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    • 25. 发明授权
    • Message display calculator
    • 消息显示计算器
    • US5604688A
    • 1997-02-18
    • US376233
    • 1995-01-23
    • William ChuRichard A. Waldinger
    • William ChuRichard A. Waldinger
    • G06F15/02G06F3/00
    • G06F15/0225
    • A pocket calculator includes a casing having on its front face numeric and function keys and a numeric first liquid crystal display (LCD) and a message second LCD. Housed in the casing is a calculator network module housing and a first battery connected through a key operated switch contained in the network to energize the network and actuate the first LCD. An inverter IC integrated circuit and second battery are housed in the casing and actuate the second LCD, the battery being connected to the inverter input through a transistor switch rendered conductive in response to the energization of the calculator network. Alternatively, a message third LCD provided in which the message is devisualized upon the application of a voltage thereto with the energization of the computer. The second and third LCDs may be a single common unit with the faces of a section of a common LCD being coated with light polarizing layers which are optically mutually perpendicular.
    • 袖珍计算器包括在其正面上具有数字和功能键的壳体和数字第一液晶显示器(LCD)和消息第二LCD。 壳体内设有一个计算器网络模块外壳和通过网络中包含的按键操作开关连接的第一个电池,以激励网络并启动第一个LCD。 逆变器IC集成电路和第二电池被容纳在壳体中并致动第二LCD,电池通过响应于计算器网络的通电而导通的晶体管开关连接到逆变器输入端。 或者,提供了一种消息第三LCD,其中在通过计算机的激励向其施加电压时消息被设计。 第二和第三LCD可以是单个公共单元,其中公共LCD的一部分的表面涂覆有光学相互垂直的光偏振层。
    • 27. 发明授权
    • Alignment method for semiconductor processing
    • 半导体处理对准方法
    • US08514374B2
    • 2013-08-20
    • US12611947
    • 2009-11-04
    • Todd C. BaileyWilliam ChuWilliam Muth
    • Todd C. BaileyWilliam ChuWilliam Muth
    • G01B11/00G03B27/32G03B27/42
    • G03F7/70458G03F9/7088
    • A method provides improved alignment for a photolithographic exposure. In such method, a first exposure tool and a first chuck used in a reference photolithographic exposure of a first material layer on a substrate can be identified. The substrate typically includes at least a semiconductor layer. The first chuck typically is one of a plurality of chucks usable with the first exposure tool. The method may further include identifying a second exposure tool and a second chuck used in a current photolithographic exposure of a second material layer on the substrate. In one embodiment, alignment correction information specific to each of the identified first exposure tool, the first chuck, the second exposure tool and the second chuck can be used in aligning the semiconductor substrate to a second exposure tool and a second chuck. In one embodiment, such method can compensate for alignment error caused by differences between the first and second exposure tools, between the first and second chucks, or between the first and second exposure tools and between the first and second chucks.
    • 一种方法提供了用于光刻曝光的改进的对准。 在这种方法中,可以识别在基板上的第一材料层的参考光刻曝光中使用的第一曝光工具和第一卡盘。 衬底通常包括至少一个半导体层。 第一卡盘通常是可用于第一曝光工具的多个卡盘之一。 该方法还可以包括识别在基板上的第二材料层的当前光刻曝光中使用的第二曝光工具和第二卡盘。 在一个实施例中,可以使用特定于所识别的第一曝光工具,第一卡盘,第二曝光工具和第二卡盘中的每一个的对准校正信息,以将半导体基板对准第二曝光工具和第二卡盘。 在一个实施例中,这种方法可以补偿由第​​一和第二曝光工具之间,第一和第二卡盘之间或第一和第二曝光工具之间以及第一和第二卡盘之间的差异引起的对准误差。
    • 29. 发明申请
    • ALIGNMENT METHOD FOR SEMICONDUCTOR PROCESSING
    • 半导体处理对准方法
    • US20110102760A1
    • 2011-05-05
    • US12611947
    • 2009-11-04
    • Todd C. BaileyWilliam ChuWilliam Muth
    • Todd C. BaileyWilliam ChuWilliam Muth
    • G03B27/58G01B11/00
    • G03F7/70458G03F9/7088
    • A method provides improved alignment for a photolithographic exposure. In such method, a first exposure tool and a first chuck used in a reference photolithographic exposure of a first material layer on a substrate can be identified. The substrate typically includes at least a semiconductor layer. The first chuck typically is one of a plurality of chucks usable with the first exposure tool. The method may further include identifying a second exposure tool and a second chuck used in a current photolithographic exposure of a second material layer on the substrate. In one embodiment, alignment correction information specific to each of the identified first exposure tool, the first chuck, the second exposure tool and the second chuck can be used in aligning the semiconductor substrate to a second exposure tool and a second chuck. In one embodiment, such method can compensate for alignment error caused by differences between the first and second exposure tools, between the first and second chucks, or between the first and second exposure tools and between the first and second chucks.
    • 一种方法提供了用于光刻曝光的改进的对准。 在这种方法中,可以识别在基板上的第一材料层的参考光刻曝光中使用的第一曝光工具和第一卡盘。 衬底通常包括至少一个半导体层。 第一卡盘通常是可用于第一曝光工具的多个卡盘之一。 该方法还可以包括识别在基板上的第二材料层的当前光刻曝光中使用的第二曝光工具和第二卡盘。 在一个实施例中,可以使用特定于所识别的第一曝光工具,第一卡盘,第二曝光工具和第二卡盘中的每一个的对准校正信息,以将半导体基板对准第二曝光工具和第二卡盘。 在一个实施例中,这种方法可以补偿由第​​一和第二曝光工具之间,第一和第二卡盘之间或第一和第二曝光工具之间以及第一和第二卡盘之间的差异引起的对准误差。
    • 30. 发明授权
    • Omni-protocol engine for reconfigurable bit-stream processing in high-speed networks
    • 全速协议引擎,用于高速网络中的可重新配置的位流处理
    • US07782873B2
    • 2010-08-24
    • US11466367
    • 2006-08-22
    • Viswa SharmaRoger HolschbachBart StuckWilliam Chu
    • Viswa SharmaRoger HolschbachBart StuckWilliam Chu
    • H04L12/56
    • H04L69/18H04L69/12
    • A reconfigurable, protocol indifferent bit stream-processing engine, and related systems and data communication methodologies, are adapted to achieve the goal of providing inter-fabric interoperability among high-speed networks operating a speeds of at least 10 gigabits per second. The bit-stream processing engine operates as an omni-protocol, multi-stage processor that can be configured with appropriate switches and related network elements to create a seamless network fabric that permits interoperability not only among existing communication protocols, but also with the ability to accommodate future communication protocols. The method and systems of the present invention are applicable to networks that include storage networks, communication networks and processor networks.
    • 可重新配置的协议无关位流处理引擎以及相关的系统和数据通信方法适用于实现运行速度至少为每秒10吉比特的高速网络之间的架构间互操作性的目标。 位流处理引擎作为一种全方位协议的多级处理器,可以配置适当的交换机和相关的网络元件,以创建无缝网络结构,不仅可以在现有的通信协议之间实现互操作,而且能够 适应未来的通信协议。 本发明的方法和系统适用于包括存储网络,通信网络和处理器网络的网络。