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11. 发明授权

US06939447B2 Method of providing conductive tracks on a printed circuit and apparatus for use in carrying out the method 失效
标题翻译：在印刷电路上设置导电轨道的方法和用于执行该方法的装置
公开(公告)号：US06939447B2
公开(公告)日：2005-09-06
申请号：US10367362
申请日：2003-02-14
申请人： John Michael Lowe
发明人： John Michael Lowe
IPC分类号： C25D5/02 , C25D5/06 , H05K3/24 , C25D19/00
CPC分类号： H05K3/246 , C25D5/02 , C25D5/06 , H05K3/241
摘要： A method of electro-plating comprises providing an anode current for a target, applying an electron beam to the surface of a target and passing electrolyte between said target and anode, thereby to deposit material on said target. An electron beam gun directs an electron beam onto web while anode provides a current thereby depositing material on the web.
摘要翻译：一种电镀方法包括为目标物提供阳极电流，向目标表面施加电子束，并在所述靶和阳极之间通过电解质，从而将材料沉积在所述靶上。电子束枪将电子束引导到纸上，而阳极提供电流，从而在纸幅上沉积材料。

12. 发明申请

US20050133379A1 System for electropolishing and electrochemical mechanical polishing 有权
标题翻译：电抛光和电化学机械抛光系统
公开(公告)号：US20050133379A1
公开(公告)日：2005-06-23
申请号：US10822424
申请日：2004-04-12
申请人： Bulent Basol , Jalal Ashjaee , Boris Govzman , Homayoun Talieh , Bernard Frey
发明人： Bulent Basol , Jalal Ashjaee , Boris Govzman , Homayoun Talieh , Bernard Frey
IPC分类号： B24B37/04 , C25D5/02 , C25D5/06 , C25D5/22 , C25D7/12 , C25F7/00 , H01L21/00 , H01L21/288 , H01L21/321 , B23H9/00
CPC分类号： B24B37/046 , B24B37/20 , C25F7/00 , H01L21/2885 , H01L21/32115 , H01L21/32125 , H01L21/67075 , H01L21/6715
摘要： An apparatus for electropolishing a conductive layer on a wafer using a solution is disclosed. The apparatus comprises an electrode assembly immersed in the solution configured proximate to the conductive layer having a longitudinal dimension extending to at least a periphery of the wafer, the electrode assembly including an elongated contact electrode configured to receive a potential difference, an isolator adjacent the elongated contact electrode, and an elongated process electrode adjacent the isolator configured to receive the potential difference, a voltage supply is configured to supply the potential difference between the contact electrode and the process electrode to electropolish the conductive layer on the wafer.
摘要翻译：公开了一种使用溶液对晶片上的导电层进行电解抛光的装置。该装置包括浸入在靠近导电层配置的溶液中的电极组件，其具有延伸至晶片的至少周边的纵向尺寸，电极组件包括构造成接收电位差的细长接触电极，邻近细长的隔离器接触电极和邻近隔离器的细长工艺电极，其被配置为接收电位差，电压源被配置为提供接触电极和处理电极之间的电位差以对晶片上的导电层进行电解抛光。

13. 发明授权

US5630931A Process for the hydrometallurgical and electrochemical treatment of the active mass of exhausted lead batteries, to obtain electrolytic lead and elemental sulphur 失效
标题翻译：用于湿法冶金和电化学处理废气铅电池活性物质的方法，以获得电解铅和元素硫
公开(公告)号：US5630931A
公开(公告)日：1997-05-20
申请号：US591717
申请日：1996-01-25
申请人： Adilson C. Manequini
发明人： Adilson C. Manequini
IPC分类号： B09B3/00 , C01B17/06 , C01B17/24 , C01B17/26 , C22B7/00 , C22B13/00 , C25C1/18 , H01M10/54 , C25D5/06
CPC分类号： C25C1/18 , C22B13/045 , H01M10/54 , Y02P10/212 , Y02W30/84
摘要： A hydrometallurgical and electrochemical process for treating exhausted lead batteries, in particular the active mass and the electrolyte, is described having as products electrolytically obtained lead and elemental sulphur. The active mass (paste) obtained from the mechanical processing of the exhausted batteries, consisting mainly of lead sulphate and dioxide, is dispersed in a dilute H.sub.2 SO.sub.4 solution and then reacted with an Na.sub.2 S solution to convert all the lead compounds present into insoluble lead sulphide and sodium sulphate. After filtration, the sodium sulphate solution is evaporated to obtain the anhydrous salt. From this, by thermal reduction with carbon, the Na.sub.2 S is reformed for use in treating further paste. The lead sulphide obtained in this manner is leached with an electrolyte based on ferric fluoborate, which oxidizes the sulphide to elemental sulphur and solubilizes the lead in the form of fluoborate. After filtering the residue containing the elemental sulphur, the lead fluoborate solution is electrolyzed in a diaphragm cell to obtain electrolytic lead in the cathodic compartment and regenerate the ferric fluoborate in the anodic compartment for use in leaching further sulphide.
摘要翻译：描述了用于处理排出的铅电池，特别是活性物质和电解质的湿法冶金和电化学方法，其具有电解获得的铅和元素硫的产物。由主要由硫酸铅和二氧化硫组成的排出的电池的机械加工得到的活性物质（糊状物）分散在稀的H 2 SO 4溶液中，然后与Na 2 S溶液反应，将所有的铅化合物转化为不溶的硫化铅，硫酸钠。过滤后，蒸发硫酸钠溶液，得到无水盐。由此，通过用碳热还原，将Na 2 S重整以用于处理另外的糊状物。以这种方式获得的硫化铅用基于氟硼酸盐的电解质浸出，其将硫化物氧化成元素硫并以氟硼酸盐的形式溶解铅。在过滤含有元素硫的残余物之后，将荧光氟化铅溶液在隔膜电池中电解以在阴极室中获得电解铅，并在阳极室中再生氟硼酸盐以用于浸出另外的硫化物。

14. 发明授权

US5382343A Electrolytic coating cell 失效
标题翻译：电解涂层电池
公开(公告)号：US5382343A
公开(公告)日：1995-01-17
申请号：US983554
申请日：1993-02-08
申请人： Eric Zwerner
发明人： Eric Zwerner
IPC分类号： C25D5/06 , C25D17/00 , C25D17/14
CPC分类号： C25D5/06
摘要： A plating head includes a prismatic body containing a series of ducts connected via a supply duct to a source of pressurized electrolyte, and a series of ducts connected via a discharge channel to a suction source provided by a venturi in which a partial vacuum is generated by the flow of pressurized electrolyte through a branch duct.
摘要翻译：电镀头包括棱柱体，其包含经由供应管道连接到加压电解质源的一系列管道，以及通过排放通道连接到由文丘里管提供的抽吸源的一系列管道，其中通过由文丘里管产生部分真空加压电解液通过分支管道流动。

15. 发明授权

US4992154A Brush for electrolytic treatment 失效
标题翻译：刷电解处理
公开(公告)号：US4992154A
公开(公告)日：1991-02-12
申请号：US395842
申请日：1989-08-18
申请人： Yoshiaki Ida , Keigo Obata
发明人： Yoshiaki Ida , Keigo Obata
IPC分类号： C25D5/06 , C25D17/14
CPC分类号： C25D17/14
摘要： A brush for use in electrolytic treatment having a brush body including an electrode connected to one terminal of a D.C. source and contacting a workpiece connected to the other terminal of the D.C. source. The brush body comprises a forward portion defining an electrode compartment housing an electrode contact. An electrode holder is removably mounted in the compartment.
摘要翻译：一种用于电解处理的刷子，其具有刷体，该刷体包括连接到直流源的一个端子的电极，并接触连接到直流源的另一个端子的工件。刷体包括限定容纳电极接触件的电极室的前部。电极夹可移除地安装在隔间中。

16. 发明授权

US4800001A Method and apparatus for continuously galvanizing flat workpieces, and especially printed circuit boards 失效
标题翻译：连续镀锌扁平工件，特别是印刷电路板的方法和装置
公开(公告)号：US4800001A
公开(公告)日：1989-01-24
申请号：US8738
申请日：1987-01-30
申请人： Rudi Ott , Heribert Reith
发明人： Rudi Ott , Heribert Reith
IPC分类号： C25D5/06 , H05K3/24 , C25D7/00 , C25D17/12 , C25D17/28
CPC分类号： H05K3/241 , C25D5/06
摘要： Printed circuit boards can be continuously electroplated by passing them through a pair of rollers (7) forming cathodic rollers, which are spring-pressed towards each other, the rollers being driven, for example at the circumferential speed of about 1/2 meter per minute. The rollers form a transport arrangement for the printed circuit board, while providing electrical connection to conductive tracks thereon. Closely downstream of the cathodic rollers are a pair of anodic rollers, made, for example, of titanium with a covering of platinum or iridium, over which a felt sleeve is placed, on which felt sleeve an electrolyte, including sulfuric acid and copper is sprayed. The anodic rollers, connected to a positive terminal, are spaced from the surface of the printed circuit board to leave a surface gap between the rollers and the printed circuit board of about 0.1 mm. Copper is electrolytically deposited, for example, at the current density of about 15 A/dm.sup.2, which is about six times of the density of immersion bath galvanizing, thus permitting deposition of about 32 micrometers copper in 10 minutes rather than 60 minutes in an immersion bath. A plurality of cathodic roller pairs (7) and anodic roller pairs (8) are combined in a single housing to form a module, for example of 10 pairs each, requiring for ten modules 7 meters of length of plane floor space for continuous processing.
摘要翻译：印刷电路板可以通过使它们通过形成阴极辊的一对辊（7）而连续电镀，所述辊形成阴极辊，所述辊彼此弹簧压紧，所述辊被驱动，例如以约1/2米/分钟的圆周速度。辊形成用于印刷电路板的输送装置，同时提供与其上的导电轨道的电连接。阴极辊的紧密下游是一对阳极辊，例如由钛制成，具有铂或铱的覆盖物，在其上放置毡套，毛毡套上包括硫酸和铜的电解质被喷涂在其上。连接到正极端子的阳极辊与印刷电路板的表面间隔开，使辊和印刷电路板之间的表面间隙约为0.1mm。铜以例如约15A / dm 2的电流密度进行电解沉积，约为浸浴镀锌密度的六倍，从而允许在10分钟内沉积约32微米的铜而不是60分钟沉积浴。多个阴极辊对（7）和阳极辊对（8）组合在单个壳体中以形成例如每对10对的模块，其需要十个模块，用于连续处理的7米长的平面占地空间。

17. 发明授权

US4683045A Partial plating device 失效
标题翻译：部分电镀装置
公开(公告)号：US4683045A
公开(公告)日：1987-07-28
申请号：US924657
申请日：1986-10-29
申请人： Yasuto Murata , Junichi Tezuka , Kenji Yamamoto
发明人： Yasuto Murata , Junichi Tezuka , Kenji Yamamoto
IPC分类号： C25D5/02 , C25D5/06 , C25D17/00
CPC分类号： C25D5/02
摘要： This is a plating device for partially electroplating connector terminals at the tip, the target portions to be plated being a pair of forked portions of each connector terminal that are opposing to each other. In this partial plating device, a plating solution supply member to be inserted between the pair of target portions in the connector terminals comprises a support member, anode, net member and winding means. The support member has a top portion substantially forming an arrowhead with slanted guide planes on both sides. An opening is provided at or near the tip of this top portion to allow seepage of the plating solution. The net member covers the top portion of the support at its tip as well as the surface in its vicinity, the net member being freely wound up in the direction intersecting the passage line by the winding means and forming a supply section for the plating solution at a location corresponding to said passage line. With this construction, minute target portions are contacted with the plating solution which seeps on the net member while preventing the net member from being worn at given locations.
摘要翻译：这是用于在尖端处部分地电镀连接器端子的电镀装置，被电镀的目标部分是彼此相对的每个连接器端子的一对叉形部分。在该部分电镀装置中，插入在连接器端子的一对目标部分之间的电镀液供给部件包括支撑部件，阳极，网部件和卷绕装置。支撑构件具有基本形成箭头的顶部，在两侧具有倾斜的引导平面。在该顶部的尖端处或附近设置开口以允许电镀液的渗出。网构件在其尖端处覆盖支撑件的顶部以及其附近的表面，网构件通过缠绕装置沿与通道线相交的方向自由地卷绕，并且形成用于电镀液的供应部分对应于所述通道的位置。利用这种结构，微小的目标部分与网状部件渗漏的电镀液接触，同时防止网状部件在给定的位置被磨损。

18. 发明授权

US4655881A Brush plating method for connector terminals 失效
标题翻译：连接器端子刷电镀方法
公开(公告)号：US4655881A
公开(公告)日：1987-04-07
申请号：US852675
申请日：1986-04-16
申请人： Junichi Tezuka , Yasuto Murata
发明人： Junichi Tezuka , Yasuto Murata
IPC分类号： C25D5/04 , C25D5/02 , C25D5/06 , H01R43/00 , H01R43/16
CPC分类号： C25D5/06 , C25D5/02
摘要： Fork-like connector terminals are moved along the pass line under guidance so that the forked end part thereof won't pass astray from the predetermined passageway. A plating brush, which has been positioned in alignment with the predetermined passageway of the end part of said fork-like connector terminal, is moved into the gap between the opposing portions to be plated at the end of each terminal or passed through said gap in such a way that said brush contacts only the small-area portions to be plated and applies thereto the plating solution supplied to said brush by the liquid retaining material to thereby perform desired plating.
摘要翻译：叉状连接器端子在引导下沿着通过线移动，使得叉状端部不会从预定通道误入歧管。已经被定位成与所述叉状连接器端子的端部的预定通道对准的电镀刷移动到每个端子的端部处要被电镀的相对部分之间的间隙中，或者通过所述间隙这样一种方式使得所述刷只接触待镀的小区域部分，并通过液体保持材料施加到供给所述刷的镀液，从而进行所需的电镀。

19. 发明授权

US4064019A Continuous contact plater method 失效
标题翻译：连续接触法
公开(公告)号：US4064019A
公开(公告)日：1977-12-20
申请号：US666618
申请日：1976-03-15
申请人： Charles D. Eidschun, Jr.
发明人： Charles D. Eidschun, Jr.
IPC分类号： C25D5/02 , C25D5/06 , H05K3/24
CPC分类号： H05K3/241 , C25D5/02 , C25D5/06
摘要： A continuous contact plater is disclosed having a pair of opposed belts for grasping and driving contact points through a pair of opposed jaws to be plated by contact on an anode roller, the same describing a helical trace on the roller. A metering roller is provided to adjustably determine the concentration of the plating fluid on the main roller, and a tray is positioned beneath the anode roller to the end that a porous sleeve on the anode roller constantly passes into the electro-plating solution in the tray. Adjustment means are provided to adjust the roller with regard to the contact points between the opposed belts, the latter being fixed with regard to the frame of the unit.
摘要翻译：公开了一种连续接触平板机，其具有一对相对的带，用于通过一对相对的夹爪抓握并驱动接触点，以通过阳极辊上的接触进行电镀，其中描述了辊上的螺旋迹线。设置计量辊以可调节地确定主辊上的电镀液的浓度，并且托盘位于阳极辊下方，使得阳极辊上的多孔套管不断地进入托盘中的电镀溶液。提供调整装置以相对于相对的带之间的接触点来调整辊，后者相对于单元的框架是固定的。

20. 发明授权

US3865697A Platinum plating process 失效
标题翻译：铂电镀工艺
公开(公告)号：US3865697A
公开(公告)日：1975-02-11
申请号：US36383473
申请日：1973-05-25
申请人： SUGGS ROBERT
发明人： SUGGS ROBERT
IPC分类号： C25D3/50 , C25D5/06 , C23B5/48 , B23P1/02 , C23B5/24
CPC分类号： C25D3/50 , C25D5/06
摘要： The commutator segments of a rotatably supported assembled armature are shorted to the negative side of a DC voltage source and a platinum anode connected to the positive side of the voltage source is wet with an aqueous solution of chloroplatinic acid and an alkali metal compound such as sodium carbonate, the anode wet with solution being wiped across the shorted segments until a platinum layer builds up over the surface thereof. The proportions of chloroplatinic acid and sodium carbonate in the solution are such that platinum build up other than on the commutator segments remains sparse and isolated by the carbonate residue so that there is no shorting of the segments across the insulators.
摘要翻译：可旋转支撑的组装电枢的换向片段与直流电压源的负极短路，与电压源正极连接的铂阳极用氯铂酸和碱金属化合物如钠的水溶液润湿碳酸盐，用溶液润湿的阳极被擦过短路段，直到铂层在其表面上积聚。溶液中氯铂酸和碳酸钠的比例使得除了在换向片上形成的铂不断地被碳酸盐残留物稀释并分离，使得跨越绝缘体的片段不会短路。

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