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21. 发明申请

US20110189613A1 Exposure apparatus, exposure method, and device fabrication method 有权
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US20110189613A1
公开(公告)日：2011-08-04
申请号：US13064361
申请日：2011-03-21
申请人： Motokatsu Imai , Susumu Makinouchi
发明人： Motokatsu Imai , Susumu Makinouchi
IPC分类号： G03F7/20
CPC分类号： G03F7/70341
摘要： An exposure apparatus forms an immersion area by supplying a liquid onto a part of a substrate, and forms a prescribed pattern on the substrate through the liquid. A spare immersion area, which is capable of holding part of the liquid on the substrate, is formed at the outer circumference of the immersion area. It is possible to prevent the separation of the liquid, which is disposed between a lower surface of a projection optical system and a substrate surface, from the lower surface of the projection optical system in accordance with the relative movement of the projection optical system and the substrate.
摘要翻译：曝光装置通过将液体供给到基板的一部分而形成浸渍区域，并通过液体在基板上形成规定的图案。在浸渍区域的外周形成有能够将一部分液体保持在基板上的备用浸渍区域。可以根据投影光学系统和投影光学系统的相对移动来防止投影光学系统的下表面和基板表面之间的液体从投影光学系统的下表面分离基质。

22. 发明授权

US06259511B1 Scanning type exposure apparatus 有权
标题翻译：扫描型曝光装置
公开(公告)号：US06259511B1
公开(公告)日：2001-07-10
申请号：US09450566
申请日：1999-11-30
申请人： Susumu Makinouchi , Toshio Ueda
发明人： Susumu Makinouchi , Toshio Ueda
IPC分类号： G03B2742
CPC分类号： G03F7/70358 , G03F7/70725 , G03F7/70775
摘要： A scanning type exposure apparatus includes a mask stage which can move a mask along a predetermined scanning direction; a substrate stage which can move a substrate, onto which a pattern on the mask is to be transferred, along the scanning direction; a fine movement stage which is arranged on one of the mask stage and the substrate stage, and is movable along the scanning direction relative to the one stage; a first measuring device for detecting the position, along the scanning direction, of the fine movement stage; a second measuring device for detecting the position, along the scanning direction, of the other one of the mask stage and the substrate stage; a speed controller for controlling the ratio between the speeds of the mask stage and the substrate stage to a predetermined value while the pattern on the mask is scanning-exposed on the substrate; and a control device for controlling the position of the fine movement stage in accordance with the difference between the position measured by the first measuring device and the position measured by the second measuring device during the scanning exposure.
摘要翻译：扫描型曝光装置包括可沿着预定扫描方向移动掩模的掩模台; 可以沿扫描方向移动掩模上的图案要被转印的基板的基板台; 配置在掩模载台和基板台之一上的细移动台，能够相对于一个台沿着扫描方向移动; 第一测量装置，用于沿着扫描方向检测微动台的位置; 第二测量装置，用于检测掩模台和衬底台中另一个沿着扫描方向的位置; 速度控制器，用于在掩模上的图案在基板上扫描曝光时，将掩模载物台和基板载物台的速度之比控制为预定值; 以及控制装置，用于根据在扫描曝光期间由第一测量装置测量的位置与由第二测量装置测量的位置之间的差异来控制微动载台的位置。

23. 发明授权

US06188464B1 Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US06188464B1
公开(公告)日：2001-02-13
申请号：US09289614
申请日：1999-04-12
申请人： Susumu Makinouchi
发明人： Susumu Makinouchi
IPC分类号： G03B2742
CPC分类号： G03F7/70358 , G03B27/42 , G03F7/70725 , G03F7/70775
摘要： A scanning type exposure apparatus comprises a mask stage position-measuring unit, a substrate stage position-measuring unit, an arithmetic processing unit, and a control unit. The arithmetic processing unit multiplies results of measurement (WX, WY, W&thgr;) by the substrate position-measuring unit by a conversion vector comprising components containing a magnification of a projection optical system and an angle of rotation between a mask and a substrate to determine a target vector quantity (RX*, RY*, R&thgr;*) of a mask stage. An error vector is determined by subtracting, from the target vector quantity, results of measurement (RX, RY, R&thgr;) by the mask stage position-measuring unit. The controller controls the mask stage so that the error vector becomes zero. The exposure apparatus includes correcting sections for correcting time lags in measurement by the respective position-measuring units. The arithmetic processing unit uses corrected positional information. The mask stage can accurately follow a substrate stage.
摘要翻译：扫描型曝光装置包括掩模台位置测量单元，基板台位置测量单元，运算处理单元和控制单元。算术处理单元将基片位置测量单元的测量结果（WX，WY，Wtheta）乘以包含投影光学系统的放大倍率和掩模与基板之间的旋转角度的分量的转换矢量，以确定掩模阶段的目标矢量数量（RX *，RY *，Rθ* *）。通过从掩模台位置测量单元从目标矢量量减去测量结果（RX，RY，Rθ）来确定误差向量。控制器控制掩模级，使得误差向量变为零。曝光装置包括用于通过各个位置测量单元来校正测量中的时间滞后的校正部分。算术处理单元使用校正的位置信息。掩模阶段可以准确地跟随衬底阶段。

24. 发明授权

US5978071A Projection exposure apparatus and method in which mask stage is moved to provide alignment with a moving wafer stage 失效
标题翻译：投影曝光装置和方法，其中移动掩模台以提供与移动的晶片台的对准
公开(公告)号：US5978071A
公开(公告)日：1999-11-02
申请号：US84211
申请日：1998-05-26
申请人： Hideyuki Miyajima , Susumu Makinouchi , Kazuya Ota
发明人： Hideyuki Miyajima , Susumu Makinouchi , Kazuya Ota
IPC分类号： G03F7/20 , G03F9/00 , G03B27/42 , G03B27/52 , G03B27/54 , G03B27/72
CPC分类号： G03F7/70425 , G03F7/70716 , G03F9/70
摘要： A projection exposure apparatus for positioning, for each shot provided on a wafer, a pattern formed on a mask with respect to the wafer and also for exposing the pattern on the wafer includes a wafer stage carrying the wafer and movable stepwise for each shot, a mask stage carrying the mask and movable, a stage control unit for making relative positioning between the wafer and the pattern of the mask and maintaining the relative positioning so that the stage control unit moves the mask stage to make the relative positioning before the wafer stage stops for each shot, and an exposure control unit for performing exposure while the relative positioning is maintained.
摘要翻译：一种投影曝光装置，用于对于在晶片上设置的每个镜头，定位相对于晶片在掩模上形成的图案以及用于使晶片上的图案曝光的投影曝光装置包括承载晶片的晶片台，并且每个镜头均可逐步移动，携带掩模并可移动的掩模台，用于在晶片和掩模的图案之间进行相对定位并保持相对定位的台控制单元，使得台控制单元移动掩模台，以在晶片台停止之前进行相对定位以及用于在保持相对定位的同时执行曝光的曝光控制单元。

25. 发明授权

US5714860A Stage device capable of applying a damping force to a movable member 失效
标题翻译：能够向可动部件施加阻尼力的舞台装置
公开(公告)号：US5714860A
公开(公告)日：1998-02-03
申请号：US555177
申请日：1995-11-08
申请人： Susumu Makinouchi
发明人： Susumu Makinouchi
IPC分类号： G12B5/00 , G03F7/20 , G05B19/23 , H01L21/027 , G05B13/00
CPC分类号： G03F7/70716 , G03F7/709 , G05B19/232 , G05B2219/37275 , G05B2219/41117 , G05B2219/41165 , G05B2219/41327 , G05B2219/41337 , G05B2219/45026
摘要： A stage device comprises a base, a movable member movably provided on the base, a damping system for giving a damping force to the movable member, a position detector for detecting a position of the movable member with respect to the base, a deviation detector for obtaining a deviation of a position of the movable member from a target position of the movable member on the base on the basis of a result of the detection by the position detector and a damping control system for changing the damping force in accordance with the deviation detected by the deviation detector.
摘要翻译：舞台装置包括基座，可移动地设置在基座上的可动构件，用于向可动构件施加阻尼力的阻尼系统，用于检测可动构件相对于基座的位置的位置检测器，用于基于位置检测器的检测结果，根据所检测到的偏差来改变阻尼力的阻尼控制系统，获得可移动部件的位置与基座上的可动部件的目标位置的偏差通过偏差检测器。

26. 发明授权

US5446519A Stage device 失效
标题翻译：舞台装置
公开(公告)号：US5446519A
公开(公告)日：1995-08-29
申请号：US186555
申请日：1994-01-26
申请人： Susumu Makinouchi
发明人： Susumu Makinouchi
IPC分类号： G03F9/00 , G03F7/20 , G12B5/00 , H01L21/027 , H01L21/30 , G03B27/42
CPC分类号： G03F7/70716 , G03F7/709
摘要： A stage device is provided with a base plate supported by an antivibration device; a table supported by the base plate through a driving shaft in substantially rigid manner; and a first drive system for placing the table in a predetermined position on the base plate. A second drive systems is provided for applying, to the table, an acceleration the same as that of the base plate, in order to correct the relative positional aberration between the base plate and the table, induced by the vibration of the base plate generated when the table is driven by the first drive system.
摘要翻译：舞台装置设置有由防振装置支撑的底板; 由基板以基本上刚性方式通过驱动轴支撑的工作台; 以及用于将桌子放置在基板上的预定位置的第一驱动系统。提供第二驱动系统，用于向桌子施加与基板相同的加速度，以便校正由基板产生的基板的振动引起的基板和工作台之间的相对位置像差，该表由第一个驱动系统驱动。

27. 发明授权

US08390780B2 Movable-body apparatus, exposure apparatus, exposure method, and device manufacturing method 有权
标题翻译：移动体装置，曝光装置，曝光方法以及装置的制造方法
公开(公告)号：US08390780B2
公开(公告)日：2013-03-05
申请号：US12330119
申请日：2008-12-08
申请人： Susumu Makinouchi , Toru Imai , Akihiro Watanabe
发明人： Susumu Makinouchi , Toru Imai , Akihiro Watanabe
IPC分类号： G03B27/42
CPC分类号： G01D5/38 , G01D5/266 , G03F7/70716 , G03F7/70775
摘要： A moving grating is arranged on a side of a wafer stage, a light source irradiates a light to the moving grating, diffracted lights generated from the moving grating are interfered by fixed scales and an index scale of which positional relation with the light source is fixed, and a detection instrument detects the interfered light. In this case, since the moving grating is arranged on a side of the wafer stage, upsizing of the entire wafer stage can be suppressed. Further, since interference occurs between a plurality of diffracted lights (e.g., the ±1st-order diffracted light) passing extremely close optical paths, influence caused by a fluctuation of ambient atmosphere becomes less in comparison to conventional interferometers, and thus, a high-precision measurement of positional information of the movable body is possible.
摘要翻译：移动光栅布置在晶片台的一侧，光源将光照射到移动光栅，由移动光栅产生的衍射光被固定的刻度干扰，并且与光源的位置关系固定的折射率并且检测仪器检测被干扰的光。在这种情况下，由于移动光栅布置在晶片台的一侧，因此可以抑制整个晶片台的大型化。此外，由于在通过非常接近的光路的多个衍射光（例如±1级衍射光）之间发生干涉，所以与常规干涉仪相比，由环境大气的波动引起的影响变小，移动体的位置信息的精度测量是可能的。

28. 发明授权

US07961289B2 Immersion exposure apparatus and device manufacturing method with no liquid recovery during exposure 有权
公开(公告)号：US07961289B2
公开(公告)日：2011-06-14
申请号：US11355965
申请日：2006-02-17
申请人： Hiroyuki Nagasaka , Yuuki Ishii , Susumu Makinouchi
发明人： Hiroyuki Nagasaka , Yuuki Ishii , Susumu Makinouchi
IPC分类号： G03B27/52
摘要： An exposure apparatus that by irradiating an exposure light, via a projection optical system and a liquid, on a substrate placed on the image plane side of the projection optical system, exposes the substrate, the exposure apparatus includes: a liquid supply system that supplies the liquid onto the substrate and a liquid recovery system that recovers the liquid having been supplied on the substrate. When the exposure light is being irradiated on the image plane side of the projection optical system, the liquid recovery system does not perform recovery of the liquid.

29. 发明申请

US20070267571A1 Encoder 失效
标题翻译：编码器
公开(公告)号：US20070267571A1
公开(公告)日：2007-11-22
申请号：US11798255
申请日：2007-05-11
申请人： Susumu Makinouchi , Toru Imai , Akihiro Watanabe
发明人： Susumu Makinouchi , Toru Imai , Akihiro Watanabe
IPC分类号： G01D5/34
CPC分类号： G01D5/38
摘要： When an incident light is obliquely incident on an index scale, the optical path length of light A becomes longer than the optical path length of light B and an optical path length difference occurs, which causes a phase difference in both of the diffracted lights incident on a photodetection element. According to the phase difference, intensity of a photoelectric detection signal output from the photodetection element changes. That is, due to a periodic change in the incident angle of the incident light, the phase difference between light A and light B is modulated, and the interference signal becomes greatly modulated.
摘要翻译：当入射光倾斜地入射到指数刻度上时，光A的光程长度比光B的光路长度长，并且产生光程长度差，导致入射到的两个衍射光的相位差光电检测元件。根据相位差，从光检测元件输出的光电检测信号的强度变化。也就是说，由于入射光的入射角度的周期性变化，光A和光B之间的相位差被调制，并且干扰信号变得很大地被调制。

30. 发明授权

US06633363B1 Scanning exposure apparatus and method 失效
标题翻译：扫描曝光装置和方法
公开(公告)号：US06633363B1
公开(公告)日：2003-10-14
申请号：US09662340
申请日：2000-09-14
申请人： Susumu Makinouchi
发明人： Susumu Makinouchi
IPC分类号： G03B2742
CPC分类号： G03F7/70691 , G03F7/70358 , G03F7/70725 , G03F9/70
摘要： A scanning exposure apparatus and method for synchronously moving a mask and a substrate with respect to an exposing radiation flux to project an image of a mask pattern on the mask onto the substrate, includes an alignment sensor detecting the initial rotational angle of the mask relative to the substrate, a mask position detector, a substrate position detector, a calculation unit processing the position signals of the mask and the substrate in accordance with the projection ratio of the projection optical system and the initial rotational angle of the mask relative to the substrate to derive a positional deviation of the mask stage relative to the substrate stage, and a controller controlling the mask stage movement and the substrate stage movement to eliminate the positional deviation.
摘要翻译：一种扫描曝光装置和方法，用于相对于曝光辐射通量同步移动掩模和衬底，以将掩模上的掩模图案的图像投影到衬底上，包括对准传感器，其检测掩模相对于掩模的初始旋转角度基板，掩模位置检测器，基板位置检测器，计算单元，根据投影光学系统的投影比和掩模相对于基板的初始旋转角度对掩模和基板的位置信号进行处理，导出掩模台相对于基板台的位置偏移，以及控制掩模台移动和基板台移动以消除位置偏差的控制器。

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