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    • 25. 发明申请
    • Quinoline Derivatives as Antibacterial Agents
    • 喹啉衍生物作为抗菌剂
    • US20080227775A1
    • 2008-09-18
    • US11997015
    • 2006-07-31
    • Koenraad Jozef Lodewijk Marcel AndriesAnil KoulJerome Emile Georges GuillemontElisabeth Therese Jeanne Pasquier
    • Koenraad Jozef Lodewijk Marcel AndriesAnil KoulJerome Emile Georges GuillemontElisabeth Therese Jeanne Pasquier
    • A61K31/5355C07D413/08A61P31/04
    • C07D413/06A61K31/4709C07D413/14Y02A50/473
    • Use of a compound for the manufacture of a medicament for the treatment of a bacterial infection provided that the bacterial infection is other than a Mycobacterial infection, said compound being a compound of Formula (Ia) or (Ib) a pharmaceutically acceptable acid or base addition salt thereof, a quaternary amine thereof, a stereochemically isomeric form thereof, a tautomeric form thereof or a N-oxide form thereof, wherein R1 is hydrogen, halo, haloalkyl, cyano, hydroxy, Ar, Het, alkyl, alkyloxy, alkylthio, alkyloxyalkyl, alkylthioalkyl, Ar-alkyl or di(Ar)alkyl; p is 1, 2, 3 or 4; R2 is hydrogen, hydroxy, thio, alkyloxy, alkyloxyalkyloxy, alkylthio, mono or di(alkyl)amino or a radical of formula R3 is alkyl, Ar, Ar-alkyl, Het or Het-alkyl; R4 is hydrogen, alkyl or benzyl; R5 is hydrogen, halo, haloalkyl, hydroxy, Ar, alkyl, alkyloxy, alkylthio, alkyloxyalkyl, alkylthioalkyl, Ar-alkyl or di(Ar)alkyl; or two vicinal R5 radicals may be taken together to form together with the phenyl ring to which they are attached a naphthyl; r is 1, 2, 3, 4 or 5; R6 is hydrogen, alkyl, Ar or Het; R7 is hydrogen or alkyl; R5 is oxo; or R7 and R5 together form the radical —CH═CH—N═; Z is CH2 or C(═O).
    • 使用化合物制造用于治疗细菌感染的药物,只要细菌感染不是分枝杆菌感染,所述化合物是式(Ia)或(Ib)的化合物,其药学上可接受的酸或碱加成 其盐,其季胺,其立体化学异构形式,其互变异构形式或其N-氧化物形式,其中R 1是氢,卤素,卤代烷基,氰基,羟基,Ar,Het 烷基,烷氧基,烷硫基,烷氧基烷基,烷硫基烷基,芳烷基或二(Ar)烷基; p为1,2,3或4; R 2是氢,羟基,硫代,烷氧基,烷氧基烷氧基,烷硫基,一或二(烷基)氨基或式R 3的基团是烷基,Ar,Ar- 烷基,Het或Het-烷基; R 4是氢,烷基或苄基; R 5是氢,卤素,卤代烷基,羟基,Ar,烷基,烷氧基,烷硫基,烷氧基烷基,烷硫基烷基,芳烷基或二(Ar)烷基; 或两个邻位R 5个基团可以与它们所连接的苯环一起形成萘基; r为1,2,3,4或5; R 6是氢,烷基,Ar或Het; R 7是氢或烷基; R 5是氧代; 或R 7和R 5一起形成基团-CH-CH-N-; Z是CH 2或C(-O)。