of the other mask patterns allows a lower intensity of illumination light flux to be distributed to the multiple-exposure areas per exposure of the substrate than allowed by the first mask pattern. Consequently, the average intensity of illumination-light flux distributed to the single-exposure area after one exposure is substantially equal to the average intensity of illumination-light flux distributed to the multiple-exposure areas after a predetermined number of exposures of such areas.
摘要翻译：公开了用于微光刻曝光包括单一曝光区域和多曝光区域的感光衬底的方法和装置。在曝光衬底之后，单个曝光区域中的线宽度与多个曝光区域中的线宽基本上相同。还公开了包括用于暴露单次曝光区域一次的第一掩模图案和用于将多个曝光区域暴露预定次数的多个其它掩模图案的掩模。每个其它掩模图案允许每个曝光的衬底比第一掩模图案允许的更低强度的照明光通量分布到多个曝光区域。因此，在一次曝光之后分配到单一曝光区域的照明光通量的平均强度基本上等于在这些区域的预定曝光次数之后分配给多个曝光区域的照明光通量的平均强度。

28. 发明授权

US5563706A Interferometric surface profiler with an alignment optical member 失效
标题翻译：具有对准光学构件的干涉表面轮廓仪
公开(公告)号：US5563706A
公开(公告)日：1996-10-08
申请号：US292956
申请日：1994-08-22
申请人： Masato Shibuya , Yutaka Ichihara , Takashi Gemma , Shuji Toyonaga , Keiji Inada
发明人： Masato Shibuya , Yutaka Ichihara , Takashi Gemma , Shuji Toyonaga , Keiji Inada
IPC分类号： G01B9/02
CPC分类号： G01B9/02061 , G01B9/02039 , G01B9/02042 , G01B9/02057 , G01B9/02072 , G01B2290/70
摘要： In an interferometer, reflected light from a reference surface and a subject surface are introduced to an imaging optical system through a beam splitter, and an interference fringe formed from light reflected from the both surfaces is observed with a detection optical system. An alignment optical member is disposed in an optical path between the imaging optical system and an image plane of the interference fringe such that the rear focal point of the alignment optical member is located at the image plane. The alignment optical member is inserted in the optical path in aligning the subject surface and is removed in measuring the interference fringe. Accurate alignment of the subject surface is easily attained. A beam expander is interposed between a polarizing beam splitter and the subject surface and a 90.degree. retarder is interposed between the beam expander and the subject surface. The 90.degree. retarder is constructed of one or a plurality of reflecting mirrors formed of dielectric multilayer films. Noise introduced to the imaging optical system is minimized.
摘要翻译：在干涉仪中，通过分束器将来自参考面和被摄体表面的反射光引入成像光学系统，并且用检测光学系统观察由从两个表面反射的光形成的干涉条纹。对准光学构件设置在成像光学系统和干涉条纹的像平面之间的光路中，使得对准光学构件的后焦点位于像平面。对准光学构件在对准该物体表面的光路中被插入，并且在测量干涉条纹时被移除。容易实现对象表面的准确对准。光束扩展器插入在偏振分束器和被摄体表面之间，并且90度延迟器插入在光束扩展器和被摄体表面之间。 90度缓凝剂由由电介质多层膜形成的一个或多个反射镜构成。引入到成像光学系统的噪声被最小化。

29. 发明授权

US5086222A Scanning type microscope with phase member 失效
标题翻译：带相元件的扫描型显微镜
公开(公告)号：US5086222A
公开(公告)日：1992-02-04
申请号：US646461
申请日：1991-01-25
申请人： Masato Shibuya
发明人： Masato Shibuya
IPC分类号： G02B21/00 , G02B21/14
CPC分类号： G02B21/002
摘要： A scanning type microscope includes a coherent light source, a condenser for condensing rays of light supplied from the coherent light source on an object, and a phase member disposed between the coherent light source and the condenser, the phase member having first and second phase areas to provide a desired phase difference on the wave front of the rays of light reaching the object. The microscope further includes an objective for guiding the rays of light coming from the object, a photodetector arrangement which separately detects light from a first of two optical path areas respectively corresponding to the first phase area of the phase member and the second phase area of the phase member, and a scanning arrangement for relatively moving the object and the position at which the rays of light are condensed by the condenser. A phase pattern on the object diffracts light from the second phase area into the optical path area corresponding to the first phase area. The diffracted light interferes with light from the first phase area, thus enabling detection of the phase pattern by contrast.
摘要翻译：扫描型显微镜包括相干光源，用于聚集从物体上的相干光源提供的光的聚光器和设置在相干光源和冷凝器之间的相位元件，相位元件具有第一和第二相位区域以在到达物体的光线的波前提供期望的相位差。显微镜还包括用于引导来自物体的光线的目标，光检测器装置，其分别检测来自分别对应于相位构件的第一相位区域的两个光路区域中的第一个光源和第二相位区域以及用于相对移动物体的扫描装置和通过冷凝器使光线聚光的位置。物体上的相位图案将来自第二相位区域的光衍射到对应于第一相位区域的光路区域。衍射光干扰来自第一相区域的光，从而能够相对地检测相位图案。

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