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21. 发明申请

US20090105980A1 PLASMA PROCESSING APPARATUS AND METHOD FOR DETECTING STATUS OF SAID APPARATUS 失效
标题翻译：等离子体处理装置和检测装置状态的方法
公开(公告)号：US20090105980A1
公开(公告)日：2009-04-23
申请号：US12025095
申请日：2008-02-04
申请人： Tsutomu TETSUKA , Naoshi Itabashi , Atsushi Itou
发明人： Tsutomu TETSUKA , Naoshi Itabashi , Atsushi Itou
IPC分类号： B05C11/00 , G06F19/00 , G01R23/16
CPC分类号： H01J37/32082 , H01J37/321 , H01J37/32174 , H01J37/32935
摘要： The invention provides a method for detecting and managing the status of a plasma processing apparatus with high sensitivity so as to enable long-term stable processing. In a plasma processing apparatus comprising a vacuum processing chamber 10, a plasma generating high frequency power supply 16, and a measurement device unit 3 for estimating the status of the apparatus via reflected waves 54 of the incident waves 53 reflected from the processing apparatus including a waveform generator 32, a VCO 33, a directional coupler 34, a detector 35 and a measurement data processing unit 36, frequency-swept high frequency waves 53 for measurement are introduced to the processing chamber where no plasma discharge is performed, so as to monitor the change of absorption spectrum frequency of the reflected waves 54 to thereby monitor the change in status of the processing apparatus.
摘要翻译：本发明提供了一种用于检测和管理具有高灵敏度的等离子体处理装置的状态以便能够进行长期稳定处理的方法。在包括真空处理室10，等离子体产生高频电源16和测量装置单元3的等离子体处理装置中，用于通过从包括a的处理装置反射的入射波53的反射波54估计装置的状态波形发生器32，VCO33，定向耦合器34，检测器35和测量数据处理单元36，将用于测量的频率扫描高频波53引入到不进行等离子体放电的处理室中，以便监视反射波54的吸收光谱频率的变化，从而监视处理装置的状态变化。

22. 再颁专利

USRE39775E1 Vacuum processing operating method with wafers, substrates and/or semiconductors 失效
公开(公告)号：USRE39775E1
公开(公告)日：2007-08-21
申请号：US10066747
申请日：2002-09-24
申请人： Shigekazu Kato , Kouji Nishihata , Tsuenhiko Tsubone , Atsushi Itou
发明人： Shigekazu Kato , Kouji Nishihata , Tsuenhiko Tsubone , Atsushi Itou
IPC分类号： F26B5/04
CPC分类号： H01L21/67748 , C23C14/564 , H01L21/67028 , H01L21/67167 , H01L21/67253
摘要： This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple. Furthermore, the dummy substrates used for dry cleaning and the substrates to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.

23. 发明授权

US07089680B1 Vacuum processing apparatus and operating method therefor 失效
标题翻译：真空处理装置及其操作方法
公开(公告)号：US07089680B1
公开(公告)日：2006-08-15
申请号：US09766596
申请日：2001-01-23
申请人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
发明人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
IPC分类号： F26R13/30
CPC分类号： H01L21/67748 , B41J2/36 , B41J2/365 , C23C14/564 , H01L21/67028 , H01L21/67167 , H01L21/67253 , Y10S134/902 , Y10S414/139 , Y10S414/14
摘要： A vacuum processing apparatus which includes a means for transferring substrates from a loader, with a transferring device, to a double lock chamber; and, then to a selected vacuum processing chamber. The substrates are returned to a substrate, by the vacuum loader, into their original position in the substrate table. The surfaces of the substrates are maintained in a horizontal position during processing.
摘要翻译：一种真空处理装置，包括用于将基板从装载器与转印装置传送到双重锁定室的装置; 然后到选定的真空处理室。基板通过真空装载机返回到基板到基板台中的原始位置。在处理期间，基板的表面保持在水平位置。

24. 发明申请

US20060032073A1 Vacuum processing apparatus and operating method therefor 失效
公开(公告)号：US20060032073A1
公开(公告)日：2006-02-16
申请号：US11204171
申请日：2005-08-16
申请人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
发明人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
IPC分类号： F26B13/30 , F26B5/04
CPC分类号： H01L21/67748 , B01J3/006 , B41J2/36 , B41J2/365 , C23C14/564 , H01L21/67028 , H01L21/67167 , H01L21/67253 , H01L21/67736 , Y10S134/902 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple. Furthermore, the dummy substrates used for dry cleaning and the substrates to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.

25. 发明授权

US06968630B2 Vacuum processing apparatus and operating method therefor 失效
公开(公告)号：US06968630B2
公开(公告)日：2005-11-29
申请号：US10796195
申请日：2004-03-10
申请人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
发明人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
IPC分类号： B01J3/00 , B41J2/36 , B41J2/365 , C23C14/56 , H01L21/00 , H01L21/677 , F26B5/04
CPC分类号： H01L21/67748 , B01J3/006 , B41J2/36 , B41J2/365 , C23C14/564 , H01L21/67028 , H01L21/67167 , H01L21/67253 , H01L21/67736 , Y10S134/902 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple. Furthermore, the dummy substrates used for dry cleaning and the substrates to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.

26. 发明授权

US06886272B2 Vacuum processing apparatus and operating method therefor 失效
标题翻译：真空处理装置及其操作方法
公开(公告)号：US06886272B2
公开(公告)日：2005-05-03
申请号：US10683067
申请日：2003-10-14
申请人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
发明人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
IPC分类号： B01J3/00 , B41J2/36 , B41J2/365 , C23C14/56 , H01L21/00 , H01L21/677 , F26B13/30
CPC分类号： H01L21/67748 , B01J3/006 , B41J2/36 , B41J2/365 , C23C14/564 , H01L21/67028 , H01L21/67167 , H01L21/67253 , H01L21/67736 , Y10S134/902 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple. Furthermore, the dummy substrates used for dry cleaning and the substrates to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.
摘要翻译：本发明涉及一种具有真空处理室的真空处理装置，其内部必须是干式清洁的，以及一种操作这种装置的方法。当真空处理室被干洗时，虚设基板通过基板传送装置从设置在空气气氛中的虚设基板存储装置与用于存储待处理基板的存储装置一起转移到真空处理室中，通过产生等离子体对真空处理室进行干洗。在完成干洗之后，虚拟衬底返回到虚设衬底存储装置。因此，仅用于清洁目的的特定机构是不必要的，并且可以使装置的结构简单。此外，用于干洗的虚拟基板和待加工的基板不共存，可以防止由于灰尘和剩余气体而被处理的基板的污染，并且生产率可以高。

27. 发明授权

US06484415B2 Vacuum processing apparatus 失效
标题翻译：真空加工设备
公开(公告)号：US06484415B2
公开(公告)日：2002-11-26
申请号：US09782193
申请日：2001-02-14
申请人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
发明人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
IPC分类号： F26B1330
CPC分类号： H01L21/67748 , B01J3/006 , B41J2/36 , B41J2/365 , C23C14/564 , H01L21/67028 , H01L21/67167 , H01L21/67253 , H01L21/67736 , Y10S134/902 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： A wafer conveyor system for used in a vacuum processing apparatus wherein the conveyor structure is provided with a transfer structure and a robot apparatus is arranged on the transfer structure. The robot provides for rotation of the wafer horizontally from a position in a cassette to an opposite postion of the cassette.
摘要翻译：一种用于真空处理设备的晶片传送系统，其中传送结构设置有传送结构，机器人装置设置在传送结构上。机器人使晶片从盒中的位置水平地旋转到盒的相对位置。

28. 发明授权

US6044576A Vacuum processing and operating method using a vacuum chamber 失效
标题翻译：使用真空室的真空处理和操作方法
公开(公告)号：US6044576A
公开(公告)日：2000-04-04
申请号：US390684
申请日：1999-09-07
申请人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
发明人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
IPC分类号： B01J3/00 , B41J2/36 , B41J2/365 , C23C14/56 , H01L21/00 , H01L21/677 , F26B5/04
CPC分类号： H01L21/67748 , B01J3/006 , B41J2/36 , B41J2/365 , C23C14/564 , H01L21/67028 , H01L21/67167 , H01L21/67253 , H01L21/67736 , Y10S134/902 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple. Furthermore, the dummy substrates used for dry cleaning and the substrates to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.
摘要翻译：本发明涉及一种具有真空处理室的真空处理装置，其内部必须是干式清洁的，以及一种操作这种装置的方法。当真空处理室被干洗时，虚设基板通过基板传送装置从设置在空气气氛中的虚设基板存储装置与用于存储待处理基板的存储装置一起转移到真空处理室中，通过产生等离子体对真空处理室进行干洗。在完成干洗之后，虚拟衬底返回到虚设衬底存储装置。因此，仅用于清洁目的的特定机构是不必要的，并且可以使装置的结构简单。此外，用于干洗的虚拟基板和待加工的基板不共存，可以防止由于灰尘和剩余气体而被处理的基板的污染，并且生产率可以高。

29. 发明授权

US5673750A Vacuum processing method and apparatus 失效
标题翻译：真空加工方法及装置
公开(公告)号：US5673750A
公开(公告)日：1997-10-07
申请号：US460600
申请日：1995-06-02
申请人： Tsunehiko Tsubone , Naoyuki Tamura , Shigekazu Kato , Kouji Nishihata , Atsushi Itou
发明人： Tsunehiko Tsubone , Naoyuki Tamura , Shigekazu Kato , Kouji Nishihata , Atsushi Itou
IPC分类号： C23C14/50 , C23C14/54 , C23C16/458 , C30B33/00 , H01L21/00 , F28F27/00
CPC分类号： C23C16/466 , C23C14/50 , C23C14/541 , C23C16/4583 , C23C16/4586 , C30B33/00 , H01L21/67103
摘要： This invention relates to a vacuum processing method and apparatus. When a sample is plasma processed under a reduced pressure, a sample bed is cooled by a cooling medium kept at a predetermined temperature lower than an etching temperature, the sample is held on the sample bed, a heat transfer gas is supplied between the back of the sample and the sample installation surface of the sample bed, and the pressure of the heat transfer gas is controlled so as to bring the sample to a predetermined processing temperature. Before the step of holding the sample on the sample bed and supplying the heat transfer gas, heat transfer gas remaining upstream and downstream of the flow rate regulator in the supply line for the heat transfer gas is vacuum exhausted. This is accomplished using a bypass line connected upstream and downstream of the flow rate regulator and an arrangement of appropriate valves.
摘要翻译：本发明涉及一种真空处理方法和装置。当样品在减压下进行等离子体处理时，样品床被保持在比蚀刻温度低的预定温度的冷却介质冷却，样品被保持在样品床上，传热气体在样品床的样品和样品安装表面以及传热气体的压力被控制以使样品达到预定的处理温度。在将样品保持在样品床上并供给传热气体的步骤之前，用于传热气体的供给管线中的流量调节器的上游和下游的传热气体被真空排空。这是使用连接在流量调节器的上游和下游的旁路管线和适当的阀的布置来实现的。

30. 发明申请

US20130065116A1 LITHIUM ION SECONDARY BATTERY 有权
标题翻译：锂离子二次电池
公开(公告)号：US20130065116A1
公开(公告)日：2013-03-14
申请号：US13643207
申请日：2011-03-09
申请人： Wataru Ogihara , Atsushi Itou , Tomokazu Yamane , Fumihiro Haga
发明人： Wataru Ogihara , Atsushi Itou , Tomokazu Yamane , Fumihiro Haga
IPC分类号： H01M10/0568
CPC分类号： H01M10/0525 , H01M4/134 , H01M4/386 , H01M4/505 , H01M4/525 , H01M10/0568 , Y02E60/122 , Y02T10/7011
摘要： Disclosed is a lithium ion secondary battery having a positive electrode, a negative electrode and a non-aqueous electrolyte composition (electrolytic solution), characterized in that: the positive electrode includes a positive electrode active material represented by: aLi[Li1/3M12/3]O2.(1−a)LiM2O2 (where M1 represents at least one kind of metal element selected from the group consisting of Mn, Ti, Zr and V; M2 represents at least one kind of metal element selected from the group consisting of Ni, Co, Mn, Al, Cr, Fe, V. Mg and Zn; and a represents a composition ratio and satisfies a relationship of 0
摘要翻译：公开了具有正极，负极和非水电解质组合物（电解液）的锂离子二次电池，其特征在于，所述正极包括由以下物质表示的正极活性物质：Li [Li1 / 3M12 / 3 ] O 2（1-a）LiM 2 O 2（其中，M1表示选自Mn，Ti，Zr和V中的至少一种金属元素; M2表示选自Ni ，Co，Mn，Al，Cr，Fe，V，Mg和Zn; a表示组成比，满足0

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