专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

21. 发明授权

US08736814B2 Lithography wave-front control system and method 有权
标题翻译：光刻波前控制系统及方法
公开(公告)号：US08736814B2
公开(公告)日：2014-05-27
申请号：US13159245
申请日：2011-06-13
申请人： Yuan He , Jianming Zhou , Scott L. Light , Anton deVilliers , Kaveri Jain , Zishu Zhang , Dan Millward
发明人： Yuan He , Jianming Zhou , Scott L. Light , Anton deVilliers , Kaveri Jain , Zishu Zhang , Dan Millward
IPC分类号： G03B27/54 , G03B27/32 , G03F7/20
CPC分类号： G02B26/06 , G03F7/70091 , G03F7/70125 , G03F7/70258 , G03F7/70308 , G03F7/705 , G03F7/706
摘要： Some embodiments include system and methods to obtain information for adjusting variations in features formed on a substrate of a semiconductor device. Such methods can include determining a first pupil in an illumination system used to form a first feature, and determining a second pupil used to form a second feature. The methods can also include determining a pupil portion belonging to only one of the pupils, and generating a modified pupil portion from the pupil portion. Information associated with the modified pupil portion can be obtained for controlling a portion of a projection lens assembly of an illumination system. Other embodiments are described.
摘要翻译：一些实施例包括用于获得用于调整形成在半导体器件的衬底上的特征的变化的信息的系统和方法。这样的方法可以包括确定用于形成第一特征的照明系统中的第一光瞳，以及确定用于形成第二特征的第二光瞳。所述方法还可以包括确定属于仅一个瞳孔的瞳孔部分，并且从瞳孔部分产生修改的瞳孔部分。可以获得与修改的瞳孔部分相关联的信息，用于控制照明系统的投影透镜组件的一部分。描述其他实施例。

22. 发明授权

US08625078B2 Illumination design for lens heating mitigation 有权
标题翻译：镜头加热减轻的照明设计
公开(公告)号：US08625078B2
公开(公告)日：2014-01-07
申请号：US13080666
申请日：2011-04-06
申请人： Jianming Zhou , Scott Light , Dan Millward , Yuan He , Kaveri Jain , Lijing Gou , Zishu Zhang , Anton DeVilliers , Michael Hyatt
发明人： Jianming Zhou , Scott Light , Dan Millward , Yuan He , Kaveri Jain , Lijing Gou , Zishu Zhang , Anton DeVilliers , Michael Hyatt
IPC分类号： G03B27/32 , G03B27/52
CPC分类号： G03F7/70891 , G03F7/70125
摘要： A method for reducing the effects of lens heating of a lens in an imaging process includes determining heat load locations on the lens according to an illumination source and a reticle design, obtaining a lens response characterization according to the heat load locations, and utilizing the heat load locations and the lens response characterization to generate a lens heating sensitivity map.
摘要翻译：在成像过程中减少透镜加热效果的方法包括根据照明源和掩模版设计确定透镜上的热负荷位置，根据热负荷位置获得透镜响应特性，并利用热量加载位置和镜头响应表征以产生透镜加热灵敏度图。

23. 发明授权

US08440371B2 Imaging devices, methods of forming same, and methods of forming semiconductor device structures 有权
标题翻译：成像装置，其形成方法以及形成半导体器件结构的方法
公开(公告)号：US08440371B2
公开(公告)日：2013-05-14
申请号：US12986836
申请日：2011-01-07
申请人： Yuan He , Kaveri Jain , Lijing Gou , Zishu Zhang , Anton J. DeVilliers , Michael Hyatt , Jianming Zhou , Scott Light , Dan B. Millward
发明人： Yuan He , Kaveri Jain , Lijing Gou , Zishu Zhang , Anton J. DeVilliers , Michael Hyatt , Jianming Zhou , Scott Light , Dan B. Millward
IPC分类号： G03F1/36
CPC分类号： G03F1/38 , G03F1/50 , G03F1/54 , Y10T29/49002
摘要： An imaging device comprising at least one array pattern region and at least one attenuation region. A plurality of imaging features in the at least one array pattern region and a plurality of assist features in the at least one attenuation region are substantially the same size as one another and are formed substantially on pitch. Methods of forming an imaging device and methods of forming a semiconductor device structure are also disclosed.
摘要翻译：一种成像装置，包括至少一个阵列图案区域和至少一个衰减区域。所述至少一个阵列图案区域中的多个成像特征和所述至少一个衰减区域中的多个辅助特征基本上彼此相同，并且基本上形成为间距。还公开了形成成像装置的方法和形成半导体器件结构的方法。

24. 发明申请

US20120052416A1 Reticles, And Methods Of Mitigating Asymmetric Lens Heating In Photolithography 有权
标题翻译：网格和减轻光刻中不对称透镜加热的方法
公开(公告)号：US20120052416A1
公开(公告)日：2012-03-01
申请号：US12862524
申请日：2010-08-24
申请人： Scott L. Light , Dan Millward , Yuan He , Kaveri Jain , Lijing Gou , Zishu Zhang , Anton de Viiliers , Michael Hyatt , Jianming Zhou
发明人： Scott L. Light , Dan Millward , Yuan He , Kaveri Jain , Lijing Gou , Zishu Zhang , Anton de Viiliers , Michael Hyatt , Jianming Zhou
IPC分类号： G03F1/00
CPC分类号： G03F7/70741 , G03F1/38 , G03F7/70433 , G03F7/70891
摘要： A method of mitigating asymmetric lens heating in photolithographically patterning a photo-imagable material using a reticle includes determining where first hot spot locations are expected to occur on a lens when using a reticle to pattern a photo-imagable material. The reticle is then fabricated to include non-printing features within a non-printing region of the reticle which generate additional hot spot locations on the lens when using the reticle to pattern the photo-imagable material. Other implementations are contemplated, including reticles which may be independent of method of use or fabrication.
摘要翻译：减轻非对称透镜加热的方法是使用光罩光刻地图案化可光成像的材料，包括确定在使用掩模版图案化可成像材料时期望第一热点位置在透镜上发生的位置。然后制造掩模版以在掩模版的非打印区域内包括非打印特征，当使用掩模版来图案化可光成像材料时，在透镜上产生额外的热点位置。考虑了其他实施方式，包括可以独立于使用或制造方法的标线。

25. 发明申请

US20160229710A1 Cutting Fluid Processing Device 审中-公开
标题翻译：切削液加工装置
公开(公告)号：US20160229710A1
公开(公告)日：2016-08-11
申请号：US15016481
申请日：2016-02-05
申请人： Yuan He , Xiaokun He
发明人： Yuan He , Xiaokun He
IPC分类号： C02F1/32 , B23Q11/10
CPC分类号： C02F1/325 , B23Q11/1069 , C02F2103/16 , C02F2201/3223 , C02F2303/24
摘要： A cutting fluid processing device for recycling used cutting fluid. The cutting fluid processing device includes a container having a hollow interior volume, a fluid inlet, and a fluid outlet. The container includes an ultraviolet light source therein, wherein the ultraviolet light source is adapted to sanitize the cutting fluid by killing bacteria therein. The container further includes a waste outlet for removing contaminants from the container. The container further includes a filter for use in separating contaminants or particulates from the cutting fluid prior to escaping the container via the fluid outlet. Thus, the cutting fluid processing device allows cutting fluid to be treated so that it can be reused.
摘要翻译：一种用于再循环使用的切削液的切削液处理装置。切削液处理装置包括具有中空内部容积的容器，流体入口和流体出口。容器中包括紫外光源，其中紫外光源适于通过杀死切割液来消毒切割液。容器还包括用于从容器中除去污染物的废物出口。容器还包括用于在经由流体出口逸出容器之前从切削液中分离污染物或微粒的过滤器。因此，切削液处理装置允许切削液被处理以使其可以重复使用。

26. 发明申请

US20130288167A1 Methods Of Correcting For Variation Across Substrates During Photolithography 有权
标题翻译：在光刻期间校正跨基板的变化的方法
公开(公告)号：US20130288167A1
公开(公告)日：2013-10-31
申请号：US13460765
申请日：2012-04-30
申请人： Yuan He , Scott L. Light , Tim H. Bossart
发明人： Yuan He , Scott L. Light , Tim H. Bossart
IPC分类号： G03F7/20
CPC分类号： G03F7/70141 , G03F7/70616
摘要： Some embodiments include methods for correcting for variation across substrates. A difference map is created to indicate differences between a desired pattern that is to be formed across the substrates utilizing photolithographic processing and a signature pattern representing the actual pattern formed with an initial setting of illumination optics. Modifications to the illumination optics are determined for improving problematic regions identified in the difference map, and the illumination optics are then modified. Substrates are photolithographically processed utilizing the modified illumination optics.
摘要翻译：一些实施例包括用于校正跨衬底的变化的方法。创建差异图以表示使用光刻处理在待形成的基板之间的差异以及表示利用照明光学元件的初始设置形成的实际图案的签名图案之间的差异。确定对照明光学器件的修改以改善在差异图中识别的有问题的区域，然后修改照明光学器件。使用改进的照明光学器件对基片进行光刻处理。

27. 发明授权

US08486611B2 Semiconductor constructions and methods of forming patterns 有权
标题翻译：半导体结构和形成图案的方法
公开(公告)号：US08486611B2
公开(公告)日：2013-07-16
申请号：US12836495
申请日：2010-07-14
申请人： Dan Millward , Kaveri Jain , Zishu Zhang , Lijing Gou , Anton de Villiers , Jianming Zhou , Yuan He , Michael Hyatt , Scott L. Light
发明人： Dan Millward , Kaveri Jain , Zishu Zhang , Lijing Gou , Anton de Villiers , Jianming Zhou , Yuan He , Michael Hyatt , Scott L. Light
IPC分类号： G03F7/26
CPC分类号： H01L21/76879 , H01L21/0337 , H01L21/31144 , H01L21/76816 , H01L27/0207 , H01L27/105 , H01L27/1052 , H01L27/10882 , H01L27/10888
摘要： Some embodiments include methods of forming patterns. A semiconductor substrate is formed to comprise an electrically insulative material over a set of electrically conductive structures. An interconnect region is defined across the electrically conductive structures, and regions on opposing sides of the interconnect region are defined as secondary regions. A two-dimensional array of features is formed over the electrically insulative material. The two-dimensional array extends across the interconnect region and across the secondary regions. A pattern of the two-dimensional array is transferred through the electrically insulative material of the interconnect region to form contact openings that extend through the electrically insulative material and to the electrically conductive structures, and no portions of the two-dimensional array of the secondary regions is transferred into the electrically insulative material.
摘要翻译：一些实施例包括形成图案的方法。半导体衬底被形成为在一组导电结构之上包括电绝缘材料。跨导电结构限定互连区域，并且互连区域的相对侧上的区域被定义为次级区域。特征的二维阵列形成在电绝缘材料上。二维阵列跨越互连区域并跨越次级区域延伸。二维阵列的图案通过互连区域的电绝缘材料转移以形成延伸穿过电绝缘材料和导电结构的接触开口，并且二次区域的二维阵列的任何部分被转移到电绝缘材料中。

28. 发明申请

US20120288203A1 METHOD AND DEVICE FOR ACQUIRING KEYWORDS 审中-公开
标题翻译：获取关键词的方法和设备
公开(公告)号：US20120288203A1
公开(公告)日：2012-11-15
申请号：US13466538
申请日：2012-05-08
申请人： Yifeng PAN , Jun Sun , Yuanping Zhu , Pan Pan , Yuan He , Satoshi Naoi
发明人： Yifeng PAN , Jun Sun , Yuanping Zhu , Pan Pan , Yuan He , Satoshi Naoi
IPC分类号： G06K9/46
CPC分类号： G06K9/2054 , G06F16/5846 , G06K2209/01
摘要： Locating text areas in an image and recognizing text contents in the text areas through optical character recognition, OCR; selecting a first class of pending keywords from the recognized text contents to search for webpages; extracting a second class of pending keywords from the retrieved webpages; and determining one or more keywords corresponding to the image from at least the second class of pending keywords. With the embodiment, both OCR and webpage searching can be combined so that the webpages can be retrieved based upon the first class of pending keywords recognized and selected through OCR to ensure convergence of the keywords and then the second class of pending keywords can be selected from the retrieved webpages to ensure correctness of the keywords.
摘要翻译：在图像中定位文本区域，并通过光学字符识别OCR识别文本区域中的文本内容; 从识别的文本内容中选择一类待处理的关键字来搜索网页; 从检索的网页中提取第二类待处理的关键字; 以及从至少所述第二类未决关键字确定与所述图像相对应的一个或多个关键字。利用该实施例，可以组合OCR和网页搜索，使得可以基于通过OCR识别和选择的第一类未决关键字来检索网页，以确保关键字的收敛，然后可以从第检索的网页以确保关键字的正确性。

29. 发明申请

US20120038895A1 LENS HEATING COMPENSATION IN PHOTOLITHOGRAPHY 有权
标题翻译：透镜加热补偿
公开(公告)号：US20120038895A1
公开(公告)日：2012-02-16
申请号：US12857316
申请日：2010-08-16
申请人： Yuan He , Kaveri Jain , Lijing Gou , Zishu Zhang , Anton deVilliers , Michael Hyatt , Jianming Zhou , Scott Light , Dan Millward
发明人： Yuan He , Kaveri Jain , Lijing Gou , Zishu Zhang , Anton deVilliers , Michael Hyatt , Jianming Zhou , Scott Light , Dan Millward
IPC分类号： G03B27/54 , G03B27/32
CPC分类号： G03F7/70116 , G03F7/70891
摘要： Photolithographic apparatus and methods are disclosed. One such apparatus includes an optical path configured to provide a first diffraction pattern in a portion of an optical system and to provide a second diffraction pattern to the portion of the optical system after providing the first diffraction pattern. Meanwhile, one such method includes providing a first diffraction pattern onto a portion of an optical system, wherein a semiconductor article is imaged using the first diffraction pattern. A second diffraction pattern is also provided onto the portion of the optical system, but the second diffraction pattern is not used to image the semiconductor article.
摘要翻译：公开了光刻设备和方法。一种这样的设备包括光路，其被配置为在光学系统的一部分中提供第一衍射图案，并且在提供第一衍射图案之后，向光学系统的部分提供第二衍射图案。同时，一种这样的方法包括在光学系统的一部分上提供第一衍射图案，其中半导体制品使用第一衍射图案成像。第二衍射图案也提供到光学系统的部分上，但是第二衍射图案不用于对半导体制品进行成像。

30. 发明授权

US07873183B2 Embedding and detecting watermarks based on embedded positions in document layout 失效
标题翻译：基于文档布局中的嵌入位置嵌入和检测水印
公开(公告)号：US07873183B2
公开(公告)日：2011-01-18
申请号：US12603057
申请日：2009-10-21
申请人： Yuan He , Lin Luo , Ming Su , Ling Shao , Zhe Xiang
发明人： Yuan He , Lin Luo , Ming Su , Ling Shao , Zhe Xiang
IPC分类号： G06K9/00
CPC分类号： G06T1/0028 , G06F17/212 , G06T2201/0051 , G06T2201/0062 , H04K1/00 , H04L9/3236 , H04L2209/16 , H04L2209/608
摘要： A watermark embedding method for embedding a secret message sequence in a document. The techniques include obtaining layout information of the document, extracting a digest of the document by using a Hash function, calculating embedded positions where the secret message sequence is embedded in the document, and dispersedly hiding the secret message sequence in each of the calculated embedded positions by altering the layout of the document. Also provided is a watermark embedding apparatus, a corresponding watermark detecting method and apparatus, and a method and system for detecting document integrity. The integrity of documents in various forms can be detected, and secret information to be hidden can be embedded therein and extracted therefrom. The techniques described are not limited to the document either in soft copy or in hard copy and have good robustness.
摘要翻译：一种用于在文档中嵌入秘密消息序列的水印嵌入方法。这些技术包括获取文档的布局信息，通过使用散列函数提取文档的摘要，计算秘密消息序列嵌入在文档中的嵌入位置，以及分散地隐藏每个计算的嵌入位置中的秘密消息序列通过更改文档的布局。还提供了水印嵌入装置，相应的水印检测方法和装置，以及用于检测文档完整性的方法和系统。可以检测各种形式的文件的完整性，并且可以将隐藏的秘密信息嵌入其中并从中提取。所描述的技术不限于软拷贝或硬拷贝中的文档，并且具有良好的鲁棒性。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式