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21. 发明申请

US20110114022A1 WAFER CARRIER WITH HUB 审中-公开
标题翻译：带框架的拖车
公开(公告)号：US20110114022A1
公开(公告)日：2011-05-19
申请号：US12746846
申请日：2008-12-01
申请人： Vadim Boguslavskiy , Alexander I. Gurary , Keng Moy , Eric A. Armour
发明人： Vadim Boguslavskiy , Alexander I. Gurary , Keng Moy , Eric A. Armour
IPC分类号： C23C16/00 , B05C13/00 , C23C16/44
CPC分类号： C23C16/4581 , C23C16/45508 , C23C16/4584 , H01L21/68764 , H01L21/68771 , H01L21/68792
摘要： A wafer carrier for a rotating disc CVD reactor includes a unitary plate of a ceramic such as silicon carbide defining wafer-holding features such as pockets on its upstream surface and also includes a hub removably mounted to the plate in a central region of the plate. The hub provides a secure connection to the spindle of the reactor without imposing concentrated stresses on the ceramic plate. The hub can be removed during cleaning of the plate. The wafer carrier also preferably includes a gas flow facilitating element on the upstream surface of the plate in the central region of the plate. The gas flow facilitating element helps redirect the flow of incident gases along the upstream surface and away from a flow discontinuity in the central region.
摘要翻译：用于旋转圆盘CVD反应器的晶片载体包括诸如碳化硅的陶瓷的整体板，其限定晶片保持特征，例如其上游表面上的凹穴，并且还包括可拆卸地安装到板的中心区域中的毂。轮毂提供与反应器主轴的牢固连接，而不会在陶瓷板上产生集中应力。在清洁板时可以拆下轮毂。晶片载体还优选地包括在板的中心区域中的板的上游表面上的气流促进元件。气流促进元件有助于沿着上游表面并且远离中心区域中的流动不连续性重定向入射气体的流动。

22. 发明授权

US06197121B1 Chemical vapor deposition apparatus 有权
标题翻译：化学气相沉积装置
公开(公告)号：US06197121B1
公开(公告)日：2001-03-06
申请号：US09345032
申请日：1999-06-30
申请人： Alexander I. Gurary , Richard A. Stall , Robert F. Karlicek, Jr. , Peter Zawadzki , Thomas Salagaj
发明人： Alexander I. Gurary , Richard A. Stall , Robert F. Karlicek, Jr. , Peter Zawadzki , Thomas Salagaj
IPC分类号： C23C1600
CPC分类号： C23C16/45574 , C23C16/45514 , C23C16/45565 , C23C16/45572 , C23C16/45591 , C23C16/4584 , C30B25/14
摘要： Reactors for growing epitaxial layers on substrates are disclosed including rotatable substrate carriers and injectors for injecting gases into the reactor towards the substrates on the carriers and including a gas separator for separately maintaining various gases between gas inlets and the injector. Various reactor embodiments are disclosed including removable gas separators, and particular injectors which include cooling channels, as well as flow restrictors mounted within the reactors to restrict the flow of the gases to the substrates from the injector, and heaters mounted within the rotatable shell holding the substrate carriers so that the heaters can be accessed and removed through a lid forming a wall of the reactor.
摘要翻译：公开了用于在衬底上生长外延层的反应器，其包括可转动的衬底载体和用于将气体注入载体上的衬底的反应器的喷射器，并且包括用于分别保持气体入口和注射器之间的各种气体的气体分离器。公开了各种反应器实施方案，包括可移除的气体分离器和包括冷却通道的特定注射器以及安装在反应器内的限流器，以限制从喷射器流到基板的气体，以及安装在可旋转外壳内的加热器，衬底载体，使得可以通过形成反应器的壁的盖子来访问和移除加热器。

23. 发明授权

US10136472B2 Terminal for mechanical support of a heating element 有权
公开(公告)号：US10136472B2
公开(公告)日：2018-11-20
申请号：US13568928
申请日：2012-08-07
申请人： Arno Plankensteiner , Christian Feist , Vadim Boguslavskiy , Alexander I. Gurary , Chenghung Paul Chang
发明人： Arno Plankensteiner , Christian Feist , Vadim Boguslavskiy , Alexander I. Gurary , Chenghung Paul Chang
IPC分类号： H05B1/00 , C23C16/458 , C23C16/46 , H01L21/67
摘要： A terminal for mechanical support of a heating element, includes a base device, a mounting device, the mounting device adapted to support the heating element, and a support device connecting the base device to the mounting device, the support device allowing displacement of the heating element about a radial axis and less than about 10% displacement of the heating element about a tangential and/or axial axis.

24. 外观设计

USD726133S1 Keyed spindle 有权
标题翻译：键控主轴
公开(公告)号：USD726133S1
公开(公告)日：2015-04-07
申请号：US29416216
申请日：2012-03-20
申请人： Sandeep Krishnan , Keng Moy , Alexander I. Gurary , Matthew King , Vadim Boguslavskiy , Steven Krommenhoek
设计人： Sandeep Krishnan , Keng Moy , Alexander I. Gurary , Matthew King , Vadim Boguslavskiy , Steven Krommenhoek

25. 发明授权

US08888360B2 Methods and systems for in-situ pyrometer calibration 有权
标题翻译：用于原位高温计校准的方法和系统
公开(公告)号：US08888360B2
公开(公告)日：2014-11-18
申请号：US13331112
申请日：2011-12-20
申请人： Alexander I. Gurary , Vadim Boguslavskiy , Sandeep Krishnan , Matthew King
发明人： Alexander I. Gurary , Vadim Boguslavskiy , Sandeep Krishnan , Matthew King
IPC分类号： G01K15/00 , G01K13/12 , G01K1/00 , G01J5/00
CPC分类号： G01J5/0003 , G01J5/0007 , G01J2005/0048
摘要： A method of in-situ pyrometer calibration for a wafer treatment reactor such as a chemical vapor deposition reactor desirably includes the steps of positioning a calibrating pyrometer at a first calibrating position and heating the reactor until the reactor reaches a pyrometer calibration temperature. The method desirably further includes rotating the support element about the rotational axis, and while the support element is rotating about the rotational axis, obtaining first operating temperature measurements from a first operating pyrometer installed at a first operating position, and obtaining first calibrating temperature measurements from the calibration pyrometer. Both the calibrating pyrometer and the first operating pyrometer desirably are adapted to receive radiation from a first portion of a wafer support element at a first radial distance from a rotational axis of the wafer support element.
摘要翻译：用于晶片处理反应器如化学气相沉积反应器的原位高温计校准的方法理想地包括以下步骤：将校准高温计放置在第一校准位置并加热反应器直到反应器达到高温计校准温度。该方法理想地还包括围绕旋转轴线旋转支撑元件，并且当支撑元件围绕旋转轴线旋转时，从安装在第一操作位置的第一操作高温计获得第一操作温度测量值，并获得第一校准温度测量值校准高温计。校准高温计和第一操作高温计都期望地适于在离晶片支撑元件的旋转轴线的第一径向距离处接收来自晶片支撑元件的第一部分的辐射。

26. 发明申请

US20140042147A1 TERMINAL FOR MECHANICAL SUPPORT OF A HEATING ELEMENT 审中-公开
标题翻译：加热元件的机械支撑终端
公开(公告)号：US20140042147A1
公开(公告)日：2014-02-13
申请号：US13568928
申请日：2012-08-07
申请人： ARNO PLANKENSTEINER , CHRISTIAN FEIST , VADIM BOGUSLAVSKIY , ALEXANDER I. GURARY , CHENGHUNG PAUL CHANG
发明人： ARNO PLANKENSTEINER , CHRISTIAN FEIST , VADIM BOGUSLAVSKIY , ALEXANDER I. GURARY , CHENGHUNG PAUL CHANG
IPC分类号： H05B1/00
CPC分类号： H05B1/00 , C23C16/4585 , C23C16/46 , H01L21/67115
摘要： A terminal for mechanical support of a heating element, includes a base device, a mounting device, the mounting device adapted to support the heating element, and a support device connecting the base device to the mounting device, the support device allowing displacement of the heating element about a radial axis and less than about 10% displacement of the heating element about a tangential and/or axial axis.
摘要翻译：一种用于加热元件的机械支撑的端子，包括基座装置，安装装置，适于支撑加热元件的安装装置和将基座装置连接到安装装置的支撑装置，支撑装置允许加热元件围绕径向轴线并且围绕切线和/或轴向轴线小于约10％的加热元件的位移。

27. 外观设计

USD695242S1 Wafer carrier having pockets 有权
标题翻译：具有口袋的晶圆架
公开(公告)号：USD695242S1
公开(公告)日：2013-12-10
申请号：US29416244
申请日：2012-03-20
申请人： Alexander I. Gurary , Keng Moy , Paul Chang
设计人： Alexander I. Gurary , Keng Moy , Paul Chang

28. 发明授权

US08021487B2 Wafer carrier with hub 失效
标题翻译：带轮毂的晶圆架
公开(公告)号：US08021487B2
公开(公告)日：2011-09-20
申请号：US12001761
申请日：2007-12-12
申请人： Vadim Boguslavskiy , Alexander I. Gurary
发明人： Vadim Boguslavskiy , Alexander I. Gurary
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： C23C16/4581 , C23C16/4584 , H01L21/68764 , H01L21/68771 , H01L21/68792
摘要： A wafer carrier for a rotating disc CVD reactor includes a unitary plate of a ceramic such as silicon carbide defining wafer-holding features such as pockets on its upstream surface and also includes a hub removably mounted to the plate in a central region of the plate. The hub provides a secure connection to the spindle of the reactor without imposing concentrated stresses on the ceramic plate. The hub can be removed during cleaning of the plate.
摘要翻译：用于旋转圆盘CVD反应器的晶片载体包括诸如碳化硅的陶瓷的整体板，其限定晶片保持特征，例如其上游表面上的凹穴，并且还包括可拆卸地安装到板的中心区域中的毂。轮毂提供与反应器主轴的牢固连接，而不会在陶瓷板上产生集中应力。在清洁板时可以拆下轮毂。

29. 发明授权

US6001183A Wafer carriers for epitaxial growth processes 失效
标题翻译：用于外延生长工艺的晶圆载体
公开(公告)号：US6001183A
公开(公告)日：1999-12-14
申请号：US723682
申请日：1996-09-30
申请人： Alexander I. Gurary , Eric A. Armour , Douglas A. Collins , Richard A. Stall
发明人： Alexander I. Gurary , Eric A. Armour , Douglas A. Collins , Richard A. Stall
IPC分类号： C23C16/458 , C23C16/46 , C30B25/12 , C23C16/00
CPC分类号： C23C16/4584 , C23C16/46 , C30B25/12
摘要： A wafer carrier/susceptor combination for use in an epitaxial deposition process has a configuration which provides greater thermal conductivity between the susceptor and the wafer carrier in regions substantially underlying the wafers than in regions not underlying the wafers. This difference in thermal conductivity is produced by configuring the wafer carrier or susceptor so that the lower surface of the wafer carrier is disposed closer to the susceptor in regions substantially underlying the wafers than in at least some regions not underlying the wafers. By controlling the thermal conductivity so that it is greater in certain regions than in other regions, the temperature difference between the wafers and the surface of the wafer carrier can be reduced, and a more uniform temperature distribution across the surface of the wafer can be achieved. As a result, the combination may be used to deposit a more uniform coating across the entire surface of each wafer.
摘要翻译：在外延沉积工艺中使用的晶片载体/基座组合具有这样一种构造，其在基底在晶片下方的区域中在不在晶片下方的区域中在基座和晶片载体之间提供更大的导热性。通过配置晶片载体或基座来产生这种热导率的差异，使得晶片载体的下表面在不在晶片下方的至少一些区域内的基本上位于晶片下方的区域中更靠近基座。通过控制热导率使其在某些区域比其他区域更大，可以减小晶片和晶片载体表面之间的温度差，并且可以实现跨晶片表面的更均匀的温度分布。结果，该组合可用于在每个晶片的整个表面上沉积更均匀的涂层。

30. 发明授权

US09816184B2 Keyed wafer carrier 有权
公开(公告)号：US09816184B2
公开(公告)日：2017-11-14
申请号：US13424821
申请日：2012-03-20
申请人： Sandeep Krishnan , Keng Moy , Alexander I. Gurary , Matthew King , Vadim Boguslavskiy , Steven Krommenhoek
发明人： Sandeep Krishnan , Keng Moy , Alexander I. Gurary , Matthew King , Vadim Boguslavskiy , Steven Krommenhoek
IPC分类号： C23C16/458 , C23C16/46 , H01L21/67 , H01L21/687
CPC分类号： C23C16/4584 , C23C16/4586 , C23C16/46 , H01L21/6719 , H01L21/68764 , H01L21/68771 , H01L21/68792
摘要： A structure for a chemical vapor deposition reactor desirably includes a reaction chamber having an interior, a spindle mounted in the reaction chamber, and a wafer carrier releasably mounted onto the spindle for rotation therewith. The spindle desirably has a shaft extending along a vertical rotational axis and a key projecting outwardly from the shaft. The wafer carrier preferably has a body defining oppositely-facing top and bottom surfaces and at least one wafer-holding feature configured so that a wafer can be held therein with a surface of the wafer exposed at the top surface of the body. The wafer carrier desirably further has a recess extending into the body from the bottom surface of the body and a keyway projecting outwardly from a periphery of the recess along a first transverse axis. The shaft preferably is engaged in the recess and the key preferably is engaged into the keyway.

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