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21. 发明申请

US20070114451A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20070114451A1
公开(公告)日：2007-05-24
申请号：US11603228
申请日：2006-11-22
申请人： Hans Jansen , Sebastiaan Maria Cornelissen , Sjoerd Nicolaas Donders , Roelof De Graaf , Christiaan Hoogendam , Hernes Jacobs , Martinus Hendrikus Leenders , Jeroen Johannes Mertens , Bob Streefkerk , Jan-Gerard Van Der Toorn , Peter Smits , Franciscus Johannes Janssen , Michel Riepen
发明人： Hans Jansen , Sebastiaan Maria Cornelissen , Sjoerd Nicolaas Donders , Roelof De Graaf , Christiaan Hoogendam , Hernes Jacobs , Martinus Hendrikus Leenders , Jeroen Johannes Mertens , Bob Streefkerk , Jan-Gerard Van Der Toorn , Peter Smits , Franciscus Johannes Janssen , Michel Riepen
IPC分类号： G21G5/00
CPC分类号： G03F7/70341 , G03F7/707
摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
摘要翻译：在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。

22. 发明授权

US07145269B2 Lithographic apparatus, Lorentz actuator, and device manufacturing method 有权
标题翻译：光刻设备，洛伦兹致动器和器件制造方法
公开(公告)号：US07145269B2
公开(公告)日：2006-12-05
申请号：US10796291
申请日：2004-03-10
申请人： Sven Antoin Johan Hol , Henrikus Herman Marie Cox , Hernes Jacobs , Patricia Vreugdewater , Koen Jacobus Johannes Marie Zaal
发明人： Sven Antoin Johan Hol , Henrikus Herman Marie Cox , Hernes Jacobs , Patricia Vreugdewater , Koen Jacobus Johannes Marie Zaal
IPC分类号： H02K41/00
CPC分类号： G03F7/70758 , G03F7/70941
摘要： A lithographic apparatus comprising a highly effective Lorentz actuator, is presented. The Lorentz actuator comprises a main magnet system and a subsidiary magnet system arranged in Halbach configuration, an electrically conductive element for producing a force via the interaction of an electric current carried by the electrically conductive element and a resulting field of the first and second magnetic field generated by the main and subsidiary magnet system, respectively. The actuator further comprises a magnetic element extending substantially between outer sides of the first and second magnet system subassemblies. The magnetic element guides a portion of the second, subsidiary field between the first and second magnet system subassemblies.
摘要翻译：提出了包括高效洛伦兹致动器的光刻设备。洛伦兹致动器包括以Halbach构造布置的主磁体系统和辅助磁体系统，用于通过由导电元件承载的电流和第一和第二磁场的所得场的相互作用产生力的导电元件分别由主磁铁系统产生。致动器还包括基本上在第一和第二磁体系统子组件的外侧之间延伸的磁性元件。磁性元件引导第一和第二磁体系统子组件之间的第二辅助磁场的一部分。

23. 发明申请

US20060252270A1 LIthographic apparatus and device manufacturing method utilizing a flat panel display handler 失效
标题翻译：利用平板显示处理器的照相设备和设备制造方法
公开(公告)号：US20060252270A1
公开(公告)日：2006-11-09
申请号：US11123232
申请日：2005-05-06
申请人： Hernes Jacobs
发明人： Hernes Jacobs
IPC分类号： H01L21/306 , C23F1/00 , C03C25/68 , H01L21/461
CPC分类号： G03F7/7075 , Y10S414/141
摘要： A lithographic apparatus comprises an illumination system that conditions a radiation beam, a patterning device that modulates the radiation beam, a substrate table that supports a substrate, and a projection system that projects the modulated radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a substrate handler that loads and/or unloads a substrate on/from the substrate table. The substrate handler supports the substrate in a support plane and comprises a conveyor device for moving the substrate in a direction substantially parallel to the support plane. The conveyor device comprises a gripping device configured to push or pull the substrate in the indicated direction and a driving device for driving the gripping device in the indicated direction.
摘要翻译：光刻设备包括调节辐射束的照明系统，调制辐射束的图案形成装置，支撑衬底的衬底台，以及将调制的辐射束投影到衬底的目标部分上的投影系统。该光刻设备还包括一个衬底处理器，该衬底处理器在衬底台上载入和/或卸载衬底。衬底处理器在支撑平面中支撑衬底并且包括用于沿基本上平行于支撑平面的方向移动衬底的输送装置。输送装置包括构造成沿所示方向推动或拉动基板的夹紧装置和用于沿所示方向驱动夹持装置的驱动装置。

24. 发明授权

US07012264B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07012264B2
公开(公告)日：2006-03-14
申请号：US10860654
申请日：2004-06-04
申请人： Martinus Arnoldus Henricus Terken , Hernes Jacobs , Harmen Klaas Van Der Schoot , Petrus M H Vosters , Koen J J M Zaal
发明人： Martinus Arnoldus Henricus Terken , Hernes Jacobs , Harmen Klaas Van Der Schoot , Petrus M H Vosters , Koen J J M Zaal
IPC分类号： G21K5/10
CPC分类号： G03F7/70716
摘要： A lithographic apparatus is provided. The apparatus includes an illumination system that conditions a beam of radiation, an article support member that supports an article to be placed in a beam path of the beam of radiation on the article support, and a movable carriage for moving the article support member. The carriage includes a compartmented composite structure provided with a non-composite mounting interface and/or cooling interface With such an arrangement, conventional interfacing using, for example metal or ceramic materials, can be applied in combination with the advantages of composite structures, such as a low specific weight, a high Young's modulus at places and directions where required, high strength, high stability, and high electrical resistivity.
摘要翻译：提供光刻设备。该装置包括照射辐射束的照明系统，支撑待放置在物品支撑件上的辐射束的光束路径中的物品的物品支撑构件以及用于移动物品支撑构件的可移动托架。托架包括设置有非复合安装界面和/或冷却界面的分隔复合结构。通过这种布置，使用例如金属或陶瓷材料的常规接口可以与复合结构的优点结合使用，诸如低比重，高的杨氏模量和需要的方向，高强度，高稳定性和高电阻率。

25. 发明授权

US06937316B2 Lithographic apparatus, device manufacturing method and device manufactured thereby 失效
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US06937316B2
公开(公告)日：2005-08-30
申请号：US10217332
申请日：2002-08-13
申请人： Nicolaas Rudolf Kemper , Hernes Jacobs , Edwin Johan Buis
发明人： Nicolaas Rudolf Kemper , Hernes Jacobs , Edwin Johan Buis
IPC分类号： H01L21/027 , F16J3/04 , F16L11/15 , G03F7/20 , G03B24/42 , G03B27/52 , G03B27/58
CPC分类号： G03F7/70841 , F16J3/047 , F16L11/15 , G03F7/709
摘要： A bellows used to connect two sealed compartments of the lithographic apparatus or a compartment and a pump, comprises a first section having smooth helical corrugations and a second section that can accommodate the longitudinal movement caused by relative rotation of the ends of the first section. The second section may be a mirror image of the first section or one or more sub-sections of circumferential corrugations.
摘要翻译：用于连接光刻设备或隔室和泵的两个密封隔室的波纹管包括具有平滑螺旋波纹的第一部分和可容纳由第一部分的端部的相对旋转引起的纵向移动的第二部分。第二部分可以是第一部分的镜像或圆周波纹的一个或多个子部分。

26. 发明授权

US07928407B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07928407B2
公开(公告)日：2011-04-19
申请号：US11603228
申请日：2006-11-22
申请人： Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen
发明人： Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen
IPC分类号： G21K5/10
CPC分类号： G03F7/70341 , G03F7/707
摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
摘要翻译：在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。

27. 发明申请

US20100044593A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20100044593A1
公开(公告)日：2010-02-25
申请号：US12613846
申请日：2009-11-06
申请人： Hans JANSEN , Sebastian Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Jan-Gerard Cornelius Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen , Bob Streefkerk
发明人： Hans JANSEN , Sebastian Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Jan-Gerard Cornelius Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen , Bob Streefkerk
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/707
摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
摘要翻译：在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。

28. 发明申请

US20090284730A1 Substrate Handler, Lithographic Apparatus and Device Manufacturing Method 有权
标题翻译：基板处理器，平版印刷设备和器件制造方法
公开(公告)号：US20090284730A1
公开(公告)日：2009-11-19
申请号：US12512220
申请日：2009-07-30
申请人： Harmen Klaas VAN DER SCHOOT , Hernes Jacobs , Bernardus Antonius Johannes Luttikhuis , Petrus Matthijs Henricus Vosters , Johannes Martinus Andreas Hazenberg , Aart Adrianus Van Beuzekom
发明人： Harmen Klaas VAN DER SCHOOT , Hernes Jacobs , Bernardus Antonius Johannes Luttikhuis , Petrus Matthijs Henricus Vosters , Johannes Martinus Andreas Hazenberg , Aart Adrianus Van Beuzekom
IPC分类号： G03B27/58
CPC分类号： G03F7/70875 , G03F7/7075
摘要： An apparatus, method, and system is provided to condition a substrate. The apparatus can include a substrate handler, an array of diodes, and a projection system. The substrate handler can include a conditioning device, a float device, and a displacing device. The array of diodes can be configured to provide a patterned radiation beam, where the projection system projects the patterned radiation beam onto a target portion of a conditioned substrate.
摘要翻译：提供了一种装置，方法和系统来调节基板。该装置可以包括基板处理器，二极管阵列和投影系统。衬底处理器可以包括调节装置，浮子装置和置换装置。二极管阵列可以被配置为提供图案化的辐射束，其中投影系统将图案化的辐射束投影到经调理的基底的目标部分上。

29. 发明授权

US07423721B2 Lithographic apparatus 有权
标题翻译：平版印刷设备
公开(公告)号：US07423721B2
公开(公告)日：2008-09-09
申请号：US11012062
申请日：2004-12-15
申请人： Antonius Johannes Josephus Van Dijsseldonk , Mustafa Amhaouch , Wilhelmus Josephus Box , Johannes Henricus Wilhelmus Jacobs , Hernes Jacobs , Marius Ravensbergen , Martinus Arnoldus Henricus Terken , Robert Gordon Livesey , Franciscus Catharina Bernardus Marinus Van Vroonhoven
发明人： Antonius Johannes Josephus Van Dijsseldonk , Mustafa Amhaouch , Wilhelmus Josephus Box , Johannes Henricus Wilhelmus Jacobs , Hernes Jacobs , Marius Ravensbergen , Martinus Arnoldus Henricus Terken , Robert Gordon Livesey , Franciscus Catharina Bernardus Marinus Van Vroonhoven
IPC分类号： G03B27/42
CPC分类号： G03F7/70841 , G03F7/70991
摘要： A vacuum operated lithographic apparatus includes a vacuum housing for providing a vacuum environment to a support constructed to support a patterning device, or a substrate table, or a projection system, or any combination thereof. An interior of the vacuum housing includes a plurality of transport circuits for transporting fluids and/or electrical signals for use in a first process mode for lithographic processing. At least one of the transport circuits is adapted to transport energy towards the interior of the vacuum housing to stimulate outgassing in the vacuum housing for use in a second process mode for bringing the lithographic apparatus into a vacuum operating condition.
摘要翻译：真空操作的光刻设备包括真空壳体，用于为构造成支撑图案形成装置的支撑件，或衬底台，投影系统或其任何组合提供真空环境。真空壳体的内部包括用于输送用于光刻处理的第一工艺模式的流体和/或电信号的多个输送电路。传送电路中的至少一个适于将能量传送到真空壳体的内部，以刺激真空壳体中的除气，以用于使光刻设备进入真空操作状态的第二工艺模式。

30. 发明授权

US07292317B2 Lithographic apparatus and device manufacturing method utilizing substrate stage compensating 有权
标题翻译：利用基板台补偿的平版印刷设备和器件制造方法
公开(公告)号：US07292317B2
公开(公告)日：2007-11-06
申请号：US11147467
申请日：2005-06-08
申请人： Henrikus Herman Marie Cox , Hernes Jacobs , Harmen Klaas Van Der Schoot , Petrus Matthijs Henricus Vosters
发明人： Henrikus Herman Marie Cox , Hernes Jacobs , Harmen Klaas Van Der Schoot , Petrus Matthijs Henricus Vosters
IPC分类号： G03B27/58
CPC分类号： G03F7/709
摘要： A lithographic apparatus has an illumination system that conditions a radiation beam and a patterning device support that supports a patterning device. The patterning device patterns the radiation beam. The lithographic apparatus also has a substrate support that supports a substrate, a machine frame that supports the substrate support, a projection system that projects the patterned beam onto a target portion of the substrate, and a substrate support drive that moves the substrate support in at least one direction. The lithographic apparatus can have a reaction mass, a balance mass, a base frame, where the substrate support drive is configured to generate a force in the at least one direction between the substrate support and the reaction mass, the balance mass, or the support frame.
摘要翻译：光刻设备具有调节辐射束的照明系统和支持图案形成装置的图案形成装置支撑件。图案形成装置对辐射束进行图案化。光刻设备还具有支撑基板的基板支撑件，支撑基板支撑件的机架，将图案化的光束投影到基板的目标部分上的投影系统以及将基板支撑件移动到基板支撑驱动器至少一个方向。光刻设备可以具有反应物料，平衡物质，基底框架，其中基底支撑驱动器构造成在基底支撑体和反应块之间的至少一个方向上产生力，平衡块或支撑体帧。

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