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21. 发明申请

US20050180008A1 Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems 有权
公开(公告)号：US20050180008A1
公开(公告)日：2005-08-18
申请号：US11106480
申请日：2005-04-15
申请人： Donis Flagello , Kevin Cummings , Alexander Straaijer
发明人： Donis Flagello , Kevin Cummings , Alexander Straaijer
IPC分类号： G02B5/30 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70566 , G02B5/3058
摘要： A radial transverse electric polarizer device is provided. The device includes a first layer of material having a first refractive index, a second layer of material having a second refractive index, and a plurality of elongated elements azimuthally and periodically spaced apart, and disposed between the first layer and the second layer. The plurality of elongated elements interact with electromagnetic waves of radiation to transmit transverse electric polarization of electromagnetic waves of radiation. One aspect of the invention is, for example, to use such polarizer device in a lithographic projection apparatus to increase imaging resolution. Another aspect is to provide a device manufacturing method including polarizing a beam of radiation in a transverse electric polarization.

22. 发明申请

US20110051114A1 OPTIMIZED POLARIZATION ILLUMINATION 有权
标题翻译：优化极化照明
公开(公告)号：US20110051114A1
公开(公告)日：2011-03-03
申请号：US12773775
申请日：2010-05-04
申请人： Robert SOCHA , Donis Flagello , Steve Hansen
发明人： Robert SOCHA , Donis Flagello , Steve Hansen
IPC分类号： G03B27/72
CPC分类号： G03F7/705 , G03F7/70125 , G03F7/70341 , G03F7/70566 , G03F7/70616
摘要： Disclosed concepts include a method of optimizing polarization of an illumination of a pattern to be formed in a surface of a substrate. Polarized illumination is optimized by determining an illumination intensity for at least one point on an illuminator for at least two polarization states, determining image log slope for the at least one point on the illuminator for the at least two polarization states, determining a maximum image log slope (ILS) where the ILS is near zero for the at least one point on the illuminator, and selecting an optimal polarization state corresponding to the at least two polarization states that minimizes an ILS for the at least one point on the illuminator. This may be repeated for a plurality of points on the illuminator.
摘要翻译：公开的概念包括优化待形成在衬底的表面中的图案的照明的偏振的方法。通过确定至少两个偏振状态的照明器上的至少一个点的照明强度来确定极化照明，确定用于至少两个偏振状态的照明器上的至少一个点的图像对数斜率，确定最大图像记录斜率（ILS），其中ILS对于照明器上的至少一个点接近于零，并且选择对应于使得照明器上的至少一个点的ILS最小化的至少两个偏振状态的最佳极化状态。对于照明器上的多个点可以重复这一点。

23. 发明申请

US20080043215A1 Optimized polarization illumination 有权
标题翻译：优化极化照明
公开(公告)号：US20080043215A1
公开(公告)日：2008-02-21
申请号：US11907648
申请日：2007-10-16
申请人： Robert Socha , Donis Flagello , Steve Hansen
发明人： Robert Socha , Donis Flagello , Steve Hansen
IPC分类号： G03B27/72
CPC分类号： G03F7/705 , G03F7/70125 , G03F7/70341 , G03F7/70566 , G03F7/70616
摘要： Disclosed concepts include a method of optimizing polarization of an illumination of a pattern to be formed in a surface of a substrate. Polarized illumination is optimized by determining an illumination intensity for at least one point on an illuminator for at least two polarization states, determining image log slope for the at least one point on the illuminator for the at least two polarization states, determining a maximum image log slope (ILS) where the ILS is near zero for the at least one point on the illuminator, and selecting an optimal polarization state corresponding to the at least two polarization states that minimizes an ILS for the at least one point on the illuminator. This may be repeated for a plurality of points on the illuminator.
摘要翻译：公开的概念包括优化待形成在衬底的表面中的图案的照明的偏振的方法。通过确定至少两个偏振状态的照明器上的至少一个点的照明强度来确定极化照明，确定用于至少两个偏振状态的照明器上的至少一个点的图像对数斜率，确定最大图像记录斜率（ILS），其中ILS对于照明器上的至少一个点接近于零，并且选择对应于使得照明器上的至少一个点的ILS最小化的至少两个偏振状态的最佳极化状态。对于照明器上的多个点可以重复这一点。

24. 发明申请

US20050259324A1 Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems 失效
标题翻译：用于高数值孔径系统的静态和动态径向横向电偏振器
公开(公告)号：US20050259324A1
公开(公告)日：2005-11-24
申请号：US11187848
申请日：2005-07-25
申请人： Donis Flagello , Kevin Cummings , Alexander Straaijer
发明人： Donis Flagello , Kevin Cummings , Alexander Straaijer
IPC分类号： G02B5/30 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70566 , G02B5/3058
摘要： A radial transverse electric polarizer device is provided. The device includes a first layer of material having a first refractive index, a second layer of material having a second refractive index, and a plurality of elongated elements azimuthally and periodically spaced apart, and disposed between the first layer and the second layer. The plurality of elongated elements interact with electromagnetic waves of radiation to transmit transverse electric polarization of electromagnetic waves of radiation. One aspect of the invention is, for example, to use such polarizer device in a lithographic projection apparatus to increase imaging resolution. Another aspect is to provide a device manufacturing method including polarizing a beam of radiation in a transverse electric polarization.
摘要翻译：提供径向横向电偏振器装置。该器件包括具有第一折射率的第一材料层，具有第二折射率的第二材料层和位于方位角和周期上间隔开的多个细长元件，并且设置在第一层和第二层之间。多个细长元件与辐射的电磁波相互作用以透射辐射的电磁波的横向电极化。本发明的一个方面是例如在光刻投影设备中使用这种偏振器装置来增加成像分辨率。另一方面是提供一种包括在横向电极化中偏振辐射束的装置制造方法。

25. 发明申请

US20050206879A1 Lithographic apparatus and methods for use thereof 失效
标题翻译：光刻设备及其使用方法
公开(公告)号：US20050206879A1
公开(公告)日：2005-09-22
申请号：US11014062
申请日：2004-12-17
申请人： Remco Van Dijk , Donis Flagello , Michel Klaassen , Tammo Uitterdijk
发明人： Remco Van Dijk , Donis Flagello , Michel Klaassen , Tammo Uitterdijk
IPC分类号： G01M11/00 , G01J1/00 , G01J4/04 , G03F1/14 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70566 , G01J4/04 , G03F1/44 , G03F7/70125 , G03F7/70133 , G03F7/70591
摘要： A method for determining a polarization state of light passed through the projection lens of a lithographic apparatus is described. Polarizing structures are disposed on an object side of the projection lens of the lithographic apparatus. By measuring light that has passed through the polarizing structures information regarding the polarization characteristics of the projection lens can be determined.
摘要翻译：描述了一种用于确定通过光刻设备的投影透镜的光的偏振状态的方法。极化结构设置在光刻设备的投影透镜的物体侧。通过测量已经通过偏振结构的光，可以确定关于投影透镜的偏振特性的信息。

26. 发明授权

US06943941B2 Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems 失效
公开(公告)号：US06943941B2
公开(公告)日：2005-09-13
申请号：US10374509
申请日：2003-02-27
申请人： Donis Flagello , Kevin Cummings
发明人： Donis Flagello , Kevin Cummings
IPC分类号： G02B5/30 , G03F7/20 , H01L21/027 , G02B27/28 , G03B27/72
CPC分类号： G03F7/70566 , G02B5/3058
摘要： A radial transverse electric polarizer device is provided. The device includes a first layer of material having a first refractive index, a second layer of material having a second refractive index, and a plurality of elongated elements azimuthally and periodically spaced apart, and disposed between the first layer and the second layer. The plurality of elongated elements interact with electromagnetic waves of radiation to transmit transverse electric polarization of electromagnetic waves of radiation. One aspect of the invention is, for example, to use such polarizer device in a lithographic projection apparatus to increase imaging resolution. Another aspect is to provide a device manufacturing method including polarizing a beam of radiation in a transverse electric polarization.

27. 发明申请

US20050094116A1 Gradient immersion lithography 失效
标题翻译：梯度浸没光刻
公开(公告)号：US20050094116A1
公开(公告)日：2005-05-05
申请号：US10698012
申请日：2003-10-31
申请人： Donis Flagello , John Doering
发明人： Donis Flagello , John Doering
IPC分类号： H01L21/027 , G02B1/10 , G03F7/20 , G03B27/42
CPC分类号： G03F7/70966 , G03F7/70341 , G03F7/70958 , G03F7/70983 , Y10S430/162
摘要： In a lithographic projection apparatus, a space between an optical element of a projection system is filled with a first fluid and a second fluid separated by a translucent plate. The first and second fluids have first and second indices of refraction, respectively, that are different from one another. The first fluid is provided in a space between a substrate and the translucent plate and preferably has an index of refraction similar to the index of refraction of the substrate. The second fluid is provided in a space between the translucent plate and the optical element and preferably has an index of refraction similar to the index of refraction of the optical element. The translucent plate has a third index of refraction between the first and second indices of refraction. The third index of refraction may be equal to the first index of refraction or the second index of refraction. A device manufacturing method includes filling a space between the optical element and the substrate with at least two fluids having different indices of refraction.
摘要翻译：在光刻投影装置中，投影系统的光学元件之间的空间填充有由半透明板隔开的第一流体和第二流体。第一和第二流体分别具有彼此不同的第一和第二折射率。第一流体设置在基板和透光板之间的空间中，并且优选地具有与基板的折射率类似的折射率。第二流体设置在透光板和光学元件之间的空间中，并且优选地具有类似于光学元件的折射率的折射率。半透明板在第一和第二折射率之间具有第三折射率。第三折射率可以等于第一折射率或第二折射率。装置制造方法包括用具有不同折射率的至少两种流体填充光学元件和基板之间的空间。

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