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21. 发明授权

US08059261B2 Masking device, lithographic apparatus, and device manufacturing method 有权
标题翻译：掩模装置，光刻设备和装置制造方法
公开(公告)号：US08059261B2
公开(公告)日：2011-11-15
申请号：US10855976
申请日：2004-05-28
申请人： Antoine Hendrik Verweij , Jacobus Frederik Molenaar , Gerbrand Petrus Johannes Van Den Hoven , Michael Johannes Vervoordeldonk , Michel Gerardus Pardoel , Gerardus Johannes Verdoes , Jan Van Eijk
发明人： Antoine Hendrik Verweij , Jacobus Frederik Molenaar , Gerbrand Petrus Johannes Van Den Hoven , Michael Johannes Vervoordeldonk , Michel Gerardus Pardoel , Gerardus Johannes Verdoes , Jan Van Eijk
IPC分类号： G03B27/72
CPC分类号： G03F7/70066 , G03F7/70858
摘要： A lithographic projection apparatus having a masking device for obscuring part of at least one of a patterning device used for patterning a projection beam before imaging the patterned beam onto a substrate. The masking device includes a first masking structure to obscure said part of said patterning device in a first direction and a second masking structure to obscure said part in a second different direction, wherein said first and second masking structure are disposed in the vicinity of said focal plane in a mechanically uncoupled arrangement with respect to each other.
摘要翻译：一种具有掩模装置的光刻投影装置，其用于遮蔽在将图案化光束成像到基板上之前将投影光束图案化的图案形成装置中的至少一个的部分。掩模装置包括第一掩模结构，以使第一方向上的所述图案形成装置的所述部分模糊，以及在第二不同方向上遮蔽所述部分的第二掩模结构，其中所述第一和第二掩模结构设置在所述焦点附近平面相对于彼此以机械方式分离布置。

22. 发明授权

US07948122B2 Displacement device 有权
标题翻译：位移装置
公开(公告)号：US07948122B2
公开(公告)日：2011-05-24
申请号：US11814003
申请日：2006-01-10
申请人： Johan Cornelis Compter , Petrus Carolus Maria Frissen , Jan Van Eijk
发明人： Johan Cornelis Compter , Petrus Carolus Maria Frissen , Jan Van Eijk
IPC分类号： H02K41/00 , G03F7/20
CPC分类号： G03F7/70758 , Y10S414/135
摘要： Especially for use in the semiconductor industry, a displacement device (701) is disclosed comprising a first part comprising a carrier (714) on which a system of magnets (710) is arranged according to a pattern of row and columns extending parallel to the X-direction and the Y-direction, respectively. The magnets in each row and column are arranged according to a Halbach array, i.e. the magnetic orientation of successive magnets in each row and each column rotates 90° counter-clockwise. The second part comprises an electric coil system (712) with two types of electric coils, one type having an angular offset of +45°, and the other type having an offset of −45° with respect to the X-direction. The first part (714, 710) is movable over a range of centimeters or more with respect to the stationary second part (712). For high precision positioning of the first part, an interferometer system (731, 730) is provided.
摘要翻译：特别是用于半导体工业中，公开了一种位移装置（701），其包括第一部分，该第一部分包括载体（714），磁体系统（710）根据平行于X的行和列的图案排列在其上方向和Y方向。每行和列中的磁体根据Halbach阵列布置，即每行中的连续磁体的磁性取向，并且每列逆时针旋转90°。第二部分包括具有两种类型的电线圈的电线圈系统（712），一种类型的角偏移为+ 45°，另一种类型相对于X方向具有-45°的偏移。第一部分（714,710）可相对于固定的第二部分（712）在一厘米或更多的范围内移动。对于第一部分的高精度定位，提供了干涉仪系统（731,730）。

23. 发明授权

US5264982A Electromagnetic support with unilateral control currents 失效
标题翻译：具有单向控制电流的电磁支持
公开(公告)号：US5264982A
公开(公告)日：1993-11-23
申请号：US664074
申请日：1991-03-04
申请人： Hendrikus H. M. Cox , Jan Van Eijk
发明人： Hendrikus H. M. Cox , Jan Van Eijk
IPC分类号： G05D3/00 , F16C39/06 , H01F7/20 , H02N15/00
CPC分类号： F16C32/0451
摘要： A device for positioning a body (5) by means of at least one pair of electromagnets (13, 15). A position sensor (29) measures the size of an air gap (23) between one of the electromagnets (13, 15) and a guide beam (1). An output signal of the position sensor (29) is applied to an electronic control unit (35) which passes a control current through the electromagnets (13, 15) in dependence on a difference between the measured and a desired size of the air gap (23). In one embodiment an electrical switch (53) is connected between the control unit (35) and the two electromagnets (13, 15) controlled by the control unit (35), applying the control current to only one of the two electromagnets (13, 15) in dependence on the polarity of a control signal from the control unit (35). The use of the switch insures that the control current flows through only one of the two electromagnets at a time so that in a simple manner a difference necessary for supporting the body is achieved between the forces exerted on the guide beam (1) by the electromagnets (13, 15). the electrical resistance losses in the electromagnets (13, 15) in such a device are low, the device is eminently suitable for use as an electromagnetic bearing in an optical lithographical device for the irradiation of semiconductor substrates, or in other precision machines.

24. 发明申请

US20080203828A1 Displacement Device 有权
标题翻译：位移装置
公开(公告)号：US20080203828A1
公开(公告)日：2008-08-28
申请号：US11814003
申请日：2006-01-10
申请人： Johan Cornelis Compter , Petrus Carolus Maria Frissen , Jan Van Eijk
发明人： Johan Cornelis Compter , Petrus Carolus Maria Frissen , Jan Van Eijk
IPC分类号： H02K41/00
CPC分类号： G03F7/70758 , Y10S414/135
摘要： Especially for use in the semiconductor industry, a displacement device (701) is disclosed comprising a first part comprising a carrier (714) on which a system of magnets (710) is arranged according to a pattern of row and columns extending parallel to the X-direction and the Y-direction, respectively. The magnets in each row and column are arranged according to a Halbach array, i.e. the magnetic orientation of successive magnets in each row and each column rotates 90° counter-clockwise. The second part comprises an electric coil system (712) with two types of electric coils, one type having an angular offset of +45°, and the other type having an offset of −45° with respect to the X-direction. The first part (714, 710) is movable over a range of centimeters or more with respect to the stationary second part (712). For high precision positioning of the first part, an interferometer system (731, 730) is provided.
摘要翻译：特别是用于半导体工业中，公开了一种位移装置（701），其包括第一部分，该第一部分包括载体（714），磁体系统（710）根据平行于X的行和列的图案排列在其上方向和Y方向。每行和列中的磁体根据Halbach阵列布置，即每行中的连续磁体的磁性取向，并且每列逆时针旋转90°。第二部分包括具有两种类型的电线圈的电线圈系统（712），一种类型的角偏移为+ 45°，另一种类型相对于X方向具有-45°的偏移。第一部分（714,710）可相对于固定的第二部分（712）在一厘米或更多的范围内移动。对于第一部分的高精度定位，提供了干涉仪系统（731,730）。

25. 发明申请

US20070069666A1 Apparatus for processing an object with high position accurancy 失效
标题翻译：用于处理具有高位置精度的物体的装置
公开(公告)号：US20070069666A1
公开(公告)日：2007-03-29
申请号：US10539371
申请日：2003-12-15
申请人： Jan Van Eijk , Arjan Bakker , Dennis Bos , Johan Compter , Angelo De Klerk , Franciscus Roes , Hubert Gerard Jean Vroomen , Thomas Warmerdam
发明人： Jan Van Eijk , Arjan Bakker , Dennis Bos , Johan Compter , Angelo De Klerk , Franciscus Roes , Hubert Gerard Jean Vroomen , Thomas Warmerdam
IPC分类号： H02K41/00 , G03B27/58
CPC分类号： F16C32/0472 , F16C32/0444 , G05B2219/41327 , G05B2219/42092 , G05B2219/49276 , H01J37/20 , H01J2237/20278 , H01J2237/3175 , H02K11/22 , H02K41/031
摘要： A apparatus processes an object (19), such as a semi-conductor wafer at accurately controlled positions. The object (19) is supported by a working platform (12) that is moveable along a path. A suspension actuator part (14) attached to the working platform (12), contains a soft magnetic core (24) with poles facing the surface of a soft magnetic element (34) on the support structure along the path and a winding (20) for application of a current to generate a magnetic field that runs through the core (24) via the poles and returns via the soft magnetic element (34). A sensor (17) senses a measured position of the suspension actuator part (14) relative to the position reference element (16). A control circuit comprises an outer control circuit (40) and an inner control circuit (42). The outer control circuit (40) receives a sensing result and determines force set point information to regulate the measured position of the actuator part (14) to a required value. The inner control circuit (42) receives the force set point information and controls the current to realize a force between the actuator part (14) and the support structure (10) according to the force set point information.
摘要翻译：一种设备在精确控制的位置处理诸如半导体晶片的物体（19）。物体（19）由可沿着路径移动的工作平台（12）支撑。安装在工作平台（12）上的悬架致动器部件（14）包含一个软磁芯（24），该软磁芯（24）具有面向沿该路径的支撑结构上的软磁元件（34）表面的磁极和一个绕组（20）用于施加电流以产生通过所述磁极穿过所述磁芯（24）并经由所述软磁元件（34）返回的磁场。传感器（17）相对于位置参考元件（16）感测悬架致动器部件（14）的测量位置。控制电路包括外部控制电路（40）和内部控制电路（42）。外部控制电路（40）接收感测结果并且确定力设定点信息以将致动器部件（14）的测量位置调节到所需值。内部控制电路（42）接收力设定点信息并根据力设定点信息控制电流以实现致动器部件（14）和支撑结构（10）之间的力。

26. 发明授权

US5172160A Optical lithographic device having a machine frame with force compensation 失效
标题翻译：具有强制补偿功能的机器框架的光学地平面设备
公开(公告)号：US5172160A
公开(公告)日：1992-12-15
申请号：US784286
申请日：1991-10-29
申请人： Jan Van Eijk , Gerard Van Engelen , Hendrikus H. M. Cox , Henricus E. Beekman , Fransiscus M. Jacobs
发明人： Jan Van Eijk , Gerard Van Engelen , Hendrikus H. M. Cox , Henricus E. Beekman , Fransiscus M. Jacobs
IPC分类号： F16F15/03 , F16H21/10 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30 , H02P25/06
CPC分类号： G03F7/70716 , G03F7/70833 , G03F7/709
摘要： An optical lithographic device having a machine frame (1) to which is fastened a lens system (11) having a vertical optical main axis (13). Below the lens system (11), a positioning device (35) is fastened on a support member (3) of the machine frame (1), by means of which device an object table (27) is displaceable relative to the lens system (11) over a guide surface (5) of the support member (3) extending perpendicular to the optical main axis (13).The device is provided with a force actuator system (67) fastened to a reference frame (83) and controlled by a feedforward control system (95). The force actuator system (67) exerts a compensatory force on the support member (3) with a direction opposite to a direction of a reaction force simultaneously exerted by the positioning device (35) on the support member (3), and with a value which is substantially equal to a value of the said reaction force. The control system (95) further comprises a negative acceleration feedback (107), whereby the force actuator system (67) exerts a control force on the support member (3) which is determined by an acceleration of the support member (3) measured by an acceleration transducer (111, 113, 115). The use of the force actuator system (67) prevents undesirable movements of the support member (3) under the influence of a reaction force exerted by the positioning device (35) on the support member (3) and under the influence of external forces.The optical lithographic device can be used inter alia for illuminating semiconductor substrates, where a semiconductor pattern provided on a mask (17) is imaged on a semiconductor substrate (25), which is positioned on the object table (27), by means of the lens system (11).

27. 发明申请

US20110239397A1 SUCTION UNIT AND AUTONOMOUS VACUUM CLEANER 有权
标题翻译：吸油机和自动真空清洁机
公开(公告)号：US20110239397A1
公开(公告)日：2011-10-06
申请号：US12673196
申请日：2008-08-18
申请人： Jeroen Dekkers , Theo Anjes Maria Ruijl , Silvester Matheus Reijnders , Jan Van Eijk , Hubert Gerard Jean Joseph Amaury Vroomen , Thomas Petrus Hendricus Warmerdam , Robertus Mathijs Gerardus Rijs
发明人： Jeroen Dekkers , Theo Anjes Maria Ruijl , Silvester Matheus Reijnders , Jan Van Eijk , Hubert Gerard Jean Joseph Amaury Vroomen , Thomas Petrus Hendricus Warmerdam , Robertus Mathijs Gerardus Rijs
IPC分类号： A47L9/02 , A47L9/28 , A47L5/00
CPC分类号： A47L9/02 , A47L5/04 , A47L9/0072 , A47L9/009 , A47L9/2821 , A47L2201/00
摘要： The invention relates to a suction unit and a vacuum cleaner. The suction unit comprises a drive system for driving the suction unit on a surface to be treated; a chassis supporting the drive system; a nozzle for removing particles from a surface to be treated, which nozzle is configured to move with relation to the chassis in a direction away from the surface to be treated, the nozzle having an interior space defining an opening that faces the surface to be treated; and an outlet communicating with the interior space, the outlet being arranged for communication with a fan unit during operating conditions. The suction unit further comprises coupling means for coupling the nozzle to the chassis, wherein the coupling means is arranged to exert a force that is directed away from the surface to be treated when the underpressure in the interior space increases. In this manner the problem of the suction unit getting stuck on the floor can be overcome or at least reduced. Furthermore, the traction of the drive system can be improved. An autonomous vacuum cleaner according to the invention comprises such a suction unit and further comprises a dust chamber, and a fan unit that communicates with the dust chamber. The fan unit communicates with the outlet for creating an underpressure in the interior space of the nozzle during operating conditions.
摘要翻译：本发明涉及抽吸单元和吸尘器。抽吸单元包括用于在被处理表面上驱动抽吸单元的驱动系统; 支撑驱动系统的底盘; 用于从待处理表面去除颗粒的喷嘴，该喷嘴构造成在远离待处理表面的方向上相对于底架移动，喷嘴具有限定面向被处理表面的开口的内部空间 ; 以及与所述内部空间连通的出口，所述出口布置成用于在操作条件期间与风扇单元通信。抽吸单元还包括用于将喷嘴联接到底架的联接装置，其中联接装置布置成当内部空间中的负压增加时施加远离被处理表面的力。以这种方式，可以克服或至少减少吸入单元卡在地板上的问题。此外，可以提高驱动系统的牵引力。根据本发明的自主真空吸尘器包括这样的抽吸单元，还包括灰尘室和与灰尘室连通的风扇单元。风扇单元与出口连通，以在操作条件下在喷嘴的内部空间中产生负压。

28. 发明授权

US5243491A Electromagnetic support with current-independent characteristics 失效
标题翻译：具有电流独立特性的电磁支持
公开(公告)号：US5243491A
公开(公告)日：1993-09-07
申请号：US664075
申请日：1991-03-04
申请人： Jan Van Eijk , Henricus E. Beekman , Hendrikus H. M. Cox
发明人： Jan Van Eijk , Henricus E. Beekman , Hendrikus H. M. Cox
IPC分类号： G05D3/00 , F16C39/06 , H01F7/20
CPC分类号： F16C32/0446 , F16C32/0451
摘要： A device for positioning a body (5) by means of at least two electromagnets (13, 15). A position sensor (29) measures the size of an air gap (23) between one of the electromagnets (13, 15) and a guide beam (1). An output signal of the position sensor (29) is applied to a linear electronic control unit (35) which passes a control current through the electromagnets (13, 15) in dependence on a difference between the measured and a desired size of the air gap (23). An electronic root extractor (37) is connected between the control unit (35) and the two electromagnets (13, 15). An output signal of the root extractor (37) has a value equal to the square root of a control signal coming from the control unit (35). In this way a force exerted by the electromagnets (13, 15) on the guide beam (1) is proportional to the value of the control signal, so that a control is obtained with the linear control unit ( 35) in which the stiffness and bandwidth are independent of the value of the control current.Since the electrical resistance losses in the electromagnets (13, 15) in such a device are low, the device is particularly suitable for use as an electromagnetic bearing in an optical lithographical device for the irradiation of semiconductor substrates, or in other precision machines.

29. 发明授权

US09192271B2 Suction unit and autonomous vacuum cleaner 有权
标题翻译：抽油机和自主吸尘器
公开(公告)号：US09192271B2
公开(公告)日：2015-11-24
申请号：US12673196
申请日：2008-08-18
申请人： Jeroen Dekkers , Theo Anjes Maria Ruijl , Silvester Matheus Reijnders , Jan Van Eijk , Hubert Gerard Jean Joseph Amaury Vroomen , Thomas Petrus Hendricus Warmerdam , Robertus Mathijs Gerardus Rijs
发明人： Jeroen Dekkers , Theo Anjes Maria Ruijl , Silvester Matheus Reijnders , Jan Van Eijk , Hubert Gerard Jean Joseph Amaury Vroomen , Thomas Petrus Hendricus Warmerdam , Robertus Mathijs Gerardus Rijs
IPC分类号： A47L9/02 , A47L9/00 , A47L9/28 , A47L5/04
CPC分类号： A47L9/02 , A47L5/04 , A47L9/0072 , A47L9/009 , A47L9/2821 , A47L2201/00
摘要： The invention relates to a suction unit and relates to a vacuum cleaner. The suction unit comprises a drive system for driving the suction unit over a surface to be treated; a chassis supporting the drive system; a nozzle for removing particles from a surface to be treated which nozzle is configured to move with relation to the chassis in a direction away from the surface to be treated, the nozzle having an interior space defining an opening that faces the surface to be treated; and an outlet communicating with the interior space, the outlet being arranged for communication with a fan unit in operating conditions. The suction unit further comprises coupling means for coupling the nozzle to the chassis, wherein the coupling means is arranged to exert a force that is directed away from the surface to be treated when the under pressure in the interior space increases. In this manner the problem of the suction unit getting stuck on the floor can be overcome or at least be reduced. Furthermore the traction of the drive system can be improved. An autonomous vacuum cleaner according to the invention comprises such a suction unit and further comprises a dust chamber, and a fan unit that communicates with the dust chamber, the fan unit communicating with the outlet for creating under pressure in the interior space of the nozzle in operating conditions.
摘要翻译：本发明涉及抽吸单元，涉及一种真空吸尘器。抽吸单元包括用于在被处理表面上驱动抽吸单元的驱动系统; 支撑驱动系统的底盘; 用于从被处理表面去除颗粒的喷嘴，该喷嘴构造成在远离待处理表面的方向上相对于底架移动，喷嘴具有限定面向待处理表面的开口的内部空间; 以及与所述内部空间连通的出口，所述出口布置成用于在操作条件下与风扇单元通信。抽吸单元还包括用于将喷嘴联接到底盘的联接装置，其中联接装置被布置成当内部空间中的欠压增加时施加远离被处理表面的力。以这种方式，可以克服或至少减少吸入单元卡在地板上的问题。此外，可以提高驱动系统的牵引力。根据本发明的自主真空吸尘器包括这样的抽吸单元，并且还包括灰尘室和与灰尘室连通的风扇单元，风扇单元与出口连通，用于在喷嘴的内部空间中产生压力运行条件。

30. 发明授权

US08441616B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08441616B2
公开(公告)日：2013-05-14
申请号：US12814171
申请日：2010-06-11
申请人： Jan Van Eijk
发明人： Jan Van Eijk
IPC分类号： G03B27/58 , G03B27/42
CPC分类号： G03B27/58 , G03F7/70775
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The substrate table and/or the support may be provided with an accelerometer to measure an acceleration of the substrate table and/or the support and the apparatus is provided with a calculator in communication with the accelerometer to calculate an acceleration based position signal from the acceleration measured by the accelerometer.
摘要翻译：光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上。衬底台和/或支撑件可以设置有加速度计以测量衬底台和/或支撑件的加速度，并且该设备设置有与加速度计通信的计算器，以从加速度计算基于加速度的位置信号由加速度计测量。

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