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    • 11. 发明授权
    • Capacitor, method of producing the same, semiconductor device, and liquid crystal display device
    • 电容器及其制造方法,半导体器件和液晶显示装置
    • US08237242B2
    • 2012-08-07
    • US11880551
    • 2007-07-23
    • Kiwamu AdachiSatoshi Horiuchi
    • Kiwamu AdachiSatoshi Horiuchi
    • H01L29/92
    • H01G4/10G02F1/136213H01G4/1254H01G4/20H01G4/33H01L28/40H01L28/56
    • A capacitor includes a first electrode, a dielectric layer, and a second electrode that are sequentially stacked. The dielectric layer has a stacked layer structure including a predetermined number of hafnium oxide sublayers and predetermined number of tantalum oxide sublayers. The number, materials, and thicknesses of the sublayers are determined so that the thickness ratio has a range in which, in voltage-leakage current characteristics showing the relationship between the voltage between the first and second electrodes and the leakage current, a start voltage at which the slope of an increase in the current starts to discontinuously increase satisfies an electric field strength of 3 [MV/cm] or more when the ratio of the total thickness of the predetermined number of tantalum oxide sublayers to the total thickness of the dielectric layer is varied, and the thickness ratio is within the range such that the start voltage is within the range.
    • 电容器包括依次层叠的第一电极,电介质层和第二电极。 电介质层具有包含规定数量的氧化铪层和预定数量的氧化钽层的堆叠层结构。 确定子层的数量,材料和厚度,使得厚度比具有这样的范围,其中,在表示第一和第二电极之间的电压与漏电流之间的关系的电压 - 漏电流特性中, 当电流增加的斜率开始不连续地增加时,当预定数量的氧化钽层的总厚度与介电层的总厚度的比例达到3 [MV / cm]以上时的电场强度 变化,厚度比在起始电压在该范围内的范围内。
    • 12. 发明授权
    • High-stability thin-film capacitor and method for making the same
    • 高稳定性薄膜电容器及其制造方法
    • US08169771B2
    • 2012-05-01
    • US12311529
    • 2007-10-16
    • Emmanuel DefayJulie GuillanSerge Blonkowski
    • Emmanuel DefayJulie GuillanSerge Blonkowski
    • H01G4/06H01G4/10
    • H01G4/1218H01G4/1254H01G4/33H01L27/016H01L28/40H01L28/56
    • The dielectric of a capacitor is formed by superposition of at least two thin layers made from the same metal oxide, respectively in crystalline and amorphous form and respectively presenting quadratic voltage coefficients of capacitance of opposite signs. The respective thicknesses da and dc of the amorphous and crystalline thin layers comply with the following general formulas: d a = ɛ 0 ⁢ ɛ a C s ⁢ ⁢ 0 ⁢ ( 1 1 - ( ɛ c ɛ a ) 2 ⁢ γ a γ c ) ⁢ ⁢ and ⁢ ⁢ d c = ɛ 0 ⁢ ɛ c C s ⁢ ⁢ 0 ⁢ ( 1 1 - ( ɛ a ɛ c ) 2 ⁢ γ c γ a ) in which ∈0 corresponds to the electric constant, ∈c and ∈a correspond to the relative permittivity of the metal oxide respectively in crystalline form and in amorphous form, Cs0 corresponds to the total surface capacitance at zero field, and γc and γa correspond to the quadratic coefficient of capacitance with respect to the electric field of the metal oxide respectively in crystalline form and in amorphous form.
    • 电容器的电介质通过分别由相同金属氧化物制成的至少两个薄层分别以结晶和非晶形式叠加并且分别呈现相反符号的电容的二次电压系数而形成。 无定型和结晶薄层的各自的厚度da和dc符合以下通式:da =εεεC s⁢0(1 1 - (εcεa)2γaγc) ⋅⋅⋅⋅⋅⋅⋅⋅⋅⋅⋅⋅⁢⁢⁢⁢⁢⁢⁢⁢aɛɛɛɛɛɛɛɛɛɛ∈∈∈∈∈∈∈∈∈∈∈∈∈∈ 分别对应于金属氧化物的结晶形式和非晶形式的相对介电常数,Cs0对应于零场的总表面电容,γc和γa对应于相对于金属氧化物电场的电容的二次系数 分别为结晶形式和无定形形式。
    • 14. 发明申请
    • Capacitors, And Methods Of Forming Capacitors
    • 电容器和形成电容器的方法
    • US20100302705A1
    • 2010-12-02
    • US12476948
    • 2009-06-02
    • Vassil AntonovVishwanath BhatChris Carlson
    • Vassil AntonovVishwanath BhatChris Carlson
    • H01G4/10B05D5/12
    • H01G4/1272H01G4/1209H01G4/1218H01G4/1227H01G4/1245H01G4/1254H01G4/33
    • Some embodiments include methods of forming capacitors. A metal oxide mixture may be formed over a first capacitor electrode. The metal oxide mixture may have a continuous concentration gradient of a second component relative to a first component. The continuous concentration gradient may correspond to a decreasing concentration of the second component as a distance from the first capacitor electrode increases. The first component may be selected from the group consisting of zirconium oxide, hafnium oxide and mixtures thereof; and the second component may be selected from the group consisting of niobium oxide, titanium oxide, strontium oxide and mixtures thereof. A second capacitor electrode may be formed over the first capacitor electrode. Some embodiments include capacitors that contain at least one metal oxide mixture having a continuous concentration gradient of the above-described second component relative to the above-described first component.
    • 一些实施例包括形成电容器的方法。 可以在第一电容器电极上形成金属氧化物混合物。 金属氧化物混合物可以具有相对于第一组分的第二组分的连续浓度梯度。 连续浓度梯度可以对应于与第一电容器电极的距离增加时第二组分的浓度降低。 第一组分可以选自氧化锆,氧化铪及其混合物; 并且第二组分可以选自氧化铌,氧化钛,氧化锶及其混合物。 可以在第一电容器电极上形成第二电容器电极。 一些实施方案包括相对于上述第一组分含有至少一种具有上述第二组分的连续浓度梯度的金属氧化物混合物的电容器。