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21. 发明授权

US06838685B1 Ion beam apparatus, ion beam processing method and sample holder member 失效
标题翻译：离子束装置，离子束处理方法和样品架构件
公开(公告)号：US06838685B1
公开(公告)日：2005-01-04
申请号：US10629217
申请日：2003-07-29
申请人： Toshio Kodama , Masakatsu Hasuda , Toshiaki Fujii , Kouji Iwasaki , Yasuhiko Sugiyama , Yasuyuki Takagi
发明人： Toshio Kodama , Masakatsu Hasuda , Toshiaki Fujii , Kouji Iwasaki , Yasuhiko Sugiyama , Yasuyuki Takagi
IPC分类号： G01N1/28 , G01N1/32 , H01J37/26 , H01J37/305 , H01J37/31 , H01J37/317
CPC分类号： H01J37/3056 , G01N1/32 , H01J2237/2007 , H01J2237/20214 , H01J2237/31745 , H01J2237/31749
摘要： An ion beam processing device has a sample holder for fixing a sample on which a section has been formed by irradiation of a specified focused ion beam from a surface side, and gas ion beam irradiation device for irradiating a gas ion beam to a region of the sample fixing using the holder member that contains the section to remove a damage layer on the section. The gas ion beam from the gas ion beam irradiation device irradiates the section from a rear surface side of the sample at a specified incident angle.

22. 发明授权

US06395347B1 Micromachining method for workpiece observation 失效
标题翻译：工件观察的微加工方法
公开(公告)号：US06395347B1
公开(公告)日：2002-05-28
申请号：US08351093
申请日：1994-11-30
申请人： Tatsuya Adachi , Takashi Kaito , Yoshihiro Koyama , Kouji Iwasaki
发明人： Tatsuya Adachi , Takashi Kaito , Yoshihiro Koyama , Kouji Iwasaki
IPC分类号： H01J300
CPC分类号： H01J37/3056 , G01N1/32 , H01J2237/31744
摘要： A method for preparing a sample for observation, by the steps of: contacting a first predetermined area of the sample surface with an organic compound vapor while irradiating the first predetermined area with an ion beam to decompose the organic compound into a layer having a mask function, the layer covering the first predetermined area; and contacting a second predetermined area of the sample surface with an etching gas while irradiating the second predetermined area with an ion beam in order to remove material from the sample surface at the second predetermined area, wherein the second predetermined area includes at least part of the first predetermined area and the layer covering the first predetermined area prevents removal of material from the sample surface in the first predetermined area.
摘要翻译：一种用于制备用于观察的样品的方法，包括以下步骤：使用离子束照射所述第一预定区域，使所述样品表面的第一预定区域与有机化合物蒸气接触，以将所述有机化合物分解成具有掩模功能的层覆盖第一预定区域的层; 以及使所述样品表面的第二预定区域与蚀刻气体接触，同时用离子束照射所述第二预定区域，以便在所述第二预定区域从所述样品表面去除材料，其中所述第二预定区域包括所述第二预定区域的至少一部分第一预定区域和覆盖第一预定区域的层防止在第一预定区域中从样品表面移除材料。

23. 发明申请

US20100215868A1 MICRO CROSS-SECTION PROCESSING METHOD 有权
标题翻译：微交叉处理方法
公开(公告)号：US20100215868A1
公开(公告)日：2010-08-26
申请号：US12708896
申请日：2010-02-19
申请人： Kouji Iwasaki , Tatsuya Adachi
发明人： Kouji Iwasaki , Tatsuya Adachi
IPC分类号： G21K5/10 , G01N23/22 , B05D3/06
CPC分类号： G21K5/04 , G01N23/2202 , G21K5/10 , H01J2237/31745 , H01J2237/31749
摘要： A micro cross-section processing method includes the steps of determining a linear cross-section estimated position including an observation object on a surface of the sample, irradiating the focused ion beam to the cross-section estimated position perpendicularly to or at a tilt angle to form a cross-section at a position in front of the cross-section estimated position, irradiating the focused ion beam to both ends of the cross-section to form side cuts extending to a position in rear of the cross-section estimated position, irradiating the focused ion beam to a position on the surface of the cross-section and at a position deeper than the observation object to form a bottom cut extending to a position in rear of the cross-section estimated position, irradiating the focused ion beam along from the side cuts to the cross-section estimated position to form wedges connecting to the bottom cut, and applying impact to a region in front of the cross-section estimated position of the sample to cleave the vicinity of the cross-section estimated position between the wedges and form a plane of cleavage.
摘要翻译：微截面处理方法包括以下步骤：确定包括在样品表面上的观察对象的线性横截面估计位置，将聚焦离子束垂直于或以倾斜角照射到横截面估计位置，在横截面估计位置前面的位置处形成横截面，将聚焦离子束照射到横截面的两端，以形成延伸到横截面估计位置后方的位置的侧切口所述聚焦离子束到达所述横截面表面上的位置，并且位于比所述观察对象更深的位置，以形成延伸到所述横截面估计位置的后方的位置的底切口，从而沿着所述聚焦离子束照射侧面切割到横截面估计位置以形成连接到底切口的楔形，并且对样品的横截面估计位置前面的区域施加冲击以切割楔块之间的横截面估计位置附近并形成切割平面。

24. 发明授权

US07297944B2 Ion beam device and ion beam processing method, and holder member 有权
标题翻译：离子束装置和离子束处理方法，以及支架构件
公开(公告)号：US07297944B2
公开(公告)日：2007-11-20
申请号：US10520982
申请日：2003-07-09
申请人： Toshio Kodama , Masakatsu Hasuda , Toshiaki Fuji , Kouji Iwasaki , Yasuhiko Sugiyama , Yasuyuki Takagi
发明人： Toshio Kodama , Masakatsu Hasuda , Toshiaki Fuji , Kouji Iwasaki , Yasuhiko Sugiyama , Yasuyuki Takagi
IPC分类号： H01J37/30 , H01J37/317 , G01N1/28 , H01J37/20
CPC分类号： H01J37/3056 , G01N1/32 , H01J2237/31745 , H01J2237/31749
摘要： An apparatus has a holder member (21) which holds a sample (3), and a removing beam source (13) which irradiates an inert ion beam onto a cross section (4) of the sample (3) held by a holder member (21) and removes a fracture layer on the cross section (4). Then, the removing beam source (13) is disposed on the holding end side of the sample (3) with respect to the normal L of the cross section (4) so that the irradiating direction of the inert ion beam is tilted at the tilt angle θ to the normal L with respect to the cross section (4).
摘要翻译：一种装置具有保持样品（3）的保持器构件（21）和将惰性离子束照射到由保持器构件保持的样品（3）的横截面（4）上的去除束源（13） 21）并且去除横截面（4）上的断裂层。然后，移除光束源（13）相对于截面（4）的法线L配置在样品（3）的保持端侧，使得惰性离子束的照射方向倾斜相对于横截面（4）的角度θ相对于法线L。

25. 外观设计

USD545693S1 Clock 失效
公开(公告)号：USD545693S1
公开(公告)日：2007-07-03
申请号：US29209785
申请日：2004-07-22
申请人： Kouji Iwasaki
设计人： Kouji Iwasaki

26. 发明申请

US20060188946A1 Nanobio device of imitative anatomy structure 有权
标题翻译：模拟解剖结构的Nanobio装置
公开(公告)号：US20060188946A1
公开(公告)日：2006-08-24
申请号：US11353603
申请日：2006-02-14
申请人： Masanao Munekane , Hiroyuki Wada , Kouji Iwasaki , Toshiaki Fujii , Takahiro Ochiya , Yusuke Yamamoto , Takumi Teratani
发明人： Masanao Munekane , Hiroyuki Wada , Kouji Iwasaki , Toshiaki Fujii , Takahiro Ochiya , Yusuke Yamamoto , Takumi Teratani
IPC分类号： G01N33/567 , G01N33/53
CPC分类号： G01N33/5088 , Y10T436/11
摘要： objects to be achieved by the invention are to provide a nanobio device in which cultured cells are organized at a high-level in a state near in vivo, and to provide a method of using the nanobio device of imitative anatomy structure. The nanobio device of imitative anatomy structure of the invention is obtained by manufacturing a substrate with a bio-compatible substance and arranging a plurality of types of cells thereon in a desired array. A method of manufacturing a nanobio device in the invention includes a step of manufacturing a substrate for a nanobio device by a micromachine processing technique and a step of arranging a plurality of cultured cells on the substrate in a desired array with laser optical tweezers.
摘要翻译：本发明要实现的目的是提供一种纳米生物装置，其中培养细胞在体内接近的状态下组织成高水平，并且提供使用模拟解剖结构的纳米装置的方法。本发明的模拟解剖结构的纳米装置通过用生物相容性物质制造衬底并以期望的阵列布置多种类型的细胞而获得。在本发明中制造纳米装置的方法包括通过微机械加工技术制造纳米装置用基板的步骤，以及使用激光光学镊子以期望的阵列在基板上排列多个培养细胞的步骤。

27. 发明授权

US07002150B2 Thin specimen producing method and apparatus 有权
标题翻译：薄标本制造方法和装置
公开(公告)号：US07002150B2
公开(公告)日：2006-02-21
申请号：US10854868
申请日：2004-05-27
申请人： Kouji Iwasaki , Yutaka Ikku
发明人： Kouji Iwasaki , Yutaka Ikku
IPC分类号： G21K7/00
CPC分类号： G01N1/32 , H01J2237/3174
摘要： A thin specimen producing method acquires a work amount in a 1-line scan by an FIB under a predetermined condition, measures a remaining work width of a thin film on an upper surface of a specimen by a microscopic length-measuring function, determines a required number of scan lines of work to reach a predetermined width by calculation, and executes a work to obtain a set thickness. The work amount in a one-line scan by the FIB under the predetermined condition is determined by working the specimen in scans of plural lines, measuring the etched dimension by the microscopic length-measuring function, and calculating an average work amount per one-line scan.
摘要翻译：薄标本制作方法通过FIB在预定条件下获取1行扫描中的工作量，通过微观长度测量功能测量样品上表面上的薄膜的剩余工作宽度，确定所需的通过计算达到预定宽度的扫描线的数量，并执行获得设定厚度的工作。通过FIB在预定条件下的单行扫描中的工作量通过在多行扫描中进行样品的工作，通过微观长度测量功能测量蚀刻尺寸并计算每行的平均工作量来确定扫描

28. 发明授权

US08191168B2 Method of preparing a transmission electron microscope sample and a sample piece for a transmission electron microscope 有权
标题翻译：制备透射电子显微镜样品的方法和透射电子显微镜的样品片
公开(公告)号：US08191168B2
公开(公告)日：2012-05-29
申请号：US12264750
申请日：2008-11-04
申请人： Xin Man , Kouji Iwasaki , Tatsuya Asahata
发明人： Xin Man , Kouji Iwasaki , Tatsuya Asahata
IPC分类号： G01N13/10
CPC分类号： H01J37/3056 , B82Y15/00 , G01N1/286 , H01J37/20 , H01J37/26 , H01J2237/2007 , H01J2237/202 , H01J2237/204 , H01J2237/206 , H01J2237/2067 , H01J2237/2802 , H01J2237/31745 , H01J2237/31749
摘要： Provided is a method of preparing a sample piece for a transmission electron microscope, the sample piece for a transmission electron microscope including a substantially planar finished surface which can be observed with the transmission electron microscope and a grabbing portion which microtweezers can grab without contacting the finished surface. The method of preparing a sample piece for a transmission electron microscope is characterized by including: a first step of cutting out the sample piece from a sample body Wa with a charged particle beam, the sample piece being coupled to the sample body at a coupling portion; a second step of grabbing with the microtweezers the grabbing portion of the sample piece with the finished surface of the sample piece cut out in the first step being covered with the microtweezers; a third step of detaching the sample piece grabbed with the microtweezers in the second step from the sample body by cutting the coupling portion with the charged particle beam with a grabbed state of the sample piece being maintained; and a fourth step of transferring and fixing with the microtweezers the sample piece detached in the third step onto a sample holder.
摘要翻译：提供了一种制备透射电子显微镜样品的方法，用于透射电子显微镜的样品片，其包括可透射电子显微镜观察的基本上平面的成品表面，以及微型加工者可以在不接触成品的情况下抓取的抓取部分表面。制备透射电子显微镜样品的方法的特征在于包括：第一步骤，利用带电粒子束从样品体Wa切出样品片，样品片以耦合部分 ; 第二步骤是用微型加湿器抓住样品的抓取部分，其中在第一步骤中切出的样品的成品表面被微型加工机覆盖; 第三步骤，通过用保持样品的抓取状态的带电粒子束切割耦合部分，将样品从第二步骤中剥离出来; 以及第四步骤，用微型加工机将第三步骤中拆卸的样品片转移和固定到样品架上。

29. 发明授权

US07736893B2 Nanobio device of imitative anatomy structure 有权
标题翻译：模拟解剖结构的Nanobio装置
公开(公告)号：US07736893B2
公开(公告)日：2010-06-15
申请号：US11353603
申请日：2006-02-14
申请人： Masanao Munekane , Hiroyuki Wada , Kouji Iwasaki , Toshiaki Fujii , Takahiro Ochiya , Yusuke Yamamoto , Takumi Teratani
发明人： Masanao Munekane , Hiroyuki Wada , Kouji Iwasaki , Toshiaki Fujii , Takahiro Ochiya , Yusuke Yamamoto , Takumi Teratani
IPC分类号： C12N5/00
CPC分类号： G01N33/5088 , Y10T436/11
摘要： Objects to be achieved by the invention are to provide a nanobio device in which cultured cells are organized at a high-level in a state near in vivo, and to provide a method of using the nanobio device of imitative anatomy structure. The nanobio device of imitative anatomy structure of the invention is obtained by manufacturing a substrate with a bio-compatible substance and arranging a plurality of types of cells thereon in a desired array. A method of manufacturing a nanobio device in the invention includes a step of manufacturing a substrate for a nanobio device by a micromachine processing technique and a step of arranging a plurality of cultured cells on the substrate in a desired array with laser optical tweezers.
摘要翻译：通过本发明实现的目的是提供一种纳米生物装置，其中培养细胞在体内接近的状态下组织在高水平，并提供使用模拟解剖结构的纳米装置的方法。本发明的模拟解剖结构的纳米装置通过用生物相容性物质制造衬底并以期望的阵列布置多种类型的细胞而获得。在本发明中制造纳米装置的方法包括通过微机械加工技术制造纳米装置用基板的步骤，以及使用激光光学镊子以期望的阵列在基板上排列多个培养细胞的步骤。

30. 发明授权

US07626165B2 Focused ion beam apparatus and method of preparing/observing sample 有权
标题翻译：聚焦离子束装置及其制备/观察方法
公开(公告)号：US07626165B2
公开(公告)日：2009-12-01
申请号：US11703292
申请日：2007-02-07
申请人： Kouji Iwasaki
发明人： Kouji Iwasaki
IPC分类号： H01J37/26 , G01N13/10 , G01N23/22
CPC分类号： G01N23/2251 , G01N23/2255 , H01J37/3056 , H01J2237/202 , H01J2237/31749
摘要： A focused ion beam apparatus includes a sample base for mounting a sample, a three axis stage capable of moving the sample base in three directions: along two axes on a horizontal face and a vertical axis, and a first focused ion beam barrel and a second focused ion beam barrel for irradiating the sample with focused ion beams, the first focused ion beam barrel and the second focused ion beam barrel being arranged such that directions of the focused ion beams are substantially opposed to each other in a plane view thereof and are inclined in substantial line symmetry with regard to the vertical axis in a side view thereof.
摘要翻译：聚焦离子束装置包括用于安装样品的样品基底，能够沿着三个方向移动样品基底的三轴台：沿着水平面和垂直轴上的两个轴，以及第一聚焦离子束筒和第二聚焦离子束筒聚焦离子束筒，用于用聚焦离子束照射样品，第一聚焦离子束筒和第二聚焦离子束筒布置成使得聚焦离子束的方向在其平面视图中彼此基本相对，并且倾斜在其侧视图中相对于垂直轴线呈大致线对称。

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