会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 22. 发明授权
    • Monomeric compounds
    • 单体化合物
    • US3993684A
    • 1976-11-23
    • US385483
    • 1973-08-03
    • William R. DunnavantEdward M. HarrisPhilip F. KurzRichard A. MarkleEdward H. Parker
    • William R. DunnavantEdward M. HarrisPhilip F. KurzRichard A. MarkleEdward H. Parker
    • C07C51/353C07C51/60C08F20/28G03F7/038C07C101/46
    • G03F7/0388C07C51/353C07C51/60C08F20/28
    • Photosensitive homopolymers and substantially non-crosslinked copolymers containing the recurring unit: ##EQU1## R.sub.1 may be substituted or unsubstituted alkylene, aralkylene, alkoxyalkylene or aryloxyalkylene. R.sub.2 is a substituted or unsubstituted aryl group or heterocyclic group having aromatic character. R.sub.3, R.sub.4, and R.sub.5 are hydrogen, halogen or lower alkyl. R.sub.6 and R.sub.7 may be hydrogen, halogen, nitro, lower alkyl, phenyl, substituted phenyl, phenoxy and lower alkoxy. Lithographic plates bearing these photosensitive polymers can be stored without deterioration for extended periods prior to exposure, and produce highly abrasion resistant plates on being exposed. The photosensitive polymers of the invention are preferably produced by homopolymerization of novel monomers having the general formula ##EQU2## where R.sub.1 .sub.' is alkylene, haloalkylene, alkoxyalkylene, aminoalkylene, cycloalkylene, aralkylene, cycloalkylalkylene, cyanoalkylene, and aryloxyalkylene, and R.sub.2, R.sub.3, R.sub.4, R.sub.5, R.sub.6, and R.sub.7 are as defined above; and by copolymerization of these monomers with one or more ethylenically unsaturated comonomers. Methods of preparing the photopolymers and the novel monomers are also disclosed, as are methods of preparing and exposing plates bearing the polymers.
    • 含有重复单元的光敏均聚物和基本上非交联的共聚物:R 5 R 3 || C -C- || O = CR 4 | O | R 1 | OR 6 R 7 || O = CC = C-R 2可以是取代或未取代的亚烷基, 烷氧基亚烷基或芳氧基亚烷基。 R2是具有芳香性质的取代或未取代的芳基或杂环基。 R3,R4和R5是氢,卤素或低级烷基。 R 6和R 7可以是氢,卤素,硝基,低级烷基,苯基,取代的苯基,苯氧基和低级烷氧基。 携带这些感光性聚合物的平版印刷版可以在曝光之前长时间保存而不变质,并在曝光时产生高耐磨性的板。 本发明的光敏聚合物优选通过使具有通式R 5 R 3的新单体的均聚来制备,其中R1'为C = C | O = CR4 | O | R1'| OR6R7 || O = CC = 亚烷基,亚烷基,亚烷基,亚芳基,环烷基亚烷基,氰基亚烷基和芳氧基亚烷基,R2,R3,R4,R5,R6和R7如上定义; 并通过这些单体与一种或多种烯键式不饱和共聚单体的共聚合。 还公开了制备光聚合物和新单体的方法,以及制备和暴露带有聚合物的板的方法。