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21. 发明授权

US4882238A Die for use in forming lens 失效
标题翻译：用于成型镜片
公开(公告)号：US4882238A
公开(公告)日：1989-11-21
申请号：US251945
申请日：1988-10-03
申请人： Takashi Yoshioka , Akira Doi
发明人： Takashi Yoshioka , Akira Doi
IPC分类号： C03B11/00 , B29C33/56 , C03B11/08 , C23C16/32 , C23C16/34 , C23C16/42 , C23C28/04
CPC分类号： B29D11/00548 , B29C33/56 , C03B11/086 , C23C16/325 , C23C16/345 , C03B2215/12 , C03B2215/22 , C03B2215/34
摘要： The present invention relates to a die for use in forming optical lenses made of glass or synthetic resin used in OA instruments, VTR, cameras and the like. In order to lengthen the useful life of the die by suppressing the oxidation or deterioration of the die surface due to temperature and atmosphere and reaction of materials of which lenses are made, when lenses are formed, the die is coated with a single-layer or multi-layer thin film of Si.sub.3 N.sub.4 or SiC or compounds thereof, which are superior in wear and corrosion resistance at high temperatures, by the vapor coating method.
摘要翻译：本发明涉及一种用于形成由OA仪器，VTR，照相机等中使用的玻璃或合成树脂制成的光学透镜的模具。为了通过抑制由于温度和气氛导致的模具表面的氧化或劣化以及制造透镜的材料的反应而延长模具的使用寿命，当形成透镜时，模具被涂覆有单层或通过蒸气涂布法在高温下耐磨性和耐腐蚀性优异的Si 3 N 4或SiC的多层薄膜或其化合物。

22. 发明授权

US4474849A Coated hard alloys 失效
标题翻译：涂层硬质合金
公开(公告)号：US4474849A
公开(公告)日：1984-10-02
申请号：US419498
申请日：1982-09-17
申请人： Naoji Fujimori , Akira Doi , Yasuhiro Shimizu
发明人： Naoji Fujimori , Akira Doi , Yasuhiro Shimizu
IPC分类号： C23C14/06 , B23B27/14 , B23P15/28 , C23C14/08 , C23C16/30 , C23C30/00 , B32B15/04
CPC分类号： C23C30/005 , Y10T428/26
摘要： Coated hard alloys excellent in toughness and wear resistance comprise a substrate of hard alloy and at least one coating layer thereon, at least one of the coating layers being of amorphous alumina.
摘要翻译：韧性和耐磨性优异的涂层硬质合金包括硬质合金基材和至少一层涂层，至少一层涂层是无定形氧化铝。

23. 发明授权

US4383957A Method of sintering a ceramic composition 失效
标题翻译：烧结陶瓷组合物的方法
公开(公告)号：US4383957A
公开(公告)日：1983-05-17
申请号：US265569
申请日：1981-05-20
申请人： Akira Yamakawa , Akira Doi , Yoshihiko Doi
发明人： Akira Yamakawa , Akira Doi , Yoshihiko Doi
IPC分类号： C04B35/10 , C04B35/111 , C04B35/119 , C04B35/58 , C04B35/64
CPC分类号： C04B35/111 , C04B35/119 , C04B35/64
摘要： A ceramic sintered body with a high density and high surface smoothness is obtained by sintering a ceramic composition comprising oxides as a substantial or partial component in an atmosphere of CO gas or in a mixture of CO gas and an inert gas.
摘要翻译：通过在CO气体或CO气体和惰性气体的混合气体中烧结包含氧化物作为实质或部分成分的陶瓷组合物，获得具有高密度和高表面平滑度的陶瓷烧结体。

24. 发明授权

US07635860B2 Manufacturing method of organic thin-film transistors and equipment for manufacturing the same 失效
标题翻译：有机薄膜晶体管的制造方法及其制造方法
公开(公告)号：US07635860B2
公开(公告)日：2009-12-22
申请号：US11656220
申请日：2007-01-19
申请人： Tomohiro Inoue , Akira Doi , Masahiko Ando
发明人： Tomohiro Inoue , Akira Doi , Masahiko Ando
IPC分类号： H01L35/24
CPC分类号： H01L51/0003 , H01L21/67109 , H01L21/6715 , H01L21/67248 , H01L51/0027 , H01L51/0541 , H01L51/0545
摘要： To increase productivity of organic thin-film transistors, in an organic thin-film transistor manufacturing equipment, a liquid containing at least either one of a wiring material and a semiconductor material is coated on a substrate to form a number of organic thin-film transistors. Substrate carrying means carry the substrate. The substrate is heated by a first heating means, and the temperature of the substrate is controlled by a controller. The liquid containing at least either one of the wiring material and the semiconductor material is heated by a second heating means, and the temperature of this liquid is controlled also by the controller.
摘要翻译：为了提高有机薄膜晶体管的生产率，在有机薄膜晶体管制造设备中，将包含布线材料和半导体材料中的至少一种的液体涂覆在基板上以形成多个有机薄膜晶体管。基板承载装置承载基板。基板被第一加热装置加热，并且基板的温度由控制器控制。含有布线材料和半导体材料中的至少一种的液体被第二加热装置加热，该液体的温度也由控制器控制。

25. 发明申请

US20080036309A1 Rocking Actuator and Laser Machining Apparatus 有权
标题翻译：摇动执行器和激光加工设备
公开(公告)号：US20080036309A1
公开(公告)日：2008-02-14
申请号：US11833695
申请日：2007-08-03
申请人： Souichi Toyama , Kounosuke Kitamura , Akira Doi , Hiromu Hirai , Kenta Seki , Yoshiaki Kano
发明人： Souichi Toyama , Kounosuke Kitamura , Akira Doi , Hiromu Hirai , Kenta Seki , Yoshiaki Kano
IPC分类号： H02K33/00
CPC分类号： H02K26/00 , H02K33/16
摘要： A rocking actuator and a laser machining apparatus which can suppress a temperature rise of a permanent magnet in a moving-magnet actuator. Even when a steerable mirror is positioned by rapid and continuous motions, highly reliable machining can be performed without degrading machining throughput or hole position accuracy. A cooling jacket for cooling a casing and heat transfer units brought into contact with a coil and the casing are provided. Heat generated in the coil is introduced to the casing through the heat transfer bypass units. Thus, the temperature rise of the coil is suppressed. Radial grooves are provided in the permanent magnet opposed to the coil so as to prevent an eddy current from appearing therein. Groove depth is made not smaller than skin depth expressed by a function of volume resistivity and permeability of the permanent magnet and a fundamental frequency of a current applied to the coil.
摘要翻译：可以抑制移动磁体致动器中的永磁体的温度升高的摆动致动器和激光加工装置。即使通过快速连续的运动来定位可转向的镜子，也可以在不降低加工吞吐量或孔位置精度的情况下执行高度可靠的加工。提供了用于冷却壳体的冷却套和与线圈和壳体接触的传热单元。在线圈中产生的热量通过传热旁路单元引入壳体。因此，线圈的温度上升被抑制。在与线圈相对的永磁体中设置有径向槽，以防止其中出现涡流。凹槽深度不小于由永磁体的体积电阻率和磁导率函数表示的皮肤深度以及施加到线圈的电流的基频。

26. 发明申请

US20070176202A1 Manufacturing method of organic thin-film transistors and equipment for manufacturing the same 失效
标题翻译：有机薄膜晶体管的制造方法及其制造方法
公开(公告)号：US20070176202A1
公开(公告)日：2007-08-02
申请号：US11656220
申请日：2007-01-19
申请人： Tomohiro Inoue , Akira Doi , Masahiko Ando
发明人： Tomohiro Inoue , Akira Doi , Masahiko Ando
IPC分类号： H01L31/00
CPC分类号： H01L51/0003 , H01L21/67109 , H01L21/6715 , H01L21/67248 , H01L51/0027 , H01L51/0541 , H01L51/0545
摘要： To increase productivity of organic thin-film transistors, in an organic thin-film transistor manufacturing equipment, a liquid containing at least either one of a wiring material and a semiconductor material is coated on a substrate to form a number of organic thin-film transistors. Substrate carrying means carry the substrate. The substrate is heated by a first heating means, and the temperature of the substrate is controlled by a controller. The liquid containing at least either one of the wiring material and the semiconductor material is heated by a second heating means, and the temperature of this liquid is controlled also by the controller.
摘要翻译：为了提高有机薄膜晶体管的生产率，在有机薄膜晶体管制造设备中，将包含布线材料和半导体材料中的至少一种的液体涂覆在基板上以形成多个有机薄膜晶体管。基板承载装置承载基板。基板被第一加热装置加热，并且基板的温度由控制器控制。含有布线材料和半导体材料中的至少一种的液体被第二加热装置加热，该液体的温度也由控制器控制。

27. 发明授权

US06846363B2 Plasma processing apparatus and method 有权
标题翻译：等离子体处理装置及方法
公开(公告)号：US06846363B2
公开(公告)日：2005-01-25
申请号：US10139302
申请日：2002-05-07
申请人： Hideyuki Kazumi , Tsutomu Tetsuka , Ryoji Nishio , Masatsugu Arai , Ken Yoshioka , Tsunehiko Tsubone , Akira Doi , Manabu Edamura , Kenji Maeda , Saburo Kanai
发明人： Hideyuki Kazumi , Tsutomu Tetsuka , Ryoji Nishio , Masatsugu Arai , Ken Yoshioka , Tsunehiko Tsubone , Akira Doi , Manabu Edamura , Kenji Maeda , Saburo Kanai
IPC分类号： H01J37/32 , C23C16/00 , H05H1/00
CPC分类号： H01J37/32174 , H01J37/32009 , H01J37/321
摘要： A plasma is generated by feeding an antenna with radio-frequency electric power generated by a radio-frequency power source, and one end of the antenna is grounded to the earth through a capacitor of variable capacitance. A Faraday shield is electrically isolated from the earth, and the capacitance of the variable capacitor is determined to be such a value that the voltage at the two ends of the antenna may be equal in absolute values and inverted to reduce the partial removal of the wall after the plasma ignition. At the time of igniting the plasma, the capacitance of the capacitor is adjusted to a larger or smaller value than that minimizing the damage of the wall.
摘要翻译：通过向天线馈送由射频电源产生的射频电力产生等离子体，并且天线的一端通过可变电容的电容器接地到地球。法拉第屏蔽与地电隔离，可变电容器的电容被确定为这样一个值，即天线两端的电压可以相等于绝对值并反转以减少壁的部分去除等离子体点火后。在点燃等离子体时，电容器的电容被调整到比将壁损坏最小化的更大或更小的值。

28. 发明授权

US06833051B2 Plasma processing apparatus and method 有权
标题翻译：等离子体处理装置及方法
公开(公告)号：US06833051B2
公开(公告)日：2004-12-21
申请号：US10139281
申请日：2002-05-07
申请人： Hideyuki Kazumi , Tsutomu Tetsuka , Ryoji Nishio , Masatsugu Arai , Ken Yoshioka , Tsunehiko Tsubone , Akira Doi , Manabu Edamura , Kenji Maeda , Saburo Kanai
发明人： Hideyuki Kazumi , Tsutomu Tetsuka , Ryoji Nishio , Masatsugu Arai , Ken Yoshioka , Tsunehiko Tsubone , Akira Doi , Manabu Edamura , Kenji Maeda , Saburo Kanai
IPC分类号： H05H100
CPC分类号： H01J37/32174 , H01J37/32009 , H01J37/321
摘要： A plasma processing apparatus includes a vacuum chamber having a structure that surrounds a space where plasma is generated, a sample stage disposed in the chamber on which a sample to be processed is placed and coil antenna providing an electric field to the space. The structure has a non-conductive member surrounding the space and a conductive member covering the non-conductive member, both of which are disposed between the antenna and the space. The conductive member is electrically floated at least when the plasma is generated.
摘要翻译：等离子体处理装置包括具有围绕产生等离子体的空间的结构的真空室，设置在其上放置待处理样品的室中的样品台和向该空间提供电场的线圈天线。该结构具有围绕空间的非导电构件和覆盖非导电构件的导电构件，两者都设置在天线和空间之间。至少当产生等离子体时，导电构件电漂浮。

29. 发明授权

US06481370B2 Plasma processsing apparatus 有权
标题翻译：等离子处理装置
公开(公告)号：US06481370B2
公开(公告)日：2002-11-19
申请号：US09732307
申请日：2000-12-08
申请人： Hideyuki Kazumi , Tsutomu Tetsuka , Ryoji Nishio , Masatsugu Arai , Ken Yoshioka , Tsunehiko Tsubone , Akira Doi , Manabu Edamura , Kenji Maeda , Saburo Kanai
发明人： Hideyuki Kazumi , Tsutomu Tetsuka , Ryoji Nishio , Masatsugu Arai , Ken Yoshioka , Tsunehiko Tsubone , Akira Doi , Manabu Edamura , Kenji Maeda , Saburo Kanai
IPC分类号： C23C1600
CPC分类号： H01J37/32174 , H01J37/32009 , H01J37/321
摘要： A plasma is generated by feeding an antenna with radio-frequency electric power generated by a radio-frequency power source, and one end of the antenna is grounded to the earth through a capacitor of variable capacitance. A Faraday shield is electrically isolated from the earth, and the capacitance of the variable capacitor is determined to be such a value that the voltage at the two ends of the antenna may be equal in absolute values and inverted to reduce the partial removal of the wall after the plasma ignition. At the time of igniting the plasma, the capacitance of the capacitor is adjusted to a larger or smaller value than that minimizing the damage of the wall.
摘要翻译：通过向天线馈送由射频电源产生的射频电力产生等离子体，并且天线的一端通过可变电容的电容器接地到地球。法拉第屏蔽与地电隔离，可变电容器的电容被确定为这样一个值，即天线两端的电压可以相等于绝对值并反转以减少壁的部分去除等离子体点火后。在点燃等离子体时，电容器的电容被调整到比将壁损坏最小化的更大或更小的值。

30. 发明授权

US6023025A Electric wire and manufacturing method thereof 失效
标题翻译：电线及其制造方法
公开(公告)号：US6023025A
公开(公告)日：2000-02-08
申请号：US859362
申请日：1997-05-20
申请人： Takahiro Nakahigashi , Akira Doi
发明人： Takahiro Nakahigashi , Akira Doi
IPC分类号： C23C16/26 , C23C16/27 , C23C16/50 , H01B7/18 , H01B13/00 , H01B7/00
CPC分类号： H01B13/0026 , H01B7/18
摘要： An electric wire in which a carbon film having abrasion resistance and lubricity is formed on the outer surface of an insulation cover made from at least one kind of material selected from rubber and resin, and covering an electric wire body, and a manufacturing method of the electric wire.
摘要翻译：在由选自橡胶和树脂中的至少一种材料制成的覆盖电线体的绝缘盖的外表面上形成具有耐磨性和润滑性的碳膜的电线以及其制造方法电线。

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