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21. 发明申请

US20100095040A1 MULTI-CORE PROCESSOR, CONTROL METHOD THEREOF, AND INFORMATION PROCESSING APPARATUS 有权
标题翻译：多核处理器，其控制方法及信息处理装置
公开(公告)号：US20100095040A1
公开(公告)日：2010-04-15
申请号：US12574337
申请日：2009-10-06
申请人： Satoru NISHITA , Yukio Nishimura
发明人： Satoru NISHITA , Yukio Nishimura
IPC分类号： G06F13/24 , G06F9/46
CPC分类号： G06F15/167 , G06F9/544 , G06F12/084
摘要： A multi-core processor which includes a plurality of processor dies. The multi-core processor has a first processor core which processes a first task and a second processor core which processes a second task. The first processor core and the second processor core are formed on each of the plurality of processor dies. When the first processor core makes a request for the second task processing in processing the first task, information on the second task is stored in a memory area used by the first processor core and interrupt notification is made to each of the second processor cores provided respectively on the plurality of processor dies. Each of the second processor cores having received the interrupt notification accesses the memory area used by the first processor core provided on the same processor die as the processor die on which the second processor core is provided.
摘要翻译：一种包括多个处理器管芯的多核处理器。多核处理器具有处理第一任务的第一处理器核和处理第二任务的第二处理器核。第一处理器核心和第二处理器核心形成在多个处理器管芯中的每一个上。当第一处理器核心在处理第一任务时请求第二任务处理时，关于第二任务的信息被存储在由第一处理器核心使用的存储区域中，并且分别对分别提供的每个第二处理器核心进行中断通知在多个处理器管芯上。已经接收到中断通知的第二处理器核心中的每一个访问由与提供第二处理器核心的处理器管芯相同的处理器管芯上提供的第一处理器核心使用的存储器区域。

22. 发明申请

US20100068650A1 POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION USING THE COMPOSITION 审中-公开
标题翻译：积极工作的辐射敏感性组合物和使用组合物形成抗蚀剂图案的方法
公开(公告)号：US20100068650A1
公开(公告)日：2010-03-18
申请号：US12529341
申请日：2008-03-17
申请人： Yukio Nishimura , Kaori Sakai , Nobuji Matsumura , Makoto Sugiura , Atsushi Nakamura , Gouji Wakamatsu , Yuusuke Anno
发明人： Yukio Nishimura , Kaori Sakai , Nobuji Matsumura , Makoto Sugiura , Atsushi Nakamura , Gouji Wakamatsu , Yuusuke Anno
IPC分类号： G03F7/039 , G03F7/40
CPC分类号： G03F7/0035 , G03F7/0397 , G03F7/2024 , G03F7/2041 , G03F7/40
摘要： A method of patterning using double exposure patterning in a liquid immersion lithographic process is provided. The patterning method comprises a step of forming a first pattern on a substrate using a first resist layer forming composition, a step of making the first pattern inactive, a step of forming a second pattern on a substrate on which a pattern has been formed using a second resist layer forming composition and exposing the second resist layer to radiation, and a step of developing the exposed resist layer to form a second pattern in the space area of the first pattern. The first resist layer forming composition contains a cross-linking agent which accelerates conversion of the first layer from positive-working to negative-working.
摘要翻译：提供了一种在液浸光刻工艺中使用双曝光图案化的图案化方法。图案化方法包括使用第一抗蚀剂层形成组合物在基板上形成第一图案的步骤，使第一图案无效的步骤，在其上已经形成图案的基板上形成第二图案的步骤，使用第二抗蚀剂层形成组合物并将第二抗蚀剂层暴露于辐射，以及在第一图案的空间区域中显影曝光的抗蚀剂层以形成第二图案的步骤。第一抗蚀剂层形成组合物含有交联剂，其加速第一层从正性转变为负性转化。

23. 发明申请

US20090202945A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION 有权
标题翻译：含氟聚合物，纯化方法和辐射敏感性树脂组合物
公开(公告)号：US20090202945A1
公开(公告)日：2009-08-13
申请号：US12294386
申请日：2007-03-23
申请人： Hiroki Nakagawa , Hiromitsu Nakashima , Gouji Wakamatsu , Kentarou Harada , Yukio Nishimura , Takeo Shioya
发明人： Hiroki Nakagawa , Hiromitsu Nakashima , Gouji Wakamatsu , Kentarou Harada , Yukio Nishimura , Takeo Shioya
IPC分类号： G03F7/039 , C08F20/22
CPC分类号： G03F7/0046 , C08F220/18 , C08F220/24 , C08F220/28 , G03F7/0045 , G03F7/039 , G03F7/0397 , G03F7/162 , G03F7/168 , G03F7/2006 , G03F7/2041 , G03F7/322 , G03F7/38 , G03F7/40
摘要： An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).
摘要翻译：本发明的目的是提供一种含氟聚合物，其含有含氟聚合物的液浸光刻用的辐射敏感性树脂组合物，其导致具有优异形状和优异的焦深的图案，其中在液浸光刻中曝光期间与抗蚀剂接触的液体浸液式液晶等液体中的洗脱组分的量很少，并且在抗蚀剂膜和用于液浸的液体之间提供较大的后退接触角光刻法如水，以及纯化含氟聚合物的方法。本发明的树脂组合物包含含有由通式（1）和（2）表示的重复单元并具有1,000-50,000的Mw的新的含氟聚合物（A），具有酸不稳定基团的树脂（B），辐射敏感性酸产生剂（C），含氮化合物（D）和溶剂（E）。

24. 发明授权

US07521169B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US07521169B2
公开(公告)日：2009-04-21
申请号：US10533223
申请日：2003-10-23
申请人： Yukio Nishimura , Hiroyuki Ishii , Isao Nishimura , Eiichi Kobayashi
发明人： Yukio Nishimura , Hiroyuki Ishii , Isao Nishimura , Eiichi Kobayashi
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： G03F7/0397 , G03F7/0046 , Y10S430/114
摘要： A radiation-sensitive resin composition suitable as a chemically-amplified resist useful for microfabrication utilizing various types of radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser. The radiation-sensitive resin composition of the present invention comprises: (A) a resin comprising a recurring unit (1-1) shown by the following formula (I-1) and (B) a radiation-sensitive acid generator such as 1-(4-n-butoxynaphthyl)tetrahydrothiophenium nonafluoro-n-butanesulfonate. The radiation-sensitive resin composition may further comprise (C) an acid diffusion controller such as phenylbenzimidazole
摘要翻译：适用于利用KrF准分子激光器或ArF准分子激光器表示的各种类型的辐射如深紫外线的用于微细加工的化学放大型抗蚀剂的辐射敏感性树脂组合物。本发明的辐射敏感性树脂组合物包含：（A）包含下式（I-1）所示的重复单元（1-1）和（B）的辐照敏感性酸产生剂的树脂，（4-正丁氧基萘基）四氢噻吩六氟正丁磺酸盐。辐射敏感性树脂组合物还可以包含（C）酸扩散控制剂如苯基苯并咪唑

25. 发明授权

US07452655B2 Acrylic copolymer and radiation-sensitive resin composition 有权
标题翻译：丙烯酸共聚物和辐射敏感树脂组合物
公开(公告)号：US07452655B2
公开(公告)日：2008-11-18
申请号：US10533254
申请日：2003-11-04
申请人： Hiroyuki Ishii , Kouichi Fujiwara , Hiroshi Yamaguchi , Yukio Nishimura
发明人： Hiroyuki Ishii , Kouichi Fujiwara , Hiroshi Yamaguchi , Yukio Nishimura
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： C08F220/26 , G03F7/0397
摘要： An acrylic copolymer having a specific structure and a radiation-sensitive resin composition comprising the acrylic copolymer having high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, dry etching resistance, and pattern shape, and, in particular, excelling in forming contact holes and lines-and-spaces.
摘要翻译：具有特定结构的丙烯酸共聚物和辐射敏感性树脂组合物，其包含对辐射具有高透明度的丙烯酸共聚物，作为抗敏剂，例如灵敏度，分辨率，耐干蚀刻性和图案形状的基本性能优异，优秀的形成接触孔和线和空格。

26. 发明申请

US20080193879A1 SELF-TOPCOATING PHOTORESIST FOR PHOTOLITHOGRAPHY 有权
标题翻译：自拍贴图光刻机
公开(公告)号：US20080193879A1
公开(公告)日：2008-08-14
申请号：US12023108
申请日：2008-01-31
申请人： Robert Allen , Phillip Brock , Shiro Kusumoto , Yukio Nishimura , Daniel P. Sanders , Mark Steven Slezak , Ratnam Sooriyakumaran , Linda K. Sundberg , Hoa Truong , Gregory M. Wallraff
发明人： Robert Allen , Phillip Brock , Shiro Kusumoto , Yukio Nishimura , Daniel P. Sanders , Mark Steven Slezak , Ratnam Sooriyakumaran , Linda K. Sundberg , Hoa Truong , Gregory M. Wallraff
IPC分类号： C08F220/22 , G03F7/004 , G03F7/20
CPC分类号： G03F7/2041 , C08F220/22 , G03F7/0046 , G03F7/0397 , G03F7/11 , Y10S430/108 , Y10S430/111
摘要： Photoresist additive polymers and photoresist formulations that can be used in immersion lithography without the use of an additional topcoat. The resist compositions include a photoresist polymer, at least one photoacid generator, a solvent; and a photoresist additive polymer. Also a method of forming using photoresist formulations including photoresist additive polymers.
摘要翻译：光刻胶添加剂聚合物和光致抗蚀剂制剂，可用于浸没式光刻，而不使用额外的面漆。抗蚀剂组合物包括光致抗蚀剂聚合物，至少一种光致酸产生剂，溶剂; 和光致抗蚀剂添加剂聚合物。还有一种使用包括光致抗蚀剂添加剂聚合物的光致抗蚀剂制剂的方法。

27. 发明申请

US20060074139A1 Acrylic copolymer and radiation-sensitive resin composition 有权
标题翻译：丙烯酸共聚物和辐射敏感树脂组合物
公开(公告)号：US20060074139A1
公开(公告)日：2006-04-06
申请号：US10533254
申请日：2003-11-04
申请人： Hiroyuki Ishii , Kouichi Fujiwara , Hiroshi Yamaguchi , Yukio Nishimura
发明人： Hiroyuki Ishii , Kouichi Fujiwara , Hiroshi Yamaguchi , Yukio Nishimura
IPC分类号： C08J3/28
CPC分类号： C08F220/26 , G03F7/0397
摘要： An acrylic copolymer having a specific structure and a radiation-sensitive resin composition comprising the acrylic copolymer having high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, dry etching resistance, and pattern shape, and, in particular, excelling in forming contact holes and lines-and-spaces.
摘要翻译：具有特定结构的丙烯酸共聚物和辐射敏感性树脂组合物，其包含对辐射具有高透明度的丙烯酸共聚物，作为抗敏剂，例如灵敏度，分辨率，耐干蚀刻性和图案形状的基本性能优异，优秀的形成接触孔和线和空格。

28. 发明授权

US08802348B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US08802348B2
公开(公告)日：2014-08-12
申请号：US12701592
申请日：2010-02-07
申请人： Noboru Otsuka , Takanori Kawakami , Yukio Nishimura , Makoto Sugiura
发明人： Noboru Otsuka , Takanori Kawakami , Yukio Nishimura , Makoto Sugiura
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： C08F220/12 , G03F7/0397 , G03F7/2041
摘要： A radiation-sensitive resin composition includes (A) an acid labile group-containing resin which becomes alkali-soluble by an action of an acid, (B) a radiation-sensitive acid generator, and (C) a solvent. The resin (A) includes repeating units shown by formulas (1) and (2), wherein R1 and R2 represent a hydrogen atom or a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, R3 represents a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, X represents a hydrogen atom, a hydroxyl group, or an acyl group, m represents an integer from 1 to 18, and n represents an integer from 4 to 8.
摘要翻译：辐射敏感性树脂组合物包括（A）通过酸的作用变成碱溶性的酸不稳定基团的树脂，（B）辐射敏感性酸产生剂和（C）溶剂。树脂（A）包括由式（1）和（2）表示的重复单元，其中R 1和R 2表示氢原子或取代或未取代的具有1至4个碳原子的烷基，R 3表示取代或未取代的烷基， 1至4个碳原子，X表示氢原子，羟基或酰基，m表示1至18的整数，n表示4至8的整数。

29. 发明授权

US08697331B2 Compound, polymer, and radiation-sensitive composition 有权
标题翻译：化合物，聚合物和辐射敏感组合物
公开(公告)号：US08697331B2
公开(公告)日：2014-04-15
申请号：US12949795
申请日：2010-11-19
申请人： Hirokazu Sakakibara , Takehiko Naruoka , Makoto Shimizu , Yukio Nishimura , Nobuji Matsumura , Yuusuke Asano
发明人： Hirokazu Sakakibara , Takehiko Naruoka , Makoto Shimizu , Yukio Nishimura , Nobuji Matsumura , Yuusuke Asano
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： C07C69/96 , C08F220/18 , C08F220/22 , C08F220/24 , C08F220/26 , C09D133/18 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A compound is shown by a following formula (1), wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R2 represents a methylene group, an ethylene group, a 1-methylethylene group, a 2-methylethylene group, a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, or a derivative thereof, each of R3 represents at least one of a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, a derivative thereof, and a linear or branched alkyl group having 1 to 4 carbon atoms, provided that two of R3 may bond to form a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof together with the carbon atom that is bonded thereto, and X represents a linear or branched fluoroalkylene group having 1 to 20 carbon atoms.
摘要翻译：化合物由下式（1）表示，其中R1表示氢原子，甲基或三氟甲基，R2表示亚甲基，亚乙基，1-甲基亚乙基，2-甲基亚乙基，碳原子数4〜20的二价脂环式烃基或其衍生物，各R3表示碳原子数为4〜20的一价脂环族烃基，其衍生物和具有1个碳原子的直链或支链烷基中的至少一种至4个碳原子，条件是R3中的两个可以键合形成具有4至20个碳原子的二价脂环族烃基或其衍生物和与其键合的碳原子，并且X表示具有1个碳原子的直链或支链氟亚烷基至20个碳原子。

30. 发明授权

US08507575B2 Radiation-sensitive resin composition, polymer, and compound 有权
标题翻译：辐射敏感性树脂组合物，聚合物和化合物
公开(公告)号：US08507575B2
公开(公告)日：2013-08-13
申请号：US13272523
申请日：2011-10-13
申请人： Nobuji Matsumura , Yukio Nishimura , Akimasa Soyano , Ryuichi Serizawa , Noboru Otsuka , Hiroshi Tomioka
发明人： Nobuji Matsumura , Yukio Nishimura , Akimasa Soyano , Ryuichi Serizawa , Noboru Otsuka , Hiroshi Tomioka
IPC分类号： C08F20/22 , B29D11/00 , H05B6/68 , C08G61/04
CPC分类号： G03F7/0045 , C08F220/36 , G03F7/0046 , G03F7/0382 , G03F7/0397 , G03F7/2041 , C08F2220/382 , C08F2220/283
摘要： A radiation-sensitive resin composition includes a first polymer including a repeating unit represented by a following formula (I). X+ is an onium cation. X+ in the formula (I) is preferably an onium cation represented by a following formula (1-1), an onium cation represented by a following formula (1-2) or a combination thereof.
摘要翻译：辐射敏感性树脂组合物包括含有由下式（I）表示的重复单元的第一聚合物。 X +是阳离子。式（I）中的X +优选为由下式（1-1）表示的鎓阳离子，由下式（1-2）表示的鎓阳离子或其组合。

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