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11. 发明申请

US20090176363A1 Etching composition for an under-bump metallurgy layer and method of forming a bump structure using the same 有权
标题翻译：用于凸块下冶金层的蚀刻组合物和使用其形成凸块结构的方法
公开(公告)号：US20090176363A1
公开(公告)日：2009-07-09
申请号：US12292643
申请日：2008-11-21
申请人： Dong-Min Kang , Bo-Ram Kang , Young-Nam Kim , Young-Sam Lim
发明人： Dong-Min Kang , Bo-Ram Kang , Young-Nam Kim , Young-Sam Lim
IPC分类号： H01L21/441
CPC分类号： H01L21/32134 , C23F1/38 , H01L24/11 , H01L2224/05001 , H01L2224/05022 , H01L2224/05027 , H01L2224/05124 , H01L2224/05147 , H01L2224/05572 , H01L2224/05644 , H01L2224/05655 , H01L2224/05664 , H01L2224/05666 , H01L2224/05671 , H01L2224/05684 , H01L2224/13099 , H01L2224/16 , H01L2924/01005 , H01L2924/01006 , H01L2924/01011 , H01L2924/01013 , H01L2924/01018 , H01L2924/01019 , H01L2924/01022 , H01L2924/01023 , H01L2924/01024 , H01L2924/01029 , H01L2924/01033 , H01L2924/01046 , H01L2924/01047 , H01L2924/01074 , H01L2924/01078 , H01L2924/01079 , H01L2924/14 , H01L2924/00014
摘要： In an etching composition for an under-bump metallurgy (UBM) layer and a method of forming a bump structure, the etching composition includes about 40% by weight to about 90% by weight of hydrogen peroxide (H2O2), about 1% by weight to about 20% by weight of an aqueous basic solution including ammonium hydroxide (NH4OH) or tetraalkylammonium hydroxide, about 0.01% by weight to about 10% by weight of an alcohol compound, and about 2% by weight to 30% by weight of an ethylenediamine-based chelating agent. The etching composition may effectively etch the UBM layer including titanium or titanium tungsten and remove impurities. A method of forming a bump structure may employ such an etching composition.
摘要翻译：在用于凸块下冶金（UBM）层的蚀刻组合物和形成凸块结构的方法中，蚀刻组合物包含约40重量％至约90重量％的过氧化氢（H 2 O 2），约1重量％至约20重量％的包含氢氧化铵（NH 4 OH）或四烷基氢氧化铵的碱性水溶液，约0.01重量％至约10重量％的醇化合物，和约2重量％至30重量％的乙二胺类螯合剂。蚀刻组合物可以有效地蚀刻包括钛或钛钨的UBM层并除去杂质。形成凸块结构的方法可以采用这种蚀刻组合物。

12. 发明授权

US08110508B2 Method of forming a bump structure using an etching composition for an under bump metallurgy layer 有权
标题翻译：使用用于凸块下金属层的蚀刻组合物形成凸块结构的方法
公开(公告)号：US08110508B2
公开(公告)日：2012-02-07
申请号：US12292643
申请日：2008-11-21
申请人： Dong-Min Kang , Bo-Ram Kang , Young-Nam Kim , Young-Sam Lim
发明人： Dong-Min Kang , Bo-Ram Kang , Young-Nam Kim , Young-Sam Lim
IPC分类号： H01L21/28 , H01L21/306
CPC分类号： H01L21/32134 , C23F1/38 , H01L24/11 , H01L2224/05001 , H01L2224/05022 , H01L2224/05027 , H01L2224/05124 , H01L2224/05147 , H01L2224/05572 , H01L2224/05644 , H01L2224/05655 , H01L2224/05664 , H01L2224/05666 , H01L2224/05671 , H01L2224/05684 , H01L2224/13099 , H01L2224/16 , H01L2924/01005 , H01L2924/01006 , H01L2924/01011 , H01L2924/01013 , H01L2924/01018 , H01L2924/01019 , H01L2924/01022 , H01L2924/01023 , H01L2924/01024 , H01L2924/01029 , H01L2924/01033 , H01L2924/01046 , H01L2924/01047 , H01L2924/01074 , H01L2924/01078 , H01L2924/01079 , H01L2924/14 , H01L2924/00014
摘要： In an etching composition for an under-bump metallurgy (UBM) layer and a method of forming a bump structure, the etching composition includes about 40% by weight to about 90% by weight of hydrogen peroxide (H2O2), about 1% by weight to about 20% by weight of an aqueous basic solution including ammonium hydroxide (NH4OH) or tetraalkylammonium hydroxide, about 0.01% by weight to about 10% by weight of an alcohol compound, and about 2% by weight to 30% by weight of an ethylenediamine-based chelating agent. The etching composition may effectively etch the UBM layer including titanium or titanium tungsten and remove impurities. A method of forming a bump structure may employ such an etching composition.
摘要翻译：在用于凸块下冶金（UBM）层的蚀刻组合物和形成凸块结构的方法中，蚀刻组合物包含约40重量％至约90重量％的过氧化氢（H 2 O 2），约1重量％至约20重量％的包含氢氧化铵（NH 4 OH）或四烷基氢氧化铵的碱性水溶液，约0.01重量％至约10重量％的醇化合物，和约2重量％至30重量％的乙二胺类螯合剂。蚀刻组合物可以有效地蚀刻包括钛或钛钨的UBM层并除去杂质。形成凸块结构的方法可以采用这种蚀刻组合物。

13. 发明申请

US20120111048A1 REFRIGERATOR 审中-公开
标题翻译：冰箱
公开(公告)号：US20120111048A1
公开(公告)日：2012-05-10
申请号：US13383222
申请日：2009-07-14
申请人： Young-Nam Kim , Jong-Wook An , Chang-Woan Yang , Seong-Wook Kim
发明人： Young-Nam Kim , Jong-Wook An , Chang-Woan Yang , Seong-Wook Kim
IPC分类号： F25C1/00 , F25C5/18
CPC分类号： F25C1/24 , F25C1/10 , F25C2400/06 , F25C2400/10 , F25C2400/14 , F25D23/04 , F25D23/126 , F25D2323/021 , F25D2323/121
摘要： A refrigerator includes: a cabinet formed with a plurality of storage spaces divided; a first ice maker provided in any one of the plurality of storage spaces; a dispenser provided to a door, through which ice made in the first ice maker is discharged; a second ice maker provided in the storage space different from the storage space where the first ice maker is provided; and a water feeding passage branched such that it is possible to selectively supply water to the first ice maker and the second ice maker from a water supply source.
摘要翻译：冰箱包括：形成有多个分隔的储存空间的柜体; 设置在所述多个存储空间中的任何一个中的第一制冰机; 提供给门的分配器，第一制冰机中制成的冰被排出; 设置在与设置有第一制冰机的存储空间不同的存储空间中的第二制冰机; 以及分水口，使得能够从供水源向第一制冰机和第二制冰机选择性地供水。

14. 发明授权

US07674007B2 Backlight assembly, liquid crystal display apparatus having the same and method of manufacturing lamp-fixing member 失效
标题翻译：背光组件，具有该背光组件的液晶显示装置和制造灯固定部件的方法
公开(公告)号：US07674007B2
公开(公告)日：2010-03-09
申请号：US12191599
申请日：2008-08-14
申请人： Sang-Sun Han , Jae-Hwan Chun , Jong-Ho Won , Hyun-Chul Jeong , Won-Ju Kim , Young-Nam Kim
发明人： Sang-Sun Han , Jae-Hwan Chun , Jong-Ho Won , Hyun-Chul Jeong , Won-Ju Kim , Young-Nam Kim
IPC分类号： F21V19/00
CPC分类号： G02F1/133604 , G02F1/133606 , G02F1/133608
摘要： A backlight assembly includes a receiving container, lamps, a diffusion plate and a lamp-fixing member. The receiving container includes a bottom plate and sidewalls together providing a receiving space. The lamps are arranged substantially parallel to each other on the bottom plate. The diffusion plate is disposed over the lamps. The lamp-fixing member includes a body portion extending substantially perpendicular to the lamps, a buffer protruding upwardly from the body portion, a diffusion plate supporting portion protruding from the buffer to support the diffusion plate and a lamp-fixing portion formed at the body portion to fix the lamps. Therefore, the buffer having elasticity is formed at an area at which the diffusion plate supporting portion is formed, so that rubbing between the diffusion plate and the diffusion plate supporting portion may be reduced.
摘要翻译：背光组件包括接收容器，灯，漫射板和灯固定构件。接收容器包括底板和一起提供接收空间的侧壁。灯在底板上基本上彼此平行地布置。扩散板设置在灯的上方。灯固定构件包括基本上垂直于灯延伸的主体部分，从主体部分向上突出的缓冲器，从缓冲器突出以支撑扩散板的漫射板支撑部分和形成在主体部分处的灯固定部分固定灯。因此，在扩散板支撑部分形成的区域形成具有弹性的缓冲器，从而可以减小扩散板和扩散板支撑部分之间的摩擦。

15. 发明授权

US07566666B2 Composition for removing an insulation material and related methods 有权
标题翻译：去除绝缘材料的组成和相关方法
公开(公告)号：US07566666B2
公开(公告)日：2009-07-28
申请号：US11500434
申请日：2006-08-08
申请人： Chun-Deuk Lee , Jung-Jea Myung , Myun-Kyu Park , Dong-Min Kang , Byoung-Woo Son , Masayuki Takashima , Young-Nam Kim , Hyun-Joon Kim
发明人： Chun-Deuk Lee , Jung-Jea Myung , Myun-Kyu Park , Dong-Min Kang , Byoung-Woo Son , Masayuki Takashima , Young-Nam Kim , Hyun-Joon Kim
IPC分类号： H01L21/461
CPC分类号： H01L21/31111 , H01L21/02079
摘要： A composition for removing an insulation material and related methods of use are disclosed. The composition comprises about 1 to 50 percent by weight of an oxidizing agent, about 0.1 to 35 percent by weight of a fluorine-containing compound, and water. The insulation material comprises at least one of a low-k material and a protection material.
摘要翻译：公开了一种用于除去绝缘材料的组合物和相关使用方法。该组合物包含约1-50重量％的氧化剂，约0.1-35重量％的含氟化合物和水。绝缘材料包括低k材料和保护材料中的至少一种。

16. 发明申请

US20080069429A1 Method and Apparatus for Registering a Reference Image, and Method and Apparatus for Testing a Pattern Using the Same 审中-公开
标题翻译：用于注册参考图像的方法和装置，以及用于测试使用其的图案的方法和装置
公开(公告)号：US20080069429A1
公开(公告)日：2008-03-20
申请号：US11777479
申请日：2007-07-13
申请人： Byung-Sam Choi , Bong-Su Kim , Young-Nam Kim , Ho-Seong Kang , Joung-Soo Kim , Jun-Seog Kim
发明人： Byung-Sam Choi , Bong-Su Kim , Young-Nam Kim , Ho-Seong Kang , Joung-Soo Kim , Jun-Seog Kim
IPC分类号： G06K9/00
CPC分类号： G06K9/64
摘要： A method of registering a reference image includes obtaining information of layers in a design pattern that is used for forming an actual pattern on a substrate and comparing the information to obtain a difference therebetween. The method further includes obtaining a reference image for testing the actual pattern based on the difference. Thus, the reference image, which is obtained from the design pattern, but not from the actual pattern, may include information on all of the actual patterns on the substrate.
摘要翻译：登记参考图像的方法包括获得用于在基板上形成实际图案的设计图案中的层的信息，并比较信息以获得它们之间的差异。该方法还包括基于差异获得用于测试实际图案的参考图像。因此，从设计图案而不是从实际图案获得的参考图像可以包括关于基板上的所有实际图案的信息。

17. 发明申请

US20070273030A1 Semiconductor device having metal lines with slits 有权
标题翻译：具有狭缝的金属线的半导体装置
公开(公告)号：US20070273030A1
公开(公告)日：2007-11-29
申请号：US11882805
申请日：2007-08-06
申请人： Sang-Hyun Yi , Young-Nam Kim
发明人： Sang-Hyun Yi , Young-Nam Kim
IPC分类号： H01L23/522
CPC分类号： H01L23/562 , H01L21/8221 , H01L23/528 , H01L23/585 , H01L27/0688 , H01L27/11 , H01L27/1104 , H01L27/1108 , H01L27/1112 , H01L27/115 , H01L27/11521 , H01L27/11551 , H01L27/11568 , H01L2924/0002 , H01L2924/00
摘要： A semiconductor device including a semiconductor substrate, an integrated circuit on the semiconductor substrate, an insulation layer covering the integrated circuit, and a plurality of metal line patterns on the insulation layer. First and second adjacent metal line patterns of the plurality of metal line patterns are spaced apart from each other by a space, and each of the first and second adjacent metal line patterns has at least one slit.
摘要翻译：包括半导体衬底，半导体衬底上的集成电路，覆盖集成电路的绝缘层和绝缘层上的多个金属线图案的半导体器件。多个金属线图案的第一和第二相邻的金属线图案彼此间隔一个间隔，并且第一和第二相邻金属线图案中的每一个具有至少一个狭缝。

18. 发明申请

US20070163678A1 Gold or silver particles with paramagnetism, and composition containing thereof 审中-公开
标题翻译：具有顺磁性的金或银颗粒，以及含有它们的组合物
公开(公告)号：US20070163678A1
公开(公告)日：2007-07-19
申请号：US10588135
申请日：2005-04-01
申请人： Young-Nam Kim
发明人： Young-Nam Kim
IPC分类号： B22F9/14 , H01F1/20
CPC分类号： A61K8/0212 , A01N59/16 , A61K8/19 , A61K2800/413 , A61Q1/02 , A61Q9/04 , A61Q11/00 , A61Q19/00 , A61Q19/08 , A61Q19/10 , B22F1/0018 , B22F9/12 , B22F2001/0029 , B22F2999/00 , B82Y5/00 , B82Y25/00 , B82Y30/00 , C22C2202/02 , H01F1/0018 , H01F1/0063 , B22F2202/13 , B22F2207/15
摘要： The present invention is related to gold or silver powder characterized by having paramagnetism. The gold or silver powder according to the present invention is a paramagnetic gold or silver powder having magnetism in the same direction as that of the external magnetic field in all temperature ranges. The paramagnetic gold or silver powder according to the present invention shows an extremely small coercive force, has no surface oxidation layers, is stable at a room temperature, has no cohesive property, and is highly dispersible.
摘要翻译：本发明涉及以具有顺磁性为特征的金或银粉。根据本发明的金或银粉末是在所有温度范围内具有与外部磁场相同方向的磁性的顺磁性金或银粉末。根据本发明的顺磁性金或银粉显示出非常小的矫顽力，没有表面氧化层，在室温下是稳定的，没有内聚性，并且是高度分散的。

19. 发明授权

US08034640B2 Apparatus and method to inspect defect of semiconductor device 失效
标题翻译：检测半导体器件缺陷的装置和方法
公开(公告)号：US08034640B2
公开(公告)日：2011-10-11
申请号：US12627222
申请日：2009-11-30
申请人： Ji-Young Shin , Young-Nam Kim , Jong-An Kim , Hyung-Suk Cho , Yu-Sin Yang
发明人： Ji-Young Shin , Young-Nam Kim , Jong-An Kim , Hyung-Suk Cho , Yu-Sin Yang
IPC分类号： G01R31/26 , H01L21/66
CPC分类号： H01J37/241 , H01J37/265 , H01J37/28 , H01L22/12
摘要： An apparatus and method to inspect a defect of a semiconductor device. The amount of secondary electrons generated due to a scanning electron microscope (SEM) may depend on the topology of a pattern of a semiconductor substrate. The amount of secondary electrons emitted from a recess of an under layer is far smaller than that of secondary electrons emitted from a projection of a top layer. Since the recess is darker than the projection, a ratio of a value of a secondary electron signal of the under layer to a value of a secondary electron signal of the top layer may be increased in order to improve a pattern image used to inspect a defect in the under layer. To do this, a plurality of conditions under which electron beams (e-beams) are irradiated may be set, at least two may be selected out of the set conditions, and the pattern may be scanned under the selected conditions. Thus, secondary electron signals may be generated according to the respective conditions and converted into image data so that various pattern images may be displayed on a monitor. Scan information on the pattern images may be automatically stored in a computer storage along with positional information on a predetermined portion of the semiconductor substrate. When calculation conditions are input to a computer, each of scan information on the pattern images may be calculated to generate a new integrated pattern image.
摘要翻译：一种用于检查半导体器件的缺陷的装置和方法。由扫描电子显微镜（SEM）产生的二次电子量可能取决于半导体衬底图案的拓扑结构。从下层的凹部发射的二次电子的量远远小于从顶层的投影发射的二次电子的量。由于凹部比投影更暗，所以可以增加下层的二次电子信号的值与顶层的二次电子信号的值的比例，以便改善用于检查缺陷的图案图像在下层。为此，可以设置照射电子束（电子束）的多个条件，可以从设定条件中选择至少两个，并且可以在所选择的条件下扫描图案。因此，可以根据各自的条件生成二次电子信号，并将其转换为图像数据，从而可以在监视器上显示各种图案图像。关于图案图像的扫描信息可以与位于半导体基板的预定部分上的位置信息一起自动存储在计算机存储器中。当将计算条件输入到计算机时，可以计算每个关于图案图像的扫描信息，以生成新的集成图案图像。

20. 发明授权

US07842623B2 Composition for removing an insulation material and related methods 有权
标题翻译：去除绝缘材料的组成和相关方法
公开(公告)号：US07842623B2
公开(公告)日：2010-11-30
申请号：US12494572
申请日：2009-06-30
申请人： Chun-Deuk Lee , Jung-Jea Myung , Myun-Kyu Park , Dong-Min Kang , Byoung-Woo Son , Masayuki Takashima , Young-Nam Kim , Hyun-Joon Kim
发明人： Chun-Deuk Lee , Jung-Jea Myung , Myun-Kyu Park , Dong-Min Kang , Byoung-Woo Son , Masayuki Takashima , Young-Nam Kim , Hyun-Joon Kim
IPC分类号： H01L21/00 , C11D7/32
CPC分类号： H01L21/31111 , H01L21/02079
摘要： A composition for removing an insulation material and related methods of use are disclosed. The composition comprises about 1 to 50 percent by weight of an oxidizing agent, about 0.1 to 35 percent by weight of a fluorine-containing compound, and water. The insulation material comprises at least one of a low-k material and a protection material.
摘要翻译：公开了一种用于除去绝缘材料的组合物和相关使用方法。该组合物包含约1-50重量％的氧化剂，约0.1-35重量％的含氟化合物和水。绝缘材料包括低k材料和保护材料中的至少一种。

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