专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

21. 发明授权

US07570345B2 Method of optimizing imaging performance 有权
标题翻译：优化成像性能的方法
公开(公告)号：US07570345B2
公开(公告)日：2009-08-04
申请号：US11808316
申请日：2007-06-08
申请人： Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Ulrich Wegmann
发明人： Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Ulrich Wegmann
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70191 , G03B27/52 , G03F7/70216
摘要： A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system includes an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method involves setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.
摘要翻译：提供一种优化投影曝光系统的成像性能的方法，其中投影曝光系统包括用于照亮图案形成结构的照明光学系统和用于将照射的图案形成结构的区域成像到相应场上的投影光学系统。该方法包括将场设置为第一曝光场，将投影曝光系统的光学参数设置为第一设置，使得第一曝光区域内的成像性能是第一最佳性能，将场改为第二曝光场，以及将光学参数改变为第二设置，使得第二曝光区域内的成像性能是第二最佳性能。

22. 发明申请

US20080036982A1 Method For Structuring A Substrate Using Multiple Exposure 审中-公开
标题翻译：使用多重曝光构造基板的方法
公开(公告)号：US20080036982A1
公开(公告)日：2008-02-14
申请号：US11547909
申请日：2005-04-11
申请人： Ulrich Wegmann , Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Aksel Goehnermeier
发明人： Ulrich Wegmann , Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Aksel Goehnermeier
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70466 , G03F7/2022 , G03F7/70258 , G03F7/70266 , G03F7/706
摘要： 1. Method for patterning a substrate using multiple exposure.2.1. The invention relates to a method for patterning a substrate using exposure processes of an adjustable optical system, a multiple exposure being used for producing a structure image on the substrate.2.2. According to the invention, for at least one of the plurality of exposures, the imaging quality of the optical system is determined by means of a respective measurement step and at least one parameter of the optical system that influences the imaging quality is set depending on this.2.3. Use e.g. for the patterning of semiconductor wafers in microlithography projection exposure apparatuses.
摘要翻译： 1.使用多次曝光来图案化衬底的方法。 2.1。本发明涉及使用可调节光学系统的曝光工艺对衬底进行图案化的方法，多次曝光用于在衬底上产生结构图像。 2.2。根据本发明，对于多个曝光中的至少一个，通过相应的测量步骤确定光学系统的成像质量，并且根据这一点设置影响成像质量的光学系统的至少一个参数。 2.3。使用例如用于微光刻投影曝光设备中的半导体晶片的图案化。

23. 发明申请

US20080007706A1 Method of optimizing imaging performance 有权
标题翻译：优化成像性能的方法
公开(公告)号：US20080007706A1
公开(公告)日：2008-01-10
申请号：US11808316
申请日：2007-06-08
申请人： Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Ulrich Wegmann
发明人： Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Ulrich Wegmann
IPC分类号： G03B27/54
CPC分类号： G03F7/70191 , G03B27/52 , G03F7/70216
摘要： A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system includes an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method involves setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.
摘要翻译：提供一种优化投影曝光系统的成像性能的方法，其中投影曝光系统包括用于照亮图案形成结构的照明光学系统和用于将照射的图案形成结构的区域成像到相应场上的投影光学系统。该方法包括将场设置为第一曝光场，将投影曝光系统的光学参数设置为第一设置，使得第一曝光区域内的成像性能是第一最佳性能，将场改为第二曝光场，以及将光学参数改变为第二设置，使得第二曝光区域内的成像性能是第二最佳性能。

24. 发明授权

US07209292B2 Projection objective, especially for microlithography, and method for adjusting a projection objective 有权
标题翻译：投影目标，特别是微光刻法，以及调整投影物镜的方法
公开(公告)号：US07209292B2
公开(公告)日：2007-04-24
申请号：US10448339
申请日：2003-05-30
申请人： Alexander Epple , Paul Graeupner , Winfried Kaiser , Reiner Garreis , Wilhelm Ulrich
发明人： Alexander Epple , Paul Graeupner , Winfried Kaiser , Reiner Garreis , Wilhelm Ulrich
IPC分类号： G02B3/00 , G02B15/02 , G02B27/02
CPC分类号： G03F7/70308 , G03F7/70258 , G03F7/70341
摘要： A method of adjusting a projection objective permits the projection objective to be adjusted between an immersion configuration and a dry configuration. The projection objective includes optical elements arranged along an optical axis thereof, which include a first group of elements following the object plane and a last optical element following the first group, which is arranged near the image plane. The last optical element defines an exit surface of the projection objective, which is arranged at a working distance from the image plane. The last optical element is substantially without refracting power and has no or only slight curvature. The method includes varying the thickness of the last optical element, changing the refractive index of the space between the exit surface and the image plane by introducing or removing an immersion medium, and axially displacing the last optical element to set a working distance.
摘要翻译：调整投影物镜的方法允许在浸入构型和干构型之间调节投影物镜。投影物镜包括沿其光轴布置的光学元件，其包括在物平面之后的第一组元件和位于第一组之后的最后一个光学元件，其位于图像平面附近。最后一个光学元件限定投影物镜的出射表面，该出射表面设置在距离像平面的工作距离处。最后的光学元件基本上没有屈光力并且没有或仅有微小的曲率。该方法包括通过引入或去除浸没介质来改变最后一个光学元件的厚度，改变出射表面和图像平面之间的空间的折射率，以及轴向移动最后一个光学元件以设定工作距离。

25. 发明授权

US07209241B2 Method for determining wavefront aberrations 有权
标题翻译：用于确定波前像差的方法
公开(公告)号：US07209241B2
公开(公告)日：2007-04-24
申请号：US11389053
申请日：2006-03-27
申请人： Wolfgang Emer , Paul Graeupner
发明人： Wolfgang Emer , Paul Graeupner
IPC分类号： G01B11/02 , G01B9/02
CPC分类号： G01M11/0242 , G01M11/0278 , G02B27/0025 , G03F7/706
摘要： In a method for manufacturing an optical imaging system, wavefront aberrations caused by an optical imaging system are determined before and after transporting the optical imaging system. At least some of the aberration parameters which are determined in the preceding determination are used as a given precondition for determining aberration parameters in the subsequent determination. This results in a hybrid method, in which the strength of at least two measurement methods are used in a combined form, and specific weaknesses of any one method are avoided.
摘要翻译：在用于制造光学成像系统的方法中，在传输光学成像系统之前和之后确定由光学成像系统引起的波前像差。将在先前确定中确定的至少一些像差参数用作用于在后续确定中确定像差参数的给定前提条件。这导致混合方法，其中以组合的形式使用至少两种测量方法的强度，并且避免了任何一种方法的特定弱点。

26. 发明申请

US20050264780A1 Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus 有权
标题翻译：一种用于改善微光刻投影曝光装置的投影物镜的光学成像特性的方法
公开(公告)号：US20050264780A1
公开(公告)日：2005-12-01
申请号：US11149568
申请日：2005-06-10
申请人： Paul Graeupner
发明人： Paul Graeupner
IPC分类号： G03F7/20 , G03B27/42
CPC分类号： G03F7/70341 , G03F7/70258 , G03F7/706 , G03F7/70891
摘要： A method is disclosed for improving an optical imaging property, for example spherical aberration or the focal length, of a projection objective of a microlithographic projection exposure apparatus. First, an immersion liquid is introduced into an interspace between a photosensitive surface and an end face of the projection objective. Then an imaging property of the projection objective is determined, for example using an interferometer or a CCD sensor arranged in an image plane of the projection objective. This imaging property is compared with a target imaging property. Finally, the temperature of the immersion liquid is changed until the determined imaging property is as close as possible to the target imaging property.
摘要翻译：公开了一种用于改善微光刻投影曝光装置的投影物镜的光学成像特性，例如球面像差或焦距的方法。首先，将浸没液体引入到投影物镜的感光表面和端面之间的间隙中。然后，例如使用布置在投影物镜的像平面中的干涉仪或CCD传感器来确定投影物镜的成像特性。将该成像特性与目标成像特性进行比较。最后，改变浸没液的温度，直到所确定的成像特性尽可能接近于目标成像特性。

27. 发明申请

US20050237506A1 Method of optimizing imaging performance 有权
标题翻译：优化成像性能的方法
公开(公告)号：US20050237506A1
公开(公告)日：2005-10-27
申请号：US11102835
申请日：2005-04-11
申请人： Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Ulrich Wegmann
发明人： Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Ulrich Wegmann
IPC分类号： G03B27/52 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70191 , G03B27/52 , G03F7/70216
摘要： A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system comprises an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method comprises setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.
摘要翻译：提供一种优化投影曝光系统的成像性能的方法，其中投影曝光系统包括用于照亮图案形成结构的照明光学系统和用于将照射的图案形成结构的区域成像到相应场上的投影光学系统。该方法包括将场设置为第一曝光场，将投影曝光系统的光学参数设置为第一设置，使得第一曝光区域内的成像性能是第一最佳性能，将场改为第二曝光场，以及将光学参数改变为第二设置，使得第二曝光区域内的成像性能是第二最佳性能。

28. 发明申请

US20130114056A1 METHOD FOR IMPROVING AN OPTICAL IMAGING PROPERTY OF A PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：改进微观投影曝光装置的投影目标的光学成像性能的方法
公开(公告)号：US20130114056A1
公开(公告)日：2013-05-09
申请号：US13564857
申请日：2012-08-02
申请人： Paul Graeupner
发明人： Paul Graeupner
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70258 , G03F7/706 , G03F7/70891
摘要： A method is disclosed for improving an optical imaging property, for example spherical aberration or the focal length, of a projection objective of a microlithographic projection exposure apparatus. First, an immersion liquid is introduced into an interspace between a photosensitive surface and an end face of the projection objective. Then an imaging property of the projection objective is determined, for example using an interferometer or a CCD sensor arranged in an image plane of the projection objective. This imaging property is compared with a target imaging property. Finally, the temperature of the immersion liquid is changed until the determined imaging property is as close as possible to the target imaging property.
摘要翻译：公开了一种用于改善微光刻投影曝光装置的投影物镜的光学成像特性，例如球面像差或焦距的方法。首先，将浸没液体引入到投影物镜的感光表面和端面之间的间隙中。然后，例如使用布置在投影物镜的像平面中的干涉仪或CCD传感器来确定投影物镜的成像特性。将该成像特性与目标成像特性进行比较。最后，改变浸没液的温度，直到所确定的成像特性尽可能接近于目标成像特性。

29. 发明授权

US08405907B2 Method for correcting optical proximity effects 有权
标题翻译：光学邻近效应校正方法
公开(公告)号：US08405907B2
公开(公告)日：2013-03-26
申请号：US13230191
申请日：2011-09-12
申请人： Paul Graeupner
发明人： Paul Graeupner
IPC分类号： G02B5/18
CPC分类号： G03F7/70441 , G03F1/36 , G03F7/70283 , G03F7/70308
摘要： A system and associated method employ a first projection objective including at least one optical proximity correction (OPC) filter with a filter function adapted to a particular pattern. The first projection objective has at least essentially the same imaging properties as a second projection objective in the system, for the particular pattern, to which the filter function of the optical proximity correction (OPC) filter is adapted. The first projection objective differs from the second projection objective with respect to optical imaging properties for the particular pattern when the optical proximity correction (OPC) filter is not present in the first projection objective.
摘要翻译：系统和相关联的方法采用包括具有适于特定图案的滤波器功能的至少一个光学邻近校正（OPC）滤波器的第一投影物镜。对于特定图案，第一投影物镜至少具有与系统中的第二投影物镜基本相同的成像特性，光学邻近校正（OPC）滤镜的滤镜功能适用于该特定图案。当光学邻近校正（OPC）滤波器不存在于第一投影物镜中时，第一投影物镜与第二投影物镜相对于特定图案的光学成像特性不同。

30. 发明授权

US08027091B2 Method for correcting optical proximity effects 有权
标题翻译：光学邻近效应校正方法
公开(公告)号：US08027091B2
公开(公告)日：2011-09-27
申请号：US11750547
申请日：2007-05-18
申请人： Paul Graeupner
发明人： Paul Graeupner
IPC分类号： G02B5/18
CPC分类号： G03F7/70441 , G03F1/36 , G03F7/70283 , G03F7/70308
摘要： In a method for correcting optical proximity effects (Optical Proximity Correction, OPC) when imaging a pattern, arranged in the object surface of a projection objective, into the image surface of the projection objective with the aid of a projection objective, a multiplicity of optical elements and at least one pupil surface that is Fourier-transformed to the image surface are arranged between the object surface and the image surface. An optical filtering of the light used for the imaging is carried out with the aid of at least one OPC filter inserted between the object surface and the image surface in accordance with an OPC filter function that is adapted to the pattern and corresponds to a spatially dependent transmission filtering in the region of the pupil surface of the imaging system. The profile of the pupil transmission function is adapted with the aid of the OPC filter to the pattern, characterized by the position of diffraction orders, of the mask such that there is respectively present for all the diffraction orders contributing to the imaging an optimized pupil transmission which leads to a minimization of line width variations, dependent on line density, in the image surface.
摘要翻译：在利用投影物镜将配置在投影物镜的物体表面上的图案成像的图案中的光学邻近效应（Optical Proximity Correction，OPC）的校正方法中，多个光学元件和被傅里叶变换到图像表面的至少一个瞳孔表面被布置在物体表面和图像表面之间。借助于至少一个插入在物体表面和图像表面之间的OPC滤光器，根据适合该图案的OPC滤光片功能，对用于成像的光进行光学滤光，并对应于空间上依赖的在成像系统的瞳孔表面的区域中进行透射滤波。瞳孔传递函数的轮廓通过OPC滤波器适应于掩模的衍射级的位置，其特征在于分别存在有助于成像的所有衍射级，优化的光瞳传输这导致在图像表面中取决于线密度的线宽变化的最小化。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式