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1. 发明授权

US07961289B2 Immersion exposure apparatus and device manufacturing method with no liquid recovery during exposure 有权
公开(公告)号：US07961289B2
公开(公告)日：2011-06-14
申请号：US11355965
申请日：2006-02-17
申请人： Hiroyuki Nagasaka , Yuuki Ishii , Susumu Makinouchi
发明人： Hiroyuki Nagasaka , Yuuki Ishii , Susumu Makinouchi
IPC分类号： G03B27/52
摘要： An exposure apparatus that by irradiating an exposure light, via a projection optical system and a liquid, on a substrate placed on the image plane side of the projection optical system, exposes the substrate, the exposure apparatus includes: a liquid supply system that supplies the liquid onto the substrate and a liquid recovery system that recovers the liquid having been supplied on the substrate. When the exposure light is being irradiated on the image plane side of the projection optical system, the liquid recovery system does not perform recovery of the liquid.

2. 发明申请

US20060139593A1 Exposure apparatus, exposure method and device manufacturing method 有权
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US20060139593A1
公开(公告)日：2006-06-29
申请号：US11355965
申请日：2006-02-17
申请人： Hiroyuki Nagasaka , Yuuki Ishii , Susumu Makinouchi
发明人： Hiroyuki Nagasaka , Yuuki Ishii , Susumu Makinouchi
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/709
摘要： An exposure apparatus that by irradiating an exposure light, via a projection optical system and a liquid, on a substrate placed on the image plane side of the projection optical system, exposes the substrate, the exposure apparatus includes; a liquid supply mechanism that supplies the liquid onto the substrate; a liquid recovery mechanism that recovers the liquid having been supplied on the substrate; and wherein when the exposure light is being irradiated on the image plane side of the projection optical system, the liquid recovery mechanism does not perform the recover of the liquid.
摘要翻译：曝光装置，其通过投影光学系统和液体将曝光用光照射在投影光学系统的像面侧的基板上，露出基板，曝光装置包括：将液体供给到基板上的液体供给机构; 液体回收机构，其回收已经供给到所述基板上的液体; 并且其中当曝光光被照射在投影光学系统的像面侧时，液体回收机构不执行液体的回收。

3. 发明授权

US08064037B2 Immersion exposure apparatus and device manufacturing method with no liquid recovery during exposure 有权
标题翻译：曝光时无液体回收的浸渍曝光装置和装置制造方法
公开(公告)号：US08064037B2
公开(公告)日：2011-11-22
申请号：US11355965
申请日：2006-02-17
申请人： Hiroyuki Nagasaka , Yuuki Ishii , Susumu Makinouchi
发明人： Hiroyuki Nagasaka , Yuuki Ishii , Susumu Makinouchi
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/709
摘要： An exposure apparatus that by irradiating an exposure light, via a projection optical system and a liquid, on a substrate placed on the image plane side of the projection optical system, exposes the substrate, the exposure apparatus includes: a liquid supply system that supplies the liquid onto the substrate and a liquid recovery system that recovers the liquid having been supplied on the substrate. When the exposure light is being irradiated on the image plane side of the projection optical system, the liquid recovery system does not perform recovery of the liquid.
摘要翻译：一种曝光装置，其通过投影光学系统和液体将投射光学系统和液体照射在投影光学系统的像面侧的基板上曝光基板，曝光装置包括：液体供给系统，液体到基板上，以及液体回收系统，其回收已经供应在基板上的液体。当曝光光被照射在投影光学系统的像面侧时，液体回收系统不会执行液体的回收。

4. 发明授权

US08721803B2 Cleaning liquid, cleaning method, liquid generating apparatus, exposure apparatus, and device fabricating method 有权
标题翻译：清洗液，清洗方法，液体发生装置，曝光装置和装置制造方法
公开(公告)号：US08721803B2
公开(公告)日：2014-05-13
申请号：US13307773
申请日：2011-11-30
申请人： Hiroyuki Nagasaka , Hiroshi Morita , Hiroto Tokoshima
发明人： Hiroyuki Nagasaka , Hiroshi Morita , Hiroto Tokoshima
IPC分类号： B08B3/04
CPC分类号： G03F7/70925 , G03F7/70341 , Y10T137/0318
摘要： An exposure apparatus exposes a substrate through an exposure liquid with exposure light. A cleaning liquid is provided to the exposure apparatus, in order to clean at least part of the exposure apparatus. In the cleaning liquid, a prescribed gas of an amount that is greater than or equal to the saturation concentration is dissolved.
摘要翻译：曝光装置通过具有曝光光的曝光液体曝光基板。为了清洁曝光装置的至少一部分，向曝光装置提供清洁液。在清洗液中，溶解了大于或等于饱和浓度的规定气体。

5. 发明授权

US08472001B2 Exposure method, exposure apparatus, and method for producing device 有权
标题翻译：曝光方法，曝光装置及其制造方法
公开(公告)号：US08472001B2
公开(公告)日：2013-06-25
申请号：US12222029
申请日：2008-07-31
申请人： Hiroyuki Nagasaka
发明人： Hiroyuki Nagasaka
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03B27/42 , G03F7/2041 , G03F7/70325 , G03F7/70725 , G03F7/70775
摘要： A liquid immersion exposure apparatus in which a substrate is exposed with an exposure beam, includes a projection optical system by which the substrate is exposed to the exposure beam, a first inlet disposed at a first position, which is capable of supplying a first liquid to a space adjacent to a bottom surface of the projection optical system, and a second inlet disposed at a second position which is different from the first position, the second inlet being capable of supplying a second liquid that is different from the first liquid to the space.
摘要翻译：用曝光光束曝光基板的液浸式曝光装置包括投影光学系统，通过该投影光学系统将基板暴露于曝光光束，设置在第一位置的第一入口，其能够将第一液体供应到与所述投影光学系统的底面相邻的空间，以及设置在与所述第一位置不同的第二位置的第二入口，所述第二入口能够将不同于所述第一液体的第二液体供给到所述空间。

6. 发明授权

US08373843B2 Exposure apparatus, exposure method, and method for producing device 有权
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：US08373843B2
公开(公告)日：2013-02-12
申请号：US11785722
申请日：2007-04-19
申请人： Hiroyuki Nagasaka
发明人： Hiroyuki Nagasaka
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70341
摘要： A lithographic apparatus includes a substrate table to hold a substrate and a projection system to project a patterned radiation beam onto a target portion of the substrate. A liquid supply system at least partly fills a space between the projection system and the substrate with a liquid, and has a liquid confinement structure to at least partly confine the liquid within the space. An outlet removes a mixture of liquid and gas passing through a gap between the liquid confinement structure and the substrate. An evacuation system draws the mixture through the outlet, and includes a separator tank to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, to maintain a stable pressure within the non-liquid-filled region.
摘要翻译：光刻设备包括用于保持基板的基板台和将图案化的辐射束投影到基板的目标部分上的投影系统。液体供应系统至少部分地用液体填充投影系统和衬底之间的空间，并且具有至少部分地将液体限制在空间内的液体限制结构。出口除去通过液体限制结构和衬底之间的间隙的液体和气体的混合物。抽真空系统通过出口抽出混合物，并且包括一个分离罐，用于将液体与混合物中的气体分开，分离器箱压力控制器连接到分离罐的非液体填充区域，以保持稳定的压力非液体填充区域。

7. 发明授权

US08345217B2 Liquid recovery member, exposure apparatus, exposing method, and device fabricating method 有权
标题翻译：液体回收构件，曝光装置，曝光方法和装置制造方法
公开(公告)号：US08345217B2
公开(公告)日：2013-01-01
申请号：US12149782
申请日：2008-05-08
申请人： Hiroyuki Nagasaka
发明人： Hiroyuki Nagasaka
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An exposure apparatus comprises a recovery member that recovers a liquid. The recovery ability with which the recovery member recovers the liquid differs in accordance with the region of the recovery member.
摘要翻译：曝光装置包括回收液体的回收构件。回收构件回收液体的回收能力根据回收构件的区域而不同。

8. 发明申请

US20120176589A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE 有权
标题翻译：曝光装置，曝光方法和生产装置的方法
公开(公告)号：US20120176589A1
公开(公告)日：2012-07-12
申请号：US13427512
申请日：2012-03-22
申请人： Soichi Owa , Hiroyuki Nagasaka , Ryu Sugawara
发明人： Soichi Owa , Hiroyuki Nagasaka , Ryu Sugawara
IPC分类号： G03B27/52
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/70716 , G03F7/70733
摘要： An exposure apparatus is provided with a projection optical system, and the projection optical system includes a first optical element disposed most closely to an image plane of the projection optical system. The exposure apparatus includes a first liquid immersion mechanism which forms a first liquid immersion area of a first liquid between the first optical element and an upper surface of a transparent member provided on a side of the image plane of the projection optical system, and an observation unit which observes a state of the first liquid immersion area. It is possible to grasp the state of the liquid immersion area of the liquid, thereby executing optimum liquid immersion exposure.
摘要翻译：曝光装置设置有投影光学系统，投影光学系统包括最靠近投影光学系统的像面设置的第一光学元件。曝光装置包括：第一浸液机构，其在第一光学元件与设置在投影光学系统的像面侧的透明构件的上表面之间形成第一液体的第一液浸区域;以及观察观察第一液浸区域的状态的单元。可以掌握液体的液浸区域的状态，从而进行最佳的液浸曝光。

9. 发明申请

US20120033192A1 Exposure apparatus, exposure method, and device producing method 审中-公开
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US20120033192A1
公开(公告)日：2012-02-09
申请号：US13317170
申请日：2011-10-12
申请人： Hiroyuki Nagasaka
发明人： Hiroyuki Nagasaka
IPC分类号： G03B27/52
CPC分类号： G03F7/70866 , G03F7/2041 , G03F7/70341 , G03F7/70725
摘要： An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) via a projection optical system (PL) and a liquid (LQ) supplied from a liquid supply mechanism (10). The exposure apparatus (EX) has a pressure adjustment mechanism (90) for adjusting pressure of the liquid (LQ) supplied from the liquid supply mechanism (10). A liquid immersion area is satisfactorily formed to obtain high exposure accuracy and measurement accuracy.
摘要翻译：曝光装置（EX）通过经由投影光学系统（PL）和从液体供给机构（10）供给的液体（LQ）照射基板（P）上的曝光光（EL）来曝光基板（P）。曝光装置（EX）具有用于调节从液体供给机构（10）供给的液体（LQ）的压力的压力调节机构（90）。令人满意地形成液浸区域以获得高曝光精度和测量精度。

10. 发明授权

US08089608B2 Exposure apparatus, exposure method, and device manufacturing method 有权
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US08089608B2
公开(公告)日：2012-01-03
申请号：US11887584
申请日：2006-04-17
申请人： Hiroyuki Nagasaka , Kenichi Shiraishi , Tomoharu Fujiwara , Soichi Owa , Akihiro Miwa
发明人： Hiroyuki Nagasaka , Kenichi Shiraishi , Tomoharu Fujiwara , Soichi Owa , Akihiro Miwa
IPC分类号： G03B27/32 , G03B27/42 , G03B27/52
CPC分类号： G03F7/70341 , G03F7/70858 , G03F7/70891
摘要： An exposure apparatus includes an immersion space forming member (70) which fills an optical path space (K1) for exposure light (EL) with a first liquid (LQ) to form an immersion space, and a temperature regulating mechanism (60) which suppresses a change in the temperature of the immersion space forming member (70) accompanying deactivation of formation of the immersion space.
摘要翻译：曝光装置包括：浸没空间形成部件，其用第一液体（LQ）填充曝光用光（EL）的光路空间（K1），形成浸渍空间;以及温度调节机构（60），其抑制伴随着形成浸入空间的失活，浸渍空间形成部件（70）的温度变化。

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