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    • 22. 发明授权
    • Method for producing biomineral-containing substance and organic hydroponics method
    • 含生物矿物质的生产方法和有机水培法
    • US08327581B2
    • 2012-12-11
    • US12312569
    • 2006-12-04
    • Makoto ShinoharaYoichi UeharaMasato KounoHirofumi Iwakiri
    • Makoto ShinoharaYoichi UeharaMasato KounoHirofumi Iwakiri
    • A01G31/00
    • A01H4/001A01G31/00C12N5/0025
    • The present invention aims at providing a method for producing a nutrient solution for plant culture utilizing an organic material and providing a method of hydroponic culture in which a plant can be cultured while directly adding the organic material to the nutrient solution. The present invention provides a method for producing a biomineral-containing substance comprising establishing a microbial ecosystem necessary for stable mineralization of organic material by adding the organic material to water gradually or at one time and fermenting the resulting mixture and a method of hydroponic culture comprising utilizing the biomineral-containing substance obtained according to the method as at least a part of the nutrient solution and culturing the plant while directly adding the organic material to the nutrient solution.
    • 本发明的目的在于提供一种利用有机材料生产植物培养营养液的方法,并且提供一种水培培养方法,其中可以在将植物直接添加到营养液中的同时进行培养。 本发明提供一种含有生物矿物质的物质的制造方法,其特征在于,通过将有机物质逐渐或一次地添加到水中并使之发酵,形成有机材料稳定矿化所必需的微生物生态系统和水培培养方法, 根据该方法获得的含有生物矿物质的物质作为营养液的至少一部分,并在将有机材料直接添加到营养液中的同时培养植物。
    • 28. 发明授权
    • Apparatus and method for testing pixels arranged in a matrix array
    • 用于测试以矩阵阵列排列的像素的装置和方法
    • US06873175B2
    • 2005-03-29
    • US10379458
    • 2003-03-04
    • Guillermo Toro-LiraMakoto ShinoharaTakaharu Nishihara
    • Guillermo Toro-LiraMakoto ShinoharaTakaharu Nishihara
    • G01N23/225G01R31/302G01R31/305G09G3/00G01R31/00
    • G09G3/006G01R31/305
    • An apparatus for testing plural pixels arranged in a matrix array on a TFT substrate comprises an electron gun for incidenting the electron beam to the TFT substrate, a secondary electron detector for detecting the amount of secondary electrons generated by incidenting the electron beam to the TFT substrate, and a stage for carrying the TFT substrate which is held thereon. The electron gun is placed against the TFT substrate held on the stage and incidents the electron beam to each basic scanning area. The electron gun scans the electron beam in one basic scanning area a predetermined number of times to obtain a secondary electron waveform necessary for testing the presence/absence of a defect in the pixel. The stage is always moved while the electron gun scans the electron beam in each basic scanning area, whereby the entire area of the TFT substrate is tested.
    • 一种用于测试在TFT基板上以矩阵阵列排列的多个像素的装置,包括用于将电子束入射到TFT基板的电子枪,用于检测通过将电子束入射到TFT基板而产生的二次电子量的二次电子检测器 以及用于承载保持在其上的TFT基板的载物台。 将电子枪放置在保持在平台上的TFT基板上,并将电子束发射到每个基本扫描区域。 电子枪在一个基本扫描区域内扫描预定次数的电子束,以获得测试像素中缺陷的存在/不存在所需的二次电子波形。 当电子枪扫描每个基本扫描区域中的电子束时,舞台总是移动,由此测试TFT基片的整个区域。
    • 29. 发明授权
    • Wafer holder
    • 晶圆架
    • US06474987B1
    • 2002-11-05
    • US09831032
    • 2001-07-09
    • Tetsuya NakaiKatsuo AraiMakoto ShinoharaFumitomo KawaharaMakoto SaitoYasuhiko Kawamura
    • Tetsuya NakaiKatsuo AraiMakoto ShinoharaFumitomo KawaharaMakoto SaitoYasuhiko Kawamura
    • F27D500
    • H01L21/68735C23C16/4583C30B25/12C30B31/14H01L21/67309H01L21/6875
    • A wafer (22) is placed on an upper surface of a holder body (23), and the holder body is inserted into a plurality of holder-aimed concave recesses (14) formed on supporters (12) accommodated in a heat treatment furnace such that the holder body is held horizontally. The holder body is formed into a disk shape free of recessed cut portions, and the holder body is formed with an upwardly projecting ring-like projection (24) extending in the circumferential direction of the holder body around the axis of the holder body. The wafer holder is constituted such that the wafer is placed on the holder body while contacting with the upper surface of the projection, and such that the outer diameter of the projection is formed to be in a range of 0.5D to 0.98D wherein D is the diameter of the wafer, so that the outer periphery of the wafer is kept from contacting with the projection. Occurrence of slips in the wafer is restricted by preventing warpage of the holder body upon fabricating the holder body. Further, each of wafers having different diameters is assuredly held by the same holder body without deviating from a relevant predetermined position. Moreover, the working operations for loading and unloading the wafer to and from the holder body are smoothly conducted.
    • 将晶片(22)放置在保持器主体(23)的上表面上,并且将保持器主体插入形成在容纳在热处理炉中的支撑体(12)上的多个保持器目标凹入凹部(14)中, 保持器主体水平地保持。 保持体形成为没有凹进切口部的圆盘形状,并且保持体形成有沿保持体本体的周向延伸的向上突出的环状突起(24)。 晶片保持器构成为使得晶片与突起的上表面接触地放置在保持器主体上,并且使得突起的外径形成为0.5D至0.98D的范围,其中D为 晶片的直径,使得晶片的外周保持不与突起接触。通过在制造保持器主体时防止保持器本体的翘曲来限制晶片中的滑移。 此外,具有不同直径的每个晶片在不偏离相关预定位置的情况下可靠地由相同的保持器主体保持。 此外,平滑地进行用于将晶片装载到保持器主体和从保持器主体卸载的工作操作。