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1. 发明申请

US20080036982A1 Method For Structuring A Substrate Using Multiple Exposure 审中-公开
标题翻译：使用多重曝光构造基板的方法
公开(公告)号：US20080036982A1
公开(公告)日：2008-02-14
申请号：US11547909
申请日：2005-04-11
申请人： Ulrich Wegmann , Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Aksel Goehnermeier
发明人： Ulrich Wegmann , Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Aksel Goehnermeier
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70466 , G03F7/2022 , G03F7/70258 , G03F7/70266 , G03F7/706
摘要： 1. Method for patterning a substrate using multiple exposure.2.1. The invention relates to a method for patterning a substrate using exposure processes of an adjustable optical system, a multiple exposure being used for producing a structure image on the substrate.2.2. According to the invention, for at least one of the plurality of exposures, the imaging quality of the optical system is determined by means of a respective measurement step and at least one parameter of the optical system that influences the imaging quality is set depending on this.2.3. Use e.g. for the patterning of semiconductor wafers in microlithography projection exposure apparatuses.
摘要翻译： 1.使用多次曝光来图案化衬底的方法。 2.1。本发明涉及使用可调节光学系统的曝光工艺对衬底进行图案化的方法，多次曝光用于在衬底上产生结构图像。 2.2。根据本发明，对于多个曝光中的至少一个，通过相应的测量步骤确定光学系统的成像质量，并且根据这一点设置影响成像质量的光学系统的至少一个参数。 2.3。使用例如用于微光刻投影曝光设备中的半导体晶片的图案化。

2. 发明授权

US07233386B2 Method of optimizing imaging performance 有权
标题翻译：优化成像性能的方法
公开(公告)号：US07233386B2
公开(公告)日：2007-06-19
申请号：US11102835
申请日：2005-04-11
申请人： Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Ulrich Wegmann
发明人： Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Ulrich Wegmann
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70191 , G03B27/52 , G03F7/70216
摘要： A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system includes an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method involves setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.
摘要翻译：提供一种优化投影曝光系统的成像性能的方法，其中投影曝光系统包括用于照亮图案形成结构的照明光学系统和用于将照射的图案形成结构的区域成像到相应场上的投影光学系统。该方法包括将场设置为第一曝光场，将投影曝光系统的光学参数设置为第一设置，使得第一曝光区域内的成像性能是第一最佳性能，将场改为第二曝光场，以及将光学参数改变为第二设置，使得第二曝光区域内的成像性能是第二最佳性能。

3. 发明授权

US07570345B2 Method of optimizing imaging performance 有权
标题翻译：优化成像性能的方法
公开(公告)号：US07570345B2
公开(公告)日：2009-08-04
申请号：US11808316
申请日：2007-06-08
申请人： Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Ulrich Wegmann
发明人： Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Ulrich Wegmann
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70191 , G03B27/52 , G03F7/70216
摘要： A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system includes an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method involves setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.
摘要翻译：提供一种优化投影曝光系统的成像性能的方法，其中投影曝光系统包括用于照亮图案形成结构的照明光学系统和用于将照射的图案形成结构的区域成像到相应场上的投影光学系统。该方法包括将场设置为第一曝光场，将投影曝光系统的光学参数设置为第一设置，使得第一曝光区域内的成像性能是第一最佳性能，将场改为第二曝光场，以及将光学参数改变为第二设置，使得第二曝光区域内的成像性能是第二最佳性能。

4. 发明申请

US20080007706A1 Method of optimizing imaging performance 有权
标题翻译：优化成像性能的方法
公开(公告)号：US20080007706A1
公开(公告)日：2008-01-10
申请号：US11808316
申请日：2007-06-08
申请人： Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Ulrich Wegmann
发明人： Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Ulrich Wegmann
IPC分类号： G03B27/54
CPC分类号： G03F7/70191 , G03B27/52 , G03F7/70216
摘要： A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system includes an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method involves setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.
摘要翻译：提供一种优化投影曝光系统的成像性能的方法，其中投影曝光系统包括用于照亮图案形成结构的照明光学系统和用于将照射的图案形成结构的区域成像到相应场上的投影光学系统。该方法包括将场设置为第一曝光场，将投影曝光系统的光学参数设置为第一设置，使得第一曝光区域内的成像性能是第一最佳性能，将场改为第二曝光场，以及将光学参数改变为第二设置，使得第二曝光区域内的成像性能是第二最佳性能。

5. 发明申请

US20050237506A1 Method of optimizing imaging performance 有权
标题翻译：优化成像性能的方法
公开(公告)号：US20050237506A1
公开(公告)日：2005-10-27
申请号：US11102835
申请日：2005-04-11
申请人： Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Ulrich Wegmann
发明人： Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Ulrich Wegmann
IPC分类号： G03B27/52 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70191 , G03B27/52 , G03F7/70216
摘要： A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system comprises an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method comprises setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.
摘要翻译：提供一种优化投影曝光系统的成像性能的方法，其中投影曝光系统包括用于照亮图案形成结构的照明光学系统和用于将照射的图案形成结构的区域成像到相应场上的投影光学系统。该方法包括将场设置为第一曝光场，将投影曝光系统的光学参数设置为第一设置，使得第一曝光区域内的成像性能是第一最佳性能，将场改为第二曝光场，以及将光学参数改变为第二设置，使得第二曝光区域内的成像性能是第二最佳性能。

6. 发明申请

US20080225921A1 Projection Exposure System, Beam Delivery System and Method of Generating a Beam of Light 有权
公开(公告)号：US20080225921A1
公开(公告)日：2008-09-18
申请号：US11792099
申请日：2005-12-01
申请人： Matthias Kuss , Damian Fiolka , Gerd Reisinger , Manfred Maul , Vladimir Davydenko
发明人： Matthias Kuss , Damian Fiolka , Gerd Reisinger , Manfred Maul , Vladimir Davydenko
IPC分类号： G03F7/20 , H01S3/08 , H01S3/03
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70583
摘要： A beam delivery system of a projection exposure system comprises a laser generating a beam of laser light from a plurality of longitudinal laser modes in a cavity, wherein light generated by a single longitudinal laser mode has an average line width λlat, wherein the laser light of the beam has, at each of respective lateral positions of the beam, a second line width λlat corresponding to lateral laser modes, and wherein the laser light of the beam has, when averaged over a whole cross section thereof, a line width λb corresponding to plural lateral laser modes, and wherein λm

7. 发明申请

US20120013878A1 Projection Exposure System, Beam Delivery System and Method of Generating a Beam of Light 审中-公开
标题翻译：投影曝光系统，光束投射系统和光束生成方法
公开(公告)号：US20120013878A1
公开(公告)日：2012-01-19
申请号：US13173207
申请日：2011-06-30
申请人： Matthias Kuss , Damian Fiolka , Gerd Reisinger , Manfred Maul , Vladimir Davydenko
发明人： Matthias Kuss , Damian Fiolka , Gerd Reisinger , Manfred Maul , Vladimir Davydenko
IPC分类号： G03F7/20 , G02B27/48 , G03B27/72 , G02B27/00
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70583
摘要： A beam delivery system of a projection exposure system comprises a laser generating a beam of laser light from a plurality of longitudinal laser modes in a cavity, wherein light generated by a single longitudinal laser mode has an average line width λlat, wherein the laser light of the beam has, at each of respective lateral positions of the beam, a second line width λlat corresponding to lateral laser modes, and wherein the laser light of the beam has, when averaged over a whole cross section thereof, a line width λb corresponding to plural lateral laser modes, and wherein λm
摘要翻译：投影曝光系统的光束传送系统包括激光器，其从空腔中的多个纵向激光模式产生激光束，其中由单个纵向激光模式产生的光具有平均线宽度λlat，其中激光所述光束在所述光束的各个横向位置处具有对应于横向激光模式的第二线宽度λl1，并且其中当所述光束的整个横截面上的平均时，所述光束的激光具有对应于多个横向激光模式，并且其中λm<λlat<λb，并且其中设置在所述光束中的光学延迟装置提供光程差Dgr; l，其中0.8·λ0 2（2·＆Dgr;λλ） ; 其中λ0是第一激光束的光的平均波长，＆Dgr;λlat表示第二行宽。

8. 发明授权

US07995280B2 Projection exposure system, beam delivery system and method of generating a beam of light 有权
标题翻译：投影曝光系统，光束传输系统和产生光束的方法
公开(公告)号：US07995280B2
公开(公告)日：2011-08-09
申请号：US11792099
申请日：2005-12-01
申请人： Matthias Kuss , Damian Fiolka , Gerd Reisinger , Manfred Maul , Vladimir Davydenko
发明人： Matthias Kuss , Damian Fiolka , Gerd Reisinger , Manfred Maul , Vladimir Davydenko
IPC分类号： G02B27/14
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70583
摘要： A beam delivery system of a projection exposure system comprises a laser generating a beam of laser light from a plurality of longitudinal laser modes in a cavity, wherein light generated by a single longitudinal laser mode has an average line width λlat, wherein the laser light of the beam has, at each of respective lateral positions of the beam, a second line width λlat corresponding to lateral laser modes, and wherein the laser light of the beam has, when averaged over a whole cross section thereof, a line width λb corresponding to plural lateral laser modes, and wherein λm
摘要翻译：投影曝光系统的光束传送系统包括激光器，其从空腔中的多个纵向激光模式产生激光束，其中由单个纵向激光模式产生的光具有平均线宽度λlat，其中激光所述光束在所述光束的各个横向位置处具有对应于横向激光模式的第二线宽度λl1，并且其中当所述光束的整个横截面上的平均时，所述光束的激光具有对应于多个横向激光模式，并且其中λm<λlat<λb，并且其中设置在所述光束中的光学延迟装置提供光程差Dgr; l，其中0.8·λ0 2（2·＆Dgr;⁢λl）<＆Dgr ; 其中λ0是第一激光束的光的平均波长，＆Dgr;λlat表示第二行宽。

9. 发明授权

US08873023B2 Illumination system for microlithography 有权
标题翻译：微光刻照明系统
公开(公告)号：US08873023B2
公开(公告)日：2014-10-28
申请号：US13186068
申请日：2011-07-19
申请人： Axel Scholz , Frank Schlesener , Nils Haverkamp , Vladimir Davydenko , Michael Gerhard , Gerhard-Wilhelm Ziegler , Mirco Kern , Thomas Bischoff , Thomas Stammler , Stephan Kellner , Manfred Maul , Daniel Walldorf , Igor Hurevich , Markus Deguenther
发明人： Axel Scholz , Frank Schlesener , Nils Haverkamp , Vladimir Davydenko , Michael Gerhard , Gerhard-Wilhelm Ziegler , Mirco Kern , Thomas Bischoff , Thomas Stammler , Stephan Kellner , Manfred Maul , Daniel Walldorf , Igor Hurevich , Markus Deguenther
IPC分类号： G03B27/54 , G03B27/42 , G03F7/20
CPC分类号： G03F7/70191 , G02B3/0043 , G03F7/70058 , G03F7/70075 , G03F7/70083
摘要： An illumination system for microlithography serves to illuminate an illumination field with illumination light of a primary light source. A first raster arrangement has bundle-forming first raster elements which are arranged in a first plane of the illumination system or adjacent to the plane. The first raster arrangement serves to generate a raster arrangement of secondary light sources. A transmission optics serves for superimposed transmission of the illumination light of the secondary light sources into the illumination field. The transmission optics has a second raster arrangement with bundle-forming second raster elements. In each case one of the raster elements of the first raster arrangement is allocated to one of the raster elements of the second raster arrangement for guiding a partial bundle of an entire bundle of illumination light. The first raster arrangement for example has at least two types (I, II, III) of the first raster elements which have different bundle-influencing effects. The raster elements of the two raster arrangements are arranged relative to one another in such a way that to each raster element type (I to III) is allocated at least one individual distance (ΔI, ΔII, ΔIII) between the first raster element of this type (I to III) and the allocated second raster element of the second raster arrangement. As a result, an illumination system is obtained which allows particular illumination parameters to be influenced in such a way that undesirable influences on other illumination parameters are avoided to the greatest extent possible.
摘要翻译：用于微光刻的照明系统用于利用一次光源的照明光照射照明场。第一光栅布置具有束形成的第一光栅元件，其布置在照明系统的第一平面中或与该平面相邻。第一光栅布置用于产生二次光源的光栅布置。传输光学器件用于将次级光源的照明光的叠加传输到照明场中。传输光学器件具有第二光栅装置，其具有束形成第二光栅元件。在每种情况下，第一光栅装置的一个光栅元件被分配给第二光栅布置的光栅元件之一，用于引导整束照明光的部分束。例如，第一光栅布置具有至少两种具有不同束影响效果的第一光栅元件（I，II，III）。两个光栅装置的光栅元件相对于彼此布置成使得每个光栅元素类型（I至III）被分配至少一个单独距离（＆Dgr; I，＆Dgr; II，＆Dgr; III）这种类型的第一光栅元素（I至III）和第二光栅布置的分配的第二光栅元素。结果，获得允许特定照明参数受到影响的照明系统，使得最大程度地避免对其他照明参数的不期望的影响。

10. 发明授权

US08730455B2 Illumination system for a microlithographic projection exposure apparatus 有权
标题翻译：用于微光刻投影曝光装置的照明系统
公开(公告)号：US08730455B2
公开(公告)日：2014-05-20
申请号：US13181033
申请日：2011-07-12
申请人： Damian Fiolka , Manfred Maul , Axel Scholz , Markus Deguenther , Johannes Wangler , Vladimir Davydenko
发明人： Damian Fiolka , Manfred Maul , Axel Scholz , Markus Deguenther , Johannes Wangler , Vladimir Davydenko
IPC分类号： G03B27/54 , G03B27/72 , G03F7/20 , G03B27/68 , G03B27/42 , G03B27/52
CPC分类号： G03F7/7015 , G03B27/54 , G03F7/70075 , G03F7/70108
摘要： An illumination system for a microlithographic projection exposure step-and-scan apparatus has a light source, a first optical raster element and a second optical raster element. The first optical raster element extends in a first pupil plane of the illumination system and is designed such that the geometrical optical flux of the system is increased perpendicular to a scan direction of the projection exposure apparatus. The second optical raster element extends in a second pupil plane of the illumination system, which is not necessarily different from the first pupil plane, and is designed such that the geometrical optical flux of the system is increased in the scan direction and perpendicular thereto. This makes it possible to improve the irradiance uniformity in a reticle plane.
摘要翻译：用于微光刻投影曝光步进扫描装置的照明系统具有光源，第一光栅元件和第二光栅元件。第一光栅元件在照明系统的第一光瞳平面中延伸，并且被设计成使得系统的几何光通量垂直于投影曝光设备的扫描方向增加。第二光栅元件在照明系统的第二光瞳平面中延伸，其不一定与第一光瞳平面不同，并且被设计成使得系统的几何光通量在扫描方向上和垂直于其上增加。这使得可以提高掩模版平面中的辐照度均匀性。

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