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    • 1. 发明申请
    • Gradient immersion lithography
    • 梯度浸没光刻
    • US20050094116A1
    • 2005-05-05
    • US10698012
    • 2003-10-31
    • Donis FlagelloJohn Doering
    • Donis FlagelloJohn Doering
    • H01L21/027G02B1/10G03F7/20G03B27/42
    • G03F7/70966G03F7/70341G03F7/70958G03F7/70983Y10S430/162
    • In a lithographic projection apparatus, a space between an optical element of a projection system is filled with a first fluid and a second fluid separated by a translucent plate. The first and second fluids have first and second indices of refraction, respectively, that are different from one another. The first fluid is provided in a space between a substrate and the translucent plate and preferably has an index of refraction similar to the index of refraction of the substrate. The second fluid is provided in a space between the translucent plate and the optical element and preferably has an index of refraction similar to the index of refraction of the optical element. The translucent plate has a third index of refraction between the first and second indices of refraction. The third index of refraction may be equal to the first index of refraction or the second index of refraction. A device manufacturing method includes filling a space between the optical element and the substrate with at least two fluids having different indices of refraction.
    • 在光刻投影装置中,投影系统的光学元件之间的空间填充有由半透明板隔开的第一流体和第二流体。 第一和第二流体分别具有彼此不同的第一和第二折射率。 第一流体设置在基板和透光板之间的空间中,并且优选地具有与基板的折射率类似的折射率。 第二流体设置在透光板和光学元件之间的空间中,并且优选地具有类似于光学元件的折射率的折射率。 半透明板在第一和第二折射率之间具有第三折射率。 第三折射率可以等于第一折射率或第二折射率。 装置制造方法包括用具有不同折射率的至少两种流体填充光学元件和基板之间的空间。
    • 3. 发明授权
    • Lithographic apparatus and device manufacturing method
    • 平版印刷设备和器件制造方法
    • US07113259B2
    • 2006-09-26
    • US11218574
    • 2005-09-06
    • Donis FlagelloJohn Doering
    • Donis FlagelloJohn Doering
    • G03B27/32G03B27/42G03B27/52
    • G03F7/70958G03F7/2041G03F7/70341
    • In a lithographic projection apparatus, a space between an optical element is filled with a first fluid and a second fluid separated by a transparent plate. The first and second fluids have different first and second indices of refraction, respectively. The first fluid is provided between a substrate and the transparent plate and has an index of refraction similar to the index of refraction of the substrate. The second fluid is provided between the transparent plate and the optical element and has an index of refraction similar to the index of refraction of the optical element. The transparent plate has a third index of refraction between the first and second indices of refraction and may be equal to the first index of refraction or the second index of refraction.
    • 在光刻投影装置中,光学元件之间的空间填充有由透明板隔开的第一流体和第二流体。 第一和第二流体分别具有不同的第一和第二折射率。 第一流体设置在基板和透明板之间,并且具有与基板的折射率类似的折射率。 第二流体设置在透明板和光学元件之间,并且具有类似于光学元件的折射率的折射率。 透明板在第一和第二折射率之间具有第三折射率,并且可以等于第一折射率或第二折射率。
    • 4. 发明申请
    • Lithographic apparatus and device manufacturing method
    • 平版印刷设备和器件制造方法
    • US20060007421A1
    • 2006-01-12
    • US11218574
    • 2005-09-06
    • Donis FlagelloJohn Doering
    • Donis FlagelloJohn Doering
    • G03B27/42
    • G03F7/70958G03F7/2041G03F7/70341
    • In a lithographic projection apparatus, a space between an optical element of a projection system is filled with a first fluid and a second fluid separated by a transparent plate. The first and second fluids have first and second indices of refraction, respectively, that are different from one another. The first fluid is provided in a space between a substrate and the transparent plate and preferably has an index of refraction similar to the index of refraction of the substrate. The second fluid is provided in a space between the transparent plate and the optical element and preferably has an index of refraction similar to the index of refraction of the optical element. The transparent plate has a third index of refraction between the first and second indices of refraction. The third index of refraction may be equal to the first index of refraction or the second index of refraction. A device manufacturing method includes filling a space between the optical element and the substrate with at least two fluids having different indices of refraction.
    • 在光刻投影装置中,投影系统的光学元件之间的空间填充有由透明板隔开的第一流体和第二流体。 第一和第二流体分别具有彼此不同的第一和第二折射率。 第一流体设置在基板和透明板之间的空间中,并且优选地具有与基板的折射率类似的折射率。 第二流体设置在透明板和光学元件之间的空间中,并且优选地具有类似于光学元件的折射率的折射率。 透明板在第一和第二折射率之间具有第三折射率。 第三折射率可以等于第一折射率或第二折射率。 装置制造方法包括用具有不同折射率的至少两种流体填充光学元件和基板之间的空间。
    • 5. 发明授权
    • Gradient immersion lithography
    • 梯度浸没光刻
    • US06954256B2
    • 2005-10-11
    • US10698012
    • 2003-10-31
    • Donis FlagelloJohn Doering
    • Donis FlagelloJohn Doering
    • H01L21/027G02B1/10G03F7/20G03B27/32G03B27/42G03B27/52
    • G03F7/70966G03F7/70341G03F7/70958G03F7/70983Y10S430/162
    • In a lithographic projection apparatus, a space between an optical element is filled with a first fluid and a second fluid separated by a transparent plate. The first and second fluids have first and second indices of refraction, respectively, that are different from one another. The first fluid is provided between a substrate and the transparent plate and has an index of refraction similar to the index of refraction of the substrate. The second fluid is provided between the transparent plate and the optical element and has an index of refraction similar to the index of refraction of the optical element. The transparent plate has a third index of refraction between the first and second indices of refraction and may be equal to the first index of refraction or the second index of refraction. A device manufacturing method includes filling a space between the optical element and the substrate with at least two fluids having different indices of refraction.
    • 在光刻投影装置中,光学元件之间的空间填充有由透明板隔开的第一流体和第二流体。 第一和第二流体分别具有彼此不同的第一和第二折射率。 第一流体设置在基板和透明板之间,并且具有与基板的折射率类似的折射率。 第二流体设置在透明板和光学元件之间,并且具有类似于光学元件的折射率的折射率。 透明板在第一和第二折射率之间具有第三折射率,并且可以等于第一折射率或第二折射率。 装置制造方法包括用具有不同折射率的至少两种流体填充光学元件和基板之间的空间。