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    • 12. 发明申请
    • Process control system and process control method
    • 过程控制系统和过程控制方法
    • US20040138773A1
    • 2004-07-15
    • US10727544
    • 2003-12-05
    • Masayuki Tomoyasu
    • G06F019/00
    • G05B19/41875G05B2219/33327G05B2219/37575G05B2219/37576G05B2219/45031Y02P90/22
    • A process control system that controls processing executed on semiconductor wafers by processing apparatuses 120, 122,124 installed in each bay (area) 110 inside a factory the processing results of which are predictable, having installed in the corresponding bay, at least one measuring apparatus 130 that executes a measuring operation on workpieces undergoing the processing in the bay, a transfer path 140 of a transfer apparatus, through which the workpieces are transferred among various apparatuses installed within the bay including the individual processing apparatuses and the measuring apparatus and a process control device 150 that controls the processing apparatuses, the measuring apparatus and the transfer apparatus in the bay. This structure reduces the length of time (cycle time) to elapse from the processing through the inspection operation and also improves the operating rate of each processing apparatus.
    • 一种过程控制系统,其通过处理设备120,122,124来控制在半导体晶片上执行的处理,处理设备120,122,124安装在工厂内的每个间隔(区域)110中,其处理结果可预测地安装在相应的间隔中,至少一个测量设备130 执行在间隔中进行处理的工件上的测量操作,传送装置的传送路径140,工件在安装在包括各个处理设备和测量设备的托架内的各种设备之间传送通过该传送路径140以及过程控制设备150 它控制海湾中的处理设备,测量设备和传送设备。 该结构减少了从通过检查操作的处理中经过的时间长度(循环时间),并且还提高了每个处理装置的操作速率。