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21. 发明授权

US07477481B2 Bilayer trailing shield gap for perpendicular head 失效
标题翻译：双层拖尾屏蔽间隙用于垂直头
公开(公告)号：US07477481B2
公开(公告)日：2009-01-13
申请号：US11195227
申请日：2005-08-01
申请人： Hung-Chin Guthrie , Ming Jiang , Aron Pentek , Sue Siyang Zhang , Tsung Yuan Chen , Yinshi Liu
发明人： Hung-Chin Guthrie , Ming Jiang , Aron Pentek , Sue Siyang Zhang , Tsung Yuan Chen , Yinshi Liu
IPC分类号： G11B5/23
CPC分类号： G11B5/1871 , G11B5/1278 , G11B5/3116 , G11B5/3163
摘要： A perpendicular write head for writing data onto tracks includes a main pole, a trailing shield and bilayer trailing shield gap layer between the main pole and the trailing shield and improving writing and track width control.
摘要翻译：用于将数据写入轨道的垂直写头包括在主极和后屏蔽之间的主极，后屏蔽和双层拖尾屏蔽间隙层，并改善写入和轨道宽度控制。

22. 发明申请

US20080151437A1 Perpendicular magnetic recording head including wrap around shield with notched top write gap and method of fabricating the same 有权
标题翻译：垂直磁记录头包括带有凹口顶部写入间隙的屏蔽罩及其制造方法
公开(公告)号：US20080151437A1
公开(公告)日：2008-06-26
申请号：US11645390
申请日：2006-12-26
申请人： Tsung Yuan Chen , Hung-Chin Guthrie , Yimin Hsu , Ming Jiang
发明人： Tsung Yuan Chen , Hung-Chin Guthrie , Yimin Hsu , Ming Jiang
IPC分类号： G11B5/127
CPC分类号： G11B5/1278 , G11B5/3116 , G11B5/315 , G11B5/3163
摘要： In a perpendicular recording head, a notch is formed in the top write gap at a location on top of the main pole. A perpendicular head with this notched top write gap structure has less transition curvature and better writability while reducing the adjacent track interference (ATI). Also, the process used to fabricate the head ensures that the trailing edge (writing edge) of the main pole is extremely flat with no corner rounding.
摘要翻译：在垂直记录头中，在主极顶部的位置处，在顶部写入间隙中形成凹口。具有该切口顶部写入间隙结构的垂直头部具有较小的转变曲率和较好的可编写性，同时减小了相邻的轨道干涉（ATI）。此外，用于制造头的过程确保主极的后缘（书写边缘）非常平坦，没有圆角。

23. 发明授权

US07217666B2 Reactive ion milling/RIE assisted CMP 失效
标题翻译：反应离子研磨/ RIE辅助CMP
公开(公告)号：US07217666B2
公开(公告)日：2007-05-15
申请号：US10792330
申请日：2004-03-02
申请人： Hung-Chin Guthrie , Ming Jiang , Jerry Lo , Aron Pentek , Yi Zheng
发明人： Hung-Chin Guthrie , Ming Jiang , Jerry Lo , Aron Pentek , Yi Zheng
IPC分类号： H01L21/461
CPC分类号： B24B1/00 , G11B5/00 , G11B5/3116 , G11B5/3163 , H01L21/00 , Y10T29/49032 , Y10T29/49044 , Y10T29/49048
摘要： A method for forming a high aspect ratio magnetic structure in a magnetic write head using a combination of chemical mechanical polishing and reactive ion etching.
摘要翻译：使用化学机械抛光和反应离子蚀刻的组合在磁写头中形成高纵横比磁结构的方法。

24. 发明申请

US20060028762A1 Perpendicular write pole formation using durimide/alumina hard mask without CMP liftoff 失效
标题翻译：使用耐磨酰亚胺/氧化铝硬掩模的无垂直写磁极形成，无CMP剥离
公开(公告)号：US20060028762A1
公开(公告)日：2006-02-09
申请号：US11195532
申请日：2005-08-01
申请人： Yunxiao Gao , Hung-Chin Guthrie , Ming Jiang , Sue Zhang
发明人： Yunxiao Gao , Hung-Chin Guthrie , Ming Jiang , Sue Zhang
IPC分类号： G11B5/127
CPC分类号： G11B5/1871 , G11B5/1278 , G11B5/3163 , Y10T29/49041 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A perpendicular write head includes a main pole comprising a Durimide/Alumina hard mask formed over a laminate layer process to form the main pole without using a liftoff or chemical mechanical polishing process, thereby avoiding rounding corners of the pole, the main pole being controlled in shape for improved control of critical dimension of track width and angle of the bevel to avoid undesirable adjacent track writing.
摘要翻译：垂直写头包括主极，其包括形成在层压层工艺上的Durimide /氧化铝硬掩模，以形成主极，而不使用剥离或化学机械抛光工艺，从而避免极的圆角，主极被控制在形状，用于改善斜面的轨道宽度和角度的临界尺寸的控制，以避免不期望的相邻轨道写入。

25. 发明申请

US20050189319A1 One step copper damascene CMP process and slurry 失效
标题翻译：一步铜镶嵌CMP工艺和浆料
公开(公告)号：US20050189319A1
公开(公告)日：2005-09-01
申请号：US10789777
申请日：2004-02-27
申请人： Hung-Chin Guthrie , Ming Jiang , John Yang
发明人： Hung-Chin Guthrie , Ming Jiang , John Yang
IPC分类号： B44C1/22 , C23F1/00 , C23F3/04 , G11B5/17 , G11B5/31 , H01L21/321
CPC分类号： H01L21/3212 , C23F3/04 , G11B5/17 , G11B5/3116 , G11B5/313 , G11B5/3163 , Y10T29/49041 , Y10T29/4906 , Y10T29/49064
摘要： A Chemical Mechanical Polish (CMP) process and slurry therefore slurry that is capable of removing NiFe, SiO2, Photoresist, Ta, alumina and Cu at substantially the same rate. The slurry is useful for obtaining a substantially planar surface of several materials while avoiding corrosion of Cu coil and NiFe structure.
摘要翻译：化学机械抛光（CMP）工艺和浆料，因此能够以基本相同的速率去除NiFe，SiO 2，光致抗蚀剂，Ta，氧化铝和Cu。该浆料可用于获得几种材料的基本平坦的表面，同时避免Cu线圈和NiFe结构的腐蚀。

26. 发明授权

US07881010B2 Process for self-aligned flare point and shield throat definition prior to main pole patterning 有权
标题翻译：在主极图案化之前，自对准耀斑和屏蔽喉定义的过程
公开(公告)号：US07881010B2
公开(公告)日：2011-02-01
申请号：US11956277
申请日：2007-12-13
申请人： Hung-Chin Guthrie , Ming Jiang , Edward Hin Pong Lee , Aron Pentek , Sue Siyang Zhang , Yi Zheng
发明人： Hung-Chin Guthrie , Ming Jiang , Edward Hin Pong Lee , Aron Pentek , Sue Siyang Zhang , Yi Zheng
IPC分类号： G11B5/187
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/3146 , G11B5/315
摘要： A method for manufacturing a magnetic write head having a write pole with a flared step feature that defines a secondary flare point. The method involves depositing a magnetic write pole material on a substrate and then depositing a magnetic material over the write pole material followed by a non-magnetic material. A first mask is formed having a front edge to define the location of the secondary flare point, and one or more material removal processes are used to remove portions of the magnetic layer and non-magnetic layer that are not protected by this first mask. The first mask is replaced by a second mask that is configured to define a write pole, and an ion milling is performed to define the write pole. Shadowing from the magnetic layer and non-magnetic layer form a flared secondary flare point.
摘要翻译：一种用于制造具有定义二次闪光点的具有扩口步骤特征的写极的磁写头的方法。该方法包括将磁性写入极材料沉积在衬底上，然后将磁性材料沉积在写入极材料上，随后是非磁性材料。形成第一掩模，其具有前边缘以限定次级火炬点的位置，并且使用一个或多个材料去除过程来去除未被该第一掩模保护的磁性层和非磁性层的部分。第一个掩模由配置为定义写入极的第二个掩模代替，并且执行离子铣削来定义写入极点。从磁性层和非磁性层的阴影形成扩张的次级耀斑点。

27. 发明授权

US07768743B2 Perpendicular magnetic recording write head with trailing shield having notch and throat height defined by nonmagnetic pad layer 有权
标题翻译：垂直磁记录写头，后挡板具有由非磁性垫层限定的凹口和喉部高度
公开(公告)号：US07768743B2
公开(公告)日：2010-08-03
申请号：US11747656
申请日：2007-05-11
申请人： Hung-Chin Guthrie , Ming Jiang , Changqing Shi
发明人： Hung-Chin Guthrie , Ming Jiang , Changqing Shi
IPC分类号： G11B5/127
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/315
摘要： A perpendicular magnetic recording write head supported on an air-bearing slider has a magnetic write pole (WP) with a WP end at the air-bearing surface (ABS) having a width generally equal to the data track width and a trailing shield (TS) with a TS end generally coplanar with the WP end. The TS has a first portion with a width at the TS end substantially wider than the width of the WP end and a TS notch (TSN) portion with a width at the TS end generally equal to the width of the WP end. The TS first portion has a height in a direction perpendicular to the ABS, and the TSN portion has a throat height (TH) in a direction perpendicular to the ABS that is less than the height of the TS first portion. A nonmagnetic gap layer separates the WP from the TSN portion and a nonmagnetic pad layer separates the WP from the TS first portion. The pad layer has a front edge generally parallel to and recessed from the ABS that defines the TH of the TSN portion, and a thickness that defines the length of the TSN portion in the along-the-track direction.
摘要翻译：支撑在空气轴承滑块上的垂直磁记录写头具有在空气轴承表面（ABS）上具有WP端的磁性写入极（WP），其宽度大体上等于数据磁道宽度和后屏蔽（TS ），其TS端通常与WP端共面。 TS具有第一部分，其宽度在TS端大大宽于WP端的宽度，TS陷口（TSN）部分的宽度在TS端大致等于WP端的宽度。 TS第一部分具有垂直于ABS的方向的高度，并且TSN部分在垂直于ABS的方向上具有小于TS第一部分的高度的喉部高度（TH）。非磁隙层将WP与TSN部分分开，非磁性垫层将WP与TS第一部分分离。衬垫层具有大致平行于ABS并且从ABS凹入的前边缘，其限定TSN部分的TH，以及限定沿着轨道方向的TSN部分的长度的厚度。

28. 发明申请

US20090128964A1 METHOD FOR MANUFACTURING A PERPENDICULAR MAGNETIC WRITE HEAD WITH WRAP AROUND MAGNETIC TRAILING AND SIDE SHIELDS 有权
标题翻译：用于制作带磁带跟踪和边缘的扁平磁头写头的方法
公开(公告)号：US20090128964A1
公开(公告)日：2009-05-21
申请号：US11944125
申请日：2007-11-21
申请人： Hung-Chin Guthrie , Ming Jiang , Changqing Shi , Sue Siyang Zhang
发明人： Hung-Chin Guthrie , Ming Jiang , Changqing Shi , Sue Siyang Zhang
IPC分类号： G11B5/127
CPC分类号： G11B5/3116 , G11B5/1278 , Y10T29/49032 , Y10T29/49043 , Y10T29/49048 , Y10T29/49052 , Y10T29/49798
摘要： A method for manufacturing a magnetic write head having a wrap around magnetic shield. The method allows a highly accurate short wavelength such as 193 mm photolithography to be used to accurately define the placement and critical dimension of wrap around magnetic shield. The method includes the formation of a magnetic write pole, top gap, and side gap and the deposition of a RIEable fill layer thereover, and CMP to planarization. A 193 nm photolithography and ion milling is used to form a mask over the RIEable layer and one or more reactive ion etching processes are performed to pattern the RIEable layer through 193 nm photolithography mask. A wrap around shield can then be electroplated into the opening formed in the RIEable layer.
摘要翻译：一种用于制造具有围绕磁屏蔽的磁性写入头的方法。该方法允许使用高精度的短波长（例如193mm光刻）来精确地定义磁屏蔽环绕的放置和临界尺寸。该方法包括形成磁性写入极，顶部间隙和侧面间隙以及在其上沉积RIEable填充层，并将CMP平坦化。使用193nm光刻和离子研磨在RIEable层上形成掩模，并且执行一个或多个反应离子蚀刻工艺以通过193nm光刻掩模对RIEable层进行图案化。然后可以将环绕的护罩电镀到形成在RIEable层中的开口中。

29. 发明授权

US07469467B2 Method of manufacturing a perpendicular write head 失效
标题翻译：制造垂直写头的方法
公开(公告)号：US07469467B2
公开(公告)日：2008-12-30
申请号：US11195532
申请日：2005-08-01
申请人： Yunxiao Gao , Hung-Chin Guthrie , Ming Jiang , Sue Siyang Zhang
发明人： Yunxiao Gao , Hung-Chin Guthrie , Ming Jiang , Sue Siyang Zhang
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/1871 , G11B5/1278 , G11B5/3163 , Y10T29/49041 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A perpendicular write head includes a main pole comprising a Durimide/Alumina hard mask formed over a laminate layer process to form the main pole without using a liftoff or chemical mechanical polishing process, thereby avoiding rounding corners of the pole, the main pole being controlled in shape for improved control of critical dimension of track width and angle of the bevel to avoid undesirable adjacent track writing.
摘要翻译：垂直写头包括主极，其包括形成在层压层工艺上的Durimide /氧化铝硬掩模，以形成主极，而不使用剥离或化学机械抛光工艺，从而避免极的圆角，主极被控制在形状，用于改善斜面的轨道宽度和角度的临界尺寸的控制，以避免不期望的相邻轨道写入。

30. 发明授权

US07441325B2 Perpendicular head with trailing shield and rhodium gap process 失效
标题翻译：垂直头与后盾和铑间隙过程
公开(公告)号：US07441325B2
公开(公告)日：2008-10-28
申请号：US11195222
申请日：2005-08-01
申请人： Yunxiao Gao , Hung-Chin Guthrie , Ming Jiang , Sue Siyang Zhang
发明人： Yunxiao Gao , Hung-Chin Guthrie , Ming Jiang , Sue Siyang Zhang
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/1871 , G11B5/1278 , G11B5/3116 , G11B5/315 , G11B5/3163 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A perpendicular write head including a main pole and a trailing shield, the main pole being made of a diamond-like carbon (DLC) layer as hard mask and a rhodium (Rh) layer as shield gap, both DLC and Rh layers being CMP stop layers so as to avoid corner rounding and damage from chemical mechanical planarization (CMP) process, the DLC layer being removed by reactive ion etching (RIE) to create a trench, the trailing shield being deposited into the trench for self alignment.
摘要翻译：包括主极和后屏蔽的垂直写头，主极由金刚石碳（DLC）层作为硬掩模和铑（Rh）层作为屏蔽间隙，DLC和Rh层都是CMP停止层，以避免由化学机械平面化（CMP）工艺引起的角落圆角和损伤，通过反应离子蚀刻（RIE）去除DLC层以产生沟槽，后屏蔽层沉积到沟槽中用于自对准。

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