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21. 发明授权

US07466410B2 Photonic-based sensors and methods for detecting analytes 有权
公开(公告)号：US07466410B2
公开(公告)日：2008-12-16
申请号：US11698320
申请日：2007-01-26
申请人： Mihail Sigalas , David Fattal , Jason Blackstock , Raymond G. Beausoleil
发明人： Mihail Sigalas , David Fattal , Jason Blackstock , Raymond G. Beausoleil
IPC分类号： G01J3/18 , G01J3/42
CPC分类号： G01N21/59 , B82Y20/00 , G01N21/7743 , G01N2021/7783
摘要： Various embodiments of the present invention are directed to analyte detection methods and to photonic-based sensors that employ photonic crystal gratings to detect analytes. In one embodiment of the present invention, a photonic-based sensor includes a source, a photonic crystal, and a photodetector. The source is configured to output electromagnetic radiation. The photonic crystal includes a photonic crystal grating positioned to receive the electromagnetic radiation. The electromagnetic radiation interacts with the photonic crystal grating and an analyte situated on or in the photonic crystal grating to produce a transmission spectrum that characterizes the analyte. The photodetector is positioned to detect the transmission spectrum.

22. 发明申请

US20080165338A1 Self-aligned, sub-wavelength optical lithography 有权
标题翻译：自对准，亚波长光刻
公开(公告)号：US20080165338A1
公开(公告)日：2008-07-10
申请号：US11580646
申请日：2006-10-13
申请人： David Fattal , Jason Blackstock
发明人： David Fattal , Jason Blackstock
IPC分类号： G03B27/72 , G03B27/32 , G03F7/00 , G03F7/26
CPC分类号： G03F7/201 , G03F7/2022 , G03F7/2051
摘要： Embodiments of the invention provide a method and an apparatus for performing self-aligned, sub-wavelength optical lithography. One embodiment provides a region of photoresist above a conductive surface having a plurality of periodically arrayed openings extending therethrough. At least a portion of the region of photoresist is then exposed to a light, wherein the intensity of the light is less than the intensity required to cure the photoresist. In so doing, at least one self-aligned, sub-wavelength location in at least one location of the region of photoresist is cured.
摘要翻译：本发明的实施例提供一种用于执行自对准亚波长光刻技术的方法和装置。一个实施例提供在导电表面上方的光致抗蚀剂区域，其具有延伸穿过其中的多个周期性排列的开口。然后光致抗蚀剂区域的至少一部分暴露于光，其中光的强度小于固化光致抗蚀剂所需的强度。这样做时，光致抗蚀剂区域的至少一个位置中的至少一个自对准的亚波长位置被固化。

23. 发明授权

US08542960B2 Tunable ring resonator 有权
标题翻译：可调环形谐振器
公开(公告)号：US08542960B2
公开(公告)日：2013-09-24
申请号：US12262419
申请日：2008-10-31
申请人： David Fattal , Sagi Mathal , Marco Fiorentino , Charles Santori , Robert G Walmsley
发明人： David Fattal , Sagi Mathal , Marco Fiorentino , Charles Santori , Robert G Walmsley
IPC分类号： G02B6/26 , G02B6/42 , G02B6/12
CPC分类号： G02B6/12007
摘要： A ring resonator has a first optical waveguide arranged in a loop, a second optical waveguide tangentially optically coupled to the first optical waveguide, and a translatable body configured to selectively move into an evanescent field region of said first optical waveguide.
摘要翻译：环形谐振器具有以环路布置的第一光波导，与第一光波导切向光耦合的第二光波导，以及被配置为选择性地移动到所述第一光波导的消逝场区的可平移主体。

24. 发明申请

US20090267049A1 Plasmon Enhanced Nanowire Light Emitting Diode 有权
标题翻译：等离子体增强型纳米线发光二极管
公开(公告)号：US20090267049A1
公开(公告)日：2009-10-29
申请号：US12262451
申请日：2008-10-31
申请人： Hans Cho , David Fattal , Nathaniel Quitorlando
发明人： Hans Cho , David Fattal , Nathaniel Quitorlando
IPC分类号： H01L33/00
CPC分类号： H01L33/18
摘要： A nanowire light emitting diode (LED) and method of emitting light employ a plasmonic mode. The nanowire LED includes a nanowire having a semiconductor junction, a shell layer coaxially surrounding the nanowire, and an insulating layer, which is plasmonically thin, isolating the shell layer from the nanowire. The shell layer supports a surface plasmon that couples to the semiconductor junction by an evanescent field. Light is generated in a vicinity of the semiconductor junction and the surface plasmon is coupled to the semiconductor junction during light generation. The coupling enhances one or both of an efficiency of light emission and a light emission rate of the LED. A method of making the nanowire LED includes forming the nanowire, providing the insulating layer on the surface of the nanowire, and forming the shell layer on the insulating layer in the vicinity of the semiconductor junction.
摘要翻译：纳米线发光二极管（LED）和发光的方法采用等离子体激发模式。纳米线LED包括具有半导体结的纳米线，同轴地围绕纳米线的壳层，以及等离子体薄的绝缘层，将壳层与纳米线隔离。壳层支撑通过ev逝场耦合到半导体结的表面等离子体。在半导体结附近产生光，并且在光产生期间，表面等离子体激元耦合到半导体结。耦合增强了LED的发光效率和发光速率的一个或两个。制造纳米线LED的方法包括形成纳米线，在纳米线的表面上提供绝缘层，并在半导体结附近的绝缘层上形成壳层。

25. 发明授权

US07548671B2 Optical device including waveguide grating structure 有权
标题翻译：光器件包括波导光栅结构
公开(公告)号：US07548671B2
公开(公告)日：2009-06-16
申请号：US11879242
申请日：2007-07-16
申请人： Wei Wu , David Fattal , Charles Santori , Robert N. Bicknell , Shih-Yuan Wang , R. Stanley Williams , Nathaniel J. Quitoriano
发明人： Wei Wu , David Fattal , Charles Santori , Robert N. Bicknell , Shih-Yuan Wang , R. Stanley Williams , Nathaniel J. Quitoriano
IPC分类号： G02B6/34
CPC分类号： G02B6/12007 , G02B6/124 , G02F1/0126 , G02F1/3515 , G02F2201/307
摘要： Optical devices including waveguide grating structures are described. In accordance with one embodiment, an optical device is provided comprising a horizontal waveguide grating structure having at least one waveguiding layer and at least one subwavelength periodic grating layer. The optical device further comprises upper and lower cladding layers immediately adjoining respective upper and lower surfaces of the waveguide grating structure and having refractive indices lower than a lowest-index one of the waveguiding layers, incident radiation propagating through one of the upper and lower cladding layers toward the waveguide grating structure. The waveguide grating structure is configured for peak reflection of the incident radiation at a peak reflection frequency. A cumulative thickness of the waveguiding layers is less than one tenth of a free space wavelength of the incident radiation at the peak reflection frequency divided by an average refractive index of the waveguiding layers.
摘要翻译：描述了包括波导光栅结构的光学器件。根据一个实施例，提供一种光学装置，其包括具有至少一个波导层和至少一个亚波长周期光栅层的水平波导光栅结构。该光学器件还包括紧邻波导光栅结构的相应上表面和下表面的上和下包层，其折射率低于波导层中的最低折射率之一，入射辐射通过上，下包层中的一个传播朝向波导光栅结构。波导光栅结构被配置为以峰值反射频率对入射辐射进行峰值反射。波导层的累积厚度小于峰值反射频率处入射的辐射的自由空间波长除以波导层的平均折射率的十分之一。

26. 发明授权

US08357980B2 Plasmonic high-speed devices for enhancing the performance of microelectronic devices 有权
公开(公告)号：US08357980B2
公开(公告)日：2013-01-22
申请号：US11974746
申请日：2007-10-15
申请人： R. Stanley Williams , David Fattal
发明人： R. Stanley Williams , David Fattal
IPC分类号： H01L27/14 , H01L31/101
CPC分类号： G02B6/1226 , B82Y20/00 , G02B6/107 , G02B6/34
摘要： Various embodiments of the present invention are directed to photonic devices that can be used to collect and convert incident ER into surface plasmons that can be used to enhance the operation of microelectronic devices. In one embodiment of the present invention, a photonic device comprises a dielectric layer having a top surface and a bottom surface, and a planar nanowire network covering at least a portion of the top surface of the dielectric layer. The bottom surface of the dielectric layer is positioned on the top surface of a substrate, and the planar nanowire network is configured to convert incident electromagnetic radiation into surface plasmons that penetrate through the dielectric layer and into at least a portion of the substrate.

27. 发明授权

US08268534B2 Self-aligned, sub-wavelength optical lithography 有权
标题翻译：自对准，亚波长光刻
公开(公告)号：US08268534B2
公开(公告)日：2012-09-18
申请号：US13100458
申请日：2011-05-04
申请人： David Fattal , Jason Blackstock
发明人： David Fattal , Jason Blackstock
IPC分类号： G03F7/20
CPC分类号： G03F7/201 , G03F7/2022 , G03F7/2051
摘要： Embodiments of the invention provide a method and an apparatus for performing self-aligned, sub-wavelength optical lithography. One embodiment provides a region of photoresist above a conductive surface having a plurality of periodically arrayed openings extending therethrough. At least a portion of the region of photoresist is then exposed to a light, wherein the intensity of the light is less than the intensity required to cure the photoresist. In so doing, at least one self-aligned, sub-wavelength location in at least one location of the region of photoresist is cured.
摘要翻译：本发明的实施例提供一种用于执行自对准亚波长光刻技术的方法和装置。一个实施例提供在导电表面上方的光致抗蚀剂区域，其具有延伸穿过其中的多个周期性排列的开口。然后光致抗蚀剂区域的至少一部分暴露于光，其中光的强度小于固化光致抗蚀剂所需的强度。这样做时，光致抗蚀剂区域的至少一个位置中的至少一个自对准的亚波长位置被固化。

28. 发明授权

US07965381B2 Self-aligned, sub-wavelength optical lithography 有权
标题翻译：自对准，亚波长光刻
公开(公告)号：US07965381B2
公开(公告)日：2011-06-21
申请号：US11580646
申请日：2006-10-13
申请人： David Fattal , Jason Blackstock
发明人： David Fattal , Jason Blackstock
IPC分类号： G03B27/72 , G03F7/26
CPC分类号： G03F7/201 , G03F7/2022 , G03F7/2051
摘要： Embodiments of the invention provide a method and an apparatus for performing self-aligned, sub-wavelength optical lithography. One embodiment provides a region of photoresist above a conductive surface having a plurality of periodically arrayed openings extending therethrough. At least a portion of the region of photoresist is then exposed to a light, wherein the intensity of the light is less than the intensity required to cure the photoresist. In so doing, at least one self-aligned, sub-wavelength location in at least one location of the region of photoresist is cured.
摘要翻译：本发明的实施例提供一种用于执行自对准亚波长光刻技术的方法和装置。一个实施例提供在导电表面上方的光致抗蚀剂区域，其具有延伸穿过其中的多个周期性排列的开口。然后光致抗蚀剂区域的至少一部分暴露于光，其中光的强度小于固化光致抗蚀剂所需的强度。这样做时，光致抗蚀剂区域的至少一个位置中的至少一个自对准的亚波长位置被固化。

29. 发明授权

US07805041B2 Electromagnetic radiation amplification systems based on photonic gratings 有权
标题翻译：基于光子光栅的电磁辐射放大系统
公开(公告)号：US07805041B2
公开(公告)日：2010-09-28
申请号：US11726104
申请日：2007-03-21
申请人： David Fattal , Mihail Sigalas , Raymond G. Beausoleil , Charles Santori
发明人： David Fattal , Mihail Sigalas , Raymond G. Beausoleil , Charles Santori
IPC分类号： G02B6/10
CPC分类号： H01S5/50 , B82Y20/00 , H01S5/041 , H01S5/105 , H01S5/3412
摘要： Various embodiments of the present invention are related to electromagnetic wave amplification systems employing photonic gratings. In one embodiment of the present invention, an electromagnetic radiation amplification system comprises a photonic grating and a pump source. The photonic grating is configured with a planar periodic lattice of holes in a slab. The pump source is coupled to the photonic grating and outputs an electronic stimulus that excites electronic energy states in the photonic grating so that a coherent beam of electromagnetic radiation incident upon the photonic grating stimulates emission of coherent electromagnetic radiation that amplifies the coherent beam of electromagnetic radiation.
摘要翻译：本发明的各种实施例涉及使用光子光栅的电磁波放大系统。在本发明的一个实施例中，电磁辐射放大系统包括光子光栅和泵浦源。光子栅格被配置成具有平板中的孔的平面周期性格。泵浦源耦合到光子光栅并输出激发光子光栅中的电子能量状态的电子刺激，使得入射到光子光栅上的相干电磁辐射波束刺激放射电磁辐射的相干光束的相干电磁辐射的发射。

30. 发明申请

US20090097798A1 Plasmonic high-speed devices for enhancing the performance of microelectronic devices 有权
标题翻译：等离子体高速器件，用于提高微电子器件的性能
公开(公告)号：US20090097798A1
公开(公告)日：2009-04-16
申请号：US11974746
申请日：2007-10-15
申请人： R. Stanley Williams , David Fattal
发明人： R. Stanley Williams , David Fattal
IPC分类号： G02B6/34 , G02B6/42
CPC分类号： G02B6/1226 , B82Y20/00 , G02B6/107 , G02B6/34
摘要： Various embodiments of the present invention are directed to photonic devices that can be used to collect and convert incident ER into surface plasmons that can be used to enhance the operation of microelectronic devices. In one embodiment of the present invention, a photonic device comprises a dielectric layer having a top surface and a bottom surface, and a planar nanowire network covering at least a portion of the top surface of the dielectric layer. The bottom surface of the dielectric layer is positioned on the top surface of a substrate, and the planar nanowire network is configured to convert incident electromagnetic radiation into surface plasmons that penetrate through the dielectric layer and into at least a portion of the substrate.
摘要翻译：本发明的各种实施例涉及可用于收集并将入射的ER转换成可用于增强微电子器件的操作的表面等离子体激元的光子器件。在本发明的一个实施例中，光子器件包括具有顶表面和底表面的电介质层和覆盖电介质层顶表面的至少一部分的平面纳米线网络。电介质层的底表面位于衬底的顶表面上，并且平面纳米线网络被配置为将入射的电磁辐射转换成穿透电介质层并进入衬底的至少一部分的表面等离子体激元。

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