专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

21. 发明申请

US20080315428A1 Thin Film Transistor and Display Device, and Method for Manufacturing Thereof 有权
标题翻译：薄膜晶体管和显示装置及其制造方法
公开(公告)号：US20080315428A1
公开(公告)日：2008-12-25
申请号：US10586661
申请日：2005-02-15
申请人： Gen Fujii
发明人： Gen Fujii
IPC分类号： H01L21/768 , H01L23/535
CPC分类号： H01L29/66742 , G02F2001/136295 , H01L21/288 , H01L27/1285 , H01L27/1292 , H05K3/1241
摘要： The present invention discloses a display device and a manufacturing method thereof by which a manufacturing process can be simplified. Further, the present invention discloses technique for manufacturing a pattern such as a wiring into a desired shape with good controllability. A method for forming a pattern for constituting the display device according to the present invention comprises the steps of forming a first region and a second region; discharging a composition containing a pattern formation material to a region across the second region and the first region; and flowing a part of the composition discharged to the first region into the second region; wherein wettability with respect to the composition of the first region is lower than that of the second composition.
摘要翻译：本发明公开了一种可以简化制造工艺的显示装置及其制造方法。此外，本发明公开了一种用于将诸如布线的图案制造成具有良好可控性的所需形状的技术。根据本发明的用于形成用于构成显示装置的图案的方法包括以下步骤：形成第一区域和第二区域; 将含有图案形成材料的组合物排放到横跨第二区域和第一区域的区域; 并将排出到第一区域的组合物的一部分流入第二区域; 其中相对于第一区域的组合物的润湿性低于第二组合物的润湿性。

22. 发明授权

US07273773B2 Display device, method for manufacturing thereof, and television device 有权
标题翻译：显示装置及其制造方法以及电视装置
公开(公告)号：US07273773B2
公开(公告)日：2007-09-25
申请号：US11042518
申请日：2005-01-26
申请人： Shunpei Yamazaki , Osamu Nakamura , Shinji Maekawa , Gen Fujii , Toshiyuki Isa
发明人： Shunpei Yamazaki , Osamu Nakamura , Shinji Maekawa , Gen Fujii , Toshiyuki Isa
IPC分类号： H01L21/84
CPC分类号： H01L51/0022 , G09G3/3208 , G09G3/3225 , G09G2300/0842 , G09G2300/0861 , G09G2310/0251 , H01L27/1285 , H01L27/1292 , H01L27/3244 , H01L51/055 , H01L51/529
摘要： The invention provides a display device and a method for manufacturing thereof by increasing a material efficiently as well as simplifying steps. Also, the invention provides a technique for forming a pattern such as a wiring, that is used for forming a display device, to have a predetermined shape with an excellent controllability. The method for manufacturing a display device includes the steps of: forming a lyophobic region; selectively irradiating laser beam in the lyophobic region to form a lyophilic region; selectively discharging a composition, that contains a conductive material, in the lyophilic region to form a gate electrode layer; forming a gate insulating layer and a semiconductor layer over the gate electrode layer; discharging a composition containing a conductive material over the semiconductor layer to form a source electrode layer and a drain electrode layer; and forming a pixel electrode layer on the source or drain electrode layer.
摘要翻译：本发明提供一种显示装置及其制造方法，其通过有效地增加材料以及简化步骤来制造。此外，本发明提供了一种用于形成用于形成显示装置的布线等图案以具有优异的可控性的预定形状的技术。制造显示装置的方法包括以下步骤：形成疏液区域; 选择性地将激光束照射在疏液区域以形成亲液性区域; 选择性地将含有导电材料的组合物在亲液区域中排出以形成栅极电极层; 在栅电极层上形成栅极绝缘层和半导体层; 在半导体层上排出含有导电材料的组合物，以形成源电极层和漏电极层; 以及在源极或漏极电极层上形成像素电极层。

23. 发明申请

US20070075322A1 Light-emitting device and method for manufacturing the same 有权
标题翻译：发光装置及其制造方法
公开(公告)号：US20070075322A1
公开(公告)日：2007-04-05
申请号：US10577425
申请日：2004-11-05
申请人： Osamu Nakamura , Gen Fujii , Fuminori Tateishi
发明人： Osamu Nakamura , Gen Fujii , Fuminori Tateishi
IPC分类号： H01L33/00
CPC分类号： H01L51/0022 , H01L27/12 , H01L27/1222 , H01L27/124 , H01L27/1251 , H01L27/1285 , H01L27/1292 , H01L27/156 , H01L27/3262 , H01L27/3279 , H01L29/42384 , H01L29/66765 , H01L29/78669 , H01L29/78696 , H01L51/56 , H01L2227/323
摘要： The present invention provides a display device and a manufacturing method thereof that can simplify manufacturing steps and enhance efficiency in the use of materials, and further, a manufacturing method that can enhance adhesiveness of a pattern. One feature of the invention is that at least one or more patterns needed for manufacturing a display panel, such as a conductive layer forming a wiring or an electrode or a mask for forming a desired pattern is/are formed by a method capable of selectively forming a pattern, thereby manufacturing a display panel.
摘要翻译：本发明提供一种能够简化制造工序，提高材料使用效率的显示装置及其制造方法，进一步提高能够提高图案的粘合性的制造方法。本发明的一个特征是，通过能够选择性地形成的方法来形成用于制造显示面板所需的至少一个或多个图案，例如形成布线的导电层或用于形成所需图案的电极或掩模从而制造显示面板。

24. 发明申请

US20070004100A1 Semiconductor device and method for manufacturing the same 失效
标题翻译：半导体装置及其制造方法
公开(公告)号：US20070004100A1
公开(公告)日：2007-01-04
申请号：US10573155
申请日：2004-12-14
申请人： Shinji Maekawa , Gen Fujii , Junya Maruyama , Toru Takayama , Yumiko Fukumoto , Yasuyuki Arai
发明人： Shinji Maekawa , Gen Fujii , Junya Maruyama , Toru Takayama , Yumiko Fukumoto , Yasuyuki Arai
IPC分类号： H01L21/84 , H01L31/113
CPC分类号： G06K19/07749 , H01L27/12 , H01L27/1285 , H01L27/1292 , H01L27/13 , H01L29/66757 , H01L29/66765 , H01L29/78603 , H01L29/78684
摘要： An IC card is more expensive than a magnetic card, and an electronic tag is also more expensive as a substitute for bar codes. Therefore, the present invention provides an extremely thin integrated circuit that can be mass-produced at low cost unlike a chip of a conventional silicon wafer, and a manufacturing method thereof. One feature of the present invention is that a thin integrated circuit is formed by a formation method that can form a pattern selectively, on a glass substrate, a quartz substrate, a stainless substrate, a substrate made of synthetic resin having flexibility, such as acryl, or the like except for a bulk substrate. Further, another feature of the present invention is that an ID chip in which a thin film integrated circuit and an antenna according to the present invention are mounted is formed.
摘要翻译： IC卡比磁卡贵，电子标签也更昂贵代替条形码。因此，本发明提供了与常规硅晶片的芯片相比可以以低成本批量生产的极薄的集成电路及其制造方法。本发明的一个特征在于，通过可以在玻璃基板，石英基板，不锈钢基板，具有柔软性的合成树脂制成的基板（例如丙烯酸酯）上形成图案的形成方法形成薄的集成电路，或类似物，除了大量衬底。此外，本发明的另一个特征是形成其中安装有根据本发明的薄膜集成电路和天线的ID芯片。

25. 发明申请

US20060027804A1 Display device, manufacturing method thereof, and television set 有权
公开(公告)号：US20060027804A1
公开(公告)日：2006-02-09
申请号：US11187988
申请日：2005-07-25
申请人： Shunpei Yamazaki , Hironobu Shoji , Shinji Maekawa , Osamu Nakamura , Tatsuya Honda , Gen Fujii , Yukie Suzuki , Ikuko Kawamata
发明人： Shunpei Yamazaki , Hironobu Shoji , Shinji Maekawa , Osamu Nakamura , Tatsuya Honda , Gen Fujii , Yukie Suzuki , Ikuko Kawamata
IPC分类号： H01L29/04
CPC分类号： H01L21/02667 , G02F1/1368 , G02F2202/104 , H01L21/2022 , H01L21/2026 , H01L27/124 , H01L27/1277 , H01L27/1292 , H01L27/3246 , H01L27/3248 , H01L27/3262 , H01L27/3276 , H01L51/56
摘要： A manufacturing method of a display device having TFTs capable of high-speed operation with few variations of threshold voltage is provided, in which materials are used with high efficiency and a small number of photomasks is required. The display device of the invention comprises a gate electrode layer and a pixel electrode layer formed over an insulating surface, a gate insulating layer formed over the gate electrode layer, a crystalline semiconductor layer formed over the gate insulating layer, a semiconductor layer having one conductivity type formed in contact with the crystalline semiconductor layer, a source electrode layer and a drain electrode layer formed in contact with the semiconductor layer having one conductivity type, an insulating later formed over the source electrode layer, the drain electrode layer, and the pixel electrode layer, a first opening formed in the insulating layer to reach the source electrode layer or the drain electrode layer, a second opening formed in the gate insulating layer and the insulating layer to reach the pixel electrode layer, and a wiring layer formed in the first opening and the second opening to electrically connect the source electrode layer or the drain electrode layer to the pixel electrode layer.

26. 发明申请

US20050170565A1 Forming method of contact hole, and manufacturing method of semicondutor device, liquid crystal display device and EL display device 有权
标题翻译：接触孔的形成方法，半导体器件，液晶显示器件和EL显示器件的制造方法
公开(公告)号：US20050170565A1
公开(公告)日：2005-08-04
申请号：US11043451
申请日：2005-01-27
申请人： Gen Fujii , Hiroko Shiroguchi
发明人： Gen Fujii , Hiroko Shiroguchi
IPC分类号： H01L29/786 , H01L21/336 , H01L21/77 , H01L21/84 , H01L27/12 , H01L29/423 , H01L29/49 , H01L21/00
CPC分类号： H01L29/42384 , H01L27/12 , H01L27/1292 , H01L29/4908 , H01L29/66757 , H01L29/66765
摘要： When forming a contact hole by a conventional manufacturing step of a semiconductor device, a resist is required to be formed on almost entire surface of a substrate so as to be applied on a film other than an area in which a contact hole is to be formed, leading to drastically reduced throughput. According to a forming method of a contact hole and a manufacturing method of a semiconductor device, an EL display device and a liquid crystal display device of the invention, an island shape organic film is selectively formed over a semiconductor layer, a conductive layer or an insulating layer, and an insulating film is formed around the island shape organic film to form a contact hole. Therefore, a conventional patterning using a resist is not required, and high throughput and low cost can be achieved.
摘要翻译：当通过半导体器件的常规制造步骤形成接触孔时，需要在基板的几乎整个表面上形成抗蚀剂，以便施加在除了要形成接触孔的区域之外的膜上，导致吞吐量大幅降低。根据本发明的接触孔的形成方法和半导体装置的制造方法，EL显示装置和液晶显示装置，在半导体层，导电层或导电层上选择性地形成岛状有机膜绝缘层，并且在岛状有机膜周围形成绝缘膜以形成接触孔。因此，不需要使用抗蚀剂的常规图案，可以实现高生产率和低成本。

27. 发明申请

US20050158665A1 Substrate having film pattern and manufacturing method of the same, manufacturing method of semiconductor device, liquid crystal television, and EL television 有权
标题翻译：具有膜图案的基板及其制造方法，半导体装置，液晶电视和EL电视机的制造方法
公开(公告)号：US20050158665A1
公开(公告)日：2005-07-21
申请号：US11025921
申请日：2005-01-03
申请人： Shinji Maekawa , Gen Fujii , Hiroko Shiroguchi , Masafumi Morisue
发明人： Shinji Maekawa , Gen Fujii , Hiroko Shiroguchi , Masafumi Morisue
IPC分类号： H01L21/469 , B05D1/12 , G02B5/20 , G03F7/00 , H01L21/02
CPC分类号： G02B5/201 , G03F7/0007 , H01L27/1285 , H01L27/1292 , H01L27/3281 , H01L27/3295 , H01L29/66757 , H01L29/66765 , H01L51/56
摘要： The invention provides a manufacturing method of a substrate having a film pattern including an insulating film, a semiconductor film, a conductive film and the like by simple steps, and also a manufacturing method of a semiconductor device which is low in cost with high throughput and yield. According to the invention, after forming a first protective film which has low wettability on a substrate, a material which has high wettability is applied or discharged on an outer edge of a first mask pattern, thereby a film pattern and a substrate having the film pattern are formed.
摘要翻译：本发明通过简单的步骤提供了具有包括绝缘膜，半导体膜，导电膜等的膜图案的基板的制造方法，以及低成本，高生产率的半导体器件的制造方法，产量。根据本发明，在形成在基材上具有低润湿性的第一保护膜之后，在第一掩模图案的外边缘上施加或排出具有高润湿性的材料，从而形成膜图案和具有膜图案的基板形成。

28. 发明授权

US08518760B2 Display device, method for manufacturing thereof, and television device 有权
标题翻译：显示装置及其制造方法以及电视装置
公开(公告)号：US08518760B2
公开(公告)日：2013-08-27
申请号：US13050117
申请日：2011-03-17
申请人： Shunpei Yamazaki , Osamu Nakamura , Shinji Maekawa , Gen Fujii , Toshiyuki Isa
发明人： Shunpei Yamazaki , Osamu Nakamura , Shinji Maekawa , Gen Fujii , Toshiyuki Isa
IPC分类号： H01L21/84
CPC分类号： H01L51/0022 , G09G3/3208 , G09G3/3225 , G09G2300/0842 , G09G2300/0861 , G09G2310/0251 , H01L27/1285 , H01L27/1292 , H01L27/3244 , H01L51/055 , H01L51/529
摘要： The invention provides a display device and a method for manufacturing thereof by increasing a material efficiently as well as simplifying steps. Also, the invention provides a technique for forming a pattern such as a wiring, that is used for forming a display device, to have a predetermined shape with an excellent controllability. The method for manufacturing a display device includes the steps of: forming a lyophobic region; selectively irradiating laser beam in the lyophobic region to form a lyophilic region; selectively discharging a composition, that contains a conductive material, in the lyophilic region to form a gate electrode layer; forming a gate insulating layer and a semiconductor layer over the gate electrode layer; discharging a composition containing a conductive material over the semiconductor layer to form a source electrode layer and a drain electrode layer; and forming a pixel electrode layer on the source or drain electrode layer.
摘要翻译：本发明提供一种显示装置及其制造方法，其通过有效地增加材料以及简化步骤来制造。此外，本发明提供了一种用于形成用于形成显示装置的布线等图案以具有优异的可控性的预定形状的技术。制造显示装置的方法包括以下步骤：形成疏液区域; 选择性地将激光束照射在疏液区域以形成亲液性区域; 选择性地将含有导电材料的组合物在亲液区域中排出以形成栅极电极层; 在栅电极层上形成栅极绝缘层和半导体层; 在半导体层上排出含有导电材料的组合物，以形成源电极层和漏电极层; 以及在源极或漏极电极层上形成像素电极层。

29. 发明授权

US08293457B2 Substrate having film pattern and manufacturing method of the same, manufacturing method of semiconductor device, liquid crystal television, and EL television 有权
标题翻译：具有膜图案的基板及其制造方法，半导体装置，液晶电视和EL电视机的制造方法
公开(公告)号：US08293457B2
公开(公告)日：2012-10-23
申请号：US12537005
申请日：2009-08-06
申请人： Shinji Maekawa , Gen Fujii , Hiroko Shiroguchi , Masafumi Morisue
发明人： Shinji Maekawa , Gen Fujii , Hiroko Shiroguchi , Masafumi Morisue
IPC分类号： G03F7/26
CPC分类号： G02B5/201 , G03F7/0007 , H01L27/1285 , H01L27/1292 , H01L27/3281 , H01L27/3295 , H01L29/66757 , H01L29/66765 , H01L51/56
摘要： The invention provides a manufacturing method of a substrate having a film pattern including an insulating film, a semiconductor film, a conductive film and the like by simple steps, and also a manufacturing method of a semiconductor device which is low in cost with high throughput and yield. According to the invention, after forming a first protective film which has low wettability on a substrate, a material which has high wettability is applied or discharged on an outer edge of a first mask pattern, thereby a film pattern and a substrate having the film pattern are formed.
摘要翻译：本发明通过简单的步骤提供了具有包括绝缘膜，半导体膜，导电膜等的膜图案的基板的制造方法，以及低成本，高生产率的半导体器件的制造方法，产量。根据本发明，在形成在基材上具有低润湿性的第一保护膜之后，在第一掩模图案的外边缘上施加或排出具有高润湿性的材料，从而形成膜图案和具有膜图案的基板形成。

30. 发明授权

US08242486B2 Semiconductor device with liquid repellant layer 有权
标题翻译：具有排液层的半导体器件
公开(公告)号：US08242486B2
公开(公告)日：2012-08-14
申请号：US11795510
申请日：2006-02-07
申请人： Gen Fujii
发明人： Gen Fujii
IPC分类号： H01L35/24 , H01L51/00
CPC分类号： H01L27/283 , H01L23/5254 , H01L2924/0002 , H01L2924/00
摘要： An object is to provide technology for manufacturing a higher-reliability memory device and a semiconductor device that is equipped with the memory device at low cost. A semiconductor device of the present invention has a first conductive layer, a first insulating layer that is provided to be in contact with a side end portion of the first conductive layer, a second insulating layer that is provided over the first conductive layer and the first insulating layer, and a second conductive layer that is provided over the second insulating layer. The second insulating layer is formed of an insulating material, and wettability against a fluidized substance when the insulating material is fluidized, is higher for the first insulating layer than the first conductive layer.
摘要翻译：本发明的目的是提供一种制造高可靠性的存储器件和半导体器件的技术，该器件以低成本装备存储器件。本发明的半导体器件具有第一导电层，设置成与第一导电层的侧端部接触的第一绝缘层，设置在第一导电层上的第二绝缘层和第一导电层绝缘层和设置在第二绝缘层上的第二导电层。第二绝缘层由绝缘材料形成，并且当绝缘材料流化时对流化物质的润湿性对于第一绝缘层比第一导电层高。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式