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11. 发明申请

US20100141925A1 SCANNER MODEL REPRESENTATION WITH TRANSMISSION CROSS COEFFICIENTS 有权
标题翻译：具有传输交叉系数的扫描仪模型表示
公开(公告)号：US20100141925A1
公开(公告)日：2010-06-10
申请号：US12608460
申请日：2009-10-29
申请人： Yu CAO , Jun Ye , James Patrick Koonmen , Slefan Hunsche
发明人： Yu CAO , Jun Ye , James Patrick Koonmen , Slefan Hunsche
IPC分类号： G03B27/32
CPC分类号： G03F7/705 , G03F7/70508 , G03F7/70666
摘要： The present invention relates to a method for simulating aspects of a lithographic process. According to certain aspects, the present invention uses transmission cross coefficients to represent the scanner data and models. According to other aspects, the present invention enables sensitive data regarding various scanner subsystems to be hidden from third party view, while providing data and models useful for accurate lithographic simulation.
摘要翻译：本发明涉及一种用于模拟光刻工艺的方面的方法。根据某些方面，本发明使用传输交叉系数来表示扫描仪数据和模型。根据其他方面，本发明使得关于各种扫描器子系统的敏感数据能够从第三方视图中隐藏起来，同时提供用于精确光刻模拟的数据和模型。

12. 发明授权

US08379991B2 Delta TCC for fast sensitivity model computation 有权
标题翻译： Delta TCC用于快速灵敏度模型计算
公开(公告)号：US08379991B2
公开(公告)日：2013-02-19
申请号：US12614180
申请日：2009-11-06
申请人： Yu Cao , Jun Ye , Wenjin Shao , Hua Cao
发明人： Yu Cao , Jun Ye , Wenjin Shao , Hua Cao
IPC分类号： G06K9/68
CPC分类号： G06F17/5081 , G03F1/144 , G03F1/36 , G03F1/70 , G03F7/70483 , G03F7/705 , G03F7/70525 , G03F7/70991 , G06F17/5068
摘要： A method for determining a difference between a reference image and a further image of a pattern, the method including determining a reference imaging function; determining parameters of a difference function representative of a difference between the reference imaging function and a further imaging function; calculating a difference between the reference image and the further image of the pattern based on the difference function and the determined parameters.
摘要翻译：一种用于确定参考图像与图案的另一图像之间的差异的方法，所述方法包括确定参考成像功能; 确定代表参考成像功能和另外的成像功能之间的差异的差分函数的参数; 基于差分函数和确定的参数来计算参考图像和图像的另外图像之间的差。

13. 发明申请

US20110224956A1 Methods and Systems for Parameter-Sensitive and Orthogonal Gauge Design for Lithography Calibration 有权
标题翻译：用于光刻校准的参数敏感和正交仪表设计方法和系统
公开(公告)号：US20110224956A1
公开(公告)日：2011-09-15
申请号：US13128630
申请日：2009-11-10
申请人： Jun Ye , Yu Cao , Hanying Feng , Wenjin Shao
发明人： Jun Ye , Yu Cao , Hanying Feng , Wenjin Shao
IPC分类号： G06F17/50
CPC分类号： G06F17/50 , G03F1/14 , G03F1/44 , G03F1/68 , G03F7/70433 , G03F7/705 , G06F17/10 , G06F17/5009
摘要： Methods according to the present invention provide computationally efficient techniques for designing gauge patterns for calibrating a model for use in a simulation process, and which minimize degeneracy between model parameters, and thus maximize pattern coverage for parameter calibration. More specifically, the present invention relates to methods of designing gauge patterns that achieve complete coverage of parameter variations with minimum number of gauges and corresponding measurements in the calibration of a lithographic process utilized to image a target design having a plurality of features. According to some aspects, a method according to the invention includes transforming the space of model parametric space (based on CD sensitivity or Delta TCCs), then iteratively identifying the direction that is most orthogonal to existing gauges' CD sensitivities in this new space, and determining most sensitive line width/pitch combination with optimal assist feature placement which leads to most sensitive CD changes along that direction in model parametric space.
摘要翻译：根据本发明的方法提供用于设计用于校准用于模拟过程中的模型的计量模式的计算有效的技术，并且使模型参数之间的简并性最小化，并且因此使参数校准的模式覆盖最大化。更具体地说，本发明涉及设计规格图案的方法，该图形模式可以用最小数量的量规完成覆盖参数变化，并且在用于对具有多个特征的目标设计进行成像的光刻处理的校准中的对应测量。根据一些方面，根据本发明的方法包括改变模型参数空间的空间（基于CD灵敏度或Delta TCC），然后迭代地识别在该新空间中与现有计量器的CD灵敏度最正交的方向，以及确定最敏感的线宽/间距组合与最佳辅助功能放置，导致在模型参数空间中沿着该方向的最敏感的CD变化。

14. 发明授权

US09588439B1 Information matrix creation and calibration test pattern selection based on computational lithography model parameters 有权
标题翻译：基于计算光刻模型参数的信息矩阵创建和校准测试模式选择
公开(公告)号：US09588439B1
公开(公告)日：2017-03-07
申请号：US13332303
申请日：2011-12-20
申请人： Antoine Jean Bruguier , Yu Cao , Jun Ye , Wenjin Shao
发明人： Antoine Jean Bruguier , Yu Cao , Jun Ye , Wenjin Shao
IPC分类号： G06F17/10 , G06F7/60 , G03F7/20 , G06F17/50
CPC分类号： G03F7/705 , G03F7/70516 , G03F7/70625 , G06F17/5009
摘要： Embodiments of the present invention describe methods of selecting a subset of test patterns from an initial larger set of test patterns for calibrating a computational lithography model. An example method comprises: generating an information matrix for the initial larger set of test patterns, wherein the terms of the information matrix comprise one or more identified model parameters that represent a lithographic process response; and, executing a selection algorithm using terms of the information matrix to select the subset of test patterns that effectively determines values of the identified model parameters that contribute significantly in the lithographic process response, wherein the subset of test patterns characteristically represents the initial larger set of test patterns. The selection algorithm explores coverage relationships existing in the initial larger set of test patterns.
摘要翻译：本发明的实施例描述了从用于校准计算光刻模型的初始较大组测试图案中选择测试图案子集的方法。示例性方法包括：生成用于初始较大组的测试模式的信息矩阵，其中信息矩阵的项包括表示光刻过程响应的一个或多个识别的模型参数; 以及使用所述信息矩阵的项来执行选择算法，以选择有效地确定在所述光刻过程响应中有显着贡献的所识别的模型参数的值的测试模式子集，其中，所述测试模式的子集特征性地表示所述初始较大集合测试模式。选择算法探讨了初始较大的一组测试模式中存在的覆盖关系。

15. 发明授权

US08930172B2 Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibration 有权
标题翻译：用于光刻校准的参数敏感和正交仪表设计的方法和系统
公开(公告)号：US08930172B2
公开(公告)日：2015-01-06
申请号：US13128630
申请日：2009-11-10
申请人： Jun Ye , Yu Cao , Hanying Feng , Wenjin Shao
发明人： Jun Ye , Yu Cao , Hanying Feng , Wenjin Shao
IPC分类号： G06F17/50 , G03F1/00 , G03F7/20 , G03F1/44
CPC分类号： G06F17/50 , G03F1/14 , G03F1/44 , G03F1/68 , G03F7/70433 , G03F7/705 , G06F17/10 , G06F17/5009
摘要： Methods according to the present invention provide computationally efficient techniques for designing gauge patterns for calibrating a model for use in a simulation process, and which minimize degeneracy between model parameters, and thus maximize pattern coverage for parameter calibration. More specifically, the present invention relates to methods of designing gauge patterns that achieve complete coverage of parameter variations with minimum number of gauges and corresponding measurements in the calibration of a lithographic process utilized to image a target design having a plurality of features. According to some aspects, a method according to the invention includes transforming the space of model parametric space (based on CD sensitivity or Delta TCCs), then iteratively identifying the direction that is most orthogonal to existing gauges' CD sensitivities in this new space, and determining most sensitive line width/pitch combination with optimal assist feature placement which leads to most sensitive CD changes along that direction in model parametric space.
摘要翻译：根据本发明的方法提供用于设计用于校准用于模拟过程中的模型的计量模式的计算有效的技术，并且使模型参数之间的简并性最小化，并且因此使参数校准的模式覆盖最大化。更具体地说，本发明涉及设计规格图案的方法，该图形模式可以用最小数量的量规完成覆盖参数变化，并且在用于对具有多个特征的目标设计进行成像的光刻处理的校准中的对应测量。根据一些方面，根据本发明的方法包括改变模型参数空间的空间（基于CD灵敏度或Delta TCC），然后迭代地识别在该新空间中与现有计量器的CD灵敏度最正交的方向，以及确定最敏感的线宽/间距组合与最佳辅助功能放置，导致在模型参数空间中沿着该方向的最敏感的CD变化。

16. 发明申请

US20100260427A1 DELTA TCC FOR FAST SENSITIVITY MODEL COMPUTATION 有权
标题翻译： DELTA TCC快速灵敏度模型计算
公开(公告)号：US20100260427A1
公开(公告)日：2010-10-14
申请号：US12614180
申请日：2009-11-06
申请人： Yu CAO , Jun Ye , Wenjin Shao , Hua Cao
发明人： Yu CAO , Jun Ye , Wenjin Shao , Hua Cao
IPC分类号： G06K9/68
CPC分类号： G06F17/5081 , G03F1/144 , G03F1/36 , G03F1/70 , G03F7/70483 , G03F7/705 , G03F7/70525 , G03F7/70991 , G06F17/5068
摘要： A method for determining a difference between a reference image and a further image of a pattern, the method including determining a reference imaging function; determining parameters of a difference function representative of a difference between the reference imaging function and a further imaging function; calculating a difference between the reference image and the further image of the pattern based on the difference function and the determined parameters.
摘要翻译：一种用于确定参考图像与图案的另一图像之间的差异的方法，所述方法包括确定参考成像功能; 确定代表参考成像功能和另外的成像功能之间的差异的差分函数的参数; 基于差分函数和确定的参数来计算参考图像和图像的另外图像之间的差。

17. 发明授权

US08732625B2 Methods for performing model-based lithography guided layout design 有权
标题翻译：执行基于模型的光刻引导布局设计的方法
公开(公告)号：US08732625B2
公开(公告)日：2014-05-20
申请号：US12663121
申请日：2008-06-03
申请人： Jun Ye , Yu Cao , Hanying Feng
发明人： Jun Ye , Yu Cao , Hanying Feng
IPC分类号： G06F17/50
CPC分类号： G06F17/5009 , G03F1/36 , G03F7/70433 , G03F7/70441 , G03F7/70666
摘要： Methods are disclosed to create efficient model-based Sub-Resolution Assist Features (MB-SRAF). An SRAF guidance map is created, where each design target edge location votes for a given field point on whether a single-pixel SRAF placed on this field point would improve or degrade the aerial image over the process window. In one embodiment, the SRAF guidance map is used to determine SRAF placement rules and/or to fine-tune already-placed SRAFs. The SRAF guidance map can be used directly to place SRAFs in a mask layout. Mask layout data including SRAFs may be generated, wherein the SRAFs are placed according to the SRAF guidance map. The SRAF guidance map can comprise an image in which each pixel value indicates whether the pixel would contribute positively to edge behavior of features in the mask layout if the pixel is included as part of a sub-resolution assist feature.
摘要翻译：公开了创建有效的基于模型的子分辨率辅助特征（MB-SRAF）的方法。创建SRAF指南图，其中每个设计目标边缘位置对于给定的场点投票，放置在该场点上的单像素SRAF是否将改善或降级过程窗口上的空中图像。在一个实施例中，SRAF引导图用于确定SRAF放置规则和/或微调已经放置的SRAF。 SRAF引导图可以直接用于将SRAF放置在掩码布局中。可以生成包括SRAF的掩模布局数据，其中根据SRAF引导图放置SRAF。 SRAF引导图可以包括图像，其中每个像素值指示如果像素被包括为子分辨率辅助特征的一部分，则像素是否将对掩模布局中的特征的边缘行为贡献积极。

18. 发明申请

US20140012671A1 CONTENT-BASED TARGETED ONLINE ADVERTISEMENT 审中-公开
标题翻译：基于内容的目标在线广告
公开(公告)号：US20140012671A1
公开(公告)日：2014-01-09
申请号：US13543705
申请日：2012-07-06
申请人： Jun Ye , Yu Cao , Luoqi Chen , Ya Luo , Wei Zhuang , Hanying Feng , Hong Chen
发明人： Jun Ye , Yu Cao , Luoqi Chen , Ya Luo , Wei Zhuang , Hanying Feng , Hong Chen
IPC分类号： G06Q30/02
CPC分类号： G06Q30/0251
摘要： A method of providing targeted online advertisement includes receiving a request for an ad impression to be provided to a user in a network environment. The request includes a first content and a second content. The method also includes, using a processor, determining a context of the first content and a context of the second content, determining a correlation between the context of the first content and the context of the second content, and identifying a plurality of ads as candidates for consideration. The method further includes, using the processor, ranking the plurality of identified ads, selecting an ad among the plurality of identified ads based at least in part on a result of the ranking, and providing the selected ad as the ad impression to be displayed to the user in response to receiving the request.
摘要翻译：提供目标在线广告的方法包括在网络环境中接收要向用户提供的广告印象的请求。该请求包括第一内容和第二内容。该方法还包括使用处理器确定第一内容的上下文和第二内容的上下文，确定第一内容的上下文与第二内容的上下文之间的相关性，以及将多个广告标识为候选审议。所述方法还包括：使用所述处理器对所述多个识别的广告进行排名，至少部分地基于所述排名的结果来选择所述多个识别的广告中的广告，并且将所选择的广告提供为要显示的广告展示用户响应于接收到请求。

19. 发明授权

US08584056B2 Fast freeform source and mask co-optimization method 有权
标题翻译：快速自由源和掩码协同优化方法
公开(公告)号：US08584056B2
公开(公告)日：2013-11-12
申请号：US13130548
申请日：2009-11-20
申请人： Luoqi Chen , Jun Ye , Yu Cao
发明人： Luoqi Chen , Jun Ye , Yu Cao
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G03F1/144 , G03F1/36 , G03F7/70083 , G03F7/70125 , G03F7/70441 , G03F7/705 , G06F17/5068
摘要： The present invention relates to lithographic apparatuses and processes, and more particularly to tools for optimizing illumination sources and masks for use in lithographic apparatuses and processes. According to certain aspects, the present invention significantly speeds up the convergence of the optimization by allowing direct computation of gradient of the cost function. According to other aspects, the present invention allows for simultaneous optimization of both source and mask, thereby significantly speeding the overall convergence. According to still further aspects, the present invention allows for free-form optimization, without the constraints required by conventional optimization techniques.
摘要翻译：本发明涉及光刻设备和工艺，更具体地涉及用于优化用于光刻设备和工艺的照明源和掩模的工具。根据某些方面，本发明通过允许直接计算成本函数的梯度来显着加快优化的收敛。根据其他方面，本发明允许同时优化源和掩模，从而显着加速整体收敛。根据另外的方面，本发明允许自由形式优化，而不需要常规优化技术所要求的限制。

20. 发明授权

US08542340B2 Illumination optimization 有权
标题翻译：照明优化
公开(公告)号：US08542340B2
公开(公告)日：2013-09-24
申请号：US13003294
申请日：2009-07-07
申请人： Jun Ye , Yu Cao , Hanying Feng
发明人： Jun Ye , Yu Cao , Hanying Feng
IPC分类号： G03B27/32 , G03B27/68
CPC分类号： G03F7/70441 , G03F7/70091 , G03F7/70666
摘要： A method of optimizing an illumination pupil shape for a lithographic process comprises identifying a target pattern to be imaged by said lithographic process. It further comprises identifying at least one optimization point in said target pattern and identifying at least one design for manufacturing metric per optimization point. Additionally, it comprises selecting a set of illumination source points based on the identified at least one design for manufacturing metric and determining the illumination pupil shape based on the selected set of illumination source points.
摘要翻译：优化用于光刻工艺的照明光瞳形状的方法包括通过所述光刻工艺识别要成像的目标图案。其还包括识别所述目标图案中的至少一个优化点，并且识别用于制造每个优化点的度量的至少一个设计。另外，它包括基于所识别的用于制造度量的至少一个设计来选择一组照明源点，并且基于所选择的一组照明源点确定照明光瞳形状。

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