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21. 发明授权

US5829087A Substrate spin cleaning apparatus 失效
标题翻译：基材旋转清洗装置
公开(公告)号：US5829087A
公开(公告)日：1998-11-03
申请号：US529832
申请日：1995-09-18
申请人： Joichi Nishimura , Tadashi Sasaki , Masami Ohtani
发明人： Joichi Nishimura , Tadashi Sasaki , Masami Ohtani
IPC分类号： A46B13/04 , H01L21/304
CPC分类号： H01L21/67046
摘要： A cleaning brush is fixed to a cleaner support that is mounted to a rotary element for vertical movement with respect thereto. The rotary element is rotatably supported by a forward portion of a support arm that is pivotable about a vertical axis at the rear of the support arm. A closed space defined by a bellows is connected to air piping having a pressure gauge and a regulator. The regulator is operable in response to variations of pressure resulting from engagement of the cleaning brush with a substrate, to control pressure within said bellows whereby the latter expands and contracts to raise or lower the cleaner support relative to the substrate as required to maintain the pressure in a predetermined range. The aforesaid construction responds fast enough to allow the cleaning brush to follow warping of the substrate with facility, and by so doing clean an entire substrate surface uniformly.
摘要翻译：清洁刷被固定到安装到旋转元件上用于相对于其垂直移动的清洁器支撑件。旋转元件由支撑臂的前部可旋转地支撑，支撑臂的前部可在支撑臂的后部围绕垂直轴线枢转。由波纹管限定的封闭空间连接到具有压力计和调节器的空气管道。调节器可响应于清洁刷与衬底的接合而产生的压力的变化而操作，以控制所述波纹管内的压力，从而当所述波纹管膨胀并收缩时，根据需要使清洁器支撑件相对于基板升高或降低以维持压力在预定范围内。上述结构足够快地响应于清洁刷使设备跟随基板翘曲，并且通过这样清洁整个基板表面均匀。

22. 发明授权

US08286293B2 Substrate cleaning device and substrate processing apparatus including the same 有权
标题翻译：基板清洗装置及其基板处理装置
公开(公告)号：US08286293B2
公开(公告)日：2012-10-16
申请号：US12179559
申请日：2008-07-24
申请人： Koji Nishiyama , Joichi Nishimura , Hiroshi Yoshii
发明人： Koji Nishiyama , Joichi Nishimura , Hiroshi Yoshii
IPC分类号： B08B1/04
CPC分类号： H01L21/67046
摘要： A cleaning processing unit includes a spin chuck for horizontally holding a substrate and rotating the substrate around the vertical axis passing through the center of the substrate. A bevel cleaner is disposed outside the spin chuck. The bevel cleaner includes a cleaning brush. The cleaning brush has a shape that is symmetric about its vertical axis, and has an upper bevel cleaning surface, an end surface cleaning surface, and a lower bevel cleaning surface. The end surface cleaning surface is a cylindrical surface having its axis in the vertical direction. The upper bevel cleaning surface extends out from and is inclined upward from the upper end of the end surface cleaning surface, and the lower bevel cleaning surface extends out from and is inclined downward from the lower end of the end surface cleaning surface.
摘要翻译：清洁处理单元包括用于水平地保持基板并使基板围绕穿过基板的中心的垂直轴旋转的旋转卡盘。斜面清洁器设置在旋转卡盘外部。斜面清洁器包括清洁刷。清洁刷具有关于其垂直轴线对称的形状，并且具有上斜面清洁表面，端面清洁表面和下斜面清洁表面。端面清洁表面是其轴线在垂直方向上的圆柱形表面。上斜面清洁表面从端表面清洁表面的上端延伸出并向上倾斜，并且下斜面清洁表面从端表面清洁表面的下端向外延伸并向下倾斜。

23. 发明授权

US6060697A Substrate processing apparatus having regulated power consumption and method therefor 失效
标题翻译：具有稳定功耗的基板处理装置及其方法
公开(公告)号：US6060697A
公开(公告)日：2000-05-09
申请号：US39141
申请日：1998-03-13
申请人： Akihiko Morita , Masami Ohtani , Yasuo Imanishi , Masao Tsuji , Masaki Iwami , Joichi Nishimura , Kazuhiro Nishimura , Tetsuya Hamada , Satoshi Yamamoto , Kenji Kamei
发明人： Akihiko Morita , Masami Ohtani , Yasuo Imanishi , Masao Tsuji , Masaki Iwami , Joichi Nishimura , Kazuhiro Nishimura , Tetsuya Hamada , Satoshi Yamamoto , Kenji Kamei
IPC分类号： H01L21/02 , G05D23/19 , H02J3/00 , H02J13/00 , H05B1/02
CPC分类号： G05D23/1951
摘要： A substrate processing apparatus reduces an instantaneous maximum power consumption at turn-on. Power receiving parts of a plurality of processing units are connected to one end of a turn-on switch respectively through switches. The other end of the turn-on switch is connected to an external power source through a breaker. Timer values are set in advance in the timers, respectively. When the turn-on switch is turned on, the timers turn on the associated switches respectively after times which are defined by the timer values, whereby the processing units are provided with electric power, each with a delay of a constant time.
摘要翻译：基板处理装置降低开启时的瞬时最大功耗。多个处理单元的受电部分分别通过开关连接到导通开关的一端。导通开关的另一端通过断路器连接到外部电源。定时器值分别在定时器中设置。当接通开关接通时，定时器分别在由定时器值定义的时间之后分别关闭相应的开关，由此处理单元被提供电力，每个具有恒定时间的延迟。

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