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21. 发明授权

US06426788B1 Stage device and exposure apparatus using the same 失效
标题翻译：舞台装置和使用其的曝光装置
公开(公告)号：US06426788B1
公开(公告)日：2002-07-30
申请号：US09667240
申请日：2000-09-21
申请人： Nobushige Korenaga
发明人： Nobushige Korenaga
IPC分类号： G03B2742
CPC分类号： G03F7/70358 , G03F7/70716 , G03F7/70725 , G03F7/70825 , G03F7/70833 , G03F7/709 , H01L21/682
摘要： A scanning exposure apparatus includes a projection optical system for projecting a pattern of a reticle onto a wafer, a reticle stage for holding and scanningly moving the reticle relative to the projection optical system, a reticle stage actuator for moving the reticle stage and a reticle interferometer for detecting positional information related to the reticle stage, the reticle interferometer being kept separate from the reticle stage actuator with respect to vibration transmission.
摘要翻译：扫描曝光装置包括：投影光学系统，用于将掩模版的图案投影到晶片上;光栅平台，用于相对于投影光学系统保持和扫描所述掩模版;用于使所述标线片载台和掩模版干涉仪移动的标线片载台致动器为了检测与标线片台相关的位置信息，标线片干涉仪相对于振动传播与标线片级致动器保持分离。

22. 发明授权

US06320645B1 Stage system and exposure apparatus, and device manufacturing method using the same 有权
标题翻译：舞台系统和曝光装置以及使用其的装置制造方法
公开(公告)号：US06320645B1
公开(公告)日：2001-11-20
申请号：US09324652
申请日：1999-06-03
申请人： Mitsuru Inoue , Nobushige Korenaga , Yukio Tokuda
发明人： Mitsuru Inoue , Nobushige Korenaga , Yukio Tokuda
IPC分类号： G03B2742
CPC分类号： G03F7/70691 , G03B27/42 , Y10T74/20354
摘要： A stage system includes a movable stage, a guide mechanism for guiding the stage with respect to a predetermined direction, and a preloading mechanism for producing a magnetic attraction force with which the rigidity of the guide mechanism can be increased, wherein a portion to be attracted by the magnetic attraction force is made of a material having a product of a residual magnetic flux density Br and a holding force Hc in a hysteresis curve, not greater than 100 J/m3, this being very effective to reduce the hysteresis force, which is resistance due to the residual magnetic force, as compared with the preloading attraction force, whereby high precision positioning of the stage is accomplished.
摘要翻译：舞台系统包括可动台，用于相对于预定方向引导舞台的引导机构，以及用于产生引力机构的刚性的磁吸引力的预加载机构，其中吸引的部分通过磁吸引力由具有残余磁通密度Br和滞后曲线中的保持力Hc的乘积的材料制成，不大于100J / m 3，这对减小滞后力是非常有效的，这是非常有效的与预载吸引力相比，由于剩余磁力产生的阻力，从而实现了台的高精度定位。

23. 发明授权

US06177978B1 Stage device and exposure apparatus using the same 失效
标题翻译：舞台装置和使用其的曝光装置
公开(公告)号：US06177978B1
公开(公告)日：2001-01-23
申请号：US08901792
申请日：1997-07-28
申请人： Nobushige Korenaga
发明人： Nobushige Korenaga
IPC分类号： G03B2742
CPC分类号： G03F7/70358 , G03F7/70716 , G03F7/70725 , G03F7/70825 , G03F7/70833 , G03F7/709 , H01L21/682
摘要： A scanning exposure apparatus having a stage device. The apparatus includes a reticle stage for moving a reticle having a pattern, a wafer stage for moving a wafer in a timed relation with the movement of the reticle stage and an optical system for projecting the pattern of the reticle onto the wafer. At least one of the reticle stage and the wafer stage includes (i) a movable stage movable along a path having a constant speed movement region and an acceleration region, (ii) a first thrust producing device for moving, with acceleration, the movable stage in the acceleration region of the paths and (iii) a second thrust producing device, separate from the first thrust producing device, for moving the movable stage at a constant speed in the constant speed movement region of the path. The second thrust producing device includes a linear motor.
摘要翻译：一种具有舞台装置的扫描曝光装置。该装置包括用于移动具有图案的掩模版的掩模版平台，用于与刻线台的移动以定时关系移动晶片的晶片台和用于将掩模版图案投影到晶片上的光学系统。标线片台和晶片台中的至少一个包括（i）沿着具有恒定速度运动区域和加速度区域的路径可移动的可移动台，（ii）第一推力产生装置，用于加速地移动可移动台在所述路径的加速区域中，和（iii）与所述第一推力产生装置分离的第二推力产生装置，用于在所述路径的恒定速度运动区域中以恒定速度移动所述可移动台。第二推力产生装置包括线性马达。

24. 发明授权

US6128069A Stage mechanism for exposure apparatus 失效
标题翻译：曝光装置的舞台机构
公开(公告)号：US6128069A
公开(公告)日：2000-10-03
申请号：US41103
申请日：1998-03-12
申请人： Nobushige Korenaga
发明人： Nobushige Korenaga
IPC分类号： G03B27/42 , G03F7/20 , G03B27/58 , G03B27/62
CPC分类号： G03F7/70691 , G03B27/42 , G03F7/70358
摘要： A stage mechanism includes a first stage being movable in a first direction and along a base table, a second stage being movable in a second direction, intersecting the first direction, and along the base table, while being guided by a guide provided on the first stage, first and second fluid static pressure applying devices for supporting, with fluid, the first and second stages, respectively, upon the base table, and first and second preloading magnet units provided on the first and second stages, respectively, for attracting the first and second stages toward the base table, respectively. At least one of the first and second preloading magnet units includes a plurality of rectangular magnet pieces.
摘要翻译：舞台机构包括第一舞台，其可沿第一方向移动并且沿底座移动，第二舞台可沿与第一方向交叉的第二方向和沿着底座平台移动，同时由设置在第一方向上的导轨第一和第二流体静压施加装置，用于分别在基台上分别支撑第一和第二级的流体，以及分别设置在第一和第二级上的第一和第二预加载磁体单元，以吸引第一和第二级和分别朝基地台的第二阶段。第一和第二预加载磁体单元中的至少一个包括多个矩形磁体块。

25. 发明授权

US6107703A Linear motor mechanism for exposure apparatus, and device manufacturing method using the same 有权
标题翻译：用于曝光设备的线性电机机构及其装置制造方法
公开(公告)号：US6107703A
公开(公告)日：2000-08-22
申请号：US158511
申请日：1998-09-22
申请人： Nobushige Korenaga
发明人： Nobushige Korenaga
IPC分类号： G12B5/00 , B23Q5/28 , G03F7/20 , H01L21/027 , H02K41/03 , H02K41/00
CPC分类号： G03F7/70691 , H02K41/031
摘要： A linear motor mechanism includes a stator element and a movable element being movable relative to the stator element in a predetermined direction through an electromagnetic drive force, wherein the stator element includes a yoke and coils disposed along a predetermined direction while the movable element includes a magnet with plural magnetic poles but with no yoke. Plural stator elements are disposed opposed to each other with a magnet of the movable element disposed therebetween.
摘要翻译：线性马达机构包括定子元件和通过电磁驱动力相对于定子元件在预定方向上可移动的可动元件，其中定子元件包括一个轭和沿预定方向设置的线圈，而可移动元件包括一个磁体具有多个磁极但没有轭。多个定子元件彼此相对设置，可动元件的磁体设置在它们之间。

26. 发明授权

US5684856A Stage device and pattern transfer system using the same 失效
标题翻译：舞台装置和图案转印系统使用相同
公开(公告)号：US5684856A
公开(公告)日：1997-11-04
申请号：US275428
申请日：1994-07-15
申请人： Hirohito Itoh , Shinji Ohishi , Kazunori Iwamoto , Nobushige Korenaga , Youzou Fukagawa , Toshiya Asano , Satoru Takahashi
发明人： Hirohito Itoh , Shinji Ohishi , Kazunori Iwamoto , Nobushige Korenaga , Youzou Fukagawa , Toshiya Asano , Satoru Takahashi
IPC分类号： G03F7/20 , G03F9/00 , H01J37/20 , H05G1/00
CPC分类号： G03F9/7023 , G03F7/70716 , G03F7/70725 , G03F7/709 , H01J37/20 , H01J2237/20228 , H01J2237/20278 , H01J2237/3175
摘要： A stage device includes a first, fine-motion driving system for moving a movable stage through a first range; and a second, relatively rough-motion driving system for moving the movable stage through a second range which is substantially of the same extent as the first range.
摘要翻译：舞台装置包括用于使可移动台移动通过第一范围的第一细微动作驱动系统; 以及用于将可移动台移动到与第一范围基本上相同程度的第二范围的第二，相对粗略的运动驱动系统。

27. 发明授权

US5224139A X-ray mask and semiconductor device manufacturing method using the same 失效
标题翻译： X射线掩模和半导体器件的制造方法
公开(公告)号：US5224139A
公开(公告)日：1993-06-29
申请号：US936510
申请日：1992-08-28
申请人： Nobushige Korenaga , Hiroshi Maehara
发明人： Nobushige Korenaga , Hiroshi Maehara
IPC分类号： G03F1/22 , G03F7/20 , H01L21/027 , H01L21/30
CPC分类号： G03F1/22 , G03F7/707 , G03F7/70866
摘要： An X-ray mask has a mask frame in which the central portion thereof is removed to form a concentric hole, and four grooves are radially formed in the surface of junction with a silicon substrate. On the other hand, a permeable film portion on which a pattern is provided is formed in the central portion of the silicon substrate, four through holes being formed in the perimeter of the permeable film portion in correspondence with the grooves. During exposure of a wafer, when the side of the permeable film portion is moved toward the wafer and brought close to it, the gas present between the wafer and the X-ray mask passes through the through holes and the grooves and flows from one side of the X-ray mask on which the permeable film portion is provided to the other side of the X-ray mask. Thus the pressure between the wafer and the X-ray mask is not increased. This permits an increase in the speed of movement of the X-ray mask without breaking the permeable film portion and improvement of the productivity of an exposure device.

28. 发明申请

US20110310366A1 EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD 有权
标题翻译：曝光装置和制品制造方法
公开(公告)号：US20110310366A1
公开(公告)日：2011-12-22
申请号：US13157618
申请日：2011-06-10
申请人： Yuji Maehara , Nobushige Korenaga
发明人： Yuji Maehara , Nobushige Korenaga
IPC分类号： G03B27/52 , G03B27/32
CPC分类号： G03F7/70875 , B82Y10/00 , B82Y40/00 , H01J37/20 , H01J37/3174 , H01J2237/2001 , H01J2237/2482
摘要： An apparatus for exposing a substrate to an energy in a vacuum includes a substrate stage having a mirror surface; a mirror configured to deflect a light into a Z axis direction; a measuring device configured to measure the stage position in the Z axis direction with the light in which the mirror surface is irradiated; a driving device configured to move the measuring device so that the mirror surface is irradiated with the light; an optical system configured to project the energy onto the substrate; and a cooling device including a radiation plate (arranged between the optical system and the stage in the Z axis direction and having a first opening which the energy passes and a second opening which the light passes), including a cooler configured to cool the first radiation plate, and configured to perform radiation cooling of the substrate.
摘要翻译：用于将衬底暴露于真空中的能量的装置包括具有镜面的衬底台; 配置为将光偏转到Z轴方向的反射镜; 测量装置，被配置为用照射所述镜面的光来测量所述Z轴方向上的所述平台位置; 驱动装置，其构造成使所述测量装置移动，使得所述镜面被所述光照射; 配置成将能量投射到基板上的光学系统; 以及冷却装置，其包括辐射板（布置在所述光学系统和所述台架之间的Z轴方向上并且具有所述能量通过的第一开口和所述光通过的第二开口），所述冷却装置包括冷却器，所述冷却器被配置为冷却所述第一辐射并且被配置为执行基板的辐射冷却。

29. 发明申请

US20110084423A1 IMPRINT APPARATUS AND MANUFACTURING METHOD OF COMMODITIES 有权
标题翻译：商品的印刷设备和制造方法
公开(公告)号：US20110084423A1
公开(公告)日：2011-04-14
申请号：US12902552
申请日：2010-10-12
申请人： Nobushige KORENAGA
发明人： Nobushige KORENAGA
IPC分类号： B29C59/02
CPC分类号： H01L21/67121 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/67092 , Y10S977/887
摘要： The present invention provides an imprint apparatus including a mold and a stage that holds a substrate, the imprint apparatus executing a curing process of curing a resin while the mold and the resin applied to the substrate contact and a demolding process of releasing the mold from the resin cured in the curing process, the imprint apparatus including a structure that holds the mold, a pillar that supports the structure mechanically independently from the stage through an anti-vibration mount that reduces propagation of vibration, and a force providing unit that provides, to the structure, force in an opposite direction from a direction of force generated in the structure by providing demolding force to the mold during the demolding process.
摘要翻译：本发明提供了一种压印装置，其包括模具和保持基板的台架，所述压印装置在施加到所述基板的模具和树脂接触的同时执行固化树脂的固化过程以及从所述模具脱模的脱模过程在固化过程中固化的树脂，所述压印装置包括保持模具的结构，通过减少振动传播的防振支架而机械地独立于舞台的结构支撑的支柱;以及力提供单元，该结构通过在脱模过程中向模具提供脱模力而在与结构中产生的力的方向相反的方向上施力。

30. 发明授权

US07307692B2 Exposure apparatus and device manufacturing method 失效
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07307692B2
公开(公告)日：2007-12-11
申请号：US11091590
申请日：2005-03-29
申请人： Nobushige Korenaga , Naosuke Nishimura
发明人： Nobushige Korenaga , Naosuke Nishimura
IPC分类号： G03B27/52 , G03B27/42 , G03B27/58
CPC分类号： G03F7/70775 , G03F7/70641 , G03F7/70733
摘要： The start of exposure or a process delays because reference alignment such as abutment must be executed along the optical axis after a substrate stage is moved between the exposure position and the processing position. To solve this problem, an exposure apparatus according to this invention includes an exposure optical system which exposes a substrate to a pattern, a substrate processing system which performs a predetermined process for the substrate at a position apart from the exposure optical system, a substrate stage which moves along a plane perpendicular to the optical axis of the exposure optical system, and a measurement device which continuously measures the position of the substrate stage along the optical axis in the moving range of the substrate stage while the substrate stage moves from below the substrate processing system to below the exposure optical system.
摘要翻译：曝光开始或处理延迟，因为在曝光位置和处理位置之间移动衬底台之后，必须沿着光轴执行诸如邻接的参考对准。为了解决这个问题，根据本发明的曝光装置包括曝光光学系统，其将衬底暴露于图案;衬底处理系统，其在离开曝光光学系统的位置处对衬底执行预定的处理;衬底台其沿着与曝光光学系统的光轴垂直的平面移动;以及测量装置，其在衬底台从衬底的下方连续地测量衬底台的移动范围中沿着光轴的位置的位置处理系统到曝光光学系统下方。

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