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    • 22. 发明授权
    • Magnetic recording medium, method for manufacturing the same, and magnetic recording/reproducing apparatus
    • 磁记录介质及其制造方法以及磁记录/重放装置
    • US08029952B2
    • 2011-10-04
    • US11984278
    • 2007-11-15
    • Yuko TsuchiyaChiseki Haginoya
    • Yuko TsuchiyaChiseki Haginoya
    • G03G21/00G03G13/00G11B5/65
    • G11B5/855B82Y10/00G11B5/743G11B5/746G11B5/82G11B2005/0021
    • There is provided a method for fabricating a magnetic recording medium that provides high throughput, low manufacturing cost, and no degradation in accuracy in pattern size in fine pattern formation. A resist layer is formed on a substrate or cutting work layer. The surface of the substrate is divided into two or more areas using the center of rotation of the substrate as a reference point. An optical, contactless pattern transfer method is used to transfer a figure pattern contained in the divided area through a mask to the resist layer so as to form a latent image of the figure pattern. The pattern transfer is similarly carried out for the divided area. After the pattern transfer processes for all the divided areas are completed, the entire resist layer is developed to form a resist pattern. The resist pattern is used as a mask to cut the substrate or cutting work layer. As a result, there is provided the substrate or cut work layer onto which a fine pattern has been transferred.
    • 提供一种制造磁记录介质的方法,其提供高生产量,低制造成本,并且在精细图案形成中图案尺寸的精度没有劣化。 抗蚀剂层形成在基材或切割加工层上。 使用基板的旋转中心作为基准点将基板的表面分割为两个以上的区域。 光学,非接触式图案转印方法用于通过掩模将包含在分割区域中的图形图案转印到抗蚀剂层,以形成图形图案的潜像。 类似地,对于分割区域进行图案转印。 在完成所有分割区域的图案转印处理之后,整个抗蚀剂层被显影以形成抗蚀剂图案。 抗蚀剂图案用作掩模以切割基材或切割工作层。 结果,提供了已经转移精细图案的基板或切割工作层。
    • 23. 发明申请
    • Magnetic recording medium, method for manufacturing the same, and magnetic recording/reproducing apparatus
    • 磁记录介质及其制造方法以及磁记录/重放装置
    • US20080204934A1
    • 2008-08-28
    • US11984278
    • 2007-11-15
    • Yuko TsuchiyaChiseki Haginoya
    • Yuko TsuchiyaChiseki Haginoya
    • G11B5/82G11B5/706G03C5/00
    • G11B5/855B82Y10/00G11B5/743G11B5/746G11B5/82G11B2005/0021
    • There is provided a method for fabricating a magnetic recording medium that provides high throughput, low manufacturing cost, and no degradation in accuracy in pattern size in fine pattern formation. A resist layer is formed on a substrate or cutting work layer. The surface of the substrate is divided into two or more areas using the center of rotation of the substrate as a reference point. An optical, contactless pattern transfer method is used to transfer a figure pattern contained in the divided area through a mask to the resist layer so as to form a latent image of the figure pattern. The pattern transfer is similarly carried out for the divided area. After the pattern transfer processes for all the divided areas are completed, the entire resist layer is developed to form a resist pattern. The resist pattern is used as a mask to cut the substrate or cutting work layer. As a result, there is provided the substrate or cut work layer onto which a fine pattern has been transferred.
    • 提供一种制造磁记录介质的方法,其提供高生产量,低制造成本,并且在精细图案形成中图案尺寸的精度没有劣化。 抗蚀剂层形成在基材或切割加工层上。 使用基板的旋转中心作为基准点将基板的表面分割为两个以上的区域。 光学,非接触式图案转印方法用于通过掩模将包含在分割区域中的图形图案转印到抗蚀剂层,以形成图形图案的潜像。 类似地,对于分割区域进行图案转印。 在完成所有分割区域的图案转印处理之后,整个抗蚀剂层被显影以形成抗蚀剂图案。 抗蚀剂图案用作掩模以切割基材或切割工作层。 结果,提供了已经转移精细图案的基板或切割工作层。