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    • 21. 发明授权
    • Cleanroom lift having an articulated arm
    • 洁净室电梯具有铰接臂
    • US06688838B2
    • 2004-02-10
    • US10091686
    • 2002-03-04
    • Ilya LavitskyMichael Rosenstein
    • Ilya LavitskyMichael Rosenstein
    • B66C2300
    • B25J5/007B25J9/042B25J18/04
    • A cleanroom lift for maneuvering large objects such as turbomolecular pumps utilized in semiconductor processing applications is provided. In one embodiment, the lift includes a vertically movable carriage coupled to a linkage assembly. The linkage assembly has a first link and a second link. Each link has one piece construction to minimize deflection under load. The first link is coupled to the carriage by a carriage shaft assembly and to the second link by a linkage shaft assembly. The second link is coupled to the linkage shaft assembly and a gripper assembly. Optionally, a third link and second shaft assembly may be disposed between the gripper assembly and the second link to minimize the weight of the links to facilitate assembly in cleanroom environments.
    • 提供了用于操纵诸如用于半导体加工应用中的涡轮分子泵的大型物体的洁净室升降机。 在一个实施例中,升降机包括联接到连杆组件的可垂直移动的滑架。 连杆组件具有第一连杆和第二连杆。 每个连杆都有一件结构,以减少负载下的挠度。 第一连杆通过滑架轴组件联接到滑架,并通过连杆轴组件连接到第二连杆。 第二连杆联接到连杆轴组件和夹具组件。 可选地,第三连杆和第二轴组件可以设置在夹具组件和第二连杆之间,以最小化连杆的重量,以便于在洁净室环境中组装。
    • 22. 发明授权
    • Shutter disk and blade alignment sensor
    • 快门盘和刀片对准传感器
    • US06669829B2
    • 2003-12-30
    • US10082480
    • 2002-02-20
    • Michael FeltsmanAllen LauMichael RosensteinMarc O. Schweitzer
    • Michael FeltsmanAllen LauMichael RosensteinMarc O. Schweitzer
    • C23C1400
    • C23C14/566
    • The present invention generally provides a physical vapor deposition chamber and a method for detecting a position of a shutter disk within a physical vapor deposition chamber. In one embodiment, a physical vapor deposition chamber includes a chamber body having a shutter disk mechanism disposed therein. A housing is sealingly coupled to a sidewall of the chamber body and communicates therewith through a slot formed through the sidewall. At least a first sensor is disposed adjacent to the housing and orientated to detect the presence of a shutter disk mechanism within the housing. In one embodiment, a method for detecting the position of a shutter disk within a physical vapor deposition chamber having a substrate support generally includes moving the shutter disk away from a substrate support, and changing a state of a first sensor in response to a position of an edge the shutter disk.
    • 本发明通常提供物理气相沉积室和用于检测物理气相沉积室内的快门盘的位置的方法。 在一个实施例中,物理气相沉积室包括其中设置有快门盘机构的室主体。 壳体密封地联接到室主体的侧壁并且通过穿过侧壁形成的槽与其连通。 至少第一传感器被布置成与壳体相邻并且被定向以检测壳体内的快门盘机构的存在。 在一个实施例中,用于检测具有基板支撑件的物理气相沉积室内的快门盘的位置的方法通常包括将快门盘移离基板支撑件,并且响应于第一传感器的位置改变第一传感器的状态 边缘快门盘。
    • 24. 发明授权
    • Screwless shield assembly for vacuum processing chambers
    • 用于真空处理室的无螺纹屏蔽组件
    • US5690795A
    • 1997-11-25
    • US463463
    • 1995-06-05
    • Michael RosensteinHoward GrunesStephen Bruce Brodsky
    • Michael RosensteinHoward GrunesStephen Bruce Brodsky
    • C23C14/00C23C14/56H01L21/00H01L21/203H01L21/302H01L21/3065C23C14/34C23C16/00C23F1/02
    • H01L21/67017C23C14/564Y10S156/916
    • A structure and method is described for securing an overspray shield in processing chambers in the wall sandwich of the chamber or using a dimensionally compliant floating spacer ring to elastically clamp the overspray shield in position in a vacuum substrate processing chamber without the use of removable fasteners. The configuration uses the differential pressures between the inside and outside of the chamber to clamp the overspray shield along with its shield clamping assembly components at a spacer position in the chamber. The spacer position is generally interior to vacuum sealing limits of the chamber. The arrangement is such that if misalignment occurs a good vacuum-type seal cannot be achieved unless the parts are moved to correct alignment. When correctly aligned the overspray shield is tightly held to the processing chamber wall and electrical continuity between the processing chamber wall and the overspray shield is assured throughout expected process conditions.
    • 描述了一种结构和方法,用于将过喷屏蔽件固定在室的壁三明治中的处理腔室中,或者使用尺寸合适的浮动间隔环来弹性地将超喷射屏蔽件弹性地夹紧在真空基板处理室中的适当位置,而不使用可移除的紧固件。 该配置使用腔室内部和外部之间的压差将过喷面罩与其屏蔽夹紧组件部件一起夹在腔室中的间隔件位置。 间隔件位置通常在腔室的真空密封极限内部。 这种布置使得如果发生不对准,则不能实现良好的真空型密封,除非将部件移动到正确的对准。 当正确对准时,超喷射屏蔽被紧紧地保持在处理室壁上,并且在预期的工艺条件下确保了处理室壁和过喷面罩之间的电连续性。