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21. 发明授权

US06790287B2 Substrate processing apparatus, substrate inspection method and substrate processing system 有权
标题翻译：基板加工装置，基板检查方法及基板处理系统
公开(公告)号：US06790287B2
公开(公告)日：2004-09-14
申请号：US09942153
申请日：2001-08-29
申请人： Masayoshi Shiga , Kenji Hashinoki , Masami Ohtani , Joichi Nishimura
发明人： Masayoshi Shiga , Kenji Hashinoki , Masami Ohtani , Joichi Nishimura
IPC分类号： C23C1600
CPC分类号： H01L21/67207 , H01L21/67253
摘要： An inspection unit is provided in a substrate processing apparatus performing resist coating processing and development processing on a substrate. In the inspection unit, a film thickness measuring device, a line width measuring device, an overlay measuring device and a macro defect inspection device are successively stacked and arranged from below. The inspection unit is provided on an intermediate portion of a substrate transport path formed in the substrate processing apparatus. The substrate processed in the substrate processing apparatus is selectively introduced into each inspection part. Therefore, the apparatus can properly inspect the substrate at need while suppressing reduction of the throughput. Thus provided are a substrate processing apparatus and a substrate inspection method capable of properly inspecting a substrate while suppressing reduction of the throughput.
摘要翻译：在基板上进行抗蚀剂涂布处理和显影处理的基板处理装置中设置有检查单元。在检查单元中，从下方依次堆叠并布置膜厚测量装置，线宽测量装置，覆盖测量装置和宏观缺陷检查装置。检查单元设置在形成在基板处理装置中的基板输送路径的中间部。将在基板处理装置中处理的基板选择性地导入各检查部。因此，能够在抑制生产量的降低的同时适当地检查需要的基板。这样提供了能够在抑制生产量降低的同时适当地检查基板的基板处理装置和基板检查方法。

22. 发明授权

US6062852A Substrate heat-treating apparatus 失效
标题翻译：基板热处理装置
公开(公告)号：US6062852A
公开(公告)日：2000-05-16
申请号：US60422
申请日：1998-04-14
申请人： Takanori Kawamoto , Masami Ohtani , Yasuo Imanishi , Masao Tsuji , Masaki Iwami , Joichi Nishimura , Akihiko Morita
发明人： Takanori Kawamoto , Masami Ohtani , Yasuo Imanishi , Masao Tsuji , Masaki Iwami , Joichi Nishimura , Akihiko Morita
IPC分类号： H01L21/683 , F27D5/00 , H01L21/027 , H01L21/68
CPC分类号： H01L21/67109 , H01L21/67178 , H01L21/68728 , H01L21/68742
摘要： A substrate heat-treating apparatus includes a heat-treating plate, and support pins extending through the heat-treating plate to be vertically movable relative thereto. The support pins support each substrate at a lower surface thereof such that edges of the substrate are at a higher level than a central region of the substrate. This construction facilitates air flows into and out of a space between the lower surface of the substrate and the upper surface of the heat-treating plate when the substrate is vertically moved.
摘要翻译：基板热处理装置包括热处理板和延伸穿过热处理板以相对于其垂直移动的支撑销。支撑销在其下表面处支撑每个基板，使得基板的边缘处于比基板的中心区域更高的水平。当基板垂直移动时，这种结构便于空气流入和流出基板的下表面和热处理板的上表面之间的空间。

23. 发明授权

US5829087A Substrate spin cleaning apparatus 失效
标题翻译：基材旋转清洗装置
公开(公告)号：US5829087A
公开(公告)日：1998-11-03
申请号：US529832
申请日：1995-09-18
申请人： Joichi Nishimura , Tadashi Sasaki , Masami Ohtani
发明人： Joichi Nishimura , Tadashi Sasaki , Masami Ohtani
IPC分类号： A46B13/04 , H01L21/304
CPC分类号： H01L21/67046
摘要： A cleaning brush is fixed to a cleaner support that is mounted to a rotary element for vertical movement with respect thereto. The rotary element is rotatably supported by a forward portion of a support arm that is pivotable about a vertical axis at the rear of the support arm. A closed space defined by a bellows is connected to air piping having a pressure gauge and a regulator. The regulator is operable in response to variations of pressure resulting from engagement of the cleaning brush with a substrate, to control pressure within said bellows whereby the latter expands and contracts to raise or lower the cleaner support relative to the substrate as required to maintain the pressure in a predetermined range. The aforesaid construction responds fast enough to allow the cleaning brush to follow warping of the substrate with facility, and by so doing clean an entire substrate surface uniformly.
摘要翻译：清洁刷被固定到安装到旋转元件上用于相对于其垂直移动的清洁器支撑件。旋转元件由支撑臂的前部可旋转地支撑，支撑臂的前部可在支撑臂的后部围绕垂直轴线枢转。由波纹管限定的封闭空间连接到具有压力计和调节器的空气管道。调节器可响应于清洁刷与衬底的接合而产生的压力的变化而操作，以控制所述波纹管内的压力，从而当所述波纹管膨胀并收缩时，根据需要使清洁器支撑件相对于基板升高或降低以维持压力在预定范围内。上述结构足够快地响应于清洁刷使设备跟随基板翘曲，并且通过这样清洁整个基板表面均匀。

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