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    • 24. 发明授权
    • Coating liquid for forming a silica-containing film with a low-dielectric constant and substrate coated with such a film
    • 用于形成具有低介电常数的含二氧化硅的膜和用这种膜涂覆的基材的涂布液
    • US06451436B1
    • 2002-09-17
    • US09577507
    • 2000-05-24
    • Michio KomatsuAkira NakashimaMiki Egami
    • Michio KomatsuAkira NakashimaMiki Egami
    • B32B904
    • H01L21/3122C09D183/04H01L21/02126H01L21/02216H01L21/02282H01L21/02337Y10T428/31511Y10T428/31663Y10T428/31725Y10T428/31786Y10T428/31855C08L2666/02
    • A coating liquid for forming a silica-containing film with a low-dielectric constant, which enables the formation of a low-density film having a dielectric constant as low as 3 or less and being excellent not only in resistance of oxygen plasma and in process adaptation but also in adhesion to a substrate and in film strength, is provided. A substrate coated with the silica-containing film having the above characteristics, which is obtained by the use of the above coating liquid, is further provided. The coating liquid for forming a silica-containing film with a low-dielectric constant comprises a polymer composition mainly constituted by (i) a hydrolyzate of at least one alkoxysilane represented by the following formula (I) and/or at least one halogenated silane represented by the following formula (II), and (ii) a readily decomposable resin, XnSi(OR)4−n  (I) XnSiX′4−n  (II) wherein X represents a hydrogen atom, a fluorine atom, an unfluorinated or fluorinated alkyl group of 1 to 8 carbon atoms, an aryl group or a vinyl group; R represents a hydrogen atom, an alkyl group of 1 to 8 carbon atoms, an aryl group or a vinyl group; X′ represents a halogen atom; and n is an integer of 0 to 3.
    • 一种用于形成具有低介电常数的含二氧化硅的膜的涂布液,其能够形成介电常数低至3或更低的低密度膜,并且不仅具有优异的氧等离子体的电阻和过程 提供适应性,但也适用于对基材的粘合性和膜强度。 进一步提供了通过使用上述涂布液而获得的具有上述特性的含二氧化硅膜的基材。 用于形成具有低介电常数的含二氧化硅膜的涂布液包括主要由(i)由下式(I)表示的至少一种烷氧基硅烷的水解产物和/或至少一种卤代硅烷代表的聚合物组合物 通过下式(II)和(ii)易分解性树脂,其中X表示氢原子,氟原子,1至8个碳原子的未氟化或氟化烷基,芳基或乙烯基; R表示氢原子,1〜8个碳原子的烷基,芳基或乙烯基; X'表示卤原子; n为0〜3的整数。
    • 25. 发明授权
    • Thin film-forming method and thin film-forming apparatus therefor
    • 薄膜形成方法及其薄膜形成装置
    • US6086699A
    • 2000-07-11
    • US79112
    • 1998-05-14
    • Akira NakashimaAtsushi TonaiRyo MuraguchiMichio KomatsuKatsuyuki MachidaHakaru KyuragiKazuo Imai
    • Akira NakashimaAtsushi TonaiRyo MuraguchiMichio KomatsuKatsuyuki MachidaHakaru KyuragiKazuo Imai
    • H01L21/3205B05D1/28H01L21/00H01L21/31H01L21/316H01L21/768B32B33/00B05D5/00B05D7/24B05D7/26
    • H01L21/6715B05D1/28H01L21/67132
    • Disclosed is a thin film-forming apparatus comprising a coating liquid feed means 6 for feeding a thin film-forming coating liquid onto a surface of a transfer roll 2, a transfer means 4 including the transfer roll 2 a surface of which is coated with the thin film-forming coating liquid fed from the coating liquid feed means to form a transfer thin film 8, and a substrate conveying means 16 for continuously conveying a substrate 9 under the transfer roll, a surface of said substrate 9 to be provided with a thin film, wherein the transfer means is so fabricated that the transfer roll surface having the transfer thin film thereon is closely contacted with the surface of the substrate conveyed by the substrate conveying means, to transfer the transfer thin film formed on the transfer roll surface to the substrate surface. Also disclosed is a thin film-forming method using the thin film-forming apparatus. By the apparatus and the method, formation of a planar thin film on a substrate such as a semiconductor wafer can be carried out continuously, stably and at a low cost, and quality lowering of the thin film and property change thereof with time caused by adherence of impurities to the thin film or contamination of the thin film with impurities are avoidable. Moreover, the apparatus and the method are applicable to large-sized substrates.
    • 公开了一种薄膜形成装置,其包括用于将薄膜形成涂布液供给到转印辊2的表面上的涂布液供给装置6,包括转印辊2的转印装置4,转印辊2的表面涂覆有 从涂布液供给装置供给的薄膜形成用涂布液,形成转印薄膜8,以及用于在转印辊下连续输送基板9的基板输送机构16,所述基板9的表面设置有薄的 膜,其中转印装置被制造成使得其上具有转印薄膜的转印辊表面与由基板输送装置输送的基板的表面紧密接触,以将形成在转印辊表面上的转印薄膜转印到 基材表面。 还公开了使用该薄膜形成装置的薄膜形成方法。 通过该装置和方法,可以连续,稳定地且低成本地在诸如半导体晶片的基板上形成平面薄膜,并且随着粘附时间的推移,薄膜的质量降低及其性能变化 杂质对薄膜的污染或杂质污染薄膜是可以避免的。 此外,该装置和方法适用于大尺寸基板。
    • 26. 发明授权
    • Sheet feeding device
    • 送纸装置
    • US07600752B2
    • 2009-10-13
    • US11700878
    • 2007-02-01
    • Akira NakashimaToyoaki Nanba
    • Akira NakashimaToyoaki Nanba
    • B65H7/12
    • B65H1/14B65H1/18B65H2301/42252B65H2801/06B65H2801/21
    • A sheet feeding device includes a stacking plate, a moving mechanism, a pick-up device, a detection plate, a detecting device, and a control section. The stacking plate is movably supported inside the sheet feeding device. The mechanism moves the stacking plate up and down. The pick-up device sends a top one of sheets stacked on the stacking plate, out in a direction from a sheet feeding position within a predetermined level range. The detection plate is mounted above the position and below a top inner surface of the sheet feeding device, with a lower surface thereof facing an object to be placed on the stacking plate. The detection plate is movably supported at a support portion provided at a predetermined location in an upper surface thereof. The detecting device detects upward and downward displacement of the detection plate. According to the detection result, the section controls operation of the mechanism.
    • 片材进给装置包括堆叠板,移动机构,拾取装置,检测板,检测装置和控制部。 堆叠板可移动地支撑在片材进给装置的内部。 该机构上下移动堆放板。 拾取装置沿着从预定水平范围内的送纸位置的方向向上发送堆叠在堆叠板上的顶片。 检测板安装在片材进给装置的顶部内表面上方的位置的下方,其下表面面向要放置在堆叠板上的物体。 检测板可移动地支撑在设置在其上表面中的预定位置处的支撑部分处。 检测装置检测检测板的向上和向下位移。 根据检测结果,该部分控制机构的操作。
    • 28. 发明申请
    • Gaseous fuel vehicle rear structure
    • 气体燃料车辆后部结构
    • US20050161935A1
    • 2005-07-28
    • US11041796
    • 2005-01-21
    • Tohru OnoAkira NakashimaYusuke Sogawa
    • Tohru OnoAkira NakashimaYusuke Sogawa
    • B60K15/07B62D21/15B60P3/22B62D21/00
    • B60K15/07B60K2015/0638B62D21/152B62D21/155
    • A rear structure of a gaseous fuel vehicle in this invention includes right and left rear frame members, and a support frame mounted to the right and left rear frame members, on which support frame a gaseous fuel tank is mounted. Each of the right and left rear frame members is constituted by a curved member which includes a curved portion curving upward, and a front linear portion and a rear linear portion which are lower than the highest portion of the curved portion. The support frame is attached to the front linear portions and the rear linear portions. The front linear portions are attached to the rear end of a vehicle frame to provide a low floor in a passenger compartment. A load applied to the rear ends of the right and left rear frame members is dispersed into the right and left rear frame members and the support frame, and transmitted to the vehicle frame.
    • 本发明的气体燃料车辆的后部结构包括右后框架构件和左后框架构件,以及安装在右后框架构件和左后框架构件上的支撑框架,支撑框架安装在气体燃料箱上。 右后框架构件和左后框架构件均由弯曲构件构成,该构件包括向上弯曲的弯曲部分和比弯曲部分的最高部分低的前直线部分和后直线部分。 支撑框架附接到前线性部分和后线性部分。 前线性部分附接到车架的后端以在乘客舱中提供低地板。 施加到左右后框架构件的后端的负荷分散在左右后框架构件和支撑框架中,并被传递到车架。